G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2006
11/01/2006	CN1855419A Manufacture by Dimashg process
11/01/2006	CN1855367A Method for forming a semiconductor device including a plasma ashing treatment for removal of photoresist
11/01/2006	CN1854909A Method and apparatus for positioning a mask
11/01/2006	CN1854908A Apparatus and method for heating substrate and coating and developing system
11/01/2006	CN1854907A Substrate processing method and semiconductor manufacturing method
11/01/2006	CN1854906A Method for compensating the different responses between the individual micro lens in the micro lens array
11/01/2006	CN1854905A Method for compensating the energy differences in height comparison layer and step radiation of the workpiece
11/01/2006	CN1854904A Method for adjusting the geometric pictures in the grating images
11/01/2006	CN1854903A Method for computing values related to parts of multi-value picture element of the polygon brims
11/01/2006	CN1854902A Method for representing
11/01/2006	CN1854901A Lithogaphic apparatus and positioning apparatus
11/01/2006	CN1854900A Polarized light illumination device
11/01/2006	CN1854899A Lithography measurements using scatterometry
11/01/2006	CN1854898A Coating and developing system
11/01/2006	CN1854897A Photosensitive epoxy resin adhesive composition and use thereof
11/01/2006	CN1854896A Radiation sensitive resin composite, prominency formed therewith, separator and its producing method and liquid crystal display component
11/01/2006	CN1854895A Radiation sensitive resin composite, prominency formed therewith, separator and its producing method and liquid crystal display component
11/01/2006	CN1854894A Black matrix composition and method of forming black matrix pattern using same
11/01/2006	CN1854893A Photomask
11/01/2006	CN1854892A Photomask, method of generating mask pattern, and method of manufacturing semiconductor device
11/01/2006	CN1854890A Method for sectionalizing the micro lens array
11/01/2006	CN1854889A System and method for manufacturing a mask for semiconductor processing
11/01/2006	CN1854888A Alternative phase-shifting light mask and its solution for phase conflict
11/01/2006	CN1854877A Monochip integrating method for electric absorbing modulator of light amplifier and moulding spot converter
11/01/2006	CN1854872A Method for fabricating thin film transistor of liquid crystal display device
11/01/2006	CN1854871A LCD disply device and manufacture thereof
11/01/2006	CN1854848A Color filter panel and method of manufacturing the same, and transflective liquid crystal display using such a color filter panel
11/01/2006	CN1854841A Method of manufacturing a liquid crystal display device
11/01/2006	CN1854824A A spacer arrangement for a liquid crystal display panel and fabrication method thereof
11/01/2006	CN1854821A Assembling method of liquid-crystal panel and its liquid-crystal panel
11/01/2006	CN1854771A Spectral purity filter for multi-layer mirror, lithographic apparatus and device manufacturing method
11/01/2006	CN1854133A Heterocycle-bearing onium salts
11/01/2006	CN1283133C Method for generating conductive structure on non-plane surface and use thereof
11/01/2006	CN1282991C Method for making mask, semiconductor device and its mfg. method, method for mfg. recording medium
11/01/2006	CN1282986C Enhanced resist strip in dielectric ethcher using downstream plasma
11/01/2006	CN1282904C Exposure method for once scanning two common exposure areas
11/01/2006	CN1282903C Photoetching device and method for manufacturing device
11/01/2006	CN1282902C Photoetching agent pattern thickening material, photoetching patterns and their forming process, semiconductor device and manufacturing process thereof
11/01/2006	CN1282901C Radioactive ray sensitive composition, black array, color filter and color liquid crystal display device
11/01/2006	CN1282900C Peltier heat circulation nano impressing device
11/01/2006	CN1282713C Photosensitive polyimide resin precursor composition, optical polyimide, light wave guide tube and process for producing the same
10/2006
10/31/2006	US7131102 Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era
10/31/2006	US7131101 Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects
10/31/2006	US7130762 Method and system for handling substrates in a production line including a cluster tool and a metrology tool
10/31/2006	US7130129 Reticle-masking objective with aspherical lenses
10/31/2006	US7130056 System and method of using a side-mounted interferometer to acquire position information
10/31/2006	US7130049 Method of measurement, method for providing alignment marks, and device manufacturing method
10/31/2006	US7130029 Methods and systems for determining an adhesion characteristic and a thickness of a specimen
10/31/2006	US7130025 Illumination apparatus, exposure apparatus and device manufacturing method
10/31/2006	US7130024 Exposure apparatus
10/31/2006	US7130023 Lithographic apparatus, mirror element, device manufacturing method, and beam delivery system
10/31/2006	US7130022 Methods and systems for controlling radiation beam characteristics for microlithographic processing
