G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2006
11/07/2006	US7133118 Lithographic apparatus and device manufacturing method
11/07/2006	US7133117 Dual sided lithographic substrate imaging
11/07/2006	US7133116 Defect mitigation in spatial light modulator used for dynamic photolithography
11/07/2006	US7132550 Process for the preparation of cyanine dyes with polysulfonate anions
11/07/2006	US7132225 Methods of inspecting a lithography template
11/07/2006	US7132224 Pattern formation method
11/07/2006	US7132221 Method to print photoresist lines with negative sidewalls
11/07/2006	US7132220 reaction product of an organohydrogenpolysiloxane, an alkenyl-organopolysiloxane and a diallyl bi- or bisphenol; curable by exposure to radiation having a wide range of wavelength; highly elastic, transparent, minute pattern
11/07/2006	US7132219 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
11/07/2006	US7132218 Chemically amplified positive resist composition
11/07/2006	US7132217 Organic anti-reflective coating composition and pattern forming method using the same
11/07/2006	US7132216 Non-aromatic chromophores for use in polymer anti-reflective coatings
11/07/2006	US7132215 Ester compounds, polymers, resist compositions and patterning process
11/07/2006	US7132214 Polymers and photoresist compositions for short wavelength imaging
11/07/2006	US7132213 sensitizer and an alkali-soluble novolak containing hydroxyalkyl ether structural units that can be substituted with 1,2-naphthoquinonediazidesulfonyl groups; excellent resolution and good suppression of crack generation during plating
11/07/2006	US7132212 Including an anodized layer formed on an aluminum plate and a recording layer recordable by infrared laser exposure on the support
11/07/2006	US7132206 Heating through a filter, controlling the ultraviolet radiation wavelength, applying a consistent heat flux
11/07/2006	US7132205 Heat resistance relief images on substrate; polybenzoxazoles
11/07/2006	US7132203 Masking for layers of integrated circuits; automatic detection phase shift zones patterns; controlling; mdel for fitting between exposure pattern and targets; photolithography
11/07/2006	US7132168 Printed circuit board that includes a solder resist has a photocurable and thermosetting resin composition derived from the reaction of a multifunctional oxetane compound, an acrylic acid, where the hydroxy group of the subsequent acrylate ester is reacted with an acid anhydride to form carboxyl groups
11/07/2006	US7132123 Having at least one long-life elongated electrode for producing at least 12 billion high voltage electric discharge in fluorine containing gas; electrodes do not adversely affect gas flow and can withstand many billions of electric discharges without substantial adverse effects on laser beam quality.
11/07/2006	CA2198803C Alkylphenylbisacylphosphine oxides and photoinitiator mixtures
11/02/2006	WO2006116232A2 Uv-visible-ir multi-wave length laser marking process
11/02/2006	WO2006116223A1 Photosensitive laminate
11/02/2006	WO2006116032A2 Radiation curable polymer films having improved laser ablation properties and radiation curable sensitizers therefor
11/02/2006	WO2006115292A1 Measuring apparatus, exposure apparatus and method, and device manufacturing method
11/02/2006	WO2006115268A1 Liquid for immersion exposure, method for purifying liquid for immersion exposure, and immersion exposure method
11/02/2006	WO2006115077A1 Material for protective film formation and method of forming resist pattern therewith
11/02/2006	WO2006115074A1 Composition comprising polymer having ethylene-dicarbonyl structure for use in forming anti-reflective coating for lithography
11/02/2006	WO2006115044A1 Composition for resist underlayer film formation for forming photocrosslinking cured resist underlayer film
11/02/2006	WO2006115017A1 Positive resist composition and method for forming resist pattern
11/02/2006	WO2006115013A1 Developer composition, process for producing the same, and method of forming resist pattern
11/02/2006	WO2006115010A1 Negative resist composition and method for forming resist pattern
11/02/2006	WO2006114468A1 Method of generating variable-magnitude optical aberrations by rotating optical components and device for implementing same
11/02/2006	WO2006114369A2 Means for transferring a pattern to an object
11/02/2006	WO2006114224A1 Closing disk for immersion head
11/02/2006	US20060247401 Process for production of monosulfonium salts, cationic polymerization initiators, curable compositions, and products of curing
11/02/2006	US20060247346 has high etching resistance and attains high resolution
11/02/2006	US20060246734 Methods of forming patterned photoresist layers over semiconductor substrates
11/02/2006	US20060246384 Developing method and apparatus
11/02/2006	US20060246382 Method for preparing semiconductor device
11/02/2006	US20060246380 Micropattern forming material and method for forming micropattern
11/02/2006	US20060246378 Photolithographic process, stamper, use of said stamper and optical data storage medium
11/02/2006	US20060246377 Suitable as photolatent acids in ArF resist technology; thermally stable, even at high bake temperatures during processing and provide high photospeed; surface coatings, printing inks, printing plates, dental formulations, colour filters, resists, or image-recording materials, photoresist
11/02/2006	US20060246374 Alkali-soluble polymer and polymerizable composition thereof
11/02/2006	US20060246372 Planographic printing plate precursor
11/02/2006	US20060246371 Photosensitive fluororesin composition, cured film obtained from the composition, and method of forming pattern
11/02/2006	US20060246363 Low birefringence and with which polarized illumination can be employed or immersion exposure can be carried out; semiconductors; excimer lasers
11/02/2006	US20060246228 Bifunctional photoinitiator such as 2-ethyl-2-hydroxy-1-{4-[4-(2-hydroxy-2-methyl-propionyl)-phenoxy]-phenyl}butan-1-one
