G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2006
11/15/2006	EP1720918A1 Adhesive film functionalizing color compensation and near infrared ray (nir) blocking and plasma display panel filter using the same
11/15/2006	EP1720714A1 Lightweight offset plates, preparation and use thereof
11/15/2006	EP1546026A4 Fabrication of 3d photopolymeric devices
11/15/2006	EP1285222A4 Interferometric apparatus and method
11/15/2006	EP1277073B1 Optical reduction system with control of illumination polarization
11/15/2006	EP1273033B1 Trihydroxybenzene composition for inhibition of titanium corrosion
11/15/2006	EP1254451A4 Magnetic pole fabrication process and device
11/15/2006	EP0882086B1 Composition exhibiting improved fluorescent response
11/15/2006	CN1864244A Exposure apparatus, exposure method, and method for producing device
11/15/2006	CN1864104A Method and device for lithography by extreme ultraviolet radiation
11/15/2006	CN1864103A Method and device for immersion lithography
11/15/2006	CN1864102A Immersion lithography method and device for illuminating a substrate
11/15/2006	CN1864101A Method for determining optimal resist thickness
11/15/2006	CN1864100A Photopolymerizable compositions and flexographic plates prepared from controlled distribution block copolymers
11/15/2006	CN1864099A Positively photosensitive insulating resin composition and cured object obtained therefrom
11/15/2006	CN1863729A Method for patterning a substrate surface
11/15/2006	CN1863665A Tool for the production of a microstructured surface
11/15/2006	CN1862774A Method of forming bank, method of forming film pattern, device, and electronic apparatus
11/15/2006	CN1862393A Downstream plasma processing apparatus and method
11/15/2006	CN1862392A Composition of removing photoresistance layer and use method thereof
11/15/2006	CN1862391A Composition of removing photoresistance layer and use method thereof
11/15/2006	CN1862390A Substrate heating apparatus and method and coating and developing system
11/15/2006	CN1862389A Resistance measuring system and measuring method using same
11/15/2006	CN1862388A Graphics engine for high precision lithography
11/15/2006	CN1862387A Edge exposure apparatus, coating and developing apparatus, and edge exposure method
11/15/2006	CN1862386A Pattern forming method and method of manufacturing semiconductor device
11/15/2006	CN1862385A Photomask structures providing improved photolithographic process windows and methods of manufacturing same
11/15/2006	CN1862384A Submersible photoetching apparatus soaking liquid flow field maintaining system
11/15/2006	CN1862383A Aberration field measuring method for imaging optical system of photoetching apparatus
11/15/2006	CN1862382A A sensor for use in a lithographic apparatus
11/15/2006	CN1862381A Photoresist management system
11/15/2006	CN1862380A Balancing system for balancing a printing drum
11/15/2006	CN1862379A Method for making polymer self-supporting nano-micron-line
11/15/2006	CN1862376A Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method
11/15/2006	CN1862329A Fabricating method of flexible display
11/15/2006	CN1862296A Micro-integrated narrow-band filter array and preparing method thereof
11/15/2006	CN1285244C Method for etching laminated assembly containing polyimide layer
11/15/2006	CN1285112C Method and device for checking mask pattern
11/15/2006	CN1285109C Method and apparatus for performing final critical dimension control
11/15/2006	CN1285100C Pattern formation method
11/15/2006	CN1285072C Energy ray radiator
11/15/2006	CN1285011C Front body of flat printing plate
11/15/2006	CN1284989C Optical coupling lens system and method for manufacturing the same
11/15/2006	CN1284978C Optical element and method for its manufacture as well as lightography apparatus and method for manufacturing a semiconductor device
11/15/2006	CN1284720C Lamination and picture composition method utilizing chemical self-assembly process
11/15/2006	CN1284719C Methods for utilizing scanning probe microscope tips and its products or producing method thereof
11/14/2006	US7136520 Method of checking alignment accuracy of patterns on stacked semiconductor layers
11/14/2006	US7136402 Laser device and exposure method
11/14/2006	US7136238 Method of supporting and adjusting optical element in exposure apparatus
11/14/2006	US7136220 Catadioptric reduction lens
11/14/2006	US7136165 Substrate alignment apparatus and method, and exposure apparatus
11/14/2006	US7136159 Excimer laser inspection system
11/14/2006	US7136150 Imprint lithography template having opaque alignment marks
11/14/2006	US7136146 Exposure device and exposure method
