G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2006
11/21/2006	US7139137 Support mechanism, exposure apparatus having the same, and aberration reducing method
11/21/2006	US7139135 Apparatus for adjustment of partial coherence of light energy in an imaging system
11/21/2006	US7139127 Diffractive optical element
11/21/2006	US7139083 Methods and systems for determining a composition and a thickness of a specimen
11/21/2006	US7139080 Interferometry systems involving a dynamic beam-steering assembly
11/21/2006	US7139066 Reticle carrier including reticle positioning and location means
11/21/2006	US7139065 Stage base, stage apparatus, exposure apparatus and device manufacturing method
11/21/2006	US7139064 Optical system for providing a hexapole illumination and method of forming a photoresist pattern on a substrate using the same
11/21/2006	US7139009 Ion printer
11/21/2006	US7138550 Bridged carbocyclic compounds and methods of making and using same
11/21/2006	US7138334 Systems for forming insulative coatings for via holes in semiconductor devices
11/21/2006	US7138304 Method for forming thin film pattern, device and production method therefor, electro-optical apparatus and electronic apparatus, and production method for active matrix substrate
11/21/2006	US7138282 Correcting device, exposure apparatus, device production method, and device produced by the device production method
11/21/2006	US7138219 Planographic printing plate material and planographic printing plate preparing process
11/21/2006	US7138218 Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator
11/21/2006	US7138217 Photopolymerization using acid generator
11/21/2006	US7138212 Method and apparatus for performing model-based layout conversion for use with dipole illumination
11/21/2006	US7137803 Fluid pressure imprint lithography
11/21/2006	US7137714 Apparatus for optical beam shaping and diffusing and associated methods
11/21/2006	US7137336 Stamp having an antisticking layer and a method of forming of repairing such a stamp
11/21/2006	US7137274 The gas-flow duct surrounded by divided housing with a section conveying the coolant in contact with a smaller section controlling the coolant temperature; nozzle damaged minimised by sufficient spacing from generated xenon; efficient recirculation; extreme ultraviolet photolithographic laser target
11/21/2006	CA2127232C Epoxy acrylates
11/16/2006	WO2006121906A1 Sub-micron decal transfer lithography
11/16/2006	WO2006121824A1 Reticle alignment and overlay for multiple reticle process
11/16/2006	WO2006121580A2 Compositions for the removal of post-etch and ashed photoresist residues and bulk photoresist
11/16/2006	WO2006121242A1 Antireflective hardmask composition and methods for using same
11/16/2006	WO2006121172A1 Modified silica particles, photosensitive composition containing same, and photosensitive lithography plate
11/16/2006	WO2006121162A1 Process for producing radiation-sensitive resin composition
11/16/2006	WO2006121150A1 (meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and method for forming pattern
11/16/2006	WO2006121113A1 Photosensitive dry film for production of three-dimensional micro-molded product, and photosensitive resin composition
11/16/2006	WO2006121112A1 Method for enhancing optical stability of three-dimensional micromolded product
11/16/2006	WO2006121096A1 Novel compound, polymer and radiation-sensitive resin composition
11/16/2006	WO2006121062A1 Alkali development-type photosensitive resin composition, substrate with protrusions for liquid crystal split orientational control and color filter formed using the same, and liquid crystal display device
11/16/2006	WO2006121009A1 Projection optical system, exposure apparatus and exposure method
11/16/2006	WO2006121008A1 Projection optical system, exposure apparatus and exposure method
11/16/2006	WO2006120942A1 Plasma generating apparatus and plasma generating method
11/16/2006	WO2006120935A1 Photosensitive resin composition
11/16/2006	WO2006120897A1 Positive resist composition and method of forming resist pattern
11/16/2006	WO2006120896A1 Positive resist composition and method for forming resist pattern
11/16/2006	WO2006120845A1 Negative resist composition and method for forming resist pattern
11/16/2006	WO2006119977A1 A six-mirror euv projection system with low incidence angles
11/16/2006	WO2006119970A2 Assembly for adjusting an optical element
11/16/2006	WO2006119930A1 Laser system with integrated nitrogen supply
11/16/2006	WO2006119709A1 Composition for removing photoresist layer and method for using it
11/16/2006	WO2006085220A3 A process of imaging a photoresist with multiple antireflective coatings
11/16/2006	US20060259546 Manufacturing a replication tool, sub-master or replica
11/16/2006	US20060258809 Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent
11/16/2006	US20060258764 Method of preparing photopolymer with enhanced optical quality using nanoporous membrane and photopolymer prepared by the same
11/16/2006	US20060257797 Bank structure, wiring pattern forming method, device, electro-optical device, and electronic apparatus
11/16/2006	US20060257796 Bank structure, wiring pattern forming method, device, electro-optical device, and electronic apparatus
