| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/03/2007 | CN1293618C Rotary etcher with thickness measuring system |
| 01/03/2007 | CN1293609C Film photoetching method |
| 01/03/2007 | CN1293605C Semiconductor device mfg. method |
| 01/03/2007 | CN1293603C Remodeling technique of semiconductor pattern photoresist layer |
| 01/03/2007 | CN1293427C Photoelectric device, its substrate and manufacture, and electronic apparatus |
| 01/03/2007 | CN1293426C Method and apparatus for definiting mask pattern by doubling space frequency technology |
| 01/03/2007 | CN1293411C Manufacture for photosensitive insulating film pattern and reflection electrode and its liquid crystal display device |
| 01/03/2007 | CN1293116C Photocurable/thermoseting composition for forming matte film |
| 01/03/2007 | CN1293105C Preparation of homo-, co- and terpolymers of substituted styrenes |
| 01/03/2007 | CN1292844C Coated device and method |
| 01/02/2007 | US7158307 Efficiently illuminating a modulating device |
| 01/02/2007 | US7158280 Methods and systems for improved boundary contrast |
| 01/02/2007 | US7158275 Polarization modulator |
| 01/02/2007 | US7158238 System and method for calibrating a spatial light modulator array using shearing interferometry |
| 01/02/2007 | US7158237 Interferometric measuring device and projection exposure installation comprising such measuring device |
| 01/02/2007 | US7158236 Heterodyne laser interferometer for measuring wafer stage translation |
| 01/02/2007 | US7158233 Alignment mark, alignment apparatus and method, exposure apparatus, and device manufacturing method |
| 01/02/2007 | US7158232 Substrate processing apparatus |
| 01/02/2007 | US7158215 Large field of view protection optical system with aberration correctability for flat panel displays |
| 01/02/2007 | US7158213 Lithographic tool with dual isolation system and method for configuring the same |
| 01/02/2007 | US7158212 Scanning exposure apparatus and device manufacturing method |
| 01/02/2007 | US7158211 Lithographic apparatus and device manufacturing method |
| 01/02/2007 | US7158210 Projection exposure apparatus |
| 01/02/2007 | US7158209 Holding mechanism in exposure apparatus, and device manufacturing method |
| 01/02/2007 | US7158196 Substrate for liquid crystal display with a substantially u-shaped black matrix and method of fabricating the same |
| 01/02/2007 | US7157722 Positioning device and method of initializing a positioning device |
| 01/02/2007 | US7157507 Mixture of photopolymers, silver flakes or powder and photoinitiator |
| 01/02/2007 | US7157415 Post etch cleaning composition for dual damascene system |
| 01/02/2007 | US7157319 A high-precision patterning is conducted with a half-tone resist thickness being prevented from different due to the presence/ absence of a base film. A transmitting portion and two kinds of semi-transmitting portions providing different |
| 01/02/2007 | US7157215 Optics; semiconductors; photosensitive polymer which absorbs exposure light sources |
| 01/02/2007 | US7157213 for gravure printing, water, a tetraalkylammonium hydroxide and/or benzyltrialkylammonium hydroxide and/or ammonium hydroxide, sodium hydroxide or potassium hydroxide, and hexametaphosphoric soda, triphosphate soda and/or monophosphate soda for preventing a reduction in pH |
| 01/02/2007 | US7157212 Photoimaging using a hybrid organic-inorganic polymer such as POSS (Polyhedral Oligomeric Silsesquioxane)-based polymers and multi-photon exposure; making waveguides for example; polysilsesquioxanes can be used in high temperature process without decomposing |
| 01/02/2007 | US7157211 Method of fabricating a semiconductor device |
| 01/02/2007 | US7157210 Plate-making method, plate-making apparatus used in such plate-making method, and image recording material |
| 01/02/2007 | US7157209 Electrolytically surface-roughening an aluminum plate in an electrolyte solution of hydrochloric acid, using a sine-wave alternating current and a controlled sine-wave alternating current with a thyristor, and then anodizing the surface-roughened aluminum plate; for laser exposure |
