G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2006
11/23/2006	WO2006123447A1 Electron beam exposure device
11/23/2006	WO2006122578A1 Contaminant removal apparatus and method therefor
11/23/2006	WO2006122577A1 Method of distancing a bubble and bubble displacement apparatus
11/23/2006	WO2006016658A3 Photosensitive resin composition and photosensitive film made with the same
11/23/2006	WO2005089150A3 Thermally cured undercoat for lithographic application
11/23/2006	WO2004109400A3 Novel photosensitive resin compositions
11/23/2006	US20060265686 in photolithography to inspect respective overlays between the target layer and the underlying layers, control the alignment accuracy through computer data processing, transferring a pattern
11/23/2006	US20060265099 Semiconductor production system
11/23/2006	US20060264592 Photoresist film; low in light scattering and absorption and high in transparency
11/23/2006	US20060264591 Fluorine-containing compounds and their polymers useful for anti-relfection film materials and resist compositions
11/23/2006	US20060264529 Active energy ray curable composition
11/23/2006	US20060264526 Low-viscous, radiation curable formulation, particularly for the stereo-lithographical production of earpiece
11/23/2006	US20060263919 Electroluminescent element
11/23/2006	US20060263915 Device for testing an exposure apparatus
11/23/2006	US20060263730 Surface treatment of a dry-developed hard mask and surface treatment compositions used therefor
11/23/2006	US20060263729 Surface treatment of a dry-developed hard mask and surface treatment compositions used therefor
11/23/2006	US20060263728 Method of forming fine patterns
11/23/2006	US20060263726 forming a protective film, removing the residual substance by applying a first solvent, baking, performing immersion exposure selectively; for protecting the photoresist film from an immersion liquid on the photo resist film
11/23/2006	US20060263724 Method for forming material layer between liquid and photoresist layer
11/23/2006	US20060263723 Negative resist composition, a method for forming a resist pattern thereof, and a method for fabricating a semiconductor device
11/23/2006	US20060263722 Mixture of alkali soluble novolaks and photosensitive naphthoquinone diazide compound
11/23/2006	US20060263715 Block copolymer composition for photosensitive flexographic plate
11/23/2006	US20060263714 Resist composition and organic solvent for removing resist
11/23/2006	US20060263704 Semiconductor device manufacturing method and semiconductor manufacturing apparatus
11/23/2006	US20060263703 Pellicle Assembly Including a Molecular Sieve
11/23/2006	US20060263702 Composition for forming intermediate layer containing sylylphenylene-based polymer and pattern-forming method
11/23/2006	US20060263699 Methods for forming arrays of a small, closely spaced features
11/23/2006	US20060263548 Method of producing a sheet comprising through pores and the application thereof in the production of micronic and submicronic filters
11/23/2006	US20060263514 Device and method for forming improved resist layer
11/23/2006	US20060262413 Exposure apparatus and device fabrication method
11/23/2006	US20060262326 Periodic patterns and technique to control misalignment between two layers
11/23/2006	US20060261679 Utilities transfer system in a lithography system
11/23/2006	US20060261426 includes substrate, film structure including adhesive film (silicon dioxide) and stack (silicon dioxide), and protective film (silicon dioxide), with alternating dielectric films (silicon dioxide) and metal films (chromium, aluminum, and silver); mobile phones
11/23/2006	US20060261289 Method of forming optical images, a control circuit for use with this method, apparatus for carrying out said method and process for manufacturing a device using said method
11/23/2006	US20060261288 liquid removal in a method an device for irradiating spots on a layer
11/23/2006	DE20122618U1 Projection system with array of rectangular micro-mirror elements for providing images at angles depending on mirror tilt angle in light ray steering system
11/23/2006	DE19641303B4 Verfahren zur Herstellung eines optischen Elementes A process for producing an optical element
11/23/2006	DE19525554B4 Vorrichtung zur Trocknung photopolymerer Druckplatten Apparatus for drying of photopolymer printing plates
11/23/2006	DE19507881B4 Verfahren zum Stützen eines Objekts, verfertigt durch Stereolithographie oder ein anderes schnelles Prototypen-Fertigungsverfahren A method of supporting an object, manufactured by stereolithography or another rapid prototype production method
11/23/2006	DE102006022957A1 Optical device for projection illumination system for micro lithography, has manipulators to exert forces and/or moments, where strength of exerted forces and/or moments is in such a manner that stress birefringence is induced in lens
11/23/2006	DE102005023939A1 Imaging system, such as objective or illuminator of microlithographic projection illumination installation, includes two specified lens types and arrangement
11/23/2006	DE102005023714A1 Projector for micro-lithographic process to manufacture integrated circuits, has projector lens aperture smaller than that of the light source
