Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2014
05/27/2014US8736814 Lithography wave-front control system and method
05/27/2014US8736813 Exposure apparatus with an illumination system generating multiple illumination beams
05/27/2014US8736809 Exposure apparatus, exposure method, and method for producing device
05/27/2014US8736808 Stage drive method and stage unit, exposure apparatus, and device manufacturing method
05/27/2014US8736806 Lithographic apparatus, a radiation system, a device manufacturing method and a radiation generating method
05/27/2014US8735053 Methods of forming photoresist patterns
05/27/2014US8735052 Surface modifying material, method of forming resist pattern, and method of forming pattern
05/27/2014US8735051 Exposure method and exposure apparatus, and device manufacturing method
05/27/2014US8735049 Liquid platemaking process
05/27/2014US8735048 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method
05/27/2014US8735047 Resist composition and method for producing resist pattern
05/27/2014US8735046 Positive resist composition and patterning process
05/27/2014US8735045 Positive resist composition, method of forming resist pattern, and polymeric compound
05/27/2014US8735044 Salt and photoresist composition containing the same
05/27/2014US8735029 Positive photosensitive resin composition, and display device and organic light emitting device using the same
05/27/2014US8735027 Photosensitive resin composition for color filter and color filter using the same
05/27/2014US8735026 Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device
05/27/2014US8735024 Non-planar lithography mask and system and methods
05/27/2014US8734702 Original and article manufacturing method using same
05/27/2014US8734698 Composite substrate carrier
05/27/2014US8733277 Mask support, mask assembly, and assembly comprising a mask support and a mask
05/22/2014WO2014078789A1 Methods for forming nanoparticles using semiconductor manufacturing infrastructure
05/22/2014WO2014078140A1 Negative-working lithographic printing plate precursor
05/22/2014WO2014078097A1 Methanofullerenes
05/22/2014WO2014077405A1 Illumination optical system and illumination method, and exposure method and device
05/22/2014WO2014077404A1 Illuminating optics, illumination method, and exposure method and device
05/22/2014WO2014077171A1 White photosensitive resin composition, white cured film, white pattern, and method for producing white pattern
05/22/2014WO2014076291A1 Semiconductor treating device and method
05/22/2014WO2014075917A1 Method for assigning a pupil facet of a pupil facet mirror of an illumination optical unit of a projection exposure apparatus to a field facet of a field facet mirror of the illumination optical unit
05/22/2014WO2014075902A1 Illumination optical unit for euv projection lithography
05/22/2014US20140142017 Process And Composition For Removing Substances From Substrates
05/22/2014US20140141536 Method and System for Providing a Target Design Displaying High Sensitivity to Scanner Focus Change
05/22/2014US20140141378 Photosensitive Resin Laminate and Thermal Processing of the Same
05/22/2014US20140141377 Developer and patterning process
05/22/2014US20140141376 Self-assembled structures, method of manufacture thereof and articles comprising the same
05/22/2014US20140141375 Self-assembled structures, method of manufacture thereof and articles comprising the same
05/22/2014US20140141374 Negative-working lithographic printing plate precursors
05/22/2014US20140141373 Compound, radical polymerization initiator, method for producing compound, polymer, resist composition, and method for forming resist pattern
05/22/2014US20140141372 Photosensitive polymer, resist composition including the photosensitive polymer and method of preparing resist pattern using the resist composition
05/22/2014US20140141360 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device
05/22/2014US20140139816 Arrangement for thermal actuation of a mirror in a microlithographic projection exposure apparatus
05/22/2014US20140139815 In-situ metrology
05/22/2014US20140139814 Methods and Scatterometers, Lithographic Systems, and Lithographic Processing Cells
05/22/2014US20140139813 Double-surface manufacturing method and exposure apparatus
05/22/2014US20140137347 Photomask cleaning device
05/22/2014DE102013213254A1 Eccentric cam drive for use in tilting device for adjusting tilting angle of facet mirror of extreme UV-projection exposure system in e.g. electrical engineering, has driver element driving positioning unit relative to adjusting element
05/22/2014DE102012212194A1 Mikrolithographische Projektionsbelichtungsanlage und Verfahren zur Veränderung einer optischen Wellenfront in einem katoptrischen Objektiv einer solchen Anlage Microlithographic projection exposure apparatus and method for changing an optical wavefront in a catoptric objective of such a system
05/21/2014EP2733535A2 Surface position detection apparatus, exposure apparatus, and exposure method
05/21/2014EP2733534A1 Composition for forming fine pattern and method for forming fined pattern using same
