| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/13/2007 | US7177008 Exposure apparatus and method |
| 02/13/2007 | US7177007 Temperature adjustment apparatus, exposure apparatus having the temperature adjustment apparatus, and semiconductor device manufacturing method |
| 02/13/2007 | US7177006 Exposure apparatus and method |
| 02/13/2007 | US7176545 Apparatus and methods for maskless pattern generation |
| 02/13/2007 | US7176484 Use of an energy source to convert precursors into patterned semiconductors |
| 02/13/2007 | US7176471 Electron beam exposure method and electron beam exposure apparatus |
| 02/13/2007 | US7176415 Heating method for a band-shaped body and heating apparatus for a band-shaped body |
| 02/13/2007 | US7176407 Method and system for precisely positioning a waist of a material-processing laser beam to process microstructures within a laser-processing site |
| 02/13/2007 | US7176297 Photoactivatable silane compounds and methods for their synthesis and use |
| 02/13/2007 | US7176114 Method of depositing patterned films of materials using a positive imaging process |
| 02/13/2007 | US7176066 Fabrication of nanoelectronic circuits |
| 02/13/2007 | US7175974 applying mixtures of curing agents, light absorbers, acid generators, solvents and polydimethylsiloxane on the surfaces of a layer to be etched, then baking to form films, applying photosensitive materials, exposing to a light source and developing to form patterns |
| 02/13/2007 | US7175972 Method for fabricating a thin film magnetic head |
| 02/13/2007 | US7175971 Exposure processing method of a planographic printing plate and apparatus for executing the same method |
| 02/13/2007 | US7175969 enclosing lithographic printing plates in water impervious sheets, to improves storage stability in humid environments |
| 02/13/2007 | US7175968 Lithographic apparatus, device manufacturing method and a substrate |
| 02/13/2007 | US7175967 Heat treatment of multilayer imageable elements |
| 02/13/2007 | US7175966 Water and aqueous base soluble antireflective coating/hardmask materials |
| 02/13/2007 | US7175965 comprising hydrophilic supports having image forming layers containing thermoplastic resin microstructure particles and light to heat conversion materials |
| 02/13/2007 | US7175964 Printing plate material and its developing process |
| 02/13/2007 | US7175963 Chemical amplification type positive resist composition and a resin therefor |
| 02/13/2007 | US7175962 Incompletely oxidized transition metal having oxygen content lower than stoichiometric oxygen content; selectively exposed and developed to pattern; resolution |
| 02/13/2007 | US7175961 Bistable molecules that undergo redox reactions, such as rotaxanes and catenanes, or that undergo an electric field induced band gap change that causes the molecules to change from a fully conjugated to a less conjugated state |
| 02/13/2007 | US7175960 Positive resist composition and patterning process |
| 02/13/2007 | US7175952 Method of generating mask distortion data, exposure method and method of producing semiconductor device |
| 02/13/2007 | US7175950 comprising: a particle comprising a chromophore, which is photobleachable upon exposure to a specific energy by being altered by the specific energy when the particle is within a tissue; anda carrier |
| 02/13/2007 | US7175949 highly sensitive radiation-sensitive compositions and imageable elements that can be imaged at a wavelength of from about 150 to about 1500 nm |
| 02/13/2007 | US7175946 Modified pigment products and black matrixes comprising same |
| 02/13/2007 | US7175945 Phase shifting zones for separation of light source used to determine the quality of photolithographic prints |
| 02/13/2007 | US7175943 Multilayer photomasking; circuit patterns; connecting opacity zones; adjustment of pattern using photomasking |
| 02/13/2007 | US7175940 Generating photolithography masks; calibration patterns |
| 02/08/2007 | WO2007015423A1 Photosensitive resin composition, composition for solder resist, and photosensitive dry film |
| 02/08/2007 | WO2007015393A1 Method for manufacturing color filter, color filter and liquid crystal display |
| 02/08/2007 | WO2007015375A1 Photosensitive resin composition and cured article thereof |
| 02/08/2007 | WO2007015352A1 Resist composition and method of forming resist pattern |
| 02/08/2007 | WO2007015306A1 Charged particle beam plotting device and method |
| 02/08/2007 | WO2005057669A3 Irradiation apparatus |
| 02/08/2007 | WO2005031801A3 Apparatus for multiple beam deflection and intensity stabilization |
| 02/08/2007 | US20070032628 Crosslinked compositions comprising a poly(arylene ether) and a nonlinear optical chromophore, and devices incorporating same |
| 02/08/2007 | US20070032564 Photopolymerizable composition. |
| 02/08/2007 | US20070032086 Mehtod of manufacturing an electronic device |
| 02/08/2007 | US20070031877 Support for analyte determination methods and method for producing the support |
| 02/08/2007 | US20070031764 Exposure process |
| 02/08/2007 | US20070031763 Method of fabricating semiconductor device |
| 02/08/2007 | US20070031762 Methods of patterning substrates; and templates comprising one or both of CdS and CdSe |
| 02/08/2007 | US20070031761 Polymers, methods of use thereof, and methods of decomposition thereof |
| 02/08/2007 | US20070031760 Immersion lithography watermark reduction |
| 02/08/2007 | US20070031756 Photosensitive resin composition, method of forming level difference pattern using the photosensitive resin composition, and method of producing ink jet head |
| 02/08/2007 | US20070031755 Material for forming resist-protecting film for immersion exposure process, resist-protecting film made of such material, and method for forming resist pattern using such resist-protec- ting film |
