Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
02/2007
02/15/2007WO2007018464A2 Method and apparatus for projection printing
02/15/2007WO2007018167A1 Laser projection device
02/15/2007WO2007018127A1 Stage apparatus and exposure apparatus
02/15/2007WO2007018013A1 Printing plate material
02/15/2007WO2007017473A1 Imaging system, in particular projection lens of a microlithographic projection exposure unit
02/15/2007WO2007017307A1 Uv-curable and thermosetting epoxy resin lacquer for electronic subassemblies in humid spaces
02/15/2007WO2007017089A1 Projection objective of a microlithographic projection exposure apparatus
02/15/2007WO2007017013A2 Arrangement for mounting an optical component
02/15/2007WO2007016911A2 Method for producing cylindrical, jointless continuous surfaces
02/15/2007WO2006121580A3 Compositions for the removal of post-etch and ashed photoresist residues and bulk photoresist
02/15/2007WO2004081664A3 Novel photosensitive resin compositions
02/15/2007US20070037101 Manufacture method for micro structure
02/15/2007US20070037100 High aspect ratio mask open without hardmask
02/15/2007US20070037099 Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method
02/15/2007US20070037098 Systems and methods for modifying features in a semi-conductor device
02/15/2007US20070037097 Process for preparing a flexographic printing plate
02/15/2007US20070037091 2,4,6-Triisopropylbenzenesulfonate compound capable of generating an acid upon exposure to radiation or electron beams, polymer which changes solubility in alkaline developer under action of acid, and basic compound having high sensitivity, contrast, resolution, storage stability
02/15/2007US20070037090 Copolymer of di-tert-butyl, di-tetrahydropyranyl or di-oxocyclohexyl itaconate and adamantyl, norbornanyl, perhydroanthracenyl or perhydrodimethanonaphthyl (meth)acrylate and a photo-acid initiator; good transparency and etching resistance, high sensitivity, and little peeling.
02/15/2007US20070037087 salt of hydrofluoric acid with a non-metal base, a water-soluble organic solvent, a mercapto group containing corrosion inhibitor, and water; protects aluminum and copper wiring from corrosion while stripping photoresist films and post-ashing residues; nonprecipitating corrosion inhibitor
02/15/2007US20070037072 Levenson type phase shift mask and manufacturing method thereof
02/15/2007US20070037068 Barrier coating compositions for photoresist and methods of forming photoresist patterns using the same
02/15/2007US20070036494 Projection objective of a microlithographic projection exposure apparatus
02/15/2007US20070035814 Euv projection lens with mirrors made from material with differing signs for the rise in temperature dependence of the thermal expansion coefficient around the zero transition temperature
02/15/2007US20070035711 Exposure apparatus and method for producing device
02/15/2007US20070035710 Exposure apparatus, exposure method, and method for producing device
02/15/2007US20070035267 Stage device
02/15/2007US20070034600 Planarization Method of Patterning a Substratte
02/15/2007US20070034599 Nanoscale electric lithography
02/15/2007US20070034499 Phase shift mask blank, photo mask blank, and manufacturing apparatus and method of blanks
02/15/2007DE112005000943T5 Lichtempfindliche Originaldruckplatte für den Reliefdruck, Verfahren zur Herstellung der Reliefdruckplatte und Lichtschutztinte zur Durchführung des Verfahrens The photosensitive original printing plate for relief printing, process for producing the relief printing plate and light-shielding ink for performing the method
02/15/2007DE102006025044A1 Projection lens for microlithographic projection exposure system, has two optical units that are so designed that they are not rotationally symmetric to optical axis, where each unit generates one respective distribution of time delay
02/15/2007DE102005037531A1 Verfahren und Vorrichtung zur Reduzierung systematischer Messfehler bei der mikroskopischen Untersuchung von Objekten Method and apparatus for reducing systematic error on microscopic examination of objects
02/14/2007EP1753017A1 Analysis method, exposing equipment and exposing equipment system
02/14/2007EP1753016A1 Exposure apparatus and device producing method
02/14/2007EP1752897A1 Mechanismus for making and inspecting reticles
02/14/2007EP1752829A2 Polymer-stripping composition
02/14/2007EP1752828A1 Rinse solution for lithography
02/14/2007EP1752827A1 Rinsing fluid for lithography
02/14/2007EP1752826A1 Resist pattern forming method and composite rinse agent
02/14/2007EP1752825A2 Lithography Masks and Methods
02/14/2007EP1752494A1 Photo-radical-curable resin composition containing epoxy resin
02/14/2007EP1751784A2 Apparatus for blanking a charged particle beam
02/14/2007EP1751683A2 Intermediate layout for resolution enhancement in semiconductor fabrication
02/14/2007EP1751625A1 Method of making a photopolymer printing plate
