| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/21/2006 | WO2006134854A1 Image processing device, image drawing device, and system |
| 12/21/2006 | WO2006134846A1 Curing accelerator, thermosetting resin composition, photosensitive composition, photosensitive film, permanent pattern and method for forming same |
| 12/21/2006 | WO2006134814A1 Compound, positive resist composition, and method of forming resist pattern |
| 12/21/2006 | WO2006134811A1 Polyhydric phenol compound, compound, positive resist composition, and method of forming resist pattern |
| 12/21/2006 | WO2006134806A1 Positive resist composition and method of forming resist pattern |
| 12/21/2006 | WO2006134793A1 Projector |
| 12/21/2006 | WO2006134761A1 Drawing device and drawing method |
| 12/21/2006 | WO2006134739A1 Positive resist composition and method of forming resist pattern |
| 12/21/2006 | WO2006133956A2 Removal of thin structured polymer layers by means of atmospheric plasma |
| 12/21/2006 | WO2006133907A2 Passive reticle tool, lithographic apparatus and method of patterning a device |
| 12/21/2006 | WO2006133906A1 Lithographic projection system and projection lens polarization sensor |
| 12/21/2006 | WO2006133884A2 Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element |
| 12/21/2006 | WO2006133801A1 Projection objective having a high aperture and a planar end surface |
| 12/21/2006 | WO2006133800A1 Lithography projection objective, and a method for correcting image defects of the same |
| 12/21/2006 | WO2006133729A1 Method and system for photolithography |
| 12/21/2006 | WO2006086486A3 Apparatus for projecting a reduced image of a photomask using a schwarzschild objective |
| 12/21/2006 | WO2006078857A3 Single wavelength stimulated emission depletion microscopy |
| 12/21/2006 | WO2006051448A3 Array of spatial light modulators and method of production of a spatial light modulator device |
| 12/21/2006 | WO2006039161A3 Method and system for contamination detection and monitoring in a lithographic exposure tool and operating method for the same under controlled atmospheric conditions |
| 12/21/2006 | WO2005119366A3 Method for pre-exposing relief image printing plate |
| 12/21/2006 | WO2005103824A3 Method of forming a metal pattern on a substrate |
| 12/21/2006 | WO2005094304A3 Catadioptric imaging system employing immersion liquid for use in broad band microscopy |
| 12/21/2006 | WO2004081057A3 Novel photosensitive resin compositions |
| 12/21/2006 | US20060287558 The monomer: 3-Hydroxy-3,3-bis(trifluoromethyl)-2-methylpropyl vinyl ether; for preparing chemical amplification resists that are transparent to deep ultraviolet radiation used in the manufacture of integrated circuits |
| 12/21/2006 | US20060286809 Method for etching a patterned silicone layyer |
| 12/21/2006 | US20060286488 Methods and devices for fabricating three-dimensional nanoscale structures |
| 12/21/2006 | US20060286487 Process for coating thick resist over polymer features |
| 12/21/2006 | US20060286486 First organic layer, silicon-containing sacrificial layer, and second organic layer; photolithographically patterning the 2nd organic layer and using it as a mask to etch the sacrificial layer; using the etched sacrificial layer as a mask to etch first organic layer; using product to etch the substrate |
| 12/21/2006 | US20060286485 Substrate structure and the fabrication method thereof |
| 12/21/2006 | US20060285098 Method for determining focus deviation amount in pattern exposure and pattern exposure method |
| 12/21/2006 | US20060285097 Lithographic apparatus and device manufacturing method |
| 12/21/2006 | US20060285092 Exposure apparatus and device fabrication method |
| 12/21/2006 | US20060285091 Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application |
| 12/21/2006 | US20060284162 Programmable optical component for spatially controlling the intensity of beam of radiation |
| 12/21/2006 | US20060284120 Method for correcting electron beam exposure data |
| 12/21/2006 | US20060284110 Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particle beam exposure apparatus, and charged particle beam exposure apparatus |
| 12/21/2006 | DE10258715B4 Verfahren zur Herstellung eines optischen Abbildungssystems A process for producing an optical imaging system |
| 12/21/2006 | DE102005027046A1 Assembly to generate periodic high-resolution laser image on substrate has diffraction beam divider |
| 12/21/2006 | DE102005026569A1 Light integrator for microlithographic projection lighting equipment`s lighting system, has integrator rod possessing dimensions selected such that number of total reflections occurring at coating surfaces of rod is not more than fifteen |
| 12/21/2006 | DE102004006262B9 Abbildungseinrichtung und Verfahren zum Entwerfen einer Abbildungseinrichtung Imaging device and method for designing an imaging device |
| 12/21/2006 | DE10151661C5 Tiefdruckverfahren mit radikalisch härtbaren Druckfarben Gravure printing process with radically curable inks |
| 12/21/2006 | CA2611689A1 Methods for reclaiming developing solvents |
| 12/20/2006 | EP1734409A2 Lithographic apparatus and controllable patterning device utilizing a spatial light modulator with distributed digital to analog conversion |
| 12/20/2006 | EP1734408A1 Measurement setup with improved sensor lifetime, in particular for measuring EUV energy |