10/31/2006	US7130021 Exposure apparatus, and device manufacturing method
10/31/2006	US7130020 Roll printer with decomposed raster scan and X-Y distortion correction
10/31/2006	US7130019 Lithographic apparatus and device manufacturing method
10/31/2006	US7130018 Catoptric projection optical system, exposure apparatus and device fabrication method
10/31/2006	US7130017 Device for sealing a projection exposure apparatus
10/31/2006	US7130016 Exposure apparatus and device manufacturing method
10/31/2006	US7130015 Inert-gas purge method, exposure apparatus, device fabrication method and devices
10/31/2006	US7129199 Reducing defects in the manufacture of semiconductor devices by contacting with acetylenic diol derivatives
10/31/2006	US7129157 Method for fabricating an integrated circuit
10/31/2006	US7129029 For selectively removing photoresist residues from a microstructure
10/31/2006	US7129028 Method of forming holographic grating
10/31/2006	US7129027 Method of manufacturing microlens array
10/31/2006	US7129026 Lithographic process for multi-etching steps by using single reticle
10/31/2006	US7129025 Fabrication method of a three-dimensional microstructure
10/31/2006	US7129024 Electron beam lithography method
10/31/2006	US7129023 Photoresist polymer and photoresist composition containing the same
10/31/2006	US7129022 Photo-polymerization type photo-sensitive electrode paste composition for plasma display panel and fabricating method thereof
10/31/2006	US7129021 Substrate coated with a hydrophilic layer of a mixture of a crosslinkable polymer and a thermally active crosslinking metal salt and that becomes less hydrophilic on radiation crosslinking, and an overcoat eluable in aqueous media
10/31/2006	US7129020 Liquid coating composition for forming a top antireflective film and photoresist laminate using the same, as well as method for forming photoresist pattern
10/31/2006	US7129018 Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same
10/31/2006	US7129017 Chemically amplified resist composition and method for forming patterned film using same
10/31/2006	US7129016 Positive resist containing naphthol functionality
10/31/2006	US7129015 Addition copolymers and/or terpolymers having high transmittance at short wavelengths and high etch resistance, used as photoresists in lithography, to form high speed integrated circuits; efficiency; electrical and electronic apparatus
10/31/2006	US7129014 For F2 excimer laser photolithography comprising a alkali-insoluble protected hydroxy-containing fluoropolymer, an epoxy compound and an onium acid generator; deprotection; sensitivity, resolution; durability; dry etching resistance
10/31/2006	US7129011 polybenzoxazoles; latent crosslinker; relief images
10/31/2006	US7129009 vinyl fluoropolymers and fluorinated liquids useful in the manufacture of articles transparent to ultraviolet radiation at wavelengths from approximately 150 nanometer to 200 nanometers; semiconductors
10/31/2006	US7129008 Holographic recording material
10/31/2006	US7129006 Optical recording medium comprising photoactive polymers used for holography and data processing; recording
10/31/2006	US7128551 Surface smoothing of stereolithographically formed 3-D objects
10/31/2006	US7128481 Substrate processing apparatus for inspecting processing history data
10/26/2006	WO2006113492A2 Adjustable solubility in sacrificial layers for microfabrication
10/26/2006	WO2006112994A1 Non-aqueous photoresist stripper that inhibits galvanic corrosion
10/26/2006	WO2006112699A1 Liquid immersion lithography system comprising a tilted showerhead
10/26/2006	WO2006112555A1 Method of and system for drawing
10/26/2006	WO2006112554A1 Method of and system for drawing
10/26/2006	WO2006112484A1 Convey error measuring method, calibration method, plotting method, exposure plotting method, plotting device, and exposure plotting device
10/26/2006	WO2006112446A1 Compound, dissolution inhibitor, positive-working resist composition, and method for resist pattern formation
10/26/2006	WO2006112436A1 Exposure device, exposure method, and device manufacturing method
10/26/2006	WO2006112137A1 Pattern forming method
10/26/2006	WO2006111896A2 Device for directing radiation to a layer, apparatus with such device and method using such apparatus
10/26/2006	WO2006111319A2 Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system
10/26/2006	WO2006080972A3 System and method for forming well-defined periodic patterns using achromatic interference lithography
10/26/2006	WO2006031455A3 Lithography technique using silicone molds
10/26/2006	WO2006024998A3 A laser projection system
10/26/2006	WO2005086901A3 Cynoadamantyl compound and polymers and photoresists compresing same
10/26/2006	US20060241894 Position detecting device and position detecting method
10/26/2006	US20060241259 for photopolymerization; photography, relief imaging; color filters
10/26/2006	US20060241208 Photo-curable resin composition and sealing agent for flat panel display using the same

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