| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/04/2007 | WO2007001495A2 Thermal development system and method of using the same |
| 01/04/2007 | WO2007001045A1 Exposure apparatus, substrate processing method, and device producing method |
| 01/04/2007 | WO2007001023A1 Substrate manufacturing method and exposure apparatus |
| 01/04/2007 | WO2007001017A1 Reflective member, optical member, interferometer system, stage device, exposure device, and device manufacturing method |
| 01/04/2007 | WO2007000995A1 Exposure apparatus and method, and device manufacturing method |
| 01/04/2007 | WO2007000984A1 Exposure method, exposure device, and device manufacturing method |
| 01/04/2007 | WO2007000921A1 Exposure apparatus and exposure method |
| 01/04/2007 | WO2007000890A1 Image position measuring apparatus and exposure apparatus |
| 01/04/2007 | WO2007000885A1 Permanent patterning method |
| 01/04/2007 | WO2006119970A3 Assembly for adjusting an optical element |
| 01/04/2007 | WO2006115989A3 Use of blended solvents in defectivity prevention |
| 01/04/2007 | WO2006065310A3 Siloxane resin coating |
| 01/04/2007 | WO2006061419A3 Photoactive film, its preparation and use, and preparation of surface relief and optically anisotropic structures by irradiating said film |
| 01/04/2007 | WO2006044243A3 Holographic storage medium |
| 01/04/2007 | WO2005111720A3 Marking on a thin film |
| 01/04/2007 | WO2005110699A3 Method of patterning a conductive layer on a substrate |
| 01/04/2007 | US20070006118 Displacing Edge Segments On A Fabrication Layout Based On Proximity Effects Model Amplitudes For Correcting Proximity Effects |
| 01/04/2007 | US20070004933 Photoresist stripping solution and a method of stripping photoresists using the same |
| 01/04/2007 | US20070004816 Photocurable resin composition |
| 01/04/2007 | US20070004228 Polyamide acid-containing composition for forming antireflective film |
| 01/04/2007 | US20070004059 Method of measuring alignment of measurement pattern |
| 01/04/2007 | US20070004052 Processing schedule creaitng method, coating and developing apparatus, pattern forming apparatus and processing system |
| 01/04/2007 | US20070003883 Developer for positive photosensitive composition |
| 01/04/2007 | US20070003881 using plurality of dummy line patterns, etching to form trenches located between adjacent ones of the predetermined mask portions through photolithographic method, and filling the trenches with a predetermined material; forming patterns exactly and effectively |
| 01/04/2007 | US20070003880 Negative photosensitive resin composition |
| 01/04/2007 | US20070003879 spin drying, baking, developing; semiconductor wafers; photoresists |
| 01/04/2007 | US20070003875 Method for preparing a lithographic printing plate precursor |
| 01/04/2007 | US20070003874 Exposing a resist on a substrate to a rectangularly-shaped shot from an electron beam to form a non-angled feature; altering the rotational orientation by a predetermined angle; and forming a 2nd feature by exposing to a 2nd shot from the new angle to form an angled feature |
| 01/04/2007 | US20070003871 Positive photosensitive composition |
| 01/04/2007 | US20070003868 Systems and methods for fabricating blanks for microstructure masters by imaging a radiation sensitive layer sandwiched between outer layers, and blanks for microstructure masters fabricated thereby |
| 01/04/2007 | US20070003861 Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same |
| 01/04/2007 | US20070003860 Substrate adhesion improver for photosensitive resin composition and photosensitive resin composition containing the same |
| 01/04/2007 | US20070003859 Carboxyl group-containing acidic compound, basic alkanolamines or quaternary ammonium hydroxides, water, a sulfur-containing corrosion inhibitor and acidic ph; corrosion protection of copper, aluminum wirings with efficient stripping of photoresist, never damages interlevel films |
| 01/04/2007 | US20070003841 Forms first and second patterns on a cell region and a peripheral circuit region of a wafer; The double exposure method uses the single photomask together with different illuminating systems, exposure time so there is a decrease in exposure time and the exposure numbers; simplification |
| 01/04/2007 | US20070003839 $M(c)method for producing inclined flank patterns by photolithography |
| 01/04/2007 | US20070002448 Maskless optical interferometric lithography |
| 01/04/2007 | US20070002312 Methods for reducing spherical aberration effects in photolithography |
| 01/04/2007 | US20070002299 Exposure apparatus, exposure method, and device fabrication method |
| 01/04/2007 | DE19529656B4 Verfahren zur Herstellung von Mikrostrukturen A process for the fabrication of microstructures |
| 01/04/2007 | DE10351142B4 Vorrichtungen und Verfahren zur Messung von thermisch induzierten Oberflächendeformationen Devices and methods for the measurement of thermally induced deformations surface |
| 01/04/2007 | DE102006029225A1 Randwallentfernung bei der Immersionslithographie Edge bead removal in immersion lithography |
| 01/04/2007 | DE102005063335A1 Modell für eine fortschrittliche Prozesssteuerung, das eine Solloffsetgröße umfaßt Model for advanced process control, comprising a target offset size |
| 01/04/2007 | DE102005040883B3 Pitch periods partitioning method for e.g. semiconductor memory, involves applying complementary layer to fill free spaces, forming even surface on upper side of spacers and complementary layer, and removing spacers or complementary layer |
| 01/04/2007 | DE102005031084A1 Mikrolithografisches Belichtungsverfahren sowie Projektionsbelichtungsanlage zur Durchführung des Verfahrens Mikrolithografisches exposure method and projection exposure apparatus for performing the method |
