G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2006
12/27/2006	EP1737022A1 Substrate processing system and substrate processing method
12/27/2006	EP1736831A1 Lithographic apparatus and device manufacturing method
12/27/2006	EP1736830A1 Lithographic apparatus and device manufacturing method
12/27/2006	EP1736829A1 Radiation-sensitive resin composition
12/27/2006	EP1736828A1 Photoresist monomer, polymer thereof and photoresist composition including the same
12/27/2006	EP1736827A1 Positive resist composition for immersion exposure and method for forming resist pattern
12/27/2006	EP1736826A1 Photosensitive lithographic printing plate
12/27/2006	EP1736825A2 Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition
12/27/2006	EP1736824A2 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
12/27/2006	EP1736485A1 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern
12/27/2006	EP1736477A1 Fluorine-containing compound, water repellent composition and thin film
12/27/2006	EP1735820A2 Fabrication and use of superlattice
12/27/2006	EP1735666A2 Optical element unit for exposure processes
12/27/2006	EP1735665A2 Cleaning of multi-layer mirrors
12/27/2006	EP1735664A1 Method of producing a relief image
12/27/2006	EP1735663A1 Lithographic method products obtained and use of said method
12/27/2006	EP1735651A2 Optical element and fixture for an optical element
12/27/2006	EP1586112B1 Binder diffusion patterning of a thick film paste layer
12/27/2006	EP1539771B1 Silyl alkyl esters of anthracene- and phenanthrene carboxylic acids
12/27/2006	EP1297386B1 Negative-acting chemically amplified photoresist composition
12/27/2006	EP1222497A4 Uv-absorbing support layers and flexographic printing elements comprising same
12/27/2006	EP1120246B1 Planographic printing original plate and method of plate-making a planographic printing plate
12/27/2006	CN1886699A Reducing photoresist line edge roughness using chemically-assisted reflow
12/27/2006	CN1886698A Immersion lithographic process using a conforming immersion medium
12/27/2006	CN1886442A Pellicle and novel fluoropolymer
12/27/2006	CN1886438A Flame retardant radiation curable compositions
12/27/2006	CN1886437A One-pack-type resin composition curable with combination of light and heat and use of the same
12/27/2006	CN1886410A Silane compound, polysiloxane and radiation-sensitive resin composition
12/27/2006	CN1885492A Plasma etching method and apparatus, control program and computer-readable storage medium
12/27/2006	CN1885171A Lithographic apparatus and device manufacturing method
12/27/2006	CN1885170A Substrate processing system and substrate processing method
12/27/2006	CN1885169A Lithographic apparatus and device manufacturing method
12/27/2006	CN1885168A Soft mold and method for fabricating the same
12/27/2006	CN1885167A Exposure device and graphic forming method
12/27/2006	CN1885166A 基板处理系统及其控制方法 Substrate processing system and control method
12/27/2006	CN1885165A Coating apparatus and method of fabricating liquid crystal display device using the same
12/27/2006	CN1885164A Photoresist coating method and photoresist coating apparatus
12/27/2006	CN1885163A Negative resist composition
12/27/2006	CN1885162A Alkali developing photosensitive resin composition
12/27/2006	CN1885161A Photoresist monomer polymer thereof and photoresist composition including the same
12/27/2006	CN1885160A Substrate processing apparatus
12/27/2006	CN1885159A Method for eliminating graphic defects of semiconductor wafer edge region
12/27/2006	CN1885140A Liquid crystal display device and method of manufacturing the same
12/27/2006	CN1885129A Lighting apparatus and display apparatus
12/27/2006	CN1885108A Jig for alignment film printing mask, apparatus and method for cleaning alignment film printing mask using the same
12/27/2006	CN1292496C Pattern formation of device
12/27/2006	CN1292457C Temperature calibration method for heating processing apparatus, adjustment method for development processing apparatus, and method of manufacturing semiconductor apparatus
12/27/2006	CN1292456C Photomask group of forming multilayer interlconnection line and semiconductor device made by such photomask
12/27/2006	CN1292312C Patten drawing device
12/27/2006	CN1292311C Aligning method, aligning substrate, photoetching device and component manufacturing method
12/27/2006	CN1292310C Method of forming optical images, diffraction element for use with this method, apparatus for carrying out this method
12/27/2006	CN1292309C Panel surface exposing device
12/27/2006	CN1292308C Resin composition, process for producing resin composition, and method of forming resin film
12/27/2006	CN1292307C Positive type photoresist composition for manufacturing system LCD, and method for forming resist pattern
12/27/2006	CN1292306C Vacuum negative pressure nanometer press printing device
12/27/2006	CN1292293C 液晶显示装置 The liquid crystal display device
12/27/2006	CN1291836C Original plate of plate-printing board
12/26/2006	US7155699 Streamlined IC mask layout optical and process correction through correction reuse
