| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/07/2006 | WO2006129535A1 Drawing method and device |
| 12/07/2006 | WO2006129506A1 Image recording material and image forming method of image recording material |
| 12/07/2006 | WO2006129469A1 Photosensitive resin composition, photosensitive element employing the same, method of forming resist pattern, and process for producing printed wiring board |
| 12/07/2006 | WO2006129374A1 Patterning method |
| 12/07/2006 | WO2006128713A2 Optical imaging arrangement |
| 12/07/2006 | WO2006128642A1 Method for fine line resist stripping |
| 12/07/2006 | WO2006128613A1 Microlithography projection objective |
| 12/07/2006 | WO2006113492A3 Adjustable solubility in sacrificial layers for microfabrication |
| 12/07/2006 | WO2006111896A3 Device for directing radiation to a layer, apparatus with such device and method using such apparatus |
| 12/07/2006 | WO2006096528A3 Stabilized photoresist structure for etching process |
| 12/07/2006 | WO2006093770B1 Method to remove resist, etch residue, and copper oxide from substrates having copper and low-k dielectric material |
| 12/07/2006 | WO2006085757A3 Process for preparing a polymeric relief structure |
| 12/07/2006 | WO2006045748A3 Projection exposure apparatus for microlithography |
| 12/07/2006 | WO2005119729A3 Apparatus for generating and emitting xuv radiation |
| 12/07/2006 | WO2005070167A8 Nanoscale electric lithography |
| 12/07/2006 | WO2005067815A8 Stage alignment in lithography tools |
| 12/07/2006 | WO2005038878A3 Developer-soluble materials and methods of using the same in via-first dual damascene applications |
| 12/07/2006 | US20060277520 Method of locating areas in an image such as a photo mask layout that are sensitive to residual processing effects |
| 12/07/2006 | US20060275711 Method of manufacturing a LIGA mold by backside exposure |
| 12/07/2006 | US20060275710 Semiconductor device and manufacturing method thereof |
| 12/07/2006 | US20060275709 Lithographic apparatus and device manufacturing method |
| 12/07/2006 | US20060275708 Custom polarization, such as a combination of radial and tangential polarization; Forbidden pitch is avoided; patterning the polarized beam of radiation; projecting the patterned beam of radiation onto a target portion of the wafer |
| 12/07/2006 | US20060275707 Photoresists films with patterns formed by exposure to radiation or light and development |
| 12/07/2006 | US20060275706 forming photoresist layer, forming contamination gettering topcoat layer including hexafluoroalcohol-subsituted cyclohexane based polymers, complexing agent (trans-1,2 diaminocyclohexane-N,N,N',N'-tetracetic acid monohydrate) and casting solvent, exposing to actinic radiation through photomask |
| 12/07/2006 | US20060275705 irradiating portions of a non-conductive coating having silver conductive elements, a polyetherurethane binder to join the conductive elements, and a material to propagate absorption of radiation from a light source to induce the portions to an electrical conducting state |
| 12/07/2006 | US20060275702 Negative-working photosensitive resin composition and photosensitive resin plate using the same |
| 12/07/2006 | US20060275701 Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions |
| 12/07/2006 | US20060274296 Imaging system for thermal transfer |
| 12/07/2006 | US20060274294 Exposure apparatus, exposure method, and method for producing device |
| 12/07/2006 | US20060274293 Exposure apparatus, exposure method, and method for producing device |
| 12/07/2006 | US20060274292 Exposure apparatus and device manufacturing method |
| 12/07/2006 | US20060274291 Atmosphere control apparatus, device-manufacturing apparatus, device-manufacturing method, and exposure apparatus |
| 12/07/2006 | US20060273405 Semiconductor device and method for patterning |
| 12/07/2006 | US20060273071 Removing one of an alterated layer (formed by dry-etching or ashing)and deposited layer formed on organic film pattern, then fusing film for deformation; dielectrics; for semiconductors, liquid crystal displays; photolithography |
| 12/07/2006 | US20060272680 Method for the removal of organic residues from finely structured surfaces |
| 12/07/2006 | US20060272672 Method of cleaning at least one surface of an optical device disposed in a vacuum chamber |
| 12/07/2006 | DE19936331B4 Copolymer zur Erhöhung der Chemikalien- und Entwicklerresistenz von positiv arbeitenden Druckplatten Copolymer to increase the chemical and developer resistance of the positive-working printing plates |
| 12/07/2006 | DE102006021671A1 Extra-axial segment, for a rotationally symmetrical optical component, has several touch surfaces and an axis of symmetry designed as an optical axis |
| 12/07/2006 | DE102005060061A1 Polymer für die Immersionslithographie, Photoresistzusammensetzung, die selbiges enthält, Verfahren zur Herstellung einer Halbleitervorrichtung und Halbleitervorrichtung Polymer for the immersion lithography photoresist composition containing the same is to provide methods for manufacturing a semiconductor device and semiconductor device |
| 12/07/2006 | DE102005045568A1 Vorrichtung und Verfahren zum Schutz einer optischen Komponente, insbesondere in einer EUV-Quelle Apparatus and method for protection of an optical component, in particular in an EUV source |
| 12/07/2006 | DE102005025693A1 Verfahren zur Herstellung einer metallorganischen Schicht, mit diesem Verfahren hergestellte metallorganische Schichten und deren Verwendung A process for preparing an organometallic layer, metal organic layers produced by this method and their use |
