G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2006
12/13/2006	EP1730591A2 Nanoscale electric lithography
12/13/2006	EP1730477A1 Embedded attenuated phase shift mask with tunable transmission
12/13/2006	EP1730225A2 High performance water-based primer
12/13/2006	EP1438633B1 Method for forming elliptical and rounded features using beam shaping
12/13/2006	EP1226469B1 Trimming mask with semitransparent phase-shifting regions
12/13/2006	EP1141063B1 High photo-sensitivity curable resin, photo-curable resin composition, production method thereof, color filter and liquid crystal display panel
12/13/2006	EP1007969A4 Lithographic mask design and synthesis of diverse probes on a substrate
12/13/2006	CN2847336Y PS plate copying device
12/13/2006	CN2847335Y Automatic tape winding type optic etching screen rubber coating machine
12/13/2006	CN1879064A Pattern recognition and metrology structure for an X-initiative layout design
12/13/2006	CN1879063A Differential critical dimension and overlay metrology device and measurement method
12/13/2006	CN1879062A Illumination system for a microlithography projection exposure installation
12/13/2006	CN1879061A Positive photoresist and method for producing structure
12/13/2006	CN1879060A Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed circuit board
12/13/2006	CN1879059A Photocurable composition for producing cured articles having high clarity and improved mechanical properties
12/13/2006	CN1879058A Curable compositions and rapid prototyping process using the same
12/13/2006	CN1879046A Apparatus for manipulation of an optical element
12/13/2006	CN1878854A Photopolymerizing composition and photopolymerizing recording medium manufactured using the same and used to manufacture 3D optical memory
12/13/2006	CN1878841A Pigment compositions consisting of a yellow disazo pigment and an organic pigment
12/13/2006	CN1878798A Curable polymer compound
12/13/2006	CN1877457A Processing method, manufacturing method of semiconductor device, and processing apparatus
12/13/2006	CN1877456A Lens positioning method, cutting method, positioning method, and cutting apparatus
12/13/2006	CN1877455A Immersion photo-etching device with equal pressure at least on projection optical part and wafer and method thereof
12/13/2006	CN1877454A Projection optics
12/13/2006	CN1877453A Method for making reverse ladder structure by using architecture-complementary micro-patterning technique
12/13/2006	CN1877452A Device and method for manufacturing plate display device
12/13/2006	CN1877451A Substrate processing system and substrate processing method
12/13/2006	CN1877450A Coating compositions
12/13/2006	CN1877449A Negative light-sensitive resin composition
12/13/2006	CN1877448A Etchant, method for fabricating a wire using the etchant, and method for fabricating a thin film transistor substrate using the etchant
12/13/2006	CN1877447A 抗蚀剂组合物及其使用方法 A resist composition and method of use
12/13/2006	CN1290168C System and method of providing mask defect printablity analysis
12/13/2006	CN1290167C Lithography method for forming semiconductor devices on wafer and apparatus
12/13/2006	CN1290166C Correction of overlay offset between inspection layers in interated circuits
12/13/2006	CN1290156C Dry developing method
12/13/2006	CN1290155C Exposure device, surface position regulating unit and method for making mask and device
12/13/2006	CN1289970C Development treating method
12/13/2006	CN1289969C Lithographic apparatus, device manufacturing method
12/13/2006	CN1289968C Photoetching mask, its making method and making appts.
