G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2006
10/24/2006	US7125653 Method of producing conductive or semiconducting structured polymers
10/24/2006	US7125652 Immersion lithographic process using a conforming immersion medium
10/24/2006	US7125651 Method of manufacturing semiconductor integrated circuit device optical mask therefor, its manufacturing method, and mask blanks
10/24/2006	US7125650 Quenching dissolved oxygen in the photosensitive layer by pre-exposing the layer to actinic radiation, wherein the range of wavelengths spanned by the radiation is no more than 20 nm, followed by imagewise exposing the layer to actinic radiation to crosslink and cure it
10/24/2006	US7125649 Liquid transfer articles and method for producing the same using digital imaging photopolymerization
10/24/2006	US7125648 Method for forming images
10/24/2006	US7125647 Radiation-sensitive composition changing in refractive index and utilization thereof
10/24/2006	US7125646 Printing plate material and printing process
10/24/2006	US7125645 Composite photoresist for pattern transferring
10/24/2006	US7125643 Polymers, resist compositions and patterning process
10/24/2006	US7125642 Fluorinated vinyl sulfonate compound for use as monomer
10/24/2006	US7125641 Polymers, resist compositions and patterning process
10/24/2006	US7125640 Resist for photolithography having reactive groups for subsequent modification of the resist structures
10/24/2006	US7125639 Molecular transfer lithography
10/24/2006	US7125584 Dropping a liquid adjusted to be spread into a give amount on a substrate to be processed from a dropping nozzle or dropping nozzles of a dropping unit onto the substrate, and then moving the dropping unit and substrate
10/24/2006	US7125496 Etching method using photoresist etch barrier
10/24/2006	US7125008 Air-spring vibration isolation device
10/24/2006	US7124994 Silicon micro-mold
10/24/2006	US7124624 High-resolution gas gauge proximity sensor
10/24/2006	CA2266263C Thermally reactive near infrared absorption polymer coatings, method of preparing and methods of use
10/19/2006	WO2006110073A1 Method for a multiple exposure beams lithopraphy tool
10/19/2006	WO2006110070A1 Image enhancement technique
10/19/2006	WO2006110035A1 Microsieve membrane for emulsification and lithographic method of making the same
10/19/2006	WO2006109890A1 Photosensitive resin composition, printed wiring board, and semiconductor package substrate
10/19/2006	WO2006109721A1 Material for pattern formation, apparatus for pattern formation, and method for pattern formation
10/19/2006	WO2006109709A1 Data generating method, data generating device, and program
10/19/2006	WO2006109514A1 Photosensitive resin composition and circuit substrate employing the same
10/19/2006	WO2006109454A1 Photosensitive lithographic printing plate
10/19/2006	WO2006109343A2 Process for the formation of miniaturized getter deposits and getterdeposits so obtained
10/19/2006	WO2006109185A2 Nanocomposite photoresist composition for imaging thick films
10/19/2006	WO2006109121A2 Nanocomposite photosensitive composition and use thereof
10/19/2006	WO2006060218A3 Coextruded toner receiver layer for electrophotography
10/19/2006	WO2005094399A3 High performance water-based primer
10/19/2006	WO2005057281A3 Resist, barc and gap fill material stripping chemical and method
10/19/2006	WO2004108769A3 Composition and method of use thereof
10/19/2006	WO2003087206A3 Patterned polymeric structures, particularly microstructures, and methods for making same
10/19/2006	US20060236295 Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems
10/19/2006	US20060236294 Computer-implemented methods for detecting defects in reticle design data
10/19/2006	US20060235101 Actinic radiation curable compositions and their use
10/19/2006	US20060234168 Pattern forming materials and pattern formation method using the materials
10/19/2006	US20060234167 Semiconductor constructions
10/19/2006	US20060234166 Method of forming pattern using fine pitch hard mask
10/19/2006	US20060234165 Photomasks; etching; photolithography
10/19/2006	US20060234162 Lithographic printing with printing members including an oleophilic metal and plasma polymer layers
10/19/2006	US20060234161 Method of making a lithographic printing plate precursor
10/19/2006	US20060234160 Novel ester compounds, polymers, resist compositions and patterning process
10/19/2006	US20060234158 Bottom resist layer composition and patterning process using the same
10/19/2006	US20060234157 Composition and method for printing a patterned resist layer
10/19/2006	US20060234156 Composition for formation of underlayer film for lithography containing epoxy compound and carboxylic acid compound
10/19/2006	US20060234155 Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon
10/19/2006	US20060234154 Mixture containing acid generator and free radical catalyst; acrylated ester monomer