12/26/2006	US7155698 Method of locating areas in an image such as a photo mask layout that are sensitive to residual processing effects
12/26/2006	US7154928 Laser output beam wavefront splitter for bandwidth spectrum control
12/26/2006	US7154922 Laser beam source control method and unit, exposure method and apparatus, and device manufacturing method
12/26/2006	US7154684 Optical element holding apparatus
12/26/2006	US7154678 Projection objective having adjacently mounted aspheric lens surfaces
12/26/2006	US7154677 Projection objective for microlithography
12/26/2006	US7154676 Very-high aperture projection objective
12/26/2006	US7154674 Imaging method
12/26/2006	US7154669 Method and system for correction of intrinsic birefringence in UV microlithography
12/26/2006	US7154666 Narrow-band spectral filter and the use thereof
12/26/2006	US7154588 Alignment apparatus and exposure apparatus
12/26/2006	US7154587 Spatial light modulator, lithographic apparatus and device manufacturing method
12/26/2006	US7154586 Catoptric projection optical system and exposure apparatus having the same
12/26/2006	US7154585 Projection optical system, exposure apparatus, and device production method
12/26/2006	US7154583 Movement method, exposure method and exposure apparatus, and device manufacturing method
12/26/2006	US7154581 Scanning exposure apparatus, manufacturing method thereof, and device manufacturing method
12/26/2006	US7154524 Exposure apparatus including a controller configured to read electrical signals from an array of photoelectric converters
12/26/2006	US7154242 Moving member mechanism and control method therefor
12/26/2006	US7153634 Dual layer workpiece masking and manufacturing process
12/26/2006	US7153632 Radically polymerizable component, an initiator composition, and a polymeric binder; lower tackiness; imageable elements, negative-working, on-press developable printing plate precursors
12/26/2006	US7153631 Pattern-forming process using photosensitive resin composition
12/26/2006	US7153630 Photoresist polymer, a photoacid generator and a base; inclusion of a sufficient amount of base counteracts the detrimental effects of photoacid generators, resulting in submicron linewidth resolution
12/26/2006	US7153629 Undercoat layer, a releasing agent layer prepared by coating the undercoat layer with a releasing agent liquid of 1,4-polybutadiene and an antioxidant; curing with ultraviolet radiation
12/26/2006	US7153628 Phenolic resin, a blend of graft copolymers of a phenolic resin and a multivalent metal salt polymer of a substituted aryl carboxylic acid; for no-carbon copying paper as special resin color-developing agents, fast developing at a low temperature, bright colors, non-yellowing
12/26/2006	US7153627 Alkali-soluble polymer is a copolymer of a monomer having a carboxyl group and a hydrophobic monomer, and heat sensitive layer is formed by applying the above copolymer, dissolved in alkaline solution, on a substrate and drying the solution
12/26/2006	US7153620 Display with a transparent antistatic layer with areas of patterned coverage which comprises a continuous conductive pathway; Coating the antistatic layer in a patterned format provides a network of conductive pathways at a significantly reduced coverage
12/26/2006	US7153619 Color filter array having a blue filter layer
12/26/2006	US7153617 Low molecular weight acrylic copolymer latexes for donor elements in the thermal printing of color filters
12/26/2006	US7153616 Reference reticle is used to perform various functions and/or tests such as wafer (or flat panel) exposures, aerial image scans, vibration measurements, and periodic calibrations that ensure the tool is operating as intended
12/26/2006	US7153613 Process for the fabrication of a phase mask for optical fiber processing, optical fiber-processing phase mask, optical fiber with a Bragg grating, and dispersion compensating device using the optical fiber
12/26/2006	US7153612 A mask for use in a lithographic projection apparatus contains three brackets arranged on the circumference of the mask provide with grooves directed to a common imaginary point intend to cooperate with three pins of a gripper
12/26/2006	US7153388 Chamber for high-pressure wafer processing and method for making the same
12/26/2006	US7152529 System for thermal development of flexographic printing plates
12/26/2006	US7152331 Positioning apparatus
12/21/2006	WO2006135546A2 Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an euv light source
12/21/2006	WO2006135230A2 Lithographic apparatus and cleaning method therefor
12/21/2006	WO2006135136A1 Antireflective hardmask composition and methods for using same
12/21/2006	WO2006134967A1 Positive resist composition and method for forming resist pattern
12/21/2006	WO2006134956A1 Exposure apparatus and exposure method
12/21/2006	WO2006134922A1 Exposure device
12/21/2006	WO2006134910A1 Optical element, optical element holding apparatus, exposure apparatus and device manufacturing method
12/21/2006	WO2006134902A1 Photoresist developer and process for producing substrate with the use of the developer

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