G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2006
12/20/2006	CN1291274C Method for making miniature structure using high-energy light source
12/20/2006	CN1291270C Method for preparing semi-transparent and semi-reflective thin-film transistor liquid-crystal display
12/20/2006	CN1291268C Mask, substrate with light reflection film, method for making light-reflection film, display device and electric appliance
12/20/2006	CN1291027C Process for producing monomer
12/20/2006	CN1290881C Light sensitive polymer containing adamantane alkyl vinyl ether and optical retardent composition containing same
12/19/2006	USRE39434 Applying photoresist to plate; exposure to ultraviolet radiation; development, heating
12/19/2006	US7151981 Methods and apparatus for positioning a substrate relative to a support stage
12/19/2006	US7151594 Test pattern, inspection method, and device manufacturing method
12/19/2006	US7151593 Method for imaging wafers using a projection mask aligner
12/19/2006	US7151592 Projection system for EUV lithography
12/19/2006	US7151590 Transport system for a lithographic apparatus and device manufacturing method
12/19/2006	US7151588 Lithographic apparatus and a method of compensating for thermal deformation in a lithographic apparatus
12/19/2006	US7151054 Semiconductor processing methods of forming and utilizing antireflective material layers, and methods of forming transistor gate stacks
12/19/2006	US7151008 Fabrication method for phase change diode memory cells
12/19/2006	US7150961 dioxylithocholates, e.g., 3 alpha -acetyl tert-butyl lithocholate and alpha ,10 alpha -diacetyl tert-butyl lithocholate; added to a mixture of a photoacid generator, solvent and a photoresist polymer; contact hole formation
12/19/2006	US7150959 Heat-sensitive lithographic printing plate precursor
12/19/2006	US7150958 Splitting using laser radiation
12/19/2006	US7150957 A fluorinated vinyl ether, comprising ethylene directly substituted at an olefinic carbon atom with a OR* grouop and R* containing a fluorinated alkyl moiety substituted with a protected or unprotected hydroxyl group
12/19/2006	US7150956 Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device
12/19/2006	US7150955 Light-sensitive sheet comprising support, first and second light-sensitive layers and barrier layer
12/19/2006	US7150949 Further method to pattern a substrate
12/19/2006	US7150948 Faster wafer fabrication without wasting exposure area; simultaneous evaluation
12/19/2006	US7150947 Mixture of polyimide and acid generator; forming relief images
12/19/2006	US7150945 Polarized reticle, photolithography system, and method of forming a pattern using a polarized reticle in conjunction with polarized light
12/19/2006	US7150816 Enables use of electrophoretic resists in the microfabrication industry for production of microelectronic devices and is of sufficiently high quality to be used as a replacement for, or supplement to, current photoresist deposition technology
12/19/2006	US7150622 Systems for magnification and distortion correction for imprint lithography processes
12/19/2006	CA2341548C Method of removing organic materials from substrates
12/14/2006	WO2006133330A1 Hydrofluoroalkanesulfonic acids and salts from fluorovinyl ethers
12/14/2006	WO2006133253A1 Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition
12/14/2006	WO2006132287A1 Fluorocopolymer, process for producing the same, and resist composition containing the same
12/14/2006	WO2006132139A1 Compound for resist and resist composition
12/14/2006	WO2006132089A1 Thermoacid generator for antireflection film formation, composition for antireflection film formation, and antireflection film made therefrom
12/14/2006	WO2006132088A1 Coating-type underlayer film forming composition containing naphthalene resin derivative for lithography
12/14/2006	WO2006132008A1 Organic film release agent, and method and appartus for removing organic film using said release agent
12/14/2006	WO2006131517A2 Illuminating device of a microlithographic projection exposure system
12/14/2006	WO2006131258A1 Immersion lithography lens
12/14/2006	WO2006131242A1 Multiple-use projection system
12/14/2006	WO2006131153A1 Pattern replication with intermediate stamp
12/14/2006	WO2006131093A1 Method and device for reflection of radiation in the euv or x-ray wavelength range and method for producing a material having a refractive index sutiable therefor
12/14/2006	WO2006130995A2 Fluorescent photopolymerizable resins and uses thereof
12/14/2006	WO2006109343A3 Process for the formation of miniaturized getter deposits and getterdeposits so obtained
12/14/2006	WO2006107517A3 Composition for cleaning ion implanted photoresist in front end of line applications
12/14/2006	WO2006100076A3 Lithographic apparatus and device manufacturing method
12/14/2006	WO2006036019A3 Image recording device and image recording method
12/14/2006	WO2006015142A3 Catadioptric imaging system exhibiting enhanced deep ultraviolet spectral bandwidth
12/14/2006	WO2006012388A3 Test structures and methods for monitoring or controlling a semiconductor fabrication process
12/14/2006	WO2006002197A3 Image forming device and an exposure member
12/14/2006	WO2005109106A8 Apparatus and process for determination of dynamic lens field curvature
