G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2006
12/06/2006	CN1288069C Method for integral micromachining multilayer composite structure
12/06/2006	CN1288055C Plate supplying appts.
12/05/2006	US7146599 Method for using asymmetric OPC structures on line ends of semiconductor pattern layers
12/05/2006	US7145987 X-ray-generating devices and exposure apparatus comprising same
12/05/2006	US7145925 Laser oscillation apparatus, exposure apparatus, semiconductor device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method
12/05/2006	US7145720 Objective with fluoride crystal lenses
12/05/2006	US7145708 Light modulating engine
12/05/2006	US7145666 Position detecting method and apparatus
12/05/2006	US7145644 Device and method for testing an exposure apparatus
12/05/2006	US7145643 Interface unit, lithographic projection apparatus comprising such an interface unit and a device manufacturing method
12/05/2006	US7145641 Lithographic apparatus, device manufacturing method, and device manufactured thereby
12/05/2006	US7145640 Lithographic apparatus, device manufacturing method and variable attenuator
12/05/2006	US7145639 Projecting exposure method
12/05/2006	US7145638 Alignment apparatus, exposure apparatus, and device manufacturing method
12/05/2006	US7145637 Illumination system having a more efficient collector optic
12/05/2006	US7145635 Exposure method and apparatus
12/05/2006	US7145632 Cooling apparatus
12/05/2006	US7145629 Exposure technique
12/05/2006	US7145270 Driving unit, exposure apparatus using the same, and device fabrication method
12/05/2006	US7145269 Lithographic apparatus, Lorentz actuator, and device manufacturing method
12/05/2006	US7144968 Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method
12/05/2006	US7144927 Photoinitiator system with acylphosphine oxide initiators
12/05/2006	US7144848 Cleaning compositions containing hydroxylamine derivatives and processes using same for residue removal
12/05/2006	US7144817 For forming an opening in resin layer (polyimide) on the surface of a metal wiring of a flexible wiring board without toxic solvent
12/05/2006	US7144690 Forming on photosensitive substrate with light through a single reticle; transferring reticle; patterns separated by narrow spacing; offset printing
12/05/2006	US7144687 Manufacturing method for magnetic head suspension
12/05/2006	US7144685 Includes transparent support and shading member having pattern of at least two apertures with different widths not greater than wavelength of light from light source; transferring photoresist pattern onto silicon substrate by etching
12/05/2006	US7144683 Photopatternable molecular circuitry
12/05/2006	US7144682 non-polarized exposure light from a light source is projected onto an exposure mask having a light blocking film and a plurality of rectangular openings formed in the light blocking film; small-opening pattern
12/05/2006	US7144681 Precursor comprises switchable polymer, cyanine dye infrared radiation absorber, triazine compound and novolak resin; hydrophobic and then lipophilic after exposure to heat
12/05/2006	US7144678 Lithographic printing plate precursor
12/05/2006	US7144676 Xanthene senstitizers that affect color or shade change upon application of low energy; oxidizers, and aminocarboxylic acid amphoteric surfactant; may be peeled from workpiece in which they are coated; boats, vehicles
12/05/2006	US7144675 Radiation-sensitive resin composition
12/05/2006	US7144674 Positive resist composition
12/05/2006	US7144673 Coated photoresist having high polymer molecular weight or hardened skin is soaked in deionized water, treated with Caro's acid solution and rinsed; continuous fluid flow in integrated track; substrate is slowly rotated
12/05/2006	US7144662 Photoresist composition having a high heat resistance
12/05/2006	US7144661 Positive-working imageable radiation absorbing compound and substrate with hydrophilic surface having alkaline developer removable interior layer copolymer comprising N-(hydroxyalkyl)(meth)acrylamide monomer; ink receptive exterior layer; solvent resistance, bakeability; lithographic printing plates
12/05/2006	US7144601 Method of purging photoresist from semiconductor wafer coating apparatus
12/05/2006	US7144539 Imprint method and device
12/05/2006	US7144160 Hydrodynamic bearing apparatus and stage apparatus using the same
12/05/2006	CA2268903C Apparatus and method for recovering photoresist developers and strippers
11/2006
11/30/2006	WO2006126776A1 Antireflective hardmask composition and methods for using same
11/30/2006	WO2006126522A1 Exposure method, exposure apparatus and device manufacturing method
11/30/2006	WO2006126480A1 Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board
11/30/2006	WO2006126457A1 Image processor
11/30/2006	WO2006126444A1 Sensor calibration method, exposure method, exposure device, device fabrication method, and reflection type mask
11/30/2006	WO2006126433A1 Positive resist composition and method for forming resist pattern
11/30/2006	WO2006126406A1 Polysilane compound-containing lower layer film forming composition for lithography
11/30/2006	WO2006126374A1 Process for producing color filter, color filter, liquid crystal element, and liquid crystal display device
11/30/2006	WO2006126329A1 Positive photoresist composition, thick layered photoresist, process for producing thick resist pattern, and process for producing connecting terminal
11/30/2006	WO2006125790A2 Imaging systems in particular for a microlithographic projection illumination unit
11/30/2006	WO2006125635A1 Regeneratable, structured plate comprising oxidation catalysts
