| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/31/2007 | CN1904742A Photoresist stripper composition and methods for forming wire structures and for fabricating thin film transistor substrate using composition |
| 01/31/2007 | CN1904741A Exposure apparatus and exposure method, and method of manufacturing wiring base board |
| 01/31/2007 | CN1904740A Stage apparatus, lithographic apparatus and device manufacturing method |
| 01/31/2007 | CN1904739A Well photoresist pattern of semiconductor device and method for forming the same |
| 01/31/2007 | CN1904738A Method for expressing side intersecting with area by selecting sub-pixel bar chart |
| 01/31/2007 | CN1904737A Method and device of generating pattern, method of determining the position, measurement device, and lithographic apparatus |
| 01/31/2007 | CN1904736A Positive-type photosensitive resin composition and cured film manufactured therefrom |
| 01/31/2007 | CN1904735A Painted photosensitive resin composition |
| 01/31/2007 | CN1904734A 感光性树脂组合物 The photosensitive resin composition |
| 01/31/2007 | CN1904733A Conductor composition for use in LTCC photosensitive tape on substrate applications |
| 01/31/2007 | CN1904732A Photosensitive resin composition for photosensitive clearance material |
| 01/31/2007 | CN1904731A Method for mfg. nano-sticking paper |
| 01/31/2007 | CN1904730A Structure of gluing developing apparatus and chip transmission process |
| 01/31/2007 | CN1904728A Method for generating dense and isolated contact hole pattern by identical energy twice exposures |
| 01/31/2007 | CN1904727A Cluster tool and method for process integration in manufacturing of a photomask |
| 01/31/2007 | CN1904726A Method and system for designing optical shield layout and producing optical shield pattern |
| 01/31/2007 | CN1904708A Method for making pixel structure |
| 01/31/2007 | CN1904702A Liquid crystal display and method of manufacturing the same |
| 01/31/2007 | CN1904686A Method of manufacturing liquid crystal display device |
| 01/31/2007 | CN1904680A In-plane-switching-mode liquid crystal display device |
| 01/31/2007 | CN1904016A Composition for removal of residue comprising cationic salts and methods using same |
| 01/31/2007 | CN1903449A Coating device and coating method |
| 01/31/2007 | CN1298199C Plasma treatment method and apparatus |
| 01/31/2007 | CN1297996C Method for manufacturing ceramic green sheet and method for manufacturing electronic part using that ceramic green sheet |
| 01/31/2007 | CN1297854C Optical mask transfering method |
| 01/31/2007 | CN1297853C Image-forming composition for heat-sensitive CTP image base, acid generating source for the composition and preparation thereof |
| 01/31/2007 | CN1297852C Photosensitive ceramics composition and method for making multi-layer substrate using it |
| 01/31/2007 | CN1297836C Exposure head and exposure apparatus |
| 01/31/2007 | CN1297834C Optical projection system |
| 01/31/2007 | CN1297537C Sulfonium salt compound |
| 01/30/2007 | US7171038 Method and apparatus for inspecting a substrate |
| 01/30/2007 | US7171034 Method and system for phase/amplitude error detection of alternating phase shifting masks in photolithography |
| 01/30/2007 | US7170686 Illumination optical system, exposure apparatus, and device manufacturing method using the same |
| 01/30/2007 | US7170683 Reflection element of exposure light and production method therefor, mask, exposure system, and production method of semiconductor device |
| 01/30/2007 | US7170682 Projection aligner, aberration estimating mask pattern, aberration quantity estimating method, aberration eliminating filter and semiconductor manufacturing method |
| 01/30/2007 | US7170604 Overlay metrology method and apparatus using more than one grating per measurement direction |
| 01/30/2007 | US7170603 Position detection apparatus and exposure apparatus |
| 01/30/2007 | US7170588 Reduction Smith-Talbot interferometer prism for micropatterning |
| 01/30/2007 | US7170587 Lithographic apparatus and device manufacturing method |
| 01/30/2007 | US7170586 Lithographic apparatus and device manufacturing method |
| 01/30/2007 | US7170585 Projection lens and microlithographic projection exposure apparatus |
| 01/30/2007 | US7170580 Lithographic apparatus, projection system, method of projecting and device manufacturing method |
| 01/30/2007 | US7170579 Light source unit, exposure apparatus, and device manufacturing method |
| 01/30/2007 | US7170542 System and method for providing high brightness illumination |
| 01/30/2007 | US7169869 A fluorinated vinyl sulfonate-polyalkenamer-acrylic acid or ester terpolymer with excellent transparency, substrate adhesion, developer penetrability, and plasma etch resistance; lithographic microprocessing; photoresists |
| 01/30/2007 | US7169716 Photosensitive lacquer for providing a coating on a semiconductor substrate or a mask |
| 01/30/2007 | US7169708 Semiconductor device fabrication method |
| 01/30/2007 | US7169545 Resist exposure system and method of forming a pattern on a resist |
| 01/30/2007 | US7169541 Compound, polymer, resist composition, and patterning process |
| 01/30/2007 | US7169540 Method of treatment of porous dielectric films to reduce damage during cleaning |
| 01/30/2007 | US7169535 Superior print life; enhanced sensitivity |
| 01/30/2007 | US7169534 Photopolymer composition suitable for lithographic printing plates |
| 01/30/2007 | US7169532 For use in the formation of connectors such as bumps or metal posts, and wiring patterns, during both the manufacture of circuit substrates, and the manufacture of electronic components |
| 01/30/2007 | US7169531 Photoresist suitable for use in 157 nm photolithography and including a polymer based on fluorinated norbornene derivatives |