| 12/06/2006 | EP1729184A1 Volume hologram recording material and volume hologram recording medium |
| 12/06/2006 | EP1729179A1 Method for fine line resist stripping |
| 12/06/2006 | EP1729178A1 Pattern formation method |
| 12/06/2006 | EP1729177A1 Electron beam lithography system |
| 12/06/2006 | EP1729176A1 Positively radiation-sensitive resin composition |
| 12/06/2006 | EP1729175A1 Photosensitive resin composition and method of forming pattern with the composition |
| 12/06/2006 | EP1729174A1 Photolithographically-patterned out-of-plane coil structures and method of making |
| 12/06/2006 | EP1728860A1 Method for producing polymers |
| 12/06/2006 | EP1728826A1 Composition curable by both free-radical photocuring and cationic photocuring |
| 12/06/2006 | EP1728382A2 Apparatus for imaging using an array of lenses |
| 12/06/2006 | EP1728123A2 Information management and tracking system (imts) |
| 12/06/2006 | EP1728122A2 Method for determining relative swing curve amplitude |
| 12/06/2006 | EP1727663A1 Photocurable compositions |
| 12/06/2006 | EP1123166B1 Method of removing organic materials from substrates |
| 12/06/2006 | CN1875464A Cleaning composition for semiconductor containing unsaturated dicarboxylic acid and ethylene urea and cleaning method |
| 12/06/2006 | CN1875460A Exposure apparatus and device producing method |
| 12/06/2006 | CN1875326A Composition for separating photoresist and separating method |
| 12/06/2006 | CN1875325A Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors |
| 12/06/2006 | CN1875324A Composition for forming underlying film containing dextrin ester compound |
| 12/06/2006 | CN1875323A Thick film or ultrathick film responsive chemical amplification type photosensitive resin composition |
| 12/06/2006 | CN1875322A Chemically amplified positive photosensitive thermosetting resin composition, method of forming cured article, and method of producing functional device |
| 12/06/2006 | CN1875321A A method of forming a patterned layer on a substrate |
| 12/06/2006 | CN1875245A Method for calibration of a metrology stage |
| 12/06/2006 | CN1875047A Curable polyester having an oxetanyl group at end and process for preparing the same, resist composition, ink composition, curing methods and uses thereof |
| 12/06/2006 | CN1875045A Tougher cycloaliphatic epoxide resins |
| 12/06/2006 | CN1873786A Magnetic recording medium and manufacture method, magnetic recording and reproducing apparatus, stamper, and method of manufacturing stamper |
| 12/06/2006 | CN1873543A Stripping liquid for photoresist |
| 12/06/2006 | CN1873542A Dual stage lithographic apparatus and device manufacturing method |
| 12/06/2006 | CN1873541A Exposure device of basal plate chuck with good flatness |
| 12/06/2006 | CN1873540A Pattern writing apparatus and block number determining method |
| 12/06/2006 | CN1873539A Objective with pupil obscuration |
| 12/06/2006 | CN1873538A Checking method and method for preparation liquid crystal display device using the same |
| 12/06/2006 | CN1873537A Pattern formation method |
| 12/06/2006 | CN1873536A Method of forming image in photoresist layer |
| 12/06/2006 | CN1873535A 涂布方法和涂布装置 The coating method and coating apparatus |
| 12/06/2006 | CN1873534A Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same |
| 12/06/2006 | CN1873533A Photoresist polymer, photoresist composition and method for manufacturing semiconductor device |
| 12/06/2006 | CN1873532A Polymer for immersion lithography, photoresist composition containing the same, method of manufacturing a semiconductor device, and semiconductor device |
| 12/06/2006 | CN1873531A Method for forming concavo-convex pattern, and method for manufacturing master disk, stamper and magnetic recording medium |
| 12/06/2006 | CN1873530A Display device, method of manufacturing the same and mask for manufacturing the same |
| 12/06/2006 | CN1288720C Film forming method and device manufactured by the method and manufacturing method of device |
| 12/06/2006 | CN1288719C Microprocess for pattern photoresist |
| 12/06/2006 | CN1288692C Air-cooled lamp, and article treatment system and method utilizing an air-cooled lamp |
| 12/06/2006 | CN1288508C Inspecting method of functions of projection optical system of exposure device and photomask for inspection |
| 12/06/2006 | CN1288507C Energy beam exposure method and device |
| 12/06/2006 | CN1288506C Method for manufacturing photoetching equipment and device |
| 12/06/2006 | CN1288505C System and method for improving line width control in photoetching apparatus |
| 12/06/2006 | CN1288504C Method for producing photoetching device and equipment |
| 12/06/2006 | CN1288503C Method and apparatus for patterning a workpiece |
| 12/06/2006 | CN1288502C Printing apparatus for marking an identifying code by using laser beam |
| 12/06/2006 | CN1288501C Photoresist composition having a high heat resistance |
| 12/06/2006 | CN1288500C Resist material and microfabrication method |
| 12/06/2006 | CN1288499C Radiation-sensitive resin composition |
| 12/06/2006 | CN1288498C Multiphoton photosensitization system |
| 12/06/2006 | CN1288497C Photo sensitive composition and negative lithographic printing plate |
| 12/06/2006 | CN1288496C Method for making sub-wavelength structure |
| 12/06/2006 | CN1288488C Array substrate of LCD device and it mfg. method |
| 12/06/2006 | CN1288207C Photo-induced cation curable epoxy resin composition |
| 12/06/2006 | CN1288123C Solid mixtures of alpha-hydroxycarbonyl derivatives of alpha-methylstyrene oligomers and their use |