| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/10/2007 | CN1894773A Stage system, exposure apparatus and exposure method |
| 01/10/2007 | CN1894633A Composite patterning with trenches |
| 01/10/2007 | CN1894632A Projection objective having a high aperture and a planar end surface |
| 01/10/2007 | CN1894631A A method and apparatus for producing microchips |
| 01/10/2007 | CN1894630A Methods and systems for controlling radiation beam characteristics for microlithographic processing |
| 01/10/2007 | CN1894629A Photosensitive composition remover |
| 01/10/2007 | CN1894628A Photoresist composition for deep uv and process thereof |
| 01/10/2007 | CN1894627A Multistep process for creating irregularities in a repating array of pattern elements |
| 01/10/2007 | CN1894626A Photocurable compositions for articles having stable tensile properties |
| 01/10/2007 | CN1894621A Liquid crystal cell that resists degradation from exposure to radiation |
| 01/10/2007 | CN1894615A Projection optical system and exposure apparatus with the same |
| 01/10/2007 | CN1894611A Method for producing photon crystal and controllable defect therein |
| 01/10/2007 | CN1894605A Light-redirecting optical structure and process for forming same |
| 01/10/2007 | CN1894602A A process for the fabrication of optical microstructures |
| 01/10/2007 | CN1894294A Radiation curable aqueous compositions for low extractable film packaging |
| 01/10/2007 | CN1894109A Lithographic printing original plate and lithographic printing plate |
| 01/10/2007 | CN1894050A Supercritical fluid-based cleaning compositions and methods |
| 01/10/2007 | CN1892445A Semiconductor wafer processing method and edge-wafer residue removal system |
| 01/10/2007 | CN1892444A Method of treating substrate and chemical used therefor |
| 01/10/2007 | CN1892443A Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influence |
| 01/10/2007 | CN1892442A Method of manufacturing semiconductor device |
| 01/10/2007 | CN1892441A Lithographic apparatus, contaminant trap, and device manufacturing method |
| 01/10/2007 | CN1892440A Focus determination method, device manufacturing method, and mask |
| 01/10/2007 | CN1892439A Metrology apparatus, lithographic apparatus, process apparatus, metrology method and device manufacturing method |
| 01/10/2007 | CN1892438A Lithographic apparatus and device manufacturing method |
| 01/10/2007 | CN1892437A Lithografic apparatus and device manufacturing method |
| 01/10/2007 | CN1892436A Immersion lithography method and processing system |
| 01/10/2007 | CN1892435A Lithographic apparatus immersion damage control |
| 01/10/2007 | CN1892434A Lithographic apparatus and device manufacturing method utilizing movement of clean air to reduce contamination |
| 01/10/2007 | CN1892433A Methods and system for inhibiting immersion lithography and device |
| 01/10/2007 | CN1892432A Lithographic apparatus, device manufacturing method, device manufactured thereby, and controllable patterning device |
| 01/10/2007 | CN1892431A Method of characterization, method of characterizing a process operation, and device manufacturing method |
| 01/10/2007 | CN1892430A Method, program product and apparatus for optimizing illumination for full-chip layer |
| 01/10/2007 | CN1892429A Coating apparatus and operating method thereof |
| 01/10/2007 | CN1892428A Composition capable of optical imaging |
| 01/10/2007 | CN1892427A Photosensitive thermosetting resin composition, and photosensitive cover lay and flexible printed wiring board using the composition |
| 01/10/2007 | CN1892426A Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same |
| 01/10/2007 | CN1892425A Pigmented photoresist composition and cured matter thereof |
| 01/10/2007 | CN1892424A Photoresist composition and laminator |
| 01/10/2007 | CN1892423A Substrate processing apparatus |
| 01/10/2007 | CN1892422A Chemical solution qualification method, semiconductor device fabrication method, and liquid crystal display manufacturing method |
| 01/10/2007 | CN1892421A Method for increasing photoengraving margin using novel storage junction contact hole |
| 01/10/2007 | CN1892420A Mask for continuously transverse solidifying technology and method for forming polycrystal silicon layer |
| 01/10/2007 | CN1892419A Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor device |
| 01/10/2007 | CN1892394A Liquid crystal display device and fabricating method thereof |
| 01/10/2007 | CN1892385A Liquid crystal display and fabricating method thereof |
| 01/10/2007 | CN1892382A Liquid crystal display panel and fabricating method thereof |
| 01/10/2007 | CN1892373A Thin film transistor substrate and fabricating method thereof |
| 01/10/2007 | CN1892335A Liquid crystal device, method of manufacturing liquid crystal device, and electronic apparatus |
| 01/10/2007 | CN1892324A Printing apparatus and fabricating method thereof |
| 01/10/2007 | CN1892269A Electrode forming method for a polymer optical waveguide |
| 01/10/2007 | CN1892265A Method for making colour-filter |
| 01/10/2007 | CN1892264A Pigment-dispersing type radiation-sensitive resin composition and method of forming colored pattern |
| 01/10/2007 | CN1892261A Color filter substrate and method of fabricating the same |
| 01/10/2007 | CN1294624C Manufacturing method of semiconductor device |
| 01/10/2007 | CN1294623C Method for obtaining elliptical and rounded shapes using beam shaping |