| 01/30/2007 | US7169530 Addition polymer containing an unsaturated aromatic sulfonamide compound, unsaturated aromatic ether and acrylated resin; exposure to light; forming pattern |
| 01/30/2007 | US7169529 Compound, photosensitive composition, lithographic printing plate precursor, and method of forming image |
| 01/30/2007 | US7169518 forming images on thermal recording media comprising heat sensitive elements, polymer binders, ink receiving layers and light to heat conversion dyes, then developing and optionally baking |
| 01/30/2007 | US7169517 Method of fabricating a color filter in liquid crystal display device without using a photo mask |
| 01/30/2007 | US7169516 Applying photoresists comprising diazo dyes, curing agents, binders, photoinitiators, solvents and surfactants to glass substrates, then exposing to radiation and developing to form images having photostability, solvent and heat resistance |
| 01/30/2007 | US7169515 A data processing system containing a machine readable data storage medium with instructions for laying out a photolithographic mask, coupled to a processor; integrated circuits; electromagnetic waveform computer program for assigning phase shifting regions |
| 01/30/2007 | US7169456 Transcription plate for forming orientation layer |
| 01/30/2007 | US7169440 Method for removing photoresist and etch residues |
| 01/30/2007 | US7169314 Microfabricated elastomeric valve and pump systems |
| 01/30/2007 | US7169280 Apparatus and method for deposition of an electrophoretic emulsion |
| 01/30/2007 | US7169253 Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing |
| 01/30/2007 | US7168939 System, method, and apparatus for multilevel UV molding lithography for air bearing surface patterning |
| 01/30/2007 | US7168936 Light transparent substrate imprint tool with light blocking distal end |
| 01/30/2007 | US7168564 Composite substrate carrier |
| 01/30/2007 | US7168224 Method of making a packaged radiation sensitive resist film-coated workpiece |
| 01/30/2007 | CA2324675C A substrate for mounting an optical component, a method for producing the same, and an optical module using the same |
| 01/25/2007 | WO2007010919A1 Fluorine-containing copolymer, alkali-developable resin composition, and alkali-developable photosensitive resin composition |
| 01/25/2007 | WO2007010918A1 Alkaline-developable photosensitive colored composition |
| 01/25/2007 | WO2007010881A1 Removing solution for photosensitive composition |
| 01/25/2007 | WO2007010794A1 Process for producing resist composition, filtering apparatus, resist composition applicator, and resist composition |
| 01/25/2007 | WO2007010748A1 Patterning method |
| 01/25/2007 | WO2007010679A1 Remover compositions |
| 01/25/2007 | WO2007010667A1 Process for producing positive-working resist composition, positive-working resist composition, and method for resist pattern formation |
| 01/25/2007 | WO2007010666A1 Resist composition and method of resist pattern formation |
| 01/25/2007 | WO2007010621A1 Method of preparing photomask pattern data, photomask produced by using that photomask pattern data, and method of producing semiconductor device using that photomask |
| 01/25/2007 | WO2007010614A1 Photosensitive resin composition and laminates |
| 01/25/2007 | WO2007010385A1 New organic bottom antireflective polymer compositions |
| 01/25/2007 | WO2007010011A2 Optical element module |
| 01/25/2007 | WO2007009718A1 Folded radial brewster polariser |
| 01/25/2007 | WO2007009543A1 Pellicle for use in a microlithographic exposure apparatus |
| 01/25/2007 | WO2007009535A1 Active reticle tool and lithographic apparatus |
| 01/25/2007 | WO2006104252A3 Transfer material, and process for producing liquid crystal cell substrate and liquid crystal display device using the same |
| 01/25/2007 | WO2006047012B1 Apparatus for the rapid development of photosensitive printing elements |
| 01/25/2007 | WO2005119364A3 Photoimageable coating composition and composite article thereof |
| 01/25/2007 | WO2005116760A3 Photosensitive resin composition, and cured product and use thereof |
| 01/25/2007 | WO2005033802A3 Discharge lamp |
| 01/25/2007 | US20070022402 High transport rates of hormones delivered across cell membranes, facilitating more efficient delivery of drugs and diagnostic agents by using a viscous fluid comprising a polysaccharide a form of hydrogel, lipogel or sols; drug delivery to mucous membranes; gastrointesinal systems |
| 01/25/2007 | US20070021571 Curable polymer compound |
| 01/25/2007 | US20070020772 Gradient structures interfacing microfluidics and nanofluidics, methods for fabrication and uses thereof |
| 01/25/2007 | US20070020565 Methods of fabricating a semiconductor device |
| 01/25/2007 | US20070020563 rubbing to remove the surface protective layer and exposing a photosensitive layer containing a sensitizing dye, a polymerization initiator, a polymerizable dipentaerythritol pentaacrylate compound and a hydrophobic methacrylic copolymer binder, and chain transfer agent; hydrophilic, water-permeable |
| 01/25/2007 | US20070020555 Light sensitive composition containing a compounds capable of undergoing radical polymerization and cationic polymerization, a photopolymerization initiator of iron-arene complex and a halogenated alkyl group-containing compound; and polymeric binder; durability |
| 01/25/2007 | US20070020537 Exposure apparatus correction system, exposure apparatus correcting method, and manufacturing method of semiconductor device |
| 01/25/2007 | US20070020535 single reticle photolithography system suitable for exposing regions of the reticle having distinct patterns under different illumination conditions optimal for each respective region |
| 01/25/2007 | US20070019310 Facet mirrors and a method for producing mirror facets |
| 01/25/2007 | US20070019306 Microlens for projection lithography and method of preparation thereof |