11/16/2006	US20060257795 Method for forming composite pattern including different types of patterns
11/16/2006	US20060257794 Method for transferring structures from a photomask into a photoresist layer
11/16/2006	US20060257793 Printed wiring board manufacturing method
11/16/2006	US20060257791 Method for forming conductive line of semiconductor device
11/16/2006	US20060257789 Method for processing lithographic printing plates
11/16/2006	US20060257788 Photosensitive structure for flexographic printing
11/16/2006	US20060257786 Method for employing vertical acid transport for lithographic imaging applications
11/16/2006	US20060257781 Photoresist polymer compositions
11/16/2006	US20060257765 System and method for photolithography in semiconductor manufacturing
11/16/2006	US20060257763 Colorant-containing curable negative-type composition, color filter using the composition, and method of manufacturing the same
11/16/2006	US20060257759 Colored photosensitive composition for color filter, color filter, and process for the production thereof
11/16/2006	US20060257758 Methods of eliminating pattern collapse on photoresist patterns
11/16/2006	US20060257756 Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device
11/16/2006	US20060257630 Method and device for wetting a substrate with a liquid
11/16/2006	US20060257583 Method for producing a substrate having a resist layer in the form of a relief structure, which represents a diffraction structure, the substrate having a conductive layer which scatters the primary electrons and/or produces secondary electrons when the resist layer is exposed by an electron beam
11/16/2006	US20060257561 Method and apparatus for coating a wafer
11/16/2006	US20060257553 Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method
11/16/2006	US20060256349 Speckle reduction method and system for EUV interferometry
11/16/2006	US20060256316 Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method
11/16/2006	US20060256312 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation
11/16/2006	US20060256310 Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method
11/16/2006	US20060256309 Lithographic apparatus and device manufacturing method
11/16/2006	US20060255023 Processing spot defined by a plurality of laser beams
11/16/2006	US20060254716 Processing system and method for chemically treating a tera layer
11/16/2006	DE60121588T2 Neue photoinitiatoren New photoinitiators
11/16/2006	DE19733725B4 Verfahren zur Herstellung einer lithographischen Druckplatte A process for producing a lithographic printing plate
11/16/2006	DE112005000153T5 Erweiterte Multidruck-Werkstückprozessierung Advanced multi-pressure Werkstückprozessierung
11/16/2006	DE10358967B4 Mikrospiegelarray Micromirror array
11/16/2006	DE102006017938A1 Fokusüberwachungsverfahren, Photomaske und photolithographisches System Focus monitoring method, photomask and photolithography system
11/16/2006	DE102006016934A1 Illustrating mechanism e.g. for printing form, has laser light source by which pixel is generated on surface of printing form and suction mechanism provided for distancing particles from environment
11/16/2006	DE102006008709A1 Optimierung der Lichtweggleichförmigkeit in Inspektionssystemen Optimization of Lichtweggleichförmigkeit in inspection systems
11/16/2006	DE102005034155B3 Lens for focusing electromagnetic radiation in forming layers in three-dimensional rapid prototyping includes a heating element in the exit window
11/16/2006	DE10153851B4 Vorrichtung zum Ausrichten von Masken in der Fotolithographie An apparatus for aligning masks in photolithography
11/16/2006	CA2606849A1 Compositions for the removal of post-etch and ashed photoresist residues and bulk photoresist
11/15/2006	EP1722601A1 An electroluminescent device and a method of making the same
11/15/2006	EP1722451A1 Laser system with integrated Nitrogen supply
11/15/2006	EP1722402A2 Edge exposure apparatus, coating and developing apparatus, and edge exposure method
11/15/2006	EP1722275A1 Method for processing lithographic printing plates
11/15/2006	EP1722274A1 Alkaline developer for radiation sensitive compositions
11/15/2006	EP1722273A2 Exposure method and exposure device
11/15/2006	EP1722272A1 Polymerizable composition and lithographic printing plate precursor
11/15/2006	EP1721940A2 Phthalocyanine compounds, process for production therefore and electrophotographic photosensitive member using the compounds
11/15/2006	EP1721219A2 Illumination system for a microlithography projection exposure installation
11/15/2006	EP1721218A1 Method to determine the value of process parameters based on scatterometry data
11/15/2006	EP1721217A2 System for reducing the coherence of laser radiation
11/15/2006	EP1721216A2 Determining image blur in an imaging system
11/15/2006	EP1721215A1 Method for the production of masks used in photolithography, and use of such masks
11/15/2006	EP1721201A1 Catadioptric imaging system for high numerical aperture imaging with deep ultraviolet light
11/15/2006	EP1721120A2 Method and system to measure characteristics of a film disposed on a substrate
11/15/2006	EP1720966A1 Nanoelectronic and microelectronic cleaning compositions

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