| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/21/2014 | CN102540746B 投影式光刻机分层曝光进行三维光刻的方法 Projection lithography exposure stratification method for three-dimensional lithography |
| 05/21/2014 | CN102520581B 光阻图案形成方法 A resist pattern forming method |
| 05/21/2014 | CN102483590B 用于形成铜基配线的光刻胶剥离剂组合物 For forming a copper-based wiring photoresist stripper composition |
| 05/21/2014 | CN102424356B 一种金属纳米颗粒微阵列芯片的制备装置及方法 An apparatus and method for preparing metal nano-particles in the micro-array chips |
| 05/21/2014 | CN102314096B 制造长的微透镜阵列的方法 The method of manufacturing a microlens array length |
| 05/21/2014 | CN102252606B 用于调焦调平测量系统的零位调整装置 Leveling measurement system for focusing the zero adjustment device |
| 05/21/2014 | CN102163005B 投影曝光装置、器件制造方法以及光学部件 The projection exposure apparatus, device manufacturing method and an optical member |
| 05/21/2014 | CN102043353B 用于在晶圆上喷涂显影液的方法 Spraying the developing solution on the wafer, a method for |
| 05/21/2014 | CN101685259B 在线监控光刻条件的方法 Online monitoring lithography method conditions |
| 05/21/2014 | CN101581889B 用于光刻装置的对准标记、对准系统及其对准方法 Alignment mark for a lithographic apparatus, the alignment system and the alignment method |
| 05/20/2014 | US8730485 Lithographic apparatus and device manufacturing method |
| 05/20/2014 | US8730455 Illumination system for a microlithographic projection exposure apparatus |
| 05/20/2014 | US8730452 Source and mask optimization by changing intensity and shape of the illumination source and magnitude and phase of mask diffraction orders |
| 05/20/2014 | US8730451 Lithographic apparatus for transferring pattern from patterning device onto substrate, and damping method |
| 05/20/2014 | US8730450 Immersion photolithography system and method using microchannel nozzles |
| 05/20/2014 | US8730448 Lithographic apparatus and device manufacturing method |
| 05/20/2014 | US8729148 Photocurable dry film, method for preparing same, patterning method and film for protecting electric and electronic parts |
| 05/20/2014 | US8728943 Pattern forming method and manufacturing method of semiconductor device |
| 05/20/2014 | US8728721 Methods of processing substrates |
| 05/20/2014 | US8728720 Arbitrary pattern direct nanostructure fabrication methods and system |
| 05/20/2014 | US8728719 Diffractive laser beam homogenizer including a photo-active material and method of fabricating the same |
| 05/20/2014 | US8728718 Method for manufacturing liquid ejection head |
| 05/20/2014 | US8728717 Photosensitive sacrificial polymer with low residue |
| 05/20/2014 | US8728716 Resin pattern, method for producing the pattern, method for producing MEMS structure, method for manufacturing semiconductor device, and method for producing plated pattern |
| 05/20/2014 | US8728715 Non-photosensitive siloxane coating for processing hydrophobic photoimageable nozzle plate |
| 05/20/2014 | US8728713 Stitching methods using multiple microlithographic expose tools |
| 05/20/2014 | US8728711 Cleaning reticle, method for cleaning reticle stage, and method for manufacturing semiconductor device |
| 05/20/2014 | US8728710 Photo-imageable hardmask with dual tones for microphotolithography |
| 05/20/2014 | US8728709 Lithographic printing plate precursor and plate making method thereof |
| 05/20/2014 | US8728708 Photosensitive resin composition, oxime sulfonate compound, method for forming cured film, cured film, organic EL display device, and liquid crystal display device |
| 05/20/2014 | US8728707 Resist composition and method for producing resist pattern |
| 05/20/2014 | US8728706 Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound |
| 05/20/2014 | US8728705 Negative photosensitive material, photosensitive board employing the negative photosensitive material, and negative pattern forming method |
| 05/20/2014 | US8728688 Colored curable composition, color filter and method of producing the same, and dipyrromethene metal complex compound and tautomer thereof |
