| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/07/2007 | CN1299168C Press plate picture making equipment having offner type optical utensil |
| 02/07/2007 | CN1299167C Image-making device with VCSEL light resource array for machine plate |
| 02/07/2007 | CN1299166C Self-aligned pattern formation method using dual wavelengths |
| 02/07/2007 | CN1299165C Stamp, method, and apparatus |
| 02/07/2007 | CN1299145C Apparatus and method for projection exposure |
| 02/07/2007 | CN1298827C Aqueous stripping and cleaning composition |
| 02/06/2007 | US7173807 Organic electrolytic solution contains a pyrrolidinium salt electrolyte, a chain carbonates, sulfolane and a fluorobenzene; electroconductivity, high withstanding voltage, excellent low-temperature characteristic |
| 02/06/2007 | US7173716 Alignment apparatus, exposure apparatus using the same, and method of manufacturing devices |
| 02/06/2007 | US7173699 Spectroscopic scatterometer system |
| 02/06/2007 | US7173689 Method and system for a pellicle frame with heightened bonding surfaces |
| 02/06/2007 | US7173687 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 02/06/2007 | US7173685 Lithographic apparatus, a device manufacturing method, and a fastener for use in a lithographic apparatus |
| 02/06/2007 | US7173363 System and method for moving an object employing piezo actuators |
| 02/06/2007 | US7173263 Optical switching in lithography system |
| 02/06/2007 | US7172996 Cleaning agent composition for a positive or a negative photoresist |
| 02/06/2007 | US7172974 Methods for forming fine pattern of semiconductor device |
| 02/06/2007 | US7172972 Semiconductor device manufacture method and etching system |
| 02/06/2007 | US7172912 Pattern forming method and wiring pattern forming method, and electro-optic device and electronic equipment |
| 02/06/2007 | US7172853 Method of manufacturing semiconductor integrated circuit devices |
| 02/06/2007 | US7172851 Light sensitive composition, planographic printing plate material, and image formation method |
| 02/06/2007 | US7172850 Polymerizing at least 50 percent (meth)acrylonitrile, poly(ethylene glycol) alkyl ether (meth)acrylate, and styrene in a solvent mixture of:at least 50 percent of a (C1-C6) alkanol and at least 10 percent water and a polymerizaton initiator; lithographic substrate coatings with longer press life |
| 02/06/2007 | US7172849 Antireflective hardmask and uses thereof |
| 02/06/2007 | US7172848 Chemical amplification type positive resist composition |
| 02/06/2007 | US7172847 Capable of printing with an infrared laser for direct plate-making from digital signals in computers etc. |
| 02/06/2007 | US7172788 Optical element and method for its manufacture as well as lithography apparatus and method for manufacturing a semiconductor device |
| 02/06/2007 | US7172076 Internal die filters with multiple passageways which are fluidically in parallel |
| 02/01/2007 | WO2007013802A1 Maskless lithography system with improved reliability |
| 02/01/2007 | WO2007013676A1 Exposure head and exposure apparatus |
| 02/01/2007 | WO2007013612A1 Plotting method and device |
| 02/01/2007 | WO2007013540A1 Mask blank fabrication method and exposure mask fabrication method |
| 02/01/2007 | WO2007013471A1 Compounds, process for production thereof, low-molecular compounds, positive resist compositions and process for formation of resist patterns |
| 02/01/2007 | WO2007013459A1 Photosensitive resin composition |
| 02/01/2007 | WO2007013351A1 Image recording device and method |
| 02/01/2007 | WO2007013311A1 Cleaning liquid for lithography |
| 02/01/2007 | WO2007013233A1 Photosensitive resin composition for liquid crystal display element, color filter using the same, process for manufacture of the color filter, and liquid crystal display element |
| 02/01/2007 | WO2007013007A2 Composition and use thereof |
| 02/01/2007 | WO2005104682A3 Non-fluoride containing supercritical fluid composition for removal of ion-implant photoresist |
| 02/01/2007 | WO2005076935A3 Wavelength filtering in nanolithography |
| 02/01/2007 | US20070027569 Semiconductor production system |
| 02/01/2007 | US20070027298 Photosetting, thermosetting liquid ink |
| 02/01/2007 | US20070027231 Photosensitive insulating resin composition and cured product thereof |
| 02/01/2007 | US20070027052 Cleaning liquid used in photolithography and a method for treating substrate therewith |
| 02/01/2007 | US20070026627 Well photoresist pattern of semiconductor device and method for forming the same |
| 02/01/2007 | US20070026542 Formation of conductive templates employing indium tin oxide |
| 02/01/2007 | US20070026509 Novel surface-active polysiloxane photoinitiators |
| 02/01/2007 | US20070026323 silicon nitride antireflective coatings on EUV light absorber layer; defect inspection of mask with DUV light; eliminate the interference effect may cause reflectance oscillation near the absorber edges, increase the defect inspection sensitivity |
| 02/01/2007 | US20070026134 Method for in situ photoresist thickness characterization |
| 02/01/2007 | US20070025610 Method and apparatus for inspecting a substrate |
| 02/01/2007 | US20070024961 High performance catadioptric imaging system |
| 02/01/2007 | US20070024837 Microlithographic projection exposure apparatus with immersion projection lens |
| 02/01/2007 | US20070024836 Illumination system for a microlithographic projection exposure apparatus |
