G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2006
11/09/2006	US20060251972 Flexible photomask for photolithography, method of manufacturing the same, and micropatterning method using the same
11/09/2006	US20060251809 Method of manufacturing mask blank
11/09/2006	US20060251317 Local bias map using line width measurements
11/09/2006	US20060251135 Timing control for two-chamber gas discharge laser system
11/09/2006	US20060250658 Forming a rotogravure cup from small cups
11/09/2006	US20060250607 Optical property measuring apparatus and optical property measuring method, exposure apparatus and exposure method , and device manufacturing method
11/09/2006	US20060250602 Substrate carrying apparatus, exposure apparatus, and device manufacturing method
11/09/2006	US20060250600 Illumination apparatus, exposure apparatus and device manufacturing method
11/09/2006	US20060250599 Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method
11/09/2006	US20060250597 Positional information measuring method and device, and exposure method and apparatus
11/09/2006	US20060250596 Exposure apparatus and method for producing device
11/09/2006	US20060250595 Utilities transfer system in a lithography system
11/09/2006	US20060250593 Exposure apparatus and device fabricating method
11/09/2006	US20060249698 Debris collector for euv light generator
11/09/2006	US20060249693 Lithographic apparatus, device manufacturing method, and device manufactured thereby
11/09/2006	US20060249495 Methods for preparing ball grid array substrates via use of a laser
11/09/2006	US20060249494 Methods for preparing ball grid array substrates via use of a laser
11/09/2006	US20060249493 Methods for preparing ball grid array substrates via use of a laser
11/09/2006	US20060249492 Methods for preparing ball grid array substrates via use of a laser
11/09/2006	US20060249488 Laser radiation source
11/09/2006	US20060249239 Method for the production of photopolymerizable, cylindrical, continuous seamless flexographic printing elements, and use thereof for the production of cylindrical flexographic printing forms
11/09/2006	US20060248977 Supporting unit, and moving table device and linear-motion guiding device using the supporting unit
11/09/2006	US20060248967 Disk master producing method, disk master producing device, method for detecting difference in disk master travel distance, and device for detecting difference in disk master travel distance
11/09/2006	US20060248919 Refrigerant supply apparatus
11/09/2006	DE112004002357T5 Immersionslithographieprozess unter Anwendung eines formtreuen Immersionsmediums Immersion lithography process using a conformal immersion medium
11/09/2006	DE10324468B4 Mikrolithografische Projektionsbelichtungsanlage, Projektionsobjektiv hierfür sowie darin enthaltenes optisches Element Microlithographic projection exposure apparatus, projection lens for this purpose and contained therein optical element
11/09/2006	DE10234464B4 Verfahren zum Erzeugen von Daten für die Maskenlithographie A method for generating data for the mask lithography
11/09/2006	DE102006018962A1 Optical unit e.g. wave-front delay unit, manufacturing method for microlithographic device, involves irradiating partial region of amorphous material, from which optical unit is made, with e.g. laser light, that is linearly polarized
11/09/2006	DE102006016933A1 Printing plate imaging method, involves providing quasi continuous wave laser and emitting laser pulses of wavelength in ultra-violet range, and deflecting pulses by optical modulator as function of video signals
11/09/2006	DE102005021372A1 Microlithography projection illumination system, has measuring device including optical sensors e.g. luminescence sensors, whose optical output is based on concentration of gas components in chamber
11/09/2006	DE102005021340A1 Optical unit for e.g. projection lens of microlithographic projection exposure system, has layer made of material with non-cubical crystal structure and formed on substrate, where sign of time delays in substrate and/or layer is opposite
11/09/2006	DE102004024808B4 Quarzglasrohling für ein optisches Bauteil zur Übertragung extrem kurzwelliger ultravioletter Strahlung Quartz glass blank for an optical component for transmitting extremely short-wave ultraviolet radiation
11/09/2006	DE10146499B4 Verfahren zur Optimierung der Abbildungseigenschaften von mindestens zwei optischen Elementen sowie Verfahren zur Optimierung der Abbildungseigenschaften von mindestens drei optischen Elementen Method for optimizing imaging properties of at least two of the optical elements as well as methods for optimizing imaging properties of at least three optical elements
11/08/2006	EP1720232A2 Black matrix composition for plasma display panel and plasma display panel
11/08/2006	EP1720199A1 Optical system, exposure system, and exposure method
11/08/2006	EP1720076A1 Method for thermal development of a photosensitive element using an oriented development medium
11/08/2006	EP1720075A1 Coating compositions
11/08/2006	EP1720074A1 Lithographic apparatus and device manufacturing method
11/08/2006	EP1720073A1 Lithographic apparatus and device manufacturing method