| 02/08/2007 | US20070031742 Color filter structure and display device using the color filter, and manufacturing method thereof |
| 02/08/2007 | US20070031736 Method and apparatus for compensating for the effects of gravity on pellicle used for protecting a reticle from contamination |
| 02/08/2007 | US20070030471 Lithographic apparatus and device manufacturing method using dose control |
| 02/08/2007 | US20070030468 Optical element and projection exposure apparatus based on use of the optical element |
| 02/08/2007 | US20070030465 Exposure apparatus and a device manfacturing method using the same |
| 02/08/2007 | US20070030463 Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system |
| 02/08/2007 | US20070029686 Photoresists; photomasks |
| 02/08/2007 | US20070029511 High repetition rate laser produced plasma EUV light source |
| 02/08/2007 | DE10326324B4 Lithographiedruckplatten-Vorläufer mit 1,4-Dihydropyridin-Sensibilisator enthaltender Beschichtung, Verfahren zum Bebildern und Bebilderte Lithographiedruckplatte The lithographic printing plate precursor with 1,4-dihydropyridine-sensitizer containing coating, and method of imaging lithographic printing plate Illustrated |
| 02/08/2007 | DE102006031101A1 Adapting method for number of stepping motor cycles per revolution involves performing recording of original printing by setting corrected number of stepping motor cycles per revolution in accordance with predetermined relationship |
| 02/08/2007 | DE102005036911A1 Honey comb condenser for homogeneously illuminating target surface, has lens arrays comprising monolith, and lattice screen removing false light portions leaving from one array and embedded in recesses of arrays |
| 02/08/2007 | DE102005036892A1 Photolithographic illustration and transmission of complete mask layout simulation method for use in semiconductor manufacture involves joining overlapping areas by interpolation such that image of entire chip is produced |
| 02/08/2007 | DE102005034669A1 Mask for lithographic projection on substrate, has arrangement with auxiliary structures and having space for structural components, where space is larger than another space having adjacent auxiliary structures |
| 02/08/2007 | DE102005002550B4 Lift-Off-Verfahren Lift-off method |
| 02/07/2007 | EP1750176A2 Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material |
| 02/07/2007 | EP1750175A1 Positive photosensitive composition |
| 02/07/2007 | EP1750172A1 Wavelength converting optical system, laser light source, exposure apparatus, mask examining apparatus, and macromolecular crystal lens machining device |
| 02/07/2007 | EP1749247A1 A measurement configuration based on linear scales able to measure to a target also moving perpendicular to the measurement axis |
| 02/07/2007 | EP1749242A1 Optical module for a lens |
| 02/07/2007 | EP1749241A1 Apparatus for providing a pattern of polarization |
| 02/07/2007 | EP1749240A1 Photopolymer printing plate precursor. |
| 02/07/2007 | EP1749239A2 Method for pre-exposing relief image printing plate |
| 02/07/2007 | EP1749230A2 Catadioptric imaging system employing immersion liquid for use in broad band microscopy |
| 02/07/2007 | EP1749087A2 Non-fluoride containing supercritical fluid composition for removal of ion-implant photoresist |
| 02/07/2007 | EP1299238B1 Radiation sensitive product, method for preparing a radiation sensitive product and printing or imaging process using the product |
| 02/07/2007 | CN2867397Y Platemaking machine with automatic partition pumped vacuum and counterweight device |
| 02/07/2007 | CN2867396Y Computer direct platemaking machine with semi-automatic plate loading and unloading device for printing industry |
| 02/07/2007 | CN1910522A Polarization-modulating optical element |
| 02/07/2007 | CN1910521A Positive photosensitive composition |
| 02/07/2007 | CN1910520A Processless digitally imaged photopolymer elements using microspheres |
| 02/07/2007 | CN1910519A 感光性树脂组合物及其固化产物 The photosensitive resin composition and a cured product of |
| 02/07/2007 | CN1910518A Photosensitive inorganic paste composition, sheet-shaped unbaked body, and method of producing plasma display front plate |
| 02/07/2007 | CN1910517A Adaptive real time control of a reticle/mask system |
| 02/07/2007 | CN1910516A Computer-implemented methods for detecting defects in reticle design data |
| 02/07/2007 | CN1910494A Catadioptric projection objective |
| 02/07/2007 | CN1910308A Advanced multi-pressure workpiece processing |
| 02/07/2007 | CN1910221A 树脂和树脂组合物 Resin and the resin composition |
| 02/07/2007 | CN1908819A Developing treatment apparatus and developing treatment method |
| 02/07/2007 | CN1908818A Lens position control method, lens position control apparatus, cutting method, and cutting apparatus |
| 02/07/2007 | CN1908817A Device for regulating temperature of laser module in a printing plate exposure unit |
| 02/07/2007 | CN1908816A Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material |
| 02/07/2007 | CN1908815A Photo curable composition and optical spacer block for use in liquid crystal display device and photo-curable colouration composition |
| 02/07/2007 | CN1908812A A method, program product and apparatus for performing double exposure lithography |
| 02/07/2007 | CN1908702A Euvl reflection device, method of fabricating the same |
| 02/07/2007 | CN1907736A Method for making multi-channel stealth pattern on metallic material surface |
| 02/07/2007 | CN1907725A Novel technique of producing laser paper |
| 02/07/2007 | CN1299334C Substrate treating method and treater |
| 02/07/2007 | CN1299332C Fluid pressure imprint lithography |
| 02/07/2007 | CN1299328C Method for reducing and ensuring pattern gaps |
| 02/07/2007 | CN1299170C Scanning exposuring device |
| 02/07/2007 | CN1299169C Manufacturing method of photoetching apparatus and device |