| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 01/17/2007 | CN1295562C Radiation-curable resin composition and rapid prototyping process using the same |
| 01/17/2007 | CN1295548C Frame glue refiller for display panel and filling method therefor |
| 01/17/2007 | CN1295544C Vanadium oxide film micro photo-switch and its making method |
| 01/17/2007 | CN1295528C Method for preparing integrated Prague plane waveguide grating by primary ion exchange process |
| 01/17/2007 | CN1295121C Method and device for conveying and installing feeding board using executor in end of feeding board of robot |
| 01/16/2007 | US7165235 Exposure pattern forming method and exposure pattern |
| 01/16/2007 | US7165233 Test ket layout for precisely monitoring 3-foil lens aberration effects |
| 01/16/2007 | US7164961 Modified photolithography movement system |
| 01/16/2007 | US7164960 Apparatus for correcting a plurality of exposure tools, method for correcting a plurality of exposure tools, and method for manufacturing semiconductor device |
| 01/16/2007 | US7164571 Wafer stage with a magnet |
| 01/16/2007 | US7164534 Diffuser plate and method of making same |
| 01/16/2007 | US7164523 Image exposure system |
| 01/16/2007 | US7164464 Exposure apparatus and aberration correction method |
| 01/16/2007 | US7164463 Lithographic tool with dual isolation system and method for configuring the same |
| 01/16/2007 | US7164144 EUV light source |
| 01/16/2007 | US7164141 Charged particle beam photolithography machine, standard substrate for correcting misalignment factor of charged particle beam photolithography machine, correcting method for charged particle beam photolithography machine, and method of manufacturing electronic device |
| 01/16/2007 | US7163982 Process for preparing fluorine-containing polymer and method of forming fine pattern using same |
| 01/16/2007 | US7163781 Using resist composition having high transparency against short-wavelength light and high dry-etching resistance, capable of forming a resist pattern excellent in adhesion and resolution by means of alkali development |
| 01/16/2007 | US7163780 Disposing on a substrate surface a B-staged dielectric matrix comprising dielectric matrix materials and a removable porogen; curing; patterning the dielectric matrix material; depositing a metal layer; removing porogen |
| 01/16/2007 | US7163779 Planographic printing plate material process, planographic printing plate and printing process |
| 01/16/2007 | US7163778 Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern |
| 01/16/2007 | US7163777 Thermally sensitive imageable element |
| 01/16/2007 | US7163776 Positive-working resist composition |
| 01/16/2007 | US7163770 Multilayer imageable element containing sulfonamido resin |
| 01/16/2007 | US7163769 Suitable for image-wise recording, for example holographic recording of data or volume holograms |
| 01/16/2007 | US7163751 Coating compositions for use with an overcoated photoresist |
| 01/16/2007 | US7163301 Method and apparatus for managing actinic intensity transients in a lithography mirror |
| 01/16/2007 | US7162881 Thermophoretic wand to protect front and back surfaces of an object |
| 01/16/2007 | CA2275625C Method and apparatus for controlling a photomechanical exposure device |
| 01/11/2007 | WO2007006040A1 Reflector |
| 01/11/2007 | WO2007004995A1 Radiation crosslinker |
| 01/11/2007 | WO2007004681A1 Method for producing photosensitive laminate original printing plate for letterpress printing, photosensitive laminate original printing plate for letterpress printing, and method for producing letterpress printing plate |
| 01/11/2007 | WO2007004619A1 Photosensitive resin composition, and, photosensitive element, method for forming resist pattern, method for manufacturing printed wiring board and method for manufacturing partition wall for plasma display panel using the composition |
| 01/11/2007 | WO2007004612A1 Method of producing substrate under controlling organic matter concentration in stripping liquor |
| 01/11/2007 | WO2007004569A1 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part |
| 01/11/2007 | WO2007004567A1 Exposure apparatus, exposure method, device manufacturing method, and system |
| 01/11/2007 | WO2007004566A1 Compound, positive resist composition and method for forming resist pattern |
| 01/11/2007 | WO2007004552A1 Exposure apparatus and method, exposure apparatus maintenance method, and device manufacturing method |
| 01/11/2007 | WO2007004431A1 Method of forming high-resolution pattern and apparatus therefor |
| 01/11/2007 | WO2007004358A1 Exposure apparatus |
| 01/11/2007 | WO2007004345A1 Photosensitive resin composition and adhesion enhancer |
| 01/11/2007 | WO2007004334A1 Photosensitive resin composition |
| 01/11/2007 | WO2007004317A1 Toner, and toner production process |
| 01/11/2007 | WO2007003563A1 Projection light facility provided with a plurality of projective lenses |
| 01/11/2007 | WO2007003507A1 Sulphonium salt initiators |
| 01/11/2007 | WO2007003359A1 Collector unit for a lighting system having wavelengths < 193 nm |
| 01/11/2007 | WO2007003030A1 Thermally reactive near-infrared absorbing acetal copolymers, methods of preparation and methods of use |
| 01/11/2007 | WO2007002965A1 Rapid-prototyping method and radiation-hardenable composition of application thereto |
| 01/11/2007 | WO2006124321A3 Treatment of substrate using fuctionalizing agent in supercritical carbon dioxide |
| 01/11/2007 | WO2006117642A3 Lithographic method for maskless pattern transfer onto a photosensitive substrate |
| 01/11/2007 | WO2006084136A3 Computer to plate curing system |
| 01/11/2007 | WO2006079788A3 Method of making a photopolymer plate |
| 01/11/2007 | WO2005109108A8 Composition for removing a (photo) resist |
| 01/11/2007 | WO2005043241A3 Method for simultaneous patterning of features with nanometer scale gaps |