11/08/2006	EP1720072A1 Compositons and processes for immersion lithography
11/08/2006	EP1720071A2 Lithographic apparatus and device manufacturing method
11/08/2006	EP1720070A2 Pellicle frame with heightened bonding surfaces
11/08/2006	EP1720069A2 Method of manufacturing a projection-optical system
11/08/2006	EP1720068A1 Highly reproducible positioning low torque mirror-actuator interface
11/08/2006	EP1720067A1 Top coat composition
11/08/2006	EP1720066A2 Process for producing an image using a first minimum bottom antireflective coating composition
11/08/2006	EP1720065A1 Photosensitive lithographic printing plate
11/08/2006	EP1720064A1 Radiation-sensitive resin composition
11/08/2006	EP1720063A1 Resin containing ketene-aldehyde copolymer
11/08/2006	EP1720061A2 Embedded etch stop for phase shift masks and planar phase shift masks to reduce topography induced and wave guide effects
11/08/2006	EP1720047A1 Polarization conversion element, lighting optical device, exposure system, and exposure method
11/08/2006	EP1719218A2 Laser multiplexing
11/08/2006	EP1719169A1 Manufacturing method of semiconductor device, and ic card, ic tag, rfid, transponder, bill, securities, passport, electronic apparatus, bag, and garment
11/08/2006	EP1719157A2 Device manufacturing method and substrate comprising radiation sensitive material
11/08/2006	EP1719020A1 Process for preparing a polymeric relief structure
11/08/2006	EP1719019A2 Source optimization for image fidelity and throughput
11/08/2006	EP1719018A1 Methods for exposing patterns and emulating masks in optical maskless lithography
11/08/2006	EP1719017A2 Processless digitally imaged photopolymer elements using microspheres
11/08/2006	EP1718474A2 Combined ablation and exposure system and method
11/08/2006	EP1618601A4 Methods and apparatus for patterned deposition of nanostructure-containing materials by self-assembly and related articles
11/08/2006	EP1583946B1 A method to detect a defective pixel
11/08/2006	EP1264215B1 Device for transferring a pattern to an object
11/08/2006	CN2836057Y Vacuum printing frame controller
11/08/2006	CN2836056Y 曝光掩模板装置 Exposure mask device
11/08/2006	CN1860605A Fabrication method
11/08/2006	CN1860585A Liquid immersion type lens system and projection aligner, device production method
11/08/2006	CN1860415A Alkaline developable resin composition
11/08/2006	CN1860414A Positive photosensitive resin composition, method for forming pattern, and electronic component
11/08/2006	CN1860413A Spin-printing of electronic and display components
11/08/2006	CN1860412A Block copolymer composition for photosensitive flexographic plate
11/08/2006	CN1860134A Arylsulfinate salts in initiator systems for polymeric reactions
11/08/2006	CN1859959A Single phase fluid imprint lithography method
11/08/2006	CN1859893A Photoiniators having triarylsulfonium and arylsulfinate ions
11/08/2006	CN1858884A Original edition for color display tube shadow mask printing
11/08/2006	CN1858657A Lithographic apparatus and device manufacturing method
11/08/2006	CN1858656A Lithographic apparatus and device manufacturing method
11/08/2006	CN1858655A Lithographic apparatus and device manufacturing method
11/08/2006	CN1858654A Substrate processing apparatus
11/08/2006	CN1858653A Air float support base for regulating air diaphragm two-way rigidity
11/08/2006	CN1858652A Method for keeping optical etcher high speed synchronous control time sequence signal completeness
11/08/2006	CN1858651A Exposure device
11/08/2006	CN1858650A Polar coordinate directly writing-in method and device based on micro optical array multiple spot exposure
11/08/2006	CN1858649A Developing method and device
11/08/2006	CN1858648A Coating method and coating apparatus
11/08/2006	CN1857923A Four color dyeing and printing process
11/08/2006	CN1284206C Non-planography through selective reaction for producing mask, its products and compsns. for such method
11/08/2006	CN1284049C Exposure method for exposure device
11/08/2006	CN1284048C Photoetching apparatus and device manufacturing method
11/08/2006	CN1284047C Lithographer comprising mobile lens and method for producing digital holograms in storage medium
11/08/2006	CN1284046C Photosensitive resin composition, photosensitive element, resist pattern, method for producing resist pattern, and substrate having the resist pattern laminated thereon
11/08/2006	CN1284045C Device for removing protective film of optical mask
11/08/2006	CN1284044C Method for producing grey mask
11/08/2006	CN1283685C Radiation curable resin composition for making colored three dimensional objects
11/08/2006	CN1283375C Rotary wet preparing process and apparatus for crystal circle washing
11/07/2006	US7134010 Network interface with double data rate and delay locked loop
11/07/2006	US7133549 Local bias map using line width measurements
11/07/2006	US7133548 Method and apparatus for reticle inspection using aerial imaging
11/07/2006	US7133489 X-ray illumination optical system and X-ray reduction exposure apparatus
11/07/2006	US7133121 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
11/07/2006	US7133120 Lithographic apparatus, article support member, and method

1 ... 543 544 545 546 547 548 549 550 551 552 553 554 555 556 557 558 559 560 561 562 563 ... 1272