10/19/2006	US20060234153 hydroxyalkyl-norbornyl acrylate type (co)polymer with an acid generator; chemically-amplified resist useful for microfabrication utilizing various types of radiation
10/19/2006	US20060234152 Method for thermal development of a photosensitive element using an oriented development medium
10/19/2006	US20060234151 Functional organic thin film, organic thin-film transistor, and methods for producing these
10/19/2006	US20060233300 Illumination system particularly for microlithography
10/19/2006	US20060232757 Projection exposure apparatus, cleaning and maintenance methods of a projection exposure apparatus, and device manufacturing method
10/19/2006	US20060232754 Lithographic apparatus and device manufacturing method
10/19/2006	US20060231982 Viscosity reducible radiation curable resin composition
10/19/2006	US20060231731 Method of determining optical properties and projection exposure system comprising a wavefront detection system
10/19/2006	US20060231206 Exposure apparatus and device manufacturing method
10/19/2006	US20060231204 Portable system for semiconductor manufacturing
10/19/2006	US20060231025 Programmed material consolidation systems employing object release elements securable to platens for facilitating removal of fabricated objects therefrom
10/19/2006	US20060230964 Method and device for manufacturing relief printing plate terminal for seamless printing
10/19/2006	US20060230962 Coating method and planographic printing plate
10/19/2006	DE102006014510A1 Optical instrument to determine image aberration, contrast, light scatter characteristics, light transmission characteristics of immersed micro-lithographic lenses
10/19/2006	DE102006008708A1 Automatisierte Brennpunktrückkopplung für ein optisches Lithographiewerkzeug Automated focal point feedback for an optical lithography tool
10/19/2006	DE102004044039A9 Verfahren zur Entwicklung und/oder Herstellung von Halbleiter-Chips A method for developing and / or manufacturing of semiconductor chips
10/19/2006	DE10147011B4 Chemisch verstärkte Resistzusammensetzung und Verfahren zur Bildung eines gemusterten Films unter Verwendung derselben A chemically amplified resist composition and method for forming a patterned film using the same
10/19/2006	CA2602808A1 Process for the formation of miniaturized getter deposits and getter deposits so obtained
10/18/2006	EP1713115A1 Exposure apparatus, exposure method, and device producing method
10/18/2006	EP1713114A1 Exposure apparatus and method of producing device
10/18/2006	EP1713113A1 Stage drive method and stage drive apparatus, exposure apparatus, and device producing method
10/18/2006	EP1712955A2 Optical unit and exposure apparatus having the same
10/18/2006	EP1712954A1 A method, program product and apparatus for performing double exposure lithography
10/18/2006	EP1712537A1 Calixarene compound, process for producing the same, intermediate therefor, and composition thereof
10/18/2006	EP1711862A2 Functionalized photoinitiators
10/18/2006	EP1711861A2 Structured materials and methods
10/18/2006	EP1711724A1 Actuator arrangement for active vibration isolation using a payload as an inertial reference mass
10/18/2006	EP1711542A2 Directly photodefinable polymer compositions and methods thereof
10/18/2006	EP1613707B1 Radiation-cured substances
10/18/2006	EP1484756B1 Optical information medium
10/18/2006	EP1307783B1 Photoinitiated reactions
10/18/2006	EP1282523B1 Ink receptor sheet and its process of use
10/18/2006	EP1275029A4 Scanning framing blade apparatus
10/18/2006	EP1218798B1 Method for generating a set of masks for manufacture of an integrated circuit
10/18/2006	CN2828877Y Exposure device
10/18/2006	CN1849711A Adjustment of masks by re-flow
10/18/2006	CN1849701A Plasma processing device and ashing method
10/18/2006	CN1849561A Adaptive thermal control of lithographic chemical processes
10/18/2006	CN1849560A Photosensitive resin composition and pattern forming method using the composition
10/18/2006	CN1849559A Positive photoresist composition and resist pattern formation
10/18/2006	CN1849558A Method for preparing photosensitive aqueous developable coating composition
10/18/2006	CN1849557A Dissolution inhibitors in photoresist compositions for microlithography
10/18/2006	CN1849556A Laminated photosensitive relief printing original plate and method for producing the relief printing plate
10/18/2006	CN1849386A Cleaning composition, method of cleaning semiconductor substrate, and method of forming wiring on semiconductor substrate
10/18/2006	CN1848374A Method for controlling formula in silicon chip etching technology
10/18/2006	CN1848303A Black conductive compositions, black electrodes, and methods of forming thereof
10/18/2006	CN1847987A Lithographic apparatus and device manufacturing method
10/18/2006	CN1847986A Thin film transistor, integrated circuit, liquid crystal display, method of producing thin film transistor, and method of exposure using attenuated type mask
10/18/2006	CN1847985A Printed circuit board exposure machine

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