G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2006
11/29/2006	EP1726193A2 Micrometric direct-write methods for patterning conductive material and applications to flat panel display repair
11/29/2006	EP1726028A2 A high repetition rate laser produced plasma euv light source
11/29/2006	EP1725910A2 Device consisting of at least one optical element
11/29/2006	EP1725901A1 Method for establishing a light beam with substantially constant luminous intensity
11/29/2006	EP1725330A2 Microfluidic chip
11/29/2006	EP1656385B1 Perfluoropolyether amide-linked phosphonates, phosphates, and derivatives thereof
11/29/2006	EP1513688B1 Mold tool method of manufacturing a mold tool and storage medium formed by use of the mold tool
11/29/2006	EP1493313B1 Waterborne printed circuit board coating compositions
11/29/2006	EP1481276B1 Lighting system comprising a nested collector for annularly illuminating an exit pupil
11/29/2006	EP1402543B1 Material and method for making an electroconductive pattern
11/29/2006	EP1269266B1 A method of improving photomask geometry
11/29/2006	EP1177182B1 Novel photoinitiators and their applications
11/29/2006	EP1165708B1 Radiation curable water based cationic inks and coatings
11/29/2006	EP1097405B1 Composition for stripping photoresist and organic materials from substrate surfaces
11/29/2006	CN1871689A Projection exposure apparatus, exposure method, and element producing method
11/29/2006	CN1871562A Stage device
11/29/2006	CN1871556A Imprint lithography templates having alignment marks
11/29/2006	CN1871554A Method and apparatus for removing photoresist from a substrate
11/29/2006	CN1871553A Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materials
11/29/2006	CN1871552A Apparatus for and method of forming optical images
11/29/2006	CN1871551A Photoresist compositions comprising diamondoid derivatives.
11/29/2006	CN1871550A Low-activation energy silicon-containing resist system
11/29/2006	CN1871549A Fluorinated photoresists prepared, deposited, developed and removed in carbon dioxide
11/29/2006	CN1871333A Compositions and methods for high-efficiency cleaning/polishing of semiconductor wafers
11/29/2006	CN1871274A Phosphorus-containing urethane (meth)acrylate compounds and photosensitive compositions
11/29/2006	CN1871200A White solid photoinitiator in the form of powder and preparation thereof
11/29/2006	CN1871196A Fluorinated compound, fluoropolymer and process for its production
11/29/2006	CN1871128A Apparatus for measuring the physical properties of a surface and a pattern generating apparatus
11/29/2006	CN1871103A Systems for magnification and distortion correction for imprint lithography processes
11/29/2006	CN1869822A Method for predicting function of integrated circuit fragment photo-etched on chip
11/29/2006	CN1869821A Method for picture area representation using two-stage resolution ratio
11/29/2006	CN1869820A Light patterning device using tilting mirrors in a superpixel form
11/29/2006	CN1869819A Method and system for optical proximity correction
11/29/2006	CN1869818A Method, program product and apparatus for improving calibration of resist models used in critical dimension calculation
11/29/2006	CN1869817A Pattern image setting and multiplying power error compensation method of step-by-step exposure machine
11/29/2006	CN1869816A Photosensitive composition and color filter formed thereof
11/29/2006	CN1869815A 193nm far-ultraviolet photoetching rubber and its preparation method
11/29/2006	CN1869814A 193nm far-ultraviolet photoetching rubber and its preparation method
11/29/2006	CN1869813A Screen plate making method
11/29/2006	CN1869812A Anti-reflective coating and its design method
11/29/2006	CN1869811A Reflection mask for EUV photolithography and method of fabricating the reflection mask
11/29/2006	CN1869810A Method of correcting defect of graytone mask
11/29/2006	CN1869809A Halftone mask and method of fabricating the same, and method of fabricating display device using the same
11/29/2006	CN1869798A Liquid crystal display and method of manufacturing of a tft array panel of the same
11/29/2006	CN1869781A Manufacturing method of array substrate of semi-reflection semi-penetration liquid crystal display
11/29/2006	CN1869780A 曝光机器及曝光系统 Exposure machines and exposure system
11/29/2006	CN1869775A Liquid crystal display and method of making the same
11/29/2006	CN1869018A Thiol compound, photopolymerization initiator composition and photosensitive composition
11/29/2006	CN1287644C Material-saving type atomic beam generator
11/29/2006	CN1287587C TDI detecting device, feed-through equipment and electrocution beam apparatus. using these devices
11/29/2006	CN1287432C Method and equipment for preventing base plate from being polluted by condensation liquid
11/29/2006	CN1287423C Drying system containing cooler with hot-pipe manufacture
11/29/2006	CN1287226C Method for forming fine patterns