11/02/2006	US20060245870 Apparatus for loading and unloading a supply of plates in an automated plate handler
11/02/2006	US20060245540 Illumination system particularly for microlithography
11/02/2006	US20060245045 Condenser optic with sacrificial reflective surface
11/02/2006	US20060245044 Filter for retaining a substance originating from a radiation source and method for the manufacture of the same
11/02/2006	US20060244966 Generic interface for an optical metrology system
11/02/2006	US20060244941 Device for adjusting the illumination dose on a photosensitive layer
11/02/2006	US20060244940 Exposure method and apparatus and device producing method
11/02/2006	US20060244938 Microlitographic projection exposure apparatus and immersion liquid therefore
11/02/2006	US20060243922 Raster Frame Beam System For Electron Beam Lithography
11/02/2006	US20060243918 Raster Frame Beam System For Electron Beam Lithography
11/02/2006	EP1717845A1 Exposure apparatus and exposure method, and device producing method
11/02/2006	EP1717640A2 Light patterning device using tilting mirrors arranged in a superpixel form
11/02/2006	EP1717639A2 An exposure apparatus
11/02/2006	EP1717638A2 Extreme UV radiation exposure apparatus and extreme UV radiation source
11/02/2006	EP1717637A2 Radiation curable compositions useful in image projection systems
11/02/2006	EP1717609A1 Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
11/02/2006	EP1717261A1 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern
11/02/2006	EP1716726A2 Method and device for generating in particular euv radiation and/or soft x-ray radiation
11/02/2006	EP1716588A1 Imprinting apparatus with independently actuating separable modules
11/02/2006	EP1716458A2 Illumination system for a microlithographic projection exposure apparatus
11/02/2006	EP1716457A2 Polarization-modulating optical element
11/02/2006	EP1716456A1 A system for positioning a product
11/02/2006	EP1716455A2 Projection lens of a microlithographic projection exposure system
11/02/2006	EP1716454A1 Projection objective for a microlithographic projection exposure apparatus
11/02/2006	EP1716453A2 Immersion lithography technique and product using a protection layer covering the resist
11/02/2006	EP1716452A2 Method for providing a thin film having a chemical composition that is spatially structured on a micrometric or nanometric scale on a substrate
11/02/2006	EP1716450A1 Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates
11/02/2006	EP1716389A2 Continuously varying offset mark and methods of determining overlay
11/02/2006	EP1551906A4 Polymers, methods of use thereof, and methods of decomposition thereof
11/02/2006	EP1512112A4 Use of overlay diagnostics for enhanced automatic process control
11/02/2006	EP1449033B1 Defective pixel compensation method
11/02/2006	EP1297384B1 Device and method for cleaning articles used in the production of semiconductor components
11/02/2006	EP1024965B9 Process for removing residues from a semiconductor substrate
11/02/2006	DE112004002240T5 Positiv arbeitender Photolack und Verfahren zur Erzeugung einer Struktur Positive-working photoresist and method for generating a structure
11/02/2006	DE10228774B4 Verfahren zum Bilden feiner Muster in Halbleiteranordnungen A method for forming fine patterns in semiconductor devices
11/02/2006	DE10225925B4 Ätzverfahren unter Verwendung einer Photolack-Ätzbarriere Etching processes using a photoresist etch
11/02/2006	DE102005019716A1 Optical system including optical element with its support useful for projection objectives in microlithography has nickel or hard material coating of optical element surface and optical element consisting of refractive crystalline material
11/02/2006	DE102005014796B3 Modell für eine fortschrittliche Prozesssteuerung, das eine Solloffsetgröße umfasst Model for advanced process control, which includes a set Offset Size
11/02/2006	DE102005007615B3 Verfahren zur Herstellung von Lithographie-Druckplatten Process for the preparation of lithographic printing plates
11/02/2006	DE102005007280A1 Critical dimension determination for laterally structured layer on substrate of microelectronic or micromechanical semiconductor chip, involves using formed test mark to determine critical dimension of laterally structured layer
11/02/2006	DE102005003185B4 Abbildungssystem und Verfahren zur Herstellung von Halbleiterstrukturen auf einem Wafer durch Abbildung einer Maske auf dem Wafer mit einer Dipolblende Imaging system and process for producing semiconductor structures on a wafer by imaging a mask on the wafer with a Dipolblende
11/02/2006	DE10115435B4 Verfahren zur Erzeugung eines Druckbilds und/oder zur Löschung eines Druckbilds einer Nassoffset-Druckform mit fofothermisch veränderbarem Material Method for generating a print image and / or for the erasure of an image of a wet offset printing form with variable material fofothermisch
11/01/2006	CN2833869Y Integrated developing, film peeling, and etching device for plasma display screen
11/01/2006	CN2832754Y Light shield transporting device
11/01/2006	CN1856743A Psm alignment method and device
11/01/2006	CN1856742A Photosensitive element, method of forming resist pattern, and process for producing printed wiring board
11/01/2006	CN1856741A Low-polydispersity photoimageable polymers and photoresists and processes for microlithography
11/01/2006	CN1856740A Method and apparatus for protecting a reticle used in chip production from contamination
11/01/2006	CN1856739A Method and apparatus for compensating for the effects of gravity on a pellicle used for protecting a reticle from contamination
11/01/2006	CN1856738A Method and apparatus for protecting a reticle used in chip production from contamination
11/01/2006	CN1856737A Liquid photo solder resist composition and photo solder resist film thereof

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