G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2006
10/26/2006	US20060241012 Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith
10/26/2006	US20060240580 Method for evaluating reproduced images of wafers
10/26/2006	US20060240364 Apparatus and method for making circuitized substrates having photo-imageable dielectric layers in a continuous manner
10/26/2006	US20060240363 Semiconductor device with robust polysilicon fuse
10/26/2006	US20060240362 Method to align mask patterns
10/26/2006	US20060240361 Method of forming small pitch pattern using double spacers
10/26/2006	US20060240359 Patterning process and contact structure
10/26/2006	US20060240356 Positive type photosensitive epoxy resin composition and printed circuit board using the same
10/26/2006	US20060240355 Positive resist composition and resist laminate for low-acceleration electron beam and mehod of pattern formation
10/26/2006	US20060240344 Method of manufacture of polymer arrays
10/26/2006	US20060240341 Mask, manufacturing method for mask, and manufacturing method for semiconductor device
10/26/2006	US20060240330 Exposure method, mask, semiconductor device manufacturing method, and semiconductor device
10/26/2006	US20060240222 Pellicle and novel fluoropolymer
10/26/2006	US20060239309 Two-stage laser pulse energy control device and two-stage laser system
10/26/2006	US20060239129 Nanometer scale data storage device and associated positioning system
10/26/2006	US20060238883 Projection optical system and projection exposure apparatus
10/26/2006	US20060238749 Flare measuring method and flare measuring apparatus, exposure method and exposure apparatus, and exposure apparatus adjusting method
10/26/2006	US20060238738 Projecting exposure apparatus
10/26/2006	US20060238730 Exposure apparatus and method for producing device
10/26/2006	US20060238729 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
10/26/2006	US20060238728 Optical error minimization in a semiconductor manufacturing apparatus
10/26/2006	US20060237668 Dual hemispherical collectors
10/26/2006	US20060237639 Scanning probe microscope assembly and method for making spectrophotometric, near-filed, and scanning probe measurements
10/26/2006	US20060237127 after exposing and developing substrate, supplying solvent gas of treatment film to dissolve surface, supplying solvent gas (vapor of acetone); surface treatment; photoresists; photolithography; semiconductors
10/26/2006	US20060236793 Sensor device for non-intrusive diagnosis of a semiconductor processing system
10/26/2006	DE102006013560A1 Projection lens for micro lithographic projection illumination system, has lens , to characterizes symmetry axis of another lens by rotation of orientation of crystal axes, where lenses are separated by gap filled with liquid
10/26/2006	DE102006008075A1 Belichtungsanlage Exposure system
10/26/2006	DE102005019726A1 Projection objective lens mounting and aligning method, for lithography, involves assembling optical units to form lens, which is mounted/aligned based on azimuth angular position, which is determined based on inhomogeneities of one unit
10/26/2006	DE102005018737A1 Photomask structure transferring method for use in semiconductor technology, involves applying photoresist layer on organic anti-reflection layer, and exposing, in section, photoresist layer by imaging device and photomask
10/26/2006	DE102005008478B3 Verfahren zur Herstellung von sublithographischen Strukturen A process for producing sublithographic structures
10/26/2006	CA2605236A1 Non-aqueous photoresist stripper that inhibits galvanic corrosion
10/25/2006	EP1715386A1 Replenisher for photosensitive planographic printing plate and plate making method using the same
10/25/2006	EP1715385A2 Measuring apparatus and exposure apparatus having the same
10/25/2006	EP1715384A2 Lithographic apparatus and positioning apparatus
10/25/2006	EP1715383A2 Illumination system
10/25/2006	EP1715382A1 Process of preparing planographic printing plate
10/25/2006	EP1715381A1 Photosensitive resin composition and cured product thereof
10/25/2006	EP1715380A2 Exposure apparatus, method applied to the apparatus, and device manufacturing method
10/25/2006	EP1715373A1 Column spacer, liquid crystal display element and curable resin composition for column spacer
10/25/2006	EP1715007A2 Pigment dispersants and their use
10/25/2006	EP1714193A1 Image enhancement for multiple exposure beams
10/25/2006	EP1714192A1 Projection objective for a microlithographic projection exposure apparatus
10/25/2006	EP1714189A2 Uv radiation blocking protective layers compatible with thick film pastes
10/25/2006	EP1596424A9 Exposure apparatus and optical member for exposure apparatus
10/25/2006	EP1481284A4 Method of passivating of low dielectric materials in wafer processing