| 05/20/2014 | US8728687 Resin, pigment dispersion, colored curable composition, color filter produced using the same, and method for producing the same |
| 05/20/2014 | US8727775 Dimer acid-derived dimethacrylates and use in dental restorative compositions |
| 05/20/2014 | US8726828 Coating apparatus having coater chuck |
| 05/15/2014 | WO2014074455A1 Pressure-less ozonated d i -water (di03) recirculation reclaim system and method |
| 05/15/2014 | WO2014073676A1 Patterned-film production device and production method |
| 05/15/2014 | WO2014073535A1 Polarization beam splitter, substrate processing apparatus, device manufacturing system, and device manufacturing method |
| 05/15/2014 | WO2014073409A1 Aromatic imide compound and method for producing same |
| 05/15/2014 | WO2014073120A1 Exposure apparatus and exposure method, and device manufacturing method |
| 05/15/2014 | WO2014072190A1 Euv collector |
| 05/15/2014 | WO2014072149A2 Method and apparatus for generating radiation |
| 05/15/2014 | WO2014072139A1 Lithographic apparatus and device manufacturing method |
| 05/15/2014 | WO2014071780A1 Balance mass system shared by workpiece table and mask table, and lithography machine |
| 05/15/2014 | WO2014071689A1 Cleaning solution for removing photoresist residue |
| 05/15/2014 | WO2014071688A1 Rinse solution for removal of photoresist etching residues |
| 05/15/2014 | WO2014071552A1 Microwave excited supercritical drying apparatus and method therefor |
| 05/15/2014 | WO2014047415A4 Apparatus and method for irradiating |
| 05/15/2014 | WO2013189827A3 Radiation source and lithographic apparatus. |
| 05/15/2014 | WO2013189724A3 Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method |
| 05/15/2014 | US20140134843 Methanofullerenes |
| 05/15/2014 | US20140134544 Resist pattern-forming method |
| 05/15/2014 | US20140134543 Layout decomposition method and method for manufacturing semiconductor device applying the same |
| 05/15/2014 | US20140134542 Positive-Type Resist Composition |
| 05/15/2014 | US20140134541 Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition |
| 05/15/2014 | US20140134540 Photosensitive composition, planographic printing plate precursor, polyurethane, and method for producing polyurethane |
| 05/15/2014 | US20140134539 Alcohol compound and method for producing same, method for producing lactone compound, (meth)acrylate ester and method for producing same, polymer and method for producing same, and resist composition and method for producing substrate using same |
| 05/15/2014 | US20140134538 Patterning Process and Chemical Amplified Photoresist Composition |
| 05/15/2014 | US20140134524 Methods and materials for lithography of a high resolution hsq resist |
| 05/15/2014 | US20140134523 Method for Forming Circular Patterns on a Surface |
| 05/15/2014 | US20140133876 Exposure adjusting apparatus, image normalizing apparatus and image normalizing method |
| 05/15/2014 | US20140133009 Electrowetting display unit and method for manufacturing thereof |
| 05/15/2014 | US20140132942 Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure |
| 05/15/2014 | US20140132941 Imaging optical system and projection exposure system including the same |
| 05/15/2014 | US20140132940 Exposure apparatus and exposure method, and device manufacturing method |
| 05/15/2014 | US20140132939 Cleanup method for optics in immersion lithography |
| 05/15/2014 | US20140131912 Suppression of dewetting of polymer films via inexpensive soft lithograpy |
| 05/15/2014 | DE102013211268A1 Illumination optic unit for use in lithographic projection exposure system, has pupil facets applied with actual illumination intensity if intensity equals to zero during location of facets outside pupil region and edge section |