| 01/02/2007 | US7157208 Resin containing a specific alkoxyhydroxystyrene skeleton, which is insoluble or hardly soluble in an alkali developer and becomes soluble in an alkali developer, an acid generator and an organic base; use in ultramicrolithography; resolution, sensitivity, good pattern profile, line edge roughness |
| 01/02/2007 | US7157207 Acrylic ester terpolymer having units of a C5-C6 cycloalkyl (meth)acrylate, a hydroxy-adamantanyl acrylate, and acrylate of cyclic lactone; high resolution, patterns with less sidewall roughness, acceptable dry etch resistance, and a good margin allowed for heat treatment temperature after exposure |
| 01/02/2007 | US7157206 Positive resist composition |
| 01/02/2007 | US7157205 Interface containing organosilicon polymer |
| 01/02/2007 | US7157204 Mixture of polyamic acids and acid generator; high resolution patterns |
| 01/02/2007 | US7157203 Image forming method and image forming apparatus for planographic printing plate |
| 01/02/2007 | US7157194 Integrated circuits; data processing; electronics |
| 01/02/2007 | US7157193 An image recording layer including a polymer compound which contains a functional group with a hydrophilic/hydrophobic character being changable by heat, acid or irradiation and is directly chemically bonded to the substrate |
| 01/02/2007 | US7157189 Covering the mask layer with photoresist which contains a film forming polymer containing acid-labile group to be cleaved by an acid for liberating a polymer with increased solubility in alkaline developer |
| 01/02/2007 | US7157036 Method to reduce adhesion between a conformable region and a pattern of a mold |
| 01/02/2007 | US7157002 from mixtures of anionic surfactants, water and carbon dioxide by dehydrating to remove water |
| 01/02/2007 | US7156630 Apparatus for the rapid development of photosensitive printing elements |
| 12/28/2006 | WO2006137582A1 Exposure method and apparatus |
| 12/28/2006 | WO2006137486A1 Image exposure device |
| 12/28/2006 | WO2006137440A1 Measuring apparatus, exposure apparatus, and device manufacturing method |
| 12/28/2006 | WO2006137429A1 Frame data creation device, creation method, creation program, storage medium containing the program, and plotting device |
| 12/28/2006 | WO2006137410A1 Exposure apparatus, exposure method, maintenance method and device manufacturing method |
| 12/28/2006 | WO2006137349A1 Catadioptric projection optical system, and exposure apparatus having the same |
| 12/28/2006 | WO2006137343A1 Production method of color filter, and color filter and display unit |
| 12/28/2006 | WO2006137340A1 Negative resist composition and method of forming resist pattern |
| 12/28/2006 | WO2006137336A1 Positive resist composition and method of forming resist pattern |
| 12/28/2006 | WO2006137326A1 2-dimensional image display device, illumination light source, and exposure illumination device |
| 12/28/2006 | WO2006137261A1 Photosensitive composition, photosensitive lithographic printing plate material, and method for image formation of lithographic printing plate material |
| 12/28/2006 | WO2006137257A1 Colored alkali-developable photosensitive resin composition and color filters made by using the same |
| 12/28/2006 | WO2006137243A1 Photoresist film roll and method for manufacturing same |
| 12/28/2006 | WO2006137241A1 Patterning method |
| 12/28/2006 | WO2006137194A1 Method and apparatus for removing organic film on substrate surface |
| 12/28/2006 | WO2006137014A1 Method of cleaning and after treatment of optical surfaces in an irradiation unit |
| 12/28/2006 | WO2006136353A1 A double-facetted illumination system with attenuator elements on the pupil facet mirror |
| 12/28/2006 | WO2006136352A2 Lens featuring determination of the relative position of optical elements |
| 12/28/2006 | WO2006136184A1 Projection lens for microlithograpy and corresponding terminal element |
| 12/28/2006 | WO2006094729A3 Microlithography projection system with an accessible diaphragm or aperture stop |