10/25/2006	EP1436670A4 Determination of center of focus by cross-section analysis
10/25/2006	EP1194693B1 Microfabricated elastomeric valve and pump systems
10/25/2006	CN1853264A System and method for integrating in-situ metrology within a wafer process
10/25/2006	CN1853142A Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system
10/25/2006	CN1853141A Compound for resist and radiation-sensitive composition
10/25/2006	CN1853140A Positive photoresist composition and method of forming resist pattern
10/25/2006	CN1853139A Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography
10/25/2006	CN1853138A 光致抗蚀剂组合物 The photoresist composition
10/25/2006	CN1851559A Photoetching machine synchronous sequential control serial data communication method and system and use
10/25/2006	CN1851558A Overload buffer protection device
10/25/2006	CN1851557A Two-dimensional scanning precision laser exposure system
10/25/2006	CN1851556A Adjusting method for long mask exposure focusing plane correction
10/25/2006	CN1851547A Transflective liquid crystal display and manufacturing method of the same
10/25/2006	CN1850881A Photo-sensitive polyimide, and its preparing method
10/25/2006	CN1850798A Diphenyl ketone photo initiator containing sulfur and its preparing method
10/25/2006	CN1850783A Constitutive photo-sensitive diethylenetriamine, and its preparing method
10/25/2006	CN1850782A Diethylenetriamine containing diphenyl ether and diphenyl ketone, and its preparing method
10/25/2006	CN1850780A Photo-sensitive diethylenetriamine, and its preparing method
10/25/2006	CN1282219C Pattern forming method and method for manufacturing seniconductor applying said method
10/25/2006	CN1282040C Exposure method and exposure device
10/25/2006	CN1282039C Lithographic apparatus, device manufacturing method, and method of manufacturing an optical element
10/25/2006	CN1282038C Projection lithography method using a phase shifting aperture
10/25/2006	CN1282037C Method for mfg. printed wiring board and photosenstive resin compsn. to be used for it
10/25/2006	CN1282036C Resist curable resin composition and cured article thereof
10/25/2006	CN1282035C Positive photoresist composition for discharge nozzle type coating process and anticorrosive pattern forming method
10/25/2006	CN1282034C Light, heat, electronic beam acid generating source containing 2, 1, 4,- heavy nitrogen naphthaquinone sulfuryl and preparing process thereof
10/25/2006	CN1282033C Pattern formation method and exposure device
10/25/2006	CN1282032C Exposure control for phase shifting photolithographic masks
10/25/2006	CN1282031C Photosensitive composition
10/25/2006	CN1281577C Photosensitive quaternary ammonium salt and its preparation method and use
10/25/2006	CN1281420C Photosenstivie resin compositive for printing plate precursor capable of laser engraving and printing plate precursor using the same
10/24/2006	US7127319 Reducing asymmetrically deposited film induced registration error
10/24/2006	US7127311 Exposure apparatus and device manufacturing method
10/24/2006	US7126766 Optical stop apparatus and exposure apparatus having the same
10/24/2006	US7126765 Objective with fluoride crystal lenses
10/24/2006	US7126757 Illumination apparatus, exposure apparatus using the same, and device fabricating method
10/24/2006	US7126745 Method of irradiating ultraviolet light onto an object
10/24/2006	US7126724 Flexographic printing
10/24/2006	US7126692 Device for holding measurement instruments
10/24/2006	US7126689 Exposure method, exposure apparatus, and method for producing device
10/24/2006	US7126674 Positioning device and device manufacturing method
10/24/2006	US7126673 Illumination optical system and exposure apparatus having the same
10/24/2006	US7126671 Lithographic apparatus and device manufacturing method
10/24/2006	US7126670 Position measurement technique
10/24/2006	US7126668 Apparatus and process for determination of dynamic scan field curvature
10/24/2006	US7126667 Exposure apparatus and method
10/24/2006	US7126666 Lithographic apparatus, device manufacturing method and device manufactured thereby
10/24/2006	US7126231 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device
10/24/2006	US7126143 Method and device for producing extreme ultraviolet radiation and soft x-ray radiation
10/24/2006	US7126141 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method
10/24/2006	US7126140 Multi-electron beam exposure method and apparatus
10/24/2006	US7126137 Illumination system with field mirrors for producing uniform scanning energy
10/24/2006	US7125943 Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions
10/24/2006	US7125942 Acrylic esters of 2-cyano-2, 4 pentenedioic acid
10/24/2006	US7125806 Etching method

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