11/30/2006	WO2006125617A2 Method for improving the imaging properties of a projection objective, and such a projection objective
11/30/2006	WO2006125609A1 Method of aligning an optical system
11/30/2006	WO2006125600A1 Optical scattering disk, use thereof, and wavefront measuring apparatus
11/30/2006	WO2006125576A2 Optical grid system, measuring device, multiple exposure device and method
11/30/2006	WO2006125538A1 Optical system of a microlithographic projection exposure apparatus
11/30/2006	WO2006125369A1 Composition for removing photoresist layer and method for using it
11/30/2006	WO2006019450A3 Improved method for bump exposing relief image printing plates
11/30/2006	WO2005106597A3 Photopolymer plate and method for imaging the surface of a photopolymer plate
11/30/2006	WO2005079330A3 Permanent resist composition, cured product thereof, and use thereof
11/30/2006	US20060271907 Semiconductor circuit pattern design method for manufacturing semiconductor device or liquid crystal display device
11/30/2006	US20060270864 To produce photoresist resist material and pattern forming in a vacuum ultraviolet wavelength region
11/30/2006	US20060270748 Novel trifunctional photoinitiators
11/30/2006	US20060270575 Cleaning solution and cleaning method of a semiconductor device
11/30/2006	US20060270574 Photoresist stripping agent
11/30/2006	US20060269879 Method and apparatus for a post exposure bake of a resist
11/30/2006	US20060269874 On-press developable negative-working imageable elements
11/30/2006	US20060269873 On-press developable imageable element comprising a tetraarylborate salt
11/30/2006	US20060269867 Antireflective hardmask composition and methods for using same
11/30/2006	US20060269853 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect
11/30/2006	US20060269852 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect
11/30/2006	US20060269851 Photomask and method for conveying information associated with a photomask substrate
11/30/2006	US20060269850 Mask, method of producing the same, and method of producing semiconductor device
11/30/2006	US20060269121 Method and apparatus for circuit pattern inspection
11/30/2006	US20060269117 Method for analysis of objects in microlithography
11/30/2006	US20060268251 Illumination system for a microlithographic projection exposure apparatus
11/30/2006	US20060268250 Lithographic apparatus and device manufacturing method
11/30/2006	US20060268249 Exposure apparatus and device fabrication method
11/30/2006	US20060267252 Nanoparticle-filled stereolithographic resins
11/30/2006	US20060267224 Direct alignment scheme between multiple lithography layers
11/30/2006	DE10325151B4 Vorrichtung für die Erzeugung und/oder Beeinflussung elektromagnetischer Strahlung eines Plasmas An apparatus for generating and / or influencing electromagnetic radiation of a plasma
11/30/2006	DE102006024390A1 Übertragungsvorrichtung Transfer device
11/30/2006	DE102006020715A1 Printing plate holding device for use on drum of printing plate illuminator, has electrostatic plate holder to hold plates on drum and including voltage source to bring region in external section of drum to electrical level
11/30/2006	DE102005024518A1 Substrate coating method, involves spraying liquid under pressure through nozzle on substrate, where liquid is activated for vibration, which effects monodispersive decay of liquid jet leaving from nozzle
11/30/2006	DE102005024348A1 Semiconductor wafer`s exposure areas photolithographic structuring method for manufacturing integrated circuit, involves enclosing image field of reticle by boundary line, where field is different from rectangular form
11/30/2006	DE102005024290A1 Abbildungssystem, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage Imaging system, in particular for a microlithographic projection exposure apparatus
11/30/2006	DE102005024163A1 Optical system e.g. projection objective, for microlithography projection exposure system, has module insertable and removable as unit into system, and concave curved optical surface for capping cavity during operation of exposure system
11/30/2006	DE102005023871A1 Regenerierbare, strukturierte Platte mit Oxidationskatalysatoren A regenerable, structured plate with oxidation catalysts
11/30/2006	DE10124736B4 Retikel zur Proximity-Charakterisierung von Scannerlinsen sowie entsprechendes Verfahren Proximity to the reticle characterization of scanner lenses and corresponding method
11/30/2006	DE10027060B4 Abtastspitzen,Verfahren zur Herstellung und Verwendung derselben, insbesondere für die Rastersondenmikroskopie Scanning tips, method for preparation and use thereof, in particular for scanning probe microscopy
11/29/2006	EP1727220A2 Conductive structure based on poly-3,4-alkenedioxythiophene (PEDOT) and polystyrenesulfonic acid (PSS)
11/29/2006	EP1727188A1 Exposure apparatus, supply method and recovery method, exposure method, and device producing method
11/29/2006	EP1727158A2 Optical element for radiation in the EUV and/or soft X-ray wavelength range and an optical system comprising at least one optical element
11/29/2006	EP1726995A1 Last lens of immersion lithography equipment
11/29/2006	EP1726994A2 Light integrator for an illumination system, in particular for a microlithographic projection illumination unit
11/29/2006	EP1726993A1 Optical system and method for operating the same
11/29/2006	EP1726992A1 Negative resist composition
11/29/2006	EP1726991A2 Micro-contact-printing engine
11/29/2006	EP1726608A1 Radiation-sensitive resin composition

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