11/29/2006	CN1287225C Support of largescale thin shell and its attachment device
11/29/2006	CN1287224C Projection exposure apparatus
11/29/2006	CN1287223C Chemical amplification type plus photoresist composition and resist pattern forming method
11/29/2006	CN1287222C 感光性组合物 The photosensitive composition
11/29/2006	CN1287221C Grey mask and method for making same
11/29/2006	CN1287210C Manufacturing method for reflective liquid-crystal displaying device and peripheral circuit manufacturing method
11/29/2006	CN1287199C Method for fabricating nose of panel display
11/29/2006	CN1287167C 感光性树脂组成物 The photosensitive resin composition
11/29/2006	CN1287161C Method for making large relief deep micro lens array
11/29/2006	CN1286918C Resin compound, heat-resistant resin paste and semiconductor device using them and method for manufacture thereof
11/29/2006	CN1286905C Novolak resin mixtures and photosensitive compositions comprising the same
11/28/2006	US7142941 Computer-implemented method and carrier medium configured to generate a set of process parameters and/or a list of potential causes of deviations for a lithography process
11/28/2006	US7142366 Method of manufacturing microlens substrate, and microlens exposure optical system
11/28/2006	US7142314 Wafer stage position calibration method and system
11/28/2006	US7142287 Lithographic apparatus, device manufacturing method, and device manufactured thereby
11/28/2006	US7142285 Illumination system particularly for microlithography
11/28/2006	US7142283 Exposure apparatus
11/28/2006	US7142282 Device including contacts
11/28/2006	US7141813 Surface position detection apparatus and method, and exposure apparatus and device manufacturing method using the exposure apparatus
11/28/2006	US7141692 Molecular photoresists containing nonpolymeric silsesquioxanes
11/28/2006	US7141614 Photosensitive resin composition and photosensitive films and laminates made by using the same
11/28/2006	US7141513 Integrated ashing and implant annealing method using ozone
11/28/2006	US7141358 Image-forming method and developer
11/28/2006	US7141355 Radiation-sensitive resin composition
11/28/2006	US7141353 Photopolymerizable presensitized plate for use in making lithographic printing plate and method for making lithographic printing plate
11/28/2006	US7141352 Basic compound, resist composition and patterning process
11/28/2006	US7141351 Basic compound, resist composition and patterning process
11/28/2006	US7141350 Environmental sensitive label with a cumulative time-temperature indicator and a thermal event indicator, each of which provides an independent verification of product performance in a predetermined environment
11/28/2006	US7141348 Lamination and delamination technique for thin film processing
11/28/2006	US7141340 Structure has individually addressable pixels selectively configurable to modulate both of an amplitude and a phase of radiation that is incident on the pixel and at least one of which has a layer of solid state electrooptical material with a birefringence that varies according to an applied voltage
11/28/2006	US7141338 Reducing corner rounding and image shortening
11/28/2006	US7141275 Imprinting a pattern with nanoscale features from a mold into a semiconductor layer; forming a patternable second layer of an alloy; transformation between the liquid state and the solid state of metals and alloys is usused as the patternable layer
11/28/2006	US7141177 Etching method and composition for forming etching protective layer
11/28/2006	US7140298 Method for evaluating planographic printing plates and quality-control method thereof
11/28/2006	US7140297 Printing process and manufacturing process of printing plate material
11/28/2006	CA2362798C Method and device for treating substrates
11/27/2006	CA2546194A1 Micro-contact-printing engine
11/23/2006	WO2006124321A2 Treatment of substrate using fuctionalizing agent in supercritical carbon dioxide
11/23/2006	WO2006123834A2 Graft pattern forming method and conductive pattern forming method
11/23/2006	WO2006123700A1 Photoresist composition
11/23/2006	WO2006123643A1 Material for protective film formation for liquid immersion exposure process, and method for photoresist pattern formation using the same
11/23/2006	WO2006123605A1 Polymerizable compound for photoresist, polymer thereof, and photoresist composition containing such polymer
11/23/2006	WO2006123549A1 Image forming method and planographic printing plate material
11/23/2006	WO2006123523A1 Positive resist composition and method of forming resist pattern
11/23/2006	WO2006123496A1 Positive-working resist composition and method for resist pattern formation
11/23/2006	WO2006123487A1 Positive resist composition and method of forming resist pattern
11/23/2006	WO2006123473A1 (meth)acryloyloxytetrahydrofurans and process for production thereof

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