05/21/2014EP2733533A2 Etching method using block-copolymers
05/21/2014EP2732341A1 Lithography system and method for storing positional data of a target
05/21/2014EP2732340A1 Facility for exposing photopolymer plates
05/21/2014EP2732339A1 Method for improving print performance of flexographic printing elements
05/21/2014CN203606624U 用于光刻机曝光台的清洁装置 Lithography exposure station for cleaning the apparatus of
05/21/2014CN203605063U 一种曝光灯箱 An exposure Lightbox
05/21/2014CN103814331A 在微光刻投射曝光设备中热致动反射镜的布置 In the microlithography projection exposure apparatus in the thermally actuated mirror arrangement
05/21/2014CN103814330A 阴图制版平版印刷板前体 Negative-working lithographic printing plate precursor
05/21/2014CN103811417A 像素结构的制作方法 Production method of a pixel structure
05/21/2014CN103811334A 四分之一节距图案的形成方法 The method for forming a pattern of a quarter pitch
05/21/2014CN103811298A 测试对准使用芯片的制作方法 Production method of testing the alignment using chips
05/21/2014CN103809396A 防止污渍的光刻胶剥离剂组合物及平板显示器基板的制法 Method to prevent the stain resist stripping composition and a flat panel display substrate
05/21/2014CN103809395A 一种去除残留光刻胶的方法 A method for removing residual photoresist method
05/21/2014CN103809394A 一种去除光阻蚀刻残留物的清洗液 A method of removing photoresist etch residue cleaning solution of
05/21/2014CN103809393A 一种去除光阻残留物的清洗液 A method of removing photoresist residues of the cleaning fluid
05/21/2014CN103809392A 一种去除光刻胶残留物的清洗液 A method of removing photoresist residues in the washing liquid
05/21/2014CN103809391A 一种光刻的前烘工艺 A lithographic pre-bake process
05/21/2014CN103809390A 一种显影喷头 A developing nozzle
05/21/2014CN103809389A 一种新型显影喷淋机构 Developing a new type of spray mechanism
05/21/2014CN103809388A 显影方法 Developing methods
05/21/2014CN103809387A 印刷电路板的面板曝光装置 A printed circuit board panel exposure apparatus
05/21/2014CN103809386A 曝光装置的制造方法 The method of manufacturing an exposure apparatus
05/21/2014CN103809385A 曝光机光罩结构的水平角度调整机构及方法 Exposure mask structure horizontal angle adjustment mechanism and method
05/21/2014CN103809384A 工件台与掩模台公用的平衡质量系统及光刻机 Workpiece table and mask stage common mass balance system and lithography machines
05/21/2014CN103809383A 一种光刻机水平测量装置及测量方法 A lithographic machine level measuring device and measurement method
05/21/2014CN103809382A 用于光刻设备的匀光调节装置及使用该装置的照明系统 Uniform light for lithography equipment adjusting device and use the lighting system of the device
05/21/2014CN103809381A 一种甩胶方法 One kind of rejection glue method
05/21/2014CN103809380A 光刻胶涂胶喷嘴定位拾取装置 Photoresist coating nozzle positioning pickup
05/21/2014CN103809379A 用于柔版印刷版的背基板及其制造方法 Flexographic printing plate on the back of the substrate and a manufacturing method for
05/21/2014CN103809378A 一种负性光刻胶及其制备方法、使用方法 A negative photoresist and its preparation method, using methods
05/21/2014CN103809377A 用于制备类似abs的制品的可光固化组合物 The photocurable composition used to prepare the articles of similar abs
05/21/2014CN103809376A 一种无机相变光刻胶和基于无机相变光刻胶的光刻工艺 An inorganic-based photoresist and a phase change inorganic phase change photoresist lithography process
05/21/2014CN103809375A 感光性树脂组成物 The photosensitive resin composition
05/21/2014CN103809374A 触摸面板用遮光性组合物和触摸面板 A touch panel and a light-shielding composition touch panel
05/21/2014CN103809373A 感旋光性树脂组合物、其所形成的彩色滤光片及液晶显示装置 A photosensitive resin composition, a color filter and a liquid crystal display device formed therefrom
05/21/2014CN103809372A 印模结构以及利用该印模结构的转移方法 Stamp structure and the use of the stamp structure transfer method
05/21/2014CN103809371A 矩形形成模具用基板 Rectangular substrate to form a mold
05/21/2014CN103809370A 使用定向自组装的光刻工艺 Using a photolithography process directed self-assembly
05/21/2014CN103809236A 一种基于mems高精度网点导光板的制作方法 A method of making high-precision dot light guide based mems
05/21/2014CN103809226A 浸润刻蚀微透镜成形方法 Infiltration etched micro-lens molding method
05/21/2014CN103804196A 星形金刚烷衍生物分子玻璃及其制备方法、应用 Star adamantane derivatives molecular glass and preparation methods, application
05/21/2014CN103018819B 基于纳米压印的高分子微纳光纤布拉格光栅制备方法 Nanoimprint polymer micro-nano production method based on fiber Bragg grating
05/21/2014CN102929102B 一种深紫外化学增幅型正性光致抗蚀剂 One kind of DUV chemically amplified positive photoresist
05/21/2014CN102854748B 感光性组合物及其用途 The photosensitive composition and use thereof
05/21/2014CN102826504B 纳米线制造方法 Nanowire fabrication method
05/21/2014CN102751241B 一种阵列基板过孔的制作方法及阵列基板制作工艺 A method of manufacturing an array substrate, an array of vias in the substrate production process and
05/21/2014CN102722084B 一种光刻方法和设备 A lithographic method and apparatus
05/21/2014CN102656519B 感光性组合物、间隔壁、彩色滤光片及有机el元件 The photosensitive composition, partition walls, a color filter and an organic el element
05/21/2014CN102652285B 感光性组合物、间隔壁、彩色滤光片及有机el元件 The photosensitive composition, partition walls, a color filter and an organic el element
05/21/2014CN102591152B 化学增幅型光阻组合物 Chemically amplified resist composition
05/21/2014CN102566337B 一种标记期望位置确定方法 A method for determining the location of the desired mark
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