11/14/2006	US7136145 Pattern-forming apparatus using a photomask
11/14/2006	US7136143 Method for aberration detection and measurement
11/14/2006	US7136142 Lithographic apparatus having a gas flushing device
11/14/2006	US7136141 Lithographic apparatus with debris suppression, and device manufacturing method
11/14/2006	US7136087 Multi-exposure drawing method and apparatus therefor
11/14/2006	US7135693 Method and apparatus for recycling gases used in a lithography tool
11/14/2006	US7135692 Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiation
11/14/2006	US7135595 Photoresist composition
11/14/2006	US7135445 For removal of photoresist and flux while minimizing any etching of the substrate
11/14/2006	US7135419 Line edge roughness reduction
11/14/2006	US7135273 Pattern formation method
11/14/2006	US7135272 Method for forming a photoresist pattern and method for forming a capacitor using the same
11/14/2006	US7135271 Photosensitive composition
11/14/2006	US7135270 Resist polymer, resist composition and patterning process
11/14/2006	US7135269 Acrylic ester polymer with recurring units containing silicon and recurring units with aliphatic, aryl or cyclic pendant groups;no swell during development, minimized line edge roughness and no generation of residues, two-layer resist method for a high-aspect ratio pattern
11/14/2006	US7135268 Amplification type positive resist composition
11/14/2006	US7135267 Aqueous developable photoimageable compositions for use in photo-patterning methods
11/14/2006	US7135259 Scatterometric method of monitoring hot plate temperature and facilitating critical dimension control
11/14/2006	US7135256 Forming a layer of a chemically amplified photoresist over a substrate;baking the photoresist, then forming a non-conductive, DUV transmissive, environmental barrier layer; shelf life of one week or greater
11/14/2006	US7135255 Layout impact reduction with angled phase shapes
11/14/2006	US7135224 Adhesive tape
11/14/2006	US7134668 Differential pumping seal apparatus
11/09/2006	WO2006118343A1 Exposure apparatus
11/09/2006	WO2006118305A1 Method of forming graft pattern, graft pattern material obtained thereby, and lithographic process using the same
11/09/2006	WO2006118189A1 Exposure method, exposure apparatus, and device producing method
11/09/2006	WO2006118134A1 Drawing apparatus and drawing method
11/09/2006	WO2006118108A1 Exposure method, exposure apparatus, method for manufacturing device, and film evaluation method
11/09/2006	WO2006117992A1 Pattern forming method
11/09/2006	WO2006117642A2 Lithographic method for maskless pattern transfer onto a photosensitive substrate
11/09/2006	WO2006117527A2 An article, and a method for creating the article, with a chemically patterned surface
11/09/2006	WO2006117378A1 Optical system for a lithographic device
11/09/2006	WO2006117122A1 Microlithography exposure apparatus using polarized light and microlithography projection system having concave primary and secondary mirrors
11/09/2006	WO2006117120A1 Immersion exposure tool cleaning system and method
11/09/2006	WO2006084641A3 Immersion liquid, exposure apparatus, and exposure process
11/09/2006	WO2006080534B1 Illumination optical apparatus and optical apparatus
11/09/2006	WO2005111719A3 Anti-reflective coatings using vinyl ether crosslinkers
11/09/2006	WO2004074933A3 Dissolution rate modifiers for photoresist compositions
11/09/2006	WO2004066276A3 Method and system for replicating film data to a metal substrate and article of manufacture
11/09/2006	US20060252897 Homo- or copolymer of a (meth)acrylic acid esterified with an alcohol containing one or two 1,1,1,3,3,3-hexafluoro-2-(hydr)oxypropyl groups; antireflective materials with increased transparency
11/09/2006	US20060252277 Methods of forming patterned photoresist layers over semiconductor substrates
11/09/2006	US20060252160 Electron beam exposure device and exposure method
11/09/2006	US20060251993 Method of on-press developing thermosensitive lithographic printing plate
11/09/2006	US20060251991 Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer
11/09/2006	US20060251987 Negative photosensitive composition and negative photosensitive lithographic printing plate
11/09/2006	US20060251986 Positive resist composition and method for forming resist pattern
11/09/2006	US20060251976 Photolithography using a monovalent salt of an organic-solvent-soluble monoazo pyridine dye and a monoazo dye pyrazolone dye salt the metal of which has a di- or higher valence; prevention of dye elution during curing and overlaying; liquid crystal display, solid-state imaging; color dye filters

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