| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/18/2007 | WO2007007780A1 Material for forming protective film and method of forming photoresist pattern with the same |
| 01/18/2007 | WO2007007746A1 Exposure apparatus and method for manufacturing device |
| 01/18/2007 | WO2007007730A1 Positive photosensitive resin composition and process for pattern formation |
| 01/18/2007 | WO2007007723A1 Substrate for immersion exposure, exposure method and method for manufacturing device |
| 01/18/2007 | WO2007007626A1 Exposure method, exposure apparatus and device manufacturing method |
| 01/18/2007 | WO2007007619A1 Material for protective film formation, and method for photoresist pattern formation using the same |
| 01/18/2007 | WO2007007601A1 Lithographic printing plate material and method for image formation |
| 01/18/2007 | WO2007007580A1 Vibration isolation device and vibration isolation method |
| 01/18/2007 | WO2007007564A1 Photosensitive composition, photosensitive lithographic printing plate material, and method for image formation with photosensitive lithographic printing plate material |
| 01/18/2007 | WO2007007557A1 Lithographic printing original plate and image forming method employing it |
| 01/18/2007 | WO2007007550A1 Lithographic printing plate material and method for visible image formation |
| 01/18/2007 | WO2007007513A1 Pattern forming method |
| 01/18/2007 | WO2007007512A1 Pattern forming method |
| 01/18/2007 | WO2007007504A1 Lithographic printing plate precursor |
| 01/18/2007 | WO2007006447A1 An optical system with at least a semiconductor light source and a method for removing contaminations and/or heating the systems |
| 01/18/2007 | WO2006111766A3 Methods and apparatus for the manufacture of microstructures |
| 01/18/2007 | WO2006079093A3 A system and a method for synthesizing nanoparticle arrays in-situ |
| 01/18/2007 | WO2005091076A3 Methods for manufacturing reflective optical elements |
| 01/18/2007 | US20070015089 Method of making a semiconductor device using a dual-tone phase shift mask |
| 01/18/2007 | US20070015082 Process of making a lithographic structure using antireflective materials |
| 01/18/2007 | US20070015067 Filter exposure apparatus, and device manufacturing method |
| 01/18/2007 | US20070014920 Micro-contact-printing engine |
| 01/18/2007 | US20070014112 Variable slit apparatus, illumination apparatus, exposure apparatus, exposure method, and device fabrication method |
| 01/18/2007 | US20070014038 Adjustment arrangement of an optical element |
| 01/18/2007 | US20070014037 Optical subassembly and projection objective in semiconductor lithography |
| 01/18/2007 | US20070014036 Retainer, exposure apparatus, and device fabrication method |
| 01/18/2007 | US20070014028 Reticle-masking objective with aspherical lenses |
| 01/18/2007 | US20070013981 Holographic recording medium and method for manufacturing the same |
| 01/18/2007 | US20070013887 Methods and systems for improved optical lithographic processing |
| 01/18/2007 | US20070012871 Catadioptric projection objective with adaptive mirror and projection exposure method |
| 01/18/2007 | DE10317366B4 Verfahren zur Bestimmung der Transmission einer Linse Method for determining the transmittance of a lens |
| 01/18/2007 | DE102006031807A1 Lighting device for microlithographic projection exposure system, has depolarizing system to effect polarization direction variation such that light mixer produces light without preferred direction, and including plates of crystal material |
| 01/18/2007 | DE102006027787A1 Projection exposure system operating method for microlithography, involves considering influence of optical characteristics of system or dependent parameters that are computed based on modes and object structure during system operation |
| 01/18/2007 | DE102005033376A1 Lens e.g. illumination lens, for use in microlithography system, has optical lenses aligned to each other according to local distribution or variation of their optical characteristics, where lenses are arranged along optical axis |
| 01/18/2007 | CA2614255A1 A method of building a sensor structure |
| 01/17/2007 | EP1744348A2 A semiconductor manufacturing apparatus having a built-in inspection apparatus and method therefor |
| 01/17/2007 | EP1744219A2 Polarized radiation in lithographic apparatus and device manufacturing method |
| 01/17/2007 | EP1744218A2 Filter, exposure apparatus, and device manufacturing method |
| 01/17/2007 | EP1744217A1 Method of selecting a grid model for correcting grid deformations in a lithographic apparatus and lithographic assembly using the same |
| 01/17/2007 | EP1744216A2 Stage apparatus, lithographic apparatus and device manufacturing method |
| 01/17/2007 | EP1744215A1 Supporting device for supporting vibration sensitive components |
| 01/17/2007 | EP1744214A1 Methods and systems for improved optical lithographic processing |
| 01/17/2007 | EP1744213A1 Positive photosensitive resin composition, method for forming pattern, and electronic component |