| 05/15/2014 | DE102013209028A1 Component of microlithographic projection exposure system has magnet assembly which produces magnetic field on element of projection exposure system such that ratio of total mass of element and radial inner magnetic rings is preset |
| 05/15/2014 | DE102013207502A1 Optical system for wafer and mask inspection plant, has polarizing elements which are designed such that polarization distribution set to micro-structured element is not changed by changing operating wavelength |
| 05/15/2014 | DE102012223754A1 Method for manufacturing facet mirror for projection exposure system, involves arranging facet mirror elements on facet mirror base by robot, where each facet mirror element is provided with unique identification code |
| 05/15/2014 | DE102012220596A1 Verfahren zum Zuordnen einer Pupillenfacette eines Pupillenfacettenspiegels einer Beleuchtungsoptik einer Projektionsbelichtungsanlage zu einer Feldfacette eines Feldfacettenspiegels der Beleuchtungsoptik A method for assigning a pupil of a pupil facet mirror illumination optics of a projection exposure system to a field facet of the field facet mirror of the illumination optics |
| 05/15/2014 | DE102012220465A1 EUV-Kollektor EUV collector |
| 05/14/2014 | EP2730801A1 Vibration insulator in the form of a pneumatic spring, and method for tuning a vibration insulator |
| 05/14/2014 | EP2729846A1 Process for the production of a layered body and layered bodies without masking obtainable therefrom |
| 05/14/2014 | EP2729845A1 Process for the production of a layered body and layered bodies obtainable therefrom |
| 05/14/2014 | EP2729844A1 Lithographic patterning process and resists to use therein |
| 05/14/2014 | EP2729833A1 Method of impression-based production of a filter for an electromagnetic radiation |
| 05/14/2014 | EP2729534A2 Metal-oxide films from small molecules for lithographic applications |
| 05/14/2014 | EP2729508A1 Oligosaccharide/silicon-containing block copolymers for lithography applications |
| 05/14/2014 | EP2729427A1 Method of manufacture and apparatus therefor |
| 05/14/2014 | CN203595896U 基板显影处理装置 Developing the substrate processing apparatus |
| 05/14/2014 | CN203595895U Ccd监视led曝光机 Ccd surveillance led Exposure |
| 05/14/2014 | CN203595829U 一种可同时制作两种光纤光栅的照射系统 An illumination system can simultaneously produce two types of fiber gratings |
| 05/14/2014 | CN1984975B 颜料分散组合物、其用途以及颜料处理用化合物 The pigment dispersion composition, its use and a pigment treated with the compound |
| 05/14/2014 | CN1800979B 光固化性/热固化性单液型阻焊剂组合物以及使用其的印刷电路板 The photo-curable / thermal curable one-part compositions and the use of the solder resist which is a printed circuit board |
| 05/14/2014 | CN103797421A 制备平版印刷印版的方法 The lithographic printing plate prepared by the method |
| 05/14/2014 | CN103797420A 具有基底板的真空腔室 A vacuum chamber having a base plate |
| 05/14/2014 | CN103797419A 平版印刷版的制造方法及平版印刷版 The method of manufacturing a lithographic printing plate and a lithographic printing plate |
| 05/14/2014 | CN103797418A 一种负型感光性树脂组合物、图案形成方法、固化膜、绝缘膜、滤色器及显示装置 One kind of a negative-type photosensitive resin composition, a pattern forming method, a cured film, an insulating film, a color filter and a display device |
| 05/14/2014 | CN103797399A 具有自对准的孔隙的显示器及其制造方法 Display and a method of manufacturing a self-aligned pores |
| 05/14/2014 | CN103797329A 用于监测光刻图案形成装置的设备 Monitoring apparatus for a lithographic patterning device |
| 05/14/2014 | CN103797077A 可光固化的粘合剂组合物及其用途 A photocurable adhesive composition and its use |
| 05/14/2014 | CN103794475A 自对准三重图形化方法 Self-aligned triple patterning method |
| 05/14/2014 | CN103792801A 薄膜掩模修正装置 Film mask correction device |
| 05/14/2014 | CN103792800A 快速完成曝光时面板与掩膜精确对位的方法 Rapid completion of the exposure panel when the mask alignment precision approach |
| 05/14/2014 | CN103792799A 一种新的led光刻显影工艺 A new development process led lithography |
| 05/14/2014 | CN103792798A 光刻机偏振照明系统光瞳偏振态测量装置及其测试方法 Lithography polarized illumination system pupil polarization state measuring apparatus and test methods |