| 01/04/2007 | DE102005031057A1 Verfahren zur Belichtung von Flexodruckplatten Procedures for exposure of flexographic printing plates |
| 01/04/2007 | DE102005030410A1 Micro-structural component producing method, involves providing intermediate plate for light of operating wavelength, where plate has refractive index greater that 1.60, and projecting mask part on light sensitive layer with projection lens |
| 01/04/2007 | DE102005029998A1 Preparation of spatially resolved substance libraries, preferably polymer libraries, comprises immobilizing chemical reactions and controlling photo-sensitive precursors of activating reagent in fluidic space |
| 01/04/2007 | DE10153496B4 Verfahren zur Aromatisierung und Cycloaliphatisierung von Fotoresists im UV-Bereich A process for the aromatization and Cycloaliphatisierung of photoresists in the UV range |
| 01/03/2007 | EP1739801A2 Extended lifetime excimer laser optics |
| 01/03/2007 | EP1739495A1 Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation |
| 01/03/2007 | EP1739494A2 Lithografic apparatus and device manufacturing method |
| 01/03/2007 | EP1739493A1 Metrology apparatus for lithography |
| 01/03/2007 | EP1739492A2 Lithographic apparatus and device manufacturing method |
| 01/03/2007 | EP1739491A1 Focus determination method, device manufacturing method, and mask |
| 01/03/2007 | EP1739490A1 Radiation energy sensor with extended lifetime |
| 01/03/2007 | EP1739489A2 Lithographic apparatus immersion damage control |
| 01/03/2007 | EP1739488A1 Fluids for immersion lithography systems |
| 01/03/2007 | EP1739487A1 Bilayer laminated film for bump formation and method of bump formation |
| 01/03/2007 | EP1739486A1 Photosensitive lithographic printing plate |
| 01/03/2007 | EP1739485A1 Resist composition |
| 01/03/2007 | EP1739484A2 Photosensitive lithographic printing plate and method for making a prinitng plate. |
| 01/03/2007 | EP1739483A2 Positive photosensitive composition and pattern forming method using the same |
| 01/03/2007 | EP1739482A1 Image-forming process, lithographic printing plate, and lithography process |
| 01/03/2007 | EP1739481A1 Levenson type phase shift mask and production method therefor |
| 01/03/2007 | EP1738227A2 Method for producing two-dimensional periodic structures in a polymeric medium |
| 01/03/2007 | EP1738226A1 A method for error reduction in lithography |
| 01/03/2007 | EP1738225A2 Positive-working photoimageable bottom antireflective coating |
| 01/03/2007 | EP1738224A1 Low-expansion glass substrate for a reflective mask and reflective mask |
| 01/03/2007 | EP1737676A2 Edge cure prevention process |
| 01/03/2007 | EP1671184A4 Photoresist compositions comprising diamondoid derivatives |
| 01/03/2007 | EP1412262A4 Smif container including an electrostatic dissipative reticle support structure |
| 01/03/2007 | EP1282838B1 Process for preparing a flexographic printing plate |
| 01/03/2007 | EP1277086A4 Selectively colorable polymerizable compositions |
| 01/03/2007 | CN2854649Y PS plate extrusion coating device with nozzle for different width |
| 01/03/2007 | CN2854648Y PS plate extrusion coating device for different width |
| 01/03/2007 | CN1890822A Method for photo-embossing a monomer-containing layer |
| 01/03/2007 | CN1890780A Substrate treatment device control method and substrate treatment device |
| 01/03/2007 | CN1890779A Exposure apparatus, exposure method, device producing method, and optical component |
| 01/03/2007 | CN1890733A Process for producing original disc for optical disc and original disc for optical disc |
| 01/03/2007 | CN1890610A Method for making fluid emitter orifice |
| 01/03/2007 | CN1890609A Method and apparatus for patterning a workpiece and methods of manufacturing the same |
| 01/03/2007 | CN1890608A Sensor for lithographic apparatus and method of obtaining measurements |
| 01/03/2007 | CN1890607A Utilities transfer system in a lithography system |
| 01/03/2007 | CN1890606A Composite optical lithography method for patterning lines of significantly different widths |
| 01/03/2007 | CN1890605A Radiation-sensitive compositions and imageable elements based thereon |
| 01/03/2007 | CN1890604A Device and method for large area lithography |
| 01/03/2007 | CN1890603A Methods and devices for fabricating three-dimensional nanoscale structures |
| 01/03/2007 | CN1890328A Use of a pigment preparation based on ci pigment yellow 74 |
| 01/03/2007 | CN1890100A Method and apparatus for printing a patterned layer on a flatsubstrate with a flat-type-bed |
| 01/03/2007 | CN1889234A Method for producing semiconductor integrated circuit |
| 01/03/2007 | CN1888983A Display components forming method and structure thereof |
| 01/03/2007 | CN1888982A Method for measuring double-laser interferometer intersection angle non-orthogonality |
| 01/03/2007 | CN1888981A Photoetching projection objective lens telecentric measuring method |
| 01/03/2007 | CN1888980A Double-exposure imaging optical micro-image method for aperture |
| 01/03/2007 | CN1888979A Electronic beam exposure process sample wafer step-by-step positioning error dynamic compensating system |
| 01/03/2007 | CN1888978A Photoetching patterning method with micro-transfer patterned graph as mask plate |
| 01/03/2007 | CN1888967A Method for forming array substrate |
| 01/03/2007 | CN1888962A Liquid crystal display device and method of manufacturing the same |
| 01/03/2007 | CN1888961A Liquid crystal display device and fabrication method thereof |
| 01/03/2007 | CN1888950A One-dimensional interference optical field stability controlling method and system |