| 01/17/2007 | EP1744212A2 Photosensitive composition |
| 01/17/2007 | EP1744211A1 Substrate, lithographic multiple exposure method, machine readable medium |
| 01/17/2007 | EP1744193A1 Optical element holding device with drive mechanism allowing movement of the element along three coordinate axes |
| 01/17/2007 | EP1743406A2 Graphic-arts laser imaging with reduced-length laser cavities and improved performance |
| 01/17/2007 | EP1743363A2 Thermally cured undercoat for lithographic application |
| 01/17/2007 | EP1743278A2 High throughput image for processing inspection images |
| 01/17/2007 | EP1743222A2 Optical component having an improved thermal behavior |
| 01/17/2007 | EP1743221A2 Removal of particles generated by a radiation source |
| 01/17/2007 | EP1743220A2 Device for covering substrates in a rotating manner |
| 01/17/2007 | EP1743219A2 Anti-reflective coatings using vinyl ether crosslinkers |
| 01/17/2007 | EP1743218A1 Photocurable compositions and flexographic printing plates comprising the same |
| 01/17/2007 | EP1743217A2 Method for imprint lithography at constant temperature |
| 01/17/2007 | EP1742893A2 Composite patterning devices for soft lithography |
| 01/17/2007 | EP1399766B1 Exposure apparatus comprising an optical element made of an isometric crystal |
| 01/17/2007 | EP1373331A4 Thermally cured underlayer for lithographic application |
| 01/17/2007 | EP1312965B1 Optical element holding device |
| 01/17/2007 | EP1252079B1 Wafer transport system |
| 01/17/2007 | EP1138091B1 Conductive structure based on poly-3,4-alkenedioxythiophene (pedot) and polystyrenesulfonic acid (pss) |
| 01/17/2007 | CN1898797A Wafer with optical control modules in ic fields |
| 01/17/2007 | CN1898796A Wafer with optical control modules in dicing paths |
| 01/17/2007 | CN1898792A Contactless flash memory array |
| 01/17/2007 | CN1898611A Chuck system, lithographic apparatus using the same and device manufacturing method |
| 01/17/2007 | CN1898610A Replacement apparatus for an optical element |
| 01/17/2007 | CN1898609A Composite optical lithography method for patterning lines of unequal width |
| 01/17/2007 | CN1898608A Removable pellicle for immersion lithography |
| 01/17/2007 | CN1898607A Wafer with optical control modules in exposure fields |
| 01/17/2007 | CN1898606A Lithographic apparatus and device manufacturing method |
| 01/17/2007 | CN1898605A Radiation-sensitive resin composition, interlayer insulation film, microlens and process for producing them |
| 01/17/2007 | CN1898604A 负性感光性组合物及负性感光性平版印刷版 Negative photosensitive composition and a negative photosensitive lithographic printing plate |
| 01/17/2007 | CN1898299A Polyamide acid resin having unsaturated group, photosensitive resin composition using same, and cured product thereof |
| 01/17/2007 | CN1898291A Curable resin composition, overcoats, and process for formation thereof |
| 01/17/2007 | CN1898281A Hyperbranched polymer, process for producing the same and resist composition containing the hyperbranched polymer |
| 01/17/2007 | CN1898091A Method and apparatus for micro-contact printing |
| 01/17/2007 | CN1896877A 曝光方法 Exposure method |
| 01/17/2007 | CN1896876A Polarized radiation in lithographic apparatus and device manufacturing method |
| 01/17/2007 | CN1896875A Photoetching equipment |
| 01/17/2007 | CN1896874A Exposure process |
| 01/17/2007 | CN1896873A 光敏组合物 Photosensitive composition |
| 01/17/2007 | CN1896872A Photo setting composition, color filter and its preparation method |
| 01/17/2007 | CN1896871A Alkali development resin composition |
| 01/17/2007 | CN1896870A Positive PS-process photosensitive coating liquid for high-speed vehicle coating |
| 01/17/2007 | CN1896869A Substrate, lithographic multiple exposure method, machine readable medium |
| 01/17/2007 | CN1896855A 液晶显示设备 The liquid crystal display device |
| 01/17/2007 | CN1896854A LCD device and method for manufacturing the same |
| 01/17/2007 | CN1896827A Apparatus for and method of manufacturing liquid crystal display |
| 01/17/2007 | CN1896774A Fly's-eye lens sheet, transmission screen and rear projection image display device |
| 01/17/2007 | CN1896670A Ultraviolet irradiation device |
| 01/17/2007 | CN1896083A Macromolecular polyacyl phosphine imide light initiating agent and its production |
| 01/17/2007 | CN1895903A Wire-mesh printing method for three-part set of toilet board |
| 01/17/2007 | CN1295750C Pattern formation method |
| 01/17/2007 | CN1295749C Semiconductor integrated circuit device and mfg. method of multichip module |
| 01/17/2007 | CN1295568C Device and method for control of aqueous protective coating removing liquid |
| 01/17/2007 | CN1295567C Flexible optical sensor fabricating method |
| 01/17/2007 | CN1295566C Very high-aperture projection objective |
| 01/17/2007 | CN1295565C Lithographic apparatus and device mfg method |
| 01/17/2007 | CN1295564C Aqueous developable photo-imageable thick film compositions with photospeed enhancer |
| 01/17/2007 | CN1295563C Method of manufacturing device |