12/14/2006	WO2005103822A3 Photosensitive resin composition, cured product thereof and production method of printed circuit board using the same
12/14/2006	WO2005034193A3 Single scan irradiation for crystallization of thin films
12/14/2006	US20060282188 Remote maintenance system
12/14/2006	US20060281890 Organosilicon compounds and method of manufacturing the same
12/14/2006	US20060281032 Lithographic apparatus and device manufacturing method for writing a digital image
12/14/2006	US20060281031 Production of two superposed elements within an integrated electronic circuit
12/14/2006	US20060281030 Method for forming an anti-etching shielding layer of resist patterns in semiconductor fabrication
12/14/2006	US20060281029 Resin for under-layer material, under-layer material, laminate and method for forming resist pattern
12/14/2006	US20060281028 highly transparent to UV wavelengths ranging from about 190 nm to 260 nm; for optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography
12/14/2006	US20060281027 Aspherical-polymer fine particles and production method thereof, and method for producing lithographic printing plate, ink composition and electrophoretic particle composition
12/14/2006	US20060281023 Negative photoresist composition
12/14/2006	US20060281014 Method and apparatus for protecting a reticle used in chip production from contamination
12/14/2006	US20060280878 Column spacer, liquid crystal display element and curable resin composition for column spacer
12/14/2006	US20060280358 Pattern comparison inspection method and pattern comparison inspection device
12/14/2006	US20060280357 Use of overlay diagnostics for enhanced automatic process control
12/14/2006	US20060279837 High NA system for multiple mode imaging
12/14/2006	US20060279141 Lithographic apparatus, device manufacturing method, and device manufactured thereby
12/14/2006	US20060279024 Method for providing desirable wetting and release characteristics between a mold and a polymerizable composition
12/14/2006	US20060279018 applying liquids containing polymers on substrates, then stamping relief patterns; electronics such as displays and detectors
12/14/2006	US20060279004 Mold, pattern forming method, and pattern forming apparatus
12/14/2006	US20060278879 Nanochannel device and method of manufacturing same
12/14/2006	DE102005027099A1 Immersionslithographieobjektiv Immersion lithography lens
12/14/2006	DE102005026334A1 Method for processing of medium- and long-wave surface shape of work piece e.g., for optical elements, involves eroding modified layers to give work piece modified surface
12/14/2006	DE102005024682A1 Optical material e.g. glasses, for UV microlithography, has earth alkali metal fluoride doped with bivalent metal ions that possess ion radius, which is similar to that of alkali ions, so that bivalent ions are integrated in crystal lattice
12/13/2006	EP1732108A1 Coater/developer and coating/developing method
12/13/2006	EP1732107A1 Method for correcting electron beam exposure data
12/13/2006	EP1732075A2 Method and device for irradiating spots on a layer
12/13/2006	EP1731975A1 Volume hologram recording material and volume hologram recording medium
12/13/2006	EP1731968A2 Method of characterizing, method of characterizing a process operation, and device manufacturing method
12/13/2006	EP1731967A1 Exposure apparatus
12/13/2006	EP1731966A1 Exposure equipment
12/13/2006	EP1731965A2 Imprint stamp comprising cyclic olefin copolymer
12/13/2006	EP1731964A1 Processing apparatus, processing method, and process for producing chip
12/13/2006	EP1731963A2 Mold, pattern forming method, and pattern forming apparatus
12/13/2006	EP1731962A1 Pattern replication with intermediate stamp
12/13/2006	EP1731961A1 Template replication method
12/13/2006	EP1731960A1 Apparatus and method for separating a composite
12/13/2006	EP1731576A2 Pigment dispersants and their use
12/13/2006	EP1731504A1 Adamantane derivative and process for producing the same
12/13/2006	EP1731325A1 Hollow cylindrical printing element
12/13/2006	EP1730773A1 Polymers of polycyclic olefins having a polyhedral oligosilsesquioxane pendant group and uses thereof
12/13/2006	EP1730764A2 Lpp euv light source
12/13/2006	EP1730763A2 Euv light source
12/13/2006	EP1730600A1 Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate
12/13/2006	EP1730599A1 Apparatus and method for thermally developing flexographic printing sleeves
12/13/2006	EP1730598A2 Light source for photolithography
12/13/2006	EP1730597A2 Methods for manufacturing reflective optical elements, reflective optical elements, euv-lithography apparatuses and methods for operating optical elements and euv-lithography apparatuses, methods for determining the phase shift, methods for determining the layer thickness, and apparatuses for carryi
12/13/2006	EP1730596A2 Projection objective, projection exposure apparatus and reflective reticle for microlithography
12/13/2006	EP1730595A2 Method involving a mask or a reticle
12/13/2006	EP1730594A2 Method for producing a base material for screen printing, and base material of this type
12/13/2006	EP1730593A2 A process of imaging a deep ultraviolet photoresist with a top coating and materials thereof
12/13/2006	EP1730592A2 Permanent resist composition, cured product thereof, and use thereof

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