| 01/10/2007 | CN1294457C Agent for forming coating for narrowing pattern and method for forming fine pattern using the same |
| 01/10/2007 | CN1294456C Method for executing photoetching correction based on model |
| 01/10/2007 | CN1294455C Imaging apparatus |
| 01/10/2007 | CN1294454C Vortex phase-shift mask in photoetching technique |
| 01/10/2007 | CN1294429C Pigment-dispersed resist composition for color filters |
| 01/10/2007 | CN1294167C Polymerisable composition |
| 01/09/2007 | US7162326 Mask identification database server |
| 01/09/2007 | US7162131 Combination of hydrolyzates of fluoroalkylsilanes and a photoacid generator for producing waveguides for increasing the capacity and speed of data processing in optical communication systems and computers |
| 01/09/2007 | US7162009 X-ray multi-layer mirror and x-ray exposure apparatus |
| 01/09/2007 | US7161750 Retainer, exposure apparatus, and device fabrication method |
| 01/09/2007 | US7161735 Projection optical system, exposure apparatus and device fabricating method |
| 01/09/2007 | US7161684 Apparatus for optical system coherence testing |
| 01/09/2007 | US7161681 Aberration measuring apparatus comprising wavelength calibration and stabilization |
| 01/09/2007 | US7161675 Beam splitting apparatus, transmittance measurement apparatus, and exposure apparatus |
| 01/09/2007 | US7161662 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 01/09/2007 | US7161661 Lithographic apparatus and device manufacturing method |
| 01/09/2007 | US7161660 Photolithography system and method of monitoring the same |
| 01/09/2007 | US7161658 Lithographic apparatus and device manufacturing method |
| 01/09/2007 | US7161657 Lithographic apparatus and device manufacturing method |
| 01/09/2007 | US7161267 Displacement apparatus, litographic apparatus, device manufacturing method, and device manufactured thereby |
| 01/09/2007 | US7161212 Thin film transistor, liquid crystal display using thin film transistor, and method of manufacturing thin film transistor |
| 01/09/2007 | US7161168 Superlattice nanopatterning of wires and complex patterns |
| 01/09/2007 | US7160673 Illuminating the master element to make a first diffractive pattern on the target surface at a first location by interfering first and third order diffracted beams from the master element; moving the master element to a second location on the target surface and illuminating to produce a second pattern |
| 01/09/2007 | US7160672 Forming a thin ceramic protective coating applied at relatively low temperature by selective coating of ceramic on an electrical or magnetic biocompatible implant; metallization; photolithographic polyamide coating; scribing and dissolving away polymerized polyamide and a ceramic mask; batch processing |
| 01/09/2007 | US7160671 Substrate with a developed photoresist layer, exposed to ultraviolet light that is generated from neon and hardening the photoresist layer |
| 01/09/2007 | US7160670 A scintillating structure for aligning an electron or ion beam using a detector while exposing a wafer, which may be a wafer or mask, is described. The structure is formed by a resist including a polymer with carboxylic acid groups, |
| 01/09/2007 | US7160669 suitable for excimer laser lithography; sulfonium salt acid generator |
| 01/09/2007 | US7160668 Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same |
| 01/09/2007 | US7160667 Novolak phenolic resin, quaternary heterocyclic amine, and -onium or ammonium photo-thermal converting agents; positive planographic printing plate precursor; storage stability |
| 01/09/2007 | US7160666 Photosensitive resin composition |
| 01/09/2007 | US7160665 up diffusion of photoacid generated by patternwise imaging of an underlayer and overcoated with a polymer containing acid labile functionality; forming images in positive- or negative-tone chemically amplified photoresists |
| 01/09/2007 | US7160657 Reference wafer and process for manufacturing same |
| 01/09/2007 | US7160656 Method for determining pattern misalignment over a substrate |
| 01/09/2007 | US7160655 In a middle portion of a wafer the mask is die-by-die aligned based on marks provided at the chips, while in the second region outside of the first the coordinates of the respective chip are decided by a global alignment method based on detection of alignment marks of the first step |
| 01/09/2007 | US7160654 Method of the adjustable matching map system in lithography |
| 01/09/2007 | US7160653 A positive photolithographic printing plate having an alkaline-developed polymer inner layer and an ink receptive outer layer alkaline-resistant before its exposure that comprises a polymer binder having pendant epoxy groups and is free of hardener for the pendant epoxy groups; shelf life; resolution |
| 01/09/2007 | US7160652 Hologram element |
| 01/09/2007 | US7160650 Method of inspecting a mask |
| 01/09/2007 | US7160649 Gray level imaging masks, optical imaging apparatus for gray level imaging masks and methods for encoding mask and use of the masks |
| 01/09/2007 | US7159719 Thermophoretic protection of reticles |
| 01/09/2007 | US7159511 Method of manufacturing print belts |
| 01/09/2007 | US7159304 Method of manufacturing a spin-valve giant magnetoresistive head |
| 01/04/2007 | WO2007001848A2 High refractive index fluids with low absorption for immersion lithography |
| 01/04/2007 | WO2007001802A1 Dual-wavelength positive-working radiation-sensitive elements |