| 12/28/2006 | WO2006085962A3 Photogenerated polyelectrolyte bilayers from an aqueous-processible photoresist |
| 12/28/2006 | WO2006047012A3 Apparatus for the rapid development of photosensitive printing elements |
| 12/28/2006 | WO2006007192A3 Three-dimensional photoresist structures and method of making |
| 12/28/2006 | US20060293199 Removing agent composition and removing/cleaning method using same |
| 12/28/2006 | US20060292628 Compositions and methods involving direct write optical lithography |
| 12/28/2006 | US20060292501 Lithography process with an enhanced depth-on-focus |
| 12/28/2006 | US20060292500 Cure during rinse to prevent resist collapse |
| 12/28/2006 | US20060292498 Method for forming contact hole in semiconductor device |
| 12/28/2006 | US20060292497 Method of forming minute pattern of semiconductor device |
| 12/28/2006 | US20060292496 Circuit pattern forming method, circuit pattern forming device and printed circuit board |
| 12/28/2006 | US20060292495 Thermal development system and method of using the same |
| 12/28/2006 | US20060292490 Positive photosensitive composition and pattern forming method using the same |
| 12/28/2006 | US20060292460 Etching photomasks, photoresists; excimer lasers |
| 12/28/2006 | US20060292456 Reticle constructions, and methods for photo-processing photo-imageable material |
| 12/28/2006 | US20060292454 photoresists; photomasks; etching; semiconductors |
| 12/28/2006 | US20060292296 Process of producing optical element and optical element |
| 12/28/2006 | US20060291862 Laser light source device, exposure device, and mask inspection device using this laser light source device |
| 12/28/2006 | US20060291855 Substrate processing apparatus |
| 12/28/2006 | US20060291062 Collector with fastening devices for fastening mirror shells |
| 12/28/2006 | US20060291060 Optical element and exposure apparatus |
| 12/28/2006 | US20060291031 Arrangement of aperture diaphragms and/or filters, with changeable characteristics for optical devices |
| 12/28/2006 | US20060291024 In-line holographic mask for micromachining |
| 12/28/2006 | US20060290429 Composition form forming anti-reflective coating for use in lithography |
| 12/28/2006 | US20060289412 Laser beam irradiation apparatus and pattern drawing method |
| 12/28/2006 | DE4418620B4 Photopolymerisierbare Zusammensetzung A photopolymerizable composition |
| 12/28/2006 | DE19817714B4 Verfahren zur Messung der Lage von Strukturen auf einer Maskenoberfläche Method for measuring the position of structures on a mask surface |
| 12/28/2006 | DE10245621B4 Verfahren zur Übergabe einer Meßposition eines auf einer Maske zu bildenden Strukturelementes Method for transferring a measurement position of a forming on a mask to pattern element |
| 12/28/2006 | DE10203838B4 Fluorhaltiger Fotoresist mit Reaktionsankern für eine chemische Nachverstärkung und verbesserten Copolymerisationseigenschaften The fluorine-containing photoresist with response anchors for chemical amplification and improved copolymerization |
| 12/28/2006 | DE102006026248A1 Photo mask for use in photolithography system has polarizing structure that is formed in either peripheral circuit region or memory cell region of substrate |
| 12/28/2006 | DE102005051629A1 Flat panel display device fabricating method for liquid crystal display device, involves removing hydrophilic resin patterns to form hydrophobic nano powder thin film patterns over substrate, and treating patterns to form thin film pattern |
| 12/28/2006 | DE102005028232A1 Latent sub-wavelength lattice structure producing method for producing sub-wavelength lattice, involves selecting interference pattern and function structure such that lattice structure with period less than minimum wavelength is produced |
| 12/28/2006 | DE102005024980B3 Optical unit manufacturing method, e.g. for photo-sensor, involves removing segment of carrier layer from substrate and adhering segment to cover foil with adhesive force larger than force between carrier layer and substrate |
| 12/27/2006 | EP1737024A1 Exposure equipment, exposure method and device manufacturing method |