12/13/2006	CN1289967C Photoetching projection device and method for fabricating same
12/13/2006	CN1289966C Positive photoetching gum composition and method for forming photoetching gum pattern using the same
12/13/2006	CN1289965C Anti-corrosion layer on objective lens for liquid immersion lithography applications
12/13/2006	CN1289964C Method for making glass chip under ordinary laboratory condition
12/13/2006	CN1289621C Cationic polymerizable adhesive composition and anisotropically electroconductive adhesive composition
12/13/2006	CN1289317C Method and device for forming surface with both hydrophilic area and hydrophobic area
12/13/2006	CN1289293C Lithographic printing plate forebody
12/12/2006	US7149234 High repetition rate gas discharge laser with precise pulse timing control
12/12/2006	US7148973 Position detecting method and apparatus, exposure apparatus and device manufacturing method
12/12/2006	US7148971 Apparatus for measuring the physical properties of a surface and a pattern generating apparatus for writing a pattern on a surface
12/12/2006	US7148959 Test pattern, inspection method, and device manufacturing method
12/12/2006	US7148957 Imaging system for thermal transfer
12/12/2006	US7148956 Exposure method
12/12/2006	US7148955 Temperature adjusting system and exposure apparatus incorporating the same
12/12/2006	US7148952 Lithographic apparatus and device manufacturing method
12/12/2006	US7148950 Lithographic apparatus and device manufacturing method
12/12/2006	US7148949 Lithographic apparatus and device manufacturing method
12/12/2006	US7148948 Scanning exposure apparatus, and device manufacturing method
12/12/2006	US7148496 System and method for proximity effect correction in imaging systems
12/12/2006	US7148495 Illumination system, particularly for EUV lithography
12/12/2006	US7148382 Bathochromic mono- and bis-acylphosphine oxides and sulfides and their use as photoinitiators
12/12/2006	US7148363 Esterification to get cyclic acrylate compounds; used as raw material for functional polymers, pharmaceuticals, pesticides, semiconductor lithography
12/12/2006	US7148265 Functional polymer
12/12/2006	US7148152 Method for fabricating a mask, method for fabricating a patterned thin film and a micro device
12/12/2006	US7148138 Method of forming contact hole and method of manufacturing semiconductor device
12/12/2006	US7147995 comprises a linear-type and a branched-type alkyleneoxide adduct, anionic or amphoteric surfactants; performs even if components of an image recording layer dissolve into the developing solution while processing so that highly sharp and clear image is formed without damages to image areas
12/12/2006	US7147994 Top ARC polymers, method of preparation thereof and top ARC compositions comprising the same
12/12/2006	US7147991 Imagewise exposure to ultraviolet radiation using a digital mirror device, and removing an image formation layer having an acrylic ester-diazo resin copolymer, at non-exposed portions with an basic solution; high chemical resistance and printing durability
12/12/2006	US7147990 Procedure for photo engraving in high definition on metal
12/12/2006	US7147989 Sensitivity correlating to laser exposure, printing durability, and storage stability
12/12/2006	US7147988 A plastic support with a hydrophilic layer and back layer containing a matting agent with particle sizes between 3 and 9 microns; lithographic printing
12/12/2006	US7147987 Positive resist composition and pattern formation method using the same
12/12/2006	US7147986 Resist compounds including acid labile groups attached to polymeric chains at anhydride linkages
12/12/2006	US7147985 Resist compounds including acid labile groups having hydrophilic groups attached thereto
12/12/2006	US7147984 Patterning semiconductors; using polymer and acid generator mixture
12/12/2006	US7147983 Dyed photoresists and methods and articles of manufacture comprising same
12/12/2006	US7147977 A wafer is held on a pin chuck, and a pattern is transferred by exposure to light; the differences in distance between a focal position of the exposure light and the principal surface of the wafer held on the pin chuck are set at 50% or less; high precision lithography patterns; miniaturization
12/12/2006	US7147975 For forming a fine pattern in fabrication of semiconductor integrated circuit devices
12/12/2006	US7147973 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect
12/12/2006	US7147765 Apparatus and method for deposition of an electrophoretic emulsion
12/12/2006	US7147722 Method for in-situ cleaning of carbon contaminated surfaces
12/12/2006	US7147166 Substrate transfer apparatus, semiconductor manufacturing apparatus, and semiconductor device manufacturing method
12/12/2006	US7146909 Image forming material
12/12/2006	US7146712 Pattern forming method and method of making microdevice
12/12/2006	CA2087625C Non-systolic time delay and integration printing
12/07/2006	WO2006129973A1 Coating composition for film with low refractive index and film prepared therefrom
12/07/2006	WO2006129924A1 Method for simultaneously forming color filter overcoat and column spacer of lcd and negative photoresist composition usable therein
12/07/2006	WO2006129875A1 Radiation-sensitive resin composition, layered product, and process for producing the same
12/07/2006	WO2006129864A1 Image exposure apparatus
12/07/2006	WO2006129800A1 Surface treating agent for pattern formation
12/07/2006	WO2006129697A1 Photocuring/thermosetting resin composition, curing/setting product thereof and printed wiring board obtained using the same
12/07/2006	WO2006129663A1 Curable resin composition and cured object obtained therefrom
12/07/2006	WO2006129653A1 Exposure apparatus and exposure method
12/07/2006	WO2006129582A1 Drawing device and drawing method
12/07/2006	WO2006129581A1 Plotting device and method
12/07/2006	WO2006129574A1 Calixresorcinarene compound, photoresist base comprising the same, and composition thereof
12/07/2006	WO2006129567A1 Wet treatment apparatus and process for producing display panel
12/07/2006	WO2006129565A1 Resist material, and resist material for electron beam recording
12/07/2006	WO2006129564A1 Material for pattern formation, apparatus for pattern formation, and method for pattern formation
12/07/2006	WO2006129549A1 Semiconductor cleaning liquid composition containing phosphonic acid and ascorbic acid, and method of cleaning
12/07/2006	WO2006129538A1 Semiconductor wafer cleaning composition containing phosphonic acid and method of cleaning

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