| 02/01/2007 | US20070024834 Apparatus and process for determination of dynamic scan field curvature |
| 02/01/2007 | US20070024832 Exposure apparatus and method for producing device |
| 02/01/2007 | US20070024830 Illumination compensator for curved surface lithography |
| 02/01/2007 | US20070024829 Driving unit, exposure apparatus using the same, and device fabrication method |
| 02/01/2007 | US20070023712 System and method to pattern an object through control of a radiation source |
| 02/01/2007 | US20070023711 Discharge produced plasma EUV light source |
| 02/01/2007 | US20070023654 Charged particle beam application system |
| 02/01/2007 | US20070023547 Aperture plate and methods for its construction and use |
| 02/01/2007 | US20070022832 Sensor device for non-intrusive diagnosis of a semiconductor processing system |
| 02/01/2007 | US20070022804 Scanning probe microscopy inspection and modification system |
| 02/01/2007 | DE4203464B4 Katadioptrisches Reduktionsobjektiv A catadioptric reduction objective |
| 02/01/2007 | DE112004002199T5 Verfahren zur Herstellung einer Extrem-Ultraviolettstrahlung reflektierenden Maske unter Verwendung von Rasterkraftmikroskop-Lithographie A process for producing extreme ultra-violet radiation of a reflective mask using atomic force microscope lithography |
| 02/01/2007 | DE10243559B4 Photolithographie-Belichtungsvorrichtung und Photolithographie-Belichtungsverfahren Photolithography exposure apparatus and photolithography exposure method |
| 02/01/2007 | DE10237042B4 Zusammensetzung und Verfahren zur Resistentfernung Composition and method for resist removal |
| 02/01/2007 | DE10213285B4 Verfahren zur Steuerung eines fotolithografischen Gerätes A method for controlling a photolithographic device |
| 02/01/2007 | DE102006030757A1 Illumination system for microlithography-projection illumination installation, has mirror arrangement that includes mirrors, and is so arranged that common-polarization degree change by arrangement is smaller than degree change by mirrors |
| 02/01/2007 | DE102005035987A1 Verfahren zur Herstellung von dreidimensionalen Formkörpern A process for producing three-dimensional shaped bodies |
| 02/01/2007 | DE102005035255A1 Ätzmedien für oxidische, transparente, leitfähige Schichten Etching media for oxidic, transparent, conductive layers |
| 02/01/2007 | DE102005033564A1 Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage oder eines digitalen Projektionssystems An optical system, in particular of a microlithographic projection exposure apparatus or a digital projection system |
| 02/01/2007 | DE102004024649B4 Justiereinrichtung und Vorrichtung zum Justieren eines Wafers And adjusting device for adjusting a wafer |
| 02/01/2007 | DE102004016749B4 Verfahren und Anordnung zur Überlagerung von texturierten Oberflächen mit digitaler Grafik Method and arrangement for superposition of textured surfaces with digital graphics |
| 02/01/2007 | DE10151919B4 Belichtungsobjektiv in der Halbleiterlithographie Exposure lens in semiconductor lithography |
| 01/31/2007 | EP1748469A1 Liquid for immersion exposure and immersion exposure method |
| 01/31/2007 | EP1748318A2 Chemical amplification-type resist composition and production process thereof |
| 01/31/2007 | EP1748317A1 Method for preparation of lithographic printing plate and lithographic printing plate precursor |
| 01/31/2007 | EP1748316A2 Nanoimprint lithograph for fabricating nanoadhesive |
| 01/31/2007 | EP1747884A2 Positive photosensitive lithographic printing plate |
| 01/31/2007 | EP1747500A2 Image recording method |
| 01/31/2007 | EP1747499A2 Apparatus and method for providing fluid for immersion lithography |
| 01/31/2007 | EP1747498A2 Chemical compositions |
| 01/31/2007 | EP1747175A2 Quartz glass blank and method for producing said blank |
| 01/31/2007 | EP1586008A4 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 01/31/2007 | EP1023129B1 Improvement in aqueous stripping and cleaning compositions |
| 01/31/2007 | EP0809284B1 Method and system for transporting substrate wafers |
| 01/31/2007 | CN2864746Y Continuously producing unit for superbranched polyester micro-optical photoetching adhesive |
| 01/31/2007 | CN1906750A Substrate processing apparatus and substrate processing method |
| 01/31/2007 | CN1906543A Improvement of printing plate heating oven and its related improvement |
| 01/31/2007 | CN1906542A Apparatus and method for thermally developing flexographic printing elements |
| 01/31/2007 | CN1906541A Holding device for an optical element in an objective |
| 01/31/2007 | CN1906540A Improved lithographic process |
| 01/31/2007 | CN1906539A Precision motion control using feed forward of acceleration |
| 01/31/2007 | CN1906538A Photosensitive printing sleeves and method of forming the same |
| 01/31/2007 | CN1906537A Positive-working photosensitive composition |
| 01/31/2007 | CN1906536A Photosensitive resin composition, color filter and liquid crystal display device |
| 01/31/2007 | CN1906535A Image forming device with brush type processing member |
| 01/31/2007 | CN1906478A Advanced roughness metrology |
| 01/31/2007 | CN1906258A Resin composition for coating |
| 01/31/2007 | CN1906021A Dispense geometry and conductive template to achieve high-speed filling and throughput |
| 01/31/2007 | CN1905151A Substrate carrier |