11/23/2006	DE102005022682A1 Lithographic projector optical element mount has three angle adjustable positioners using rotating tapers locked by screws
11/23/2006	DE102004037346B4 Lithographie-Anordnung und Verfahren zum Herstellen einer Lithographie-Anordnung Lithography Apparatus and method for making a lithographic arrangement
11/22/2006	EP1725013A1 Scanning systems
11/22/2006	EP1724816A1 Exposure method and system, and device production method
11/22/2006	EP1724815A1 Aligner, device manufacturing method, maintenance method and aligning method
11/22/2006	EP1724642A2 Wavefront-aberration measuring device and exposure apparatus including the device
11/22/2006	EP1724641A1 Lithograpic projection apparatus and method of exposing a semiconductor wafer with a pattern from a mask
11/22/2006	EP1724640A1 Positive light-sensitive resin composition, relief pattern using the same, and solid imaging element
11/22/2006	EP1724639A2 Imprint lithography
11/22/2006	EP1724633A1 Laser light source device, exposure apparatus using this laser light source device, and mask examining device
11/22/2006	EP1724616A2 Process for manufacturing patterned optical filter layers on substrates
11/22/2006	EP1723472A2 Euv light source optical elements
11/22/2006	EP1723471A2 Stable high ph developer
11/22/2006	EP1723470A1 Photomask substrate made of synthetic quartz glass and photomask
11/22/2006	EP1723467A2 Method of photolithography using a fluid and a system thereof
11/22/2006	EP1723455A1 Process for producing photonic crystals and controlled defects therein
11/22/2006	EP1723203A1 Violet colorant for colour filters, inks for ink-jet, electrophotographic toners and developers and e-inks
11/22/2006	EP1634123B1 Photosensitive resin composition, ink-jet recording head using the composition, and production method for the same
11/22/2006	EP1240694B1 Line narrowed laser with bidirection beam expansion
11/22/2006	CN2840113Y Photograph
11/22/2006	CN1868043A Plasma ashing process
11/22/2006	CN1868039A Minimizing the loss method of barrier materials during photoresist stripping
11/22/2006	CN1868033A Multilayer mirror, method for manufacturing the same, and exposure equipment
11/22/2006	CN1868032A Exposing device and exposing method, and device manufacturing method
11/22/2006	CN1868005A Plasma source of directed beams and application thereof to microlithography
11/22/2006	CN1867866A Imaging element having protective overcoat layers
11/22/2006	CN1867865A Cleanup method for optics in immersion lithography
11/22/2006	CN1867695A Method of improving post-develop photoresist profile on a deposited dielectric film
11/22/2006	CN1867640A Pigment dispersion liquid, process for producing the same, colored resin composition, color filter and liquid crystal display
11/22/2006	CN1867455A Elastomeric stamp, patterning method using such a stamp and method for producing such a stamp
11/22/2006	CN1866477A Method for removing etching residue on wafer surface
11/22/2006	CN1866470A Method for forming patterned material layer
11/22/2006	CN1866131A Method for defining edges of polygon in region with edges
11/22/2006	CN1866130A Method for reducing critical dimension
11/22/2006	CN1866129A Resist material and pattern formation method using the same
11/22/2006	CN1866128A 压印光刻 Imprint Lithography
11/22/2006	CN1866099A Display panel and method of manufacturing the same, and transflective liquid crystal display with the same
11/22/2006	CN1866093A Liquid crystal display device and method of manufacture thereof
11/22/2006	CN1866092A Liquid crystal display device and fabrication method thereof
11/22/2006	CN1866091A Array panel for liquid crystal display device and method of manufacturing the same
11/22/2006	CN1866083A Array substrate for liquid crystal display device and fabricating method of the same
11/22/2006	CN1866065A Optical amplifier fiber
11/22/2006	CN1866062A Wire grid polarization film, and method for manufacturing mold for forming wire grids thereof
11/22/2006	CN1286154C Method and equipment of removing organic film
11/22/2006	CN1286150C 光刻胶供应系统及方法 Photoresist supply system and method
11/22/2006	CN1286146C System for making electronic apparatus
11/22/2006	CN1285973C Method for executing optical near correction based on model
11/22/2006	CN1285972C Method and system of controlling dummy dispense
11/22/2006	CN1285971C Photoetching apparatus and device manufacturing method
11/22/2006	CN1285970C Composition for forming wiring protective film and uses thereof
11/22/2006	CN1285969C Photoresist for high-resolution imager
11/22/2006	CN1285968C Process for pattern transfer
11/22/2006	CN1285967C Method for modifying charactristie pattern of regular polygon mask by use optical proximity effect
11/22/2006	CN1285962C Liquid crystal display and its mfg. method
11/22/2006	CN1285925C Production for aluminium-material X-ray assembled lens
11/21/2006	US7139998 Photomask designing method, pattern predicting method and computer program product
11/21/2006	US7139996 Mask pattern correction apparatus and mask pattern correction method and mask preparation method and method of production of a semiconductor device
11/21/2006	US7139301 Laser spectral engineering for lithographic process

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