| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/25/2007 | US20070019301 Very-high aperture projection objective |
| 01/25/2007 | US20070019197 Position detecting method and apparatus |
| 01/25/2007 | US20070019171 Apparatus for aberration detection and measurement |
| 01/25/2007 | US20070019170 Projection objective for a microlithographic projection exposure apparatus |
| 01/25/2007 | US20070019070 Method of forming optical images, an array of converging elements and an array of light valves for use in this method, apparatus for carrying out this method and a process for manufacturing a device using this method |
| 01/25/2007 | US20070019058 Lithography simulation method, mask pattern preparation method, semiconductor device manufacturing method and recording medium |
| 01/25/2007 | US20070018362 Device and method for large area lithography |
| 01/25/2007 | DE10297059B4 Verfahren für die Bebilderung direkt auf der Druckmaschine Method for imaging directly on the press |
| 01/25/2007 | DE102006028459A1 Einrichtung und Verfahren zur Belichtung eines Bildes in einer Belichtungsgröße auf einer Druckform Apparatus and method for exposing an image in an exposure amount on a printing form |
| 01/25/2007 | DE102005017516B3 Fotolithografische Abbildungseinrichtung und Vorrichtung zum Erzeugen einer Beleuchtungsverteilung Photolithographic imaging device and means for generating an illumination distribution |
| 01/25/2007 | DE10120673B4 Verfahren zur Strukturierung einer Photolackschicht A method for patterning a photoresist layer |
| 01/25/2007 | CA2615624A1 Method and apparatus for processing flexographic printing plates |
| 01/25/2007 | CA2525364A1 Nanoimprint lithograph for fabricating nanoadhesive |
| 01/24/2007 | EP1746637A1 Drive method for mobile body, stage device, and exposure device |
| 01/24/2007 | EP1746469A1 Holographic recording medium, holographic recording method, and holographic information medium |
| 01/24/2007 | EP1746464A2 Exposure apparatus and device manufacturing method using the apparatus |
| 01/24/2007 | EP1746463A2 Method for correcting a lithographic projection objective and projection objective of such a kind |
| 01/24/2007 | EP1746462A2 Method for exposing flexographic plates |
| 01/24/2007 | EP1746461A1 Negative radiation-sensitive resin composition |
| 01/24/2007 | EP1746460A2 Photomask blank, photomask and fabrication method thereof |
| 01/24/2007 | EP1746386A2 Method of measuring three-dimensional surface roughness of a structure |
| 01/24/2007 | EP1745333A2 Method of making a photopolymer sleeve blank for flexographic printing |
| 01/24/2007 | EP1539690A4 Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography |
| 01/24/2007 | EP1539386B1 Device for cleaning and inspecting reticles |
| 01/24/2007 | EP1444724B1 Method for photolithographic structuring by means of a carbon hard mask layer which has a diamond-like hardness and is produced by means of a plasma-enhanced deposition method |
| 01/24/2007 | EP1435012B1 Method for apodizing a planar waveguide grating |
| 01/24/2007 | EP1373877B1 Base stabilization system |
| 01/24/2007 | CN2862120Y Producing device for thin film transistor and light shield employed |
| 01/24/2007 | CN2862119Y Film coating machine |
| 01/24/2007 | CN2862118Y Panel with photoresist pattern laminate |
| 01/24/2007 | CN1902733A Exposure method and apparatus, and device producing method |
| 01/24/2007 | CN1902552A Interference patterning |
| 01/24/2007 | CN1902551A Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 01/24/2007 | CN1902550A Composition for forming nitride coating film for hard mask |
| 01/24/2007 | CN1902549A A low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists |
| 01/24/2007 | CN1902548A Photosensitive polymer composition, process for producing pattern, and electronic part |
| 01/24/2007 | CN1902547A Photosensitive resin composition, photosensitive element comprising the same, process for producing resist pattern, and process for producing printed wiring board |
| 01/24/2007 | CN1902546A Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| 01/24/2007 | CN1902523A Method and device for correcting SLM stamp image imperfections |
| 01/24/2007 | CN1902515A Optical waveguides and methods thereof |
| 01/24/2007 | CN1900829A Method for removing photoresist, etch and/or polymeric residues or contaminants from semiconductor substrates |
| 01/24/2007 | CN1900828A Exposure apparatus and method |
| 01/24/2007 | CN1900827A Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation |
| 01/24/2007 | CN1900826A Mask formation over an integrated electronic circuit |
| 01/24/2007 | CN1900825A Method for improving light intensity detector measuring accuracy |
| 01/24/2007 | CN1900824A Coating compositions for use with an overcoated photoresist |
| 01/24/2007 | CN1900823A Method of uniformly coating a substrate |
| 01/24/2007 | CN1900822A Water soluble flexible print plate and its producing method |
| 01/24/2007 | CN1900821A Organic inorganic composite photosensitive resin composition |
| 01/24/2007 | CN1900820A Pattern forming method and method for fabricating semiconductor device by using the same to form desired pattern |
| 01/24/2007 | CN1900819A Photomask blank, photomask and fabrication method thereof |
| 01/24/2007 | CN1900782A Display device manufacturing method |
| 01/24/2007 | CN1900778A Common electrode panel, manufacturing method thereof, and liquid crystal display including the panel |
| 01/24/2007 | CN1900747A Method and device for producing color filter sheet |
| 01/24/2007 | CN1296985C Substrate processing apparatus and method for adjusting a substrate connection position |