02/14/2007EP1751624A1 Ultraviolet-transparent alkanes and processes using same in vacuum and deep ultraviolet applications
02/14/2007EP1751623A2 High speed lithography machine and method
02/14/2007EP1751622A2 Laser interferometer mirror assembly
02/14/2007EP1751621A2 A vibration damper or isolator
02/14/2007EP1751620A1 Photosensitive resin composition and lcd using the same
02/14/2007EP1751601A2 Catadioptric projection objective with intermediate images
02/14/2007EP1751220A1 Method of coloring a coating composition
02/14/2007EP1750944A1 Method of making a photpopolymer sleeve blank having an integral uv transparent cushion layer for flexographic printing
02/14/2007EP1516745B1 Photosensitive resin composition for forming a laser engravable printing element
02/14/2007EP1053566B1 Method and composition for dry photoresist stripping in semiconductor fabrication
02/14/2007CN1914563A Projection objective for amicrolithographic projection exposure apparatus
02/14/2007CN1914562A Reticle fabrication using a removable hard mask
02/14/2007CN1914561A Photoresist compositions and processess of use
02/14/2007CN1914560A Functionalized photoinitiators
02/14/2007CN1914558A Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates
02/14/2007CN1914537A Spatial light modulator and method for performing dynamic photolithography
02/14/2007CN1914525A Polarization conversion element, lighting optical device, exposure system, and exposure method
02/14/2007CN1914480A A method for measuring the position of a mark in a deflector system
02/14/2007CN1914436A Actuator arrangement for active vibration isolation using a payload as an inertial reference mass
02/14/2007CN1914185A Piperazino photoinitiation sensitisers
02/14/2007CN1914048A Process for producing laser engravable printing substrate
02/14/2007CN1913101A Decompression drying device
02/14/2007CN1913001A Improved method and apparatus using an SLM
02/14/2007CN1912749A Method for removing photoetching agent and method of regeneration photoetching agent
02/14/2007CN1912748A Exposure device and exposure method
02/14/2007CN1912747A Implementing method of alignment process in electron beam exposure
02/14/2007CN1912746A Electron beam graph scanning processor
02/14/2007CN1912745A Barrier coating compositions for photoresist and methods of forming photoresist patterns using the same
02/14/2007CN1912744A Method of uniformly coating a substrate
02/14/2007CN1912743A Photosensitive resin composition for forming functional pattern and functional pattern forming method
02/14/2007CN1912742A Colorant dispersion liquid and photosensitive composition using the same
02/14/2007CN1912741A Manufacturing method for etching texture on surface of golf club head and its texture structure
02/14/2007CN1912740A Exposure mask
02/14/2007CN1912739A Light exposure mask and method for manufacturing semiconductor device using the same
02/14/2007CN1912738A Substrate with light-shielding film, color filter substrate, method of manufacture of both, and display device having substrate with light-shielding film
02/14/2007CN1912646A MEMS micro high sensitivity magnetic field sensor and manufacturing method
02/14/2007CN1300857C Method of mfg. microoptical lens
02/14/2007CN1300823C Pattern forming method
02/14/2007CN1300773C Method for foming single floating block air cushion surface by using forming polymer brush
02/14/2007CN1300641C Residue removing liquor compsn. of photo resist
02/14/2007CN1300640C Developing method, substrate treating method and substrate treating device
02/14/2007CN1300639C Method for extending the range of lithographic simulation integrals
02/14/2007CN1300638C Method for manufacturing micro mechanical components with different aspect ratio using X-ray exposure
02/14/2007CN1300637C Etching method and computer storage medium storing program for controlling same
02/14/2007CN1300636C Plus photoresist composition for manufacturing system LCD and method for making resist pattern
02/14/2007CN1300635C Vacuum negative pressure nanometer press printing method
02/14/2007CN1300634C Light shield and method for forming polycrystalline silicon layer applying the same
02/14/2007CN1300612C Process for producing polyimide optical waveguide
02/14/2007CN1300291C Cleaning composition
02/14/2007CN1300187C Selective hydrolysis method of polymer in preparation of photoresist film-forming resin
02/13/2007US7178031 Wireless security access management for a portable data storage cartridge
02/13/2007US7177718 Semiconductor production system
02/13/2007US7177457 Overlay marks, methods of overlay mark design and methods of overlay measurements
02/13/2007US7177099 Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus
02/13/2007US7177076 8-mirror microlithography projection objective
02/13/2007US7177059 Device and method for manipulation and routing of a metrology beam
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