| 12/20/2006 | EP1734407A2 Chemically amplified resist material and pattern formation method using the same |
| 12/20/2006 | EP1734406A1 Resist composition, method of forming resist pattern, semiconductor device and method od manufacturing thereof |
| 12/20/2006 | EP1734074A1 Photofunctional optical material comprising fluorinated acrylate polymer |
| 12/20/2006 | EP1734032A1 Calixresorcinarene compounds, photoresist base materials, and compositions thereof |
| 12/20/2006 | EP1733866A2 Improved edge smoothness with low resolution projected images for use in 3D modeling |
| 12/20/2006 | EP1733421A2 Aqueous solution for removing post-etch residue |
| 12/20/2006 | EP1733281A2 Method of forming a metal pattern on a substrate |
| 12/20/2006 | EP1733272A1 Catadioptric projection objective with mirror group |
| 12/20/2006 | EP1733271A1 Catadioptric projection objective |
| 12/20/2006 | EP1733229A1 Patterning method for biosensor applications and devices comprising such patterns |
| 12/20/2006 | EP1733001A2 Composition useful for removal of bottom anti-reflection coatings from patterned ion-implanted photoresist wafers |
| 12/20/2006 | EP1521797A4 Antireflective silicon-containing compositions as hardmask layer |
| 12/20/2006 | EP1488284B1 Photomask and method for photolithographic patterning of a substrate by use of phase shifted assist features |
| 12/20/2006 | EP1330859B1 Smart laser with fast deformable grating |
| 12/20/2006 | EP1192798B1 Multiple-beam, diode-pumped imaging system |
| 12/20/2006 | CN1883030A Method and apparatus for printing patterns with improved CD uniformity |
| 12/20/2006 | CN1883029A Light flux conversion element, lighting optical device, exposure system, and exposure method |
| 12/20/2006 | CN1882883A System and method for characterizing lithography effects on a wafer |
| 12/20/2006 | CN1882882A Method for forming multilayer resist |
| 12/20/2006 | CN1882881A 感光聚合物印刷版前体 Photopolymer printing plate precursor |
| 12/20/2006 | CN1882880A Aqueous resist composition |
| 12/20/2006 | CN1882879A Photopolymerizable composition |
| 12/20/2006 | CN1882878A Patterned ceramic films and method for producing the same |
| 12/20/2006 | CN1882877A Process for the manufacture of flexographic printing plates |
| 12/20/2006 | CN1882876A Polarized reticle, photolithography system, and method of forming a pattern using a polarized reticle in conjunction with polarized light |
| 12/20/2006 | CN1882875A Defect mitigation in spatial light modulator used for dynamic photolithography |
| 12/20/2006 | CN1882874A Real time image resizing for dynamic digital photolithography |
| 12/20/2006 | CN1882664A Formation of self-assembled monolayers |
| 12/20/2006 | CN1881440A Disk original version making method |
| 12/20/2006 | CN1881091A Off-axis projection optical system and extreme ultraviolet lithography apparatus using the same |
| 12/20/2006 | CN1881090A Substrate processing system for performing exposure process in gas atmosphere |
| 12/20/2006 | CN1881089A Substrate processing system for performing exposure process in gas atmosphere |
| 12/20/2006 | CN1881088A 扫描仪系统 The scanner system |
| 12/20/2006 | CN1881087A Mask CD correction based on global pattern density |
| 12/20/2006 | CN1881086A Photomask, method of making a photomask and photolithography method and system using the same |
| 12/20/2006 | CN1881085A Compositions and processes for immersion lithography |
| 12/20/2006 | CN1881084A Chemically amplified resist material and pattern formation method using the same |
| 12/20/2006 | CN1881083A Negative-type photosensitive resin composition |
| 12/20/2006 | CN1881082A Radiation sensitive resin composition, protrusion and spacer made therefrom, and liquid crystal display device comprising them |
| 12/20/2006 | CN1881081A Radiation sensitive composition and color filter for forming coloration layer |
| 12/20/2006 | CN1881080A Photosensitive resin composition, partition of display panel and display panel |
| 12/20/2006 | CN1881079A Method and apparatus for creating a topographically patterned substrate |
| 12/20/2006 | CN1881078A Method for forming an anti-etching shielding layer |
| 12/20/2006 | CN1881077A Surface reforming method of polymer |
| 12/20/2006 | CN1881076A Levenson phase transfer mask and preparation method thereof, and method for preparing semiconductor element |
| 12/20/2006 | CN1881015A Liquid crystal display panel and fabricating method thereof |
| 12/20/2006 | CN1880080A Method for manufacturing liquid discharge head, liquid discharge head, and liquid discharge recording apparatus |
| 12/20/2006 | CN1880078A Liquid discharge head and liquid discharge head manufacturing method, chip element, and printing apparatus |
| 12/20/2006 | CN1291479C A method for reducing dimension differences between isolated contact aperture and dense contact aperture |
| 12/20/2006 | CN1291281C Detergent used in photolithography and a method for treating substrate therewith |
| 12/20/2006 | CN1291280C Method for forming pattern on substrate and method for fabricating liquid crystal display using same |
| 12/20/2006 | CN1291279C Photosensitive resin composition for gap |
| 12/20/2006 | CN1291278C Radiation-sensitive resin composition |
| 12/20/2006 | CN1291277C Holotype photoresist composite |
| 12/20/2006 | CN1291276C Method for fabricating thin film transistors |
| 12/20/2006 | CN1291275C Surface conductive electronic emitting component and mfg. method for image forming device |