| 01/11/2007 | US20070011112 Method of determining movement sequence, alignment apparatus, method and apparatus of designing optical system, and medium in which program realizing the designing method |
| 01/11/2007 | US20070010412 Process solutions containing surfactants |
| 01/11/2007 | US20070010409 Reducing defects in the manufacture of semiconductor devices by contacting with acetylenic diol derivatives, amines, hydroxyamine modified polyethers, esters, quaternaryammonium compounds as surfactant, aqueous (water)and nonaqueous (ethanol, methanol, tetrahydrofuran etc) solvents |
| 01/11/2007 | US20070010038 Pattern forming method and wiring pattern forming method, and electro-optic device and electronic equipment |
| 01/11/2007 | US20070009841 Semiconductor fabrication apparatus and pattern formation method using the same |
| 01/11/2007 | US20070009840 Method of fabricating a semiconductor device |
| 01/11/2007 | US20070009839 Pattern forming method, film forming apparatus and pattern forming apparatus |
| 01/11/2007 | US20070009838 Method of manufacturing a pattern structure and method of forming a trench using the same |
| 01/11/2007 | US20070009837 Electronic substrate and its manufacturing method, electro-optical device manufacturing method, and electronic apparatus manufacturing method |
| 01/11/2007 | US20070009836 Method of manufacturing semiconductor device |
| 01/11/2007 | US20070009828 Positive resist composition, resist laminates and process for forming resist patterns |
| 01/11/2007 | US20070009827 Lamination and delamination technique for thin film processing |
| 01/11/2007 | US20070009816 Method and system for photolithography |
| 01/11/2007 | US20070009815 Method of wafer edge exposure |
| 01/11/2007 | US20070009812 Low-expansion glass substrate for a reflective mask and reflective mask |
| 01/11/2007 | US20070009147 Mask pattern inspecting method, inspection apparatus, inspecting data used therein and inspecting data generating method |
| 01/11/2007 | US20070008609 Ultraviolet laser apparatus and exposure apparatus using same |
| 01/11/2007 | US20070008390 Methods and apparatus for ink delivery to nanolithographic probe systems |
| 01/11/2007 | US20070007196 Filter cartridge for fluid for treating surface of electronic device substrate |
| 01/11/2007 | DE19734059B4 Anordnung für Schattenwurflithographie Arrangement of shadows lithography |
| 01/11/2007 | DE112005000504T5 Mehrschichtüberlagerungsmessungs- und Korrekturtechnik für die IC-Herstellung Mehrschichtüberlagerungsmessungs- and correction technique for the IC fabrication |
| 01/11/2007 | DE102005032320A1 Decontaminating optical element surface, especially in projection illumination plant for microlithography, using cleaning device applying activated reducing gas to the surface under atmospheric pressure |
| 01/11/2007 | DE102005031792A1 Verfahren zur Entfernung von Kontamination von optischen Elementen, insbesondere von Oberflächen optischer Elemente sowie ein optisches System oder Teilsystem hierfür A process for removing contamination of the optical elements, in particular of surfaces of optical elements and an optical system or subsystem thereof |
| 01/11/2007 | DE102005030839A1 Projektionsbelichtungsanlage mit einer Mehrzahl von Projektionsobjektiven Projection exposure apparatus having a plurality of projection lenses |
| 01/11/2007 | DE102005028427B3 Verfahren zur optischen Aufnahme und Inspektion eines Wafers im Rahmen der Randentlackung A method for optical recording and inspecting a wafer under the EBR |
| 01/11/2007 | DE102004010902B4 Verfahren zum Übertragen eines kritischen Layouts einer Ebene einer integrierten Schaltung auf ein Halbleitersubstrat Method for transferring a layout of a critical level of an integrated circuit on a semiconductor substrate |
| 01/10/2007 | EP1742111A2 Imaging optical system and exposure apparatus |
| 01/10/2007 | EP1742110A2 Lithographic apparatus, contaminant trap, and device manufacturing method |
| 01/10/2007 | EP1742109A2 Hydrophilic substrate for lithographic printing plate |
| 01/10/2007 | EP1742108A1 Coating compositions for use with an overcoated photoresist |
| 01/10/2007 | EP1742107A1 Photoimageable composition |
| 01/10/2007 | EP1742091A1 Optical device with refractive and diffractive properties |
| 01/10/2007 | EP1742058A2 Substrate for analyte determination and methods for manufacturing such substrates |
| 01/10/2007 | EP1741730A1 Resist protecting film forming material for immersion exposure process and resist pattern forming method using the protecting film |
| 01/10/2007 | EP1741705A1 Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process |
| 01/10/2007 | EP1741545A2 Compositions and methods for use in three dimensional model printing |
| 01/10/2007 | EP1741485A1 Photoreactive thin film processing method and photoreactive thin film processing apparatus |
| 01/10/2007 | EP1741321A2 Atomic beam to protect a reticle |
| 01/10/2007 | EP1741130A1 Device and method for treating a substrate in the field of semiconductor technology, in addition to a system comprising a device for treating a substrate |
| 01/10/2007 | EP1741006A2 Photosensitive resin composition, cured product thereof and production method of printed circuit board using the same |
| 01/10/2007 | EP1740393A1 Security mark for a data carrier, corresponding data carrier and method for the production of a security mark |
| 01/10/2007 | EP1740392A1 System for thermal development of flexographic printing plates |
| 01/10/2007 | EP1740373A2 Compliant template for uv imprinting |
| 01/10/2007 | EP1566422B1 Uv-cure adhesive composition for optical disk, cured material and goods |
| 01/10/2007 | EP1291910B1 Wafer chuck, exposure system, and method of manufacturing semiconductor device |
| 01/10/2007 | EP1262509B1 Imide-benzoxazole polycondensate and process for producing the same |