| 01/24/2007 | CN1296925C Displacement detecting method, displacement detecting device and recording device of information recording medium original disk |
| 01/24/2007 | CN1296776C Method for projecting and photo etching on thick epitaxial layer |
| 01/24/2007 | CN1296775C Manufacturing method of base plate electro-optical device and making method of electro-optical device |
| 01/24/2007 | CN1296774C Method for manufacturing photoetching device and component |
| 01/24/2007 | CN1296773C Method for preparing 1,2-naphthoaguinone-2-diazidosulfonate photosenisitizer, method for preparing photoresist composition |
| 01/24/2007 | CN1296772C Photoresist composition and pattern forming process with it |
| 01/24/2007 | CN1296771C Method of passivating of low dielectric materials in wafer processing |
| 01/24/2007 | CN1296770C Foam-eliminating dispersing agent for developer solution of photosensitive resists |
| 01/24/2007 | CN1296765C Method for producing thin film transistor liquid crystal display panel |
| 01/24/2007 | CN1296678C Liquid flow proximity detector for use in immersion lithography |
| 01/24/2007 | CN1296470C Detergent composition for alkali development apparatus |
| 01/24/2007 | CN1296435C Absorbing compounds for spin-on glass anti-reflective coatings for photolithography |
| 01/24/2007 | CN1296405C Polycarboxylic acid resin, polycarboxylic acid resin composition, and cured article obtained therefrom |
| 01/24/2007 | CN1296145C Base plate processing device, coating device and coating method |
| 01/23/2007 | US7167769 Inline connection setting method and device and substrate processing devices and substrate processing system |
| 01/23/2007 | US7167296 Continuous direct-write optical lithography |
| 01/23/2007 | US7167232 Lithographic apparatus and radiation source comprising a debris-mitigation system and method for mitigating debris particles in a lithographic apparatus |
| 01/23/2007 | US7167231 Method and apparatus for printing large data flows |
| 01/23/2007 | US7166855 Surface position detecting system and method |
| 01/23/2007 | US7166786 Artificial band gap |
| 01/23/2007 | US7166648 Containing a beta-diketone or a beta -ketoester; for example 3-{4-Acetyl-4-[2-(ethoxycarbonyl)ethyl]-5-oxohexanoyloxy}-2,2-dimethylpropyl ethyl 4,4-diacetylheptane-1,7-dioate; use in photocuring of UV curable ethylenically unsaturated compounds; yields colorless products; nonyellowing |
| 01/23/2007 | US7166534 Method of dry cleaning photoresist strips after via contact etching |
| 01/23/2007 | US7166419 Compositions substrate for removing etching residue and use thereof |
| 01/23/2007 | US7166418 Sulfonamide compound, polymer compound, resist material and pattern formation method |
| 01/23/2007 | US7166417 Method for manufacturing recording media, method for manufacturing production plate used when manufacturing recording media, apparatus for manufacturing recording media, and apparatus for manufacturing production plate used when manufacturing recording media |
| 01/23/2007 | US7166416 Protecting groups in polymers, photoresists and processes for microlithography |
| 01/23/2007 | US7166414 Chemicallyamplified positive tone photoresist comprising a phenolic resin; a sulfonium or iodinium photoacid-generating compound; and an ether, ester, or amide; relief images; enhanced resolution |
| 01/23/2007 | US7166413 Enabling chain scission of branched photoresist |
| 01/23/2007 | US7166412 Photosensitive metal nanoparticle and method of forming conductive pattern using the same |
| 01/23/2007 | US7166411 an infrared absorbing agent of given formula and a polymer compound which is insoluble in water and soluble in an aqueous alkali solution, wherein the solubility in aqueous alkali solution is changed by an infrared laser; high development latitude and storage stability for direct plate-making |
| 01/23/2007 | US7166410 Colored photosensitive resin composition and color filter comprising the same |
| 01/23/2007 | US7166409 Multipass multiphoton absorption method and apparatus |
| 01/23/2007 | US7166407 Imaging element having protective overcoat layers |
| 01/23/2007 | US7166395 Pattern containing openings; flash exposure; sizing to align apertures with images |
| 01/23/2007 | US7166393 Projectors comprising quartz substrates having light diversion and absorption stacks, and electroconductive layers, that can be chucked to substrate holders to which an electrostatic potential is applied |
| 01/23/2007 | US7166184 Multi-stage type processing apparatus |
| 01/23/2007 | US7166178 Protective film and method for preparing same |
| 01/23/2007 | US7166163 Optical member, method of manufacturing the same, and projection exposure system |
| 01/23/2007 | US7165957 Device for transferring a pattern to an object |
| 01/23/2007 | US7165493 Transport apparatus for printing plates including plate holder having two parallel, intercoupled holding decks |
| 01/18/2007 | WO2007008088A1 Nanoscale and microscale lithography methods and resultant devices |
| 01/18/2007 | WO2007007818A1 Method for manufacturing internal cell structure, internal cell structure, and display device |
| 01/18/2007 | WO2007007808A1 Substrate for liquid crystal display, liquid crystal display, and method for manufacturing substrate for liquid crystal display |
| 01/18/2007 | WO2007007802A1 Silver paste composition, method for electrically conductive pattern formation using the same, and its electrically conductive pattern |
| 01/18/2007 | WO2007007800A1 Black paste composition, method for black matrix pattern formation using the same, and its black matrix pattern |