| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/22/2007 | US20070040133 Lithographic apparatus and device manufacturing method |
| 02/22/2007 | US20070039921 Etching solutions and processes for manufacturing flexible wiring boards |
| 02/22/2007 | DE102006034549A1 Vertiefungs-Photolack-Struktur einer Halbleiter-Vorrichtung und Verfahren zum Herstellen derselben Depression photoresist structure of a semiconductor device and method of manufacturing the same |
| 02/22/2007 | DE102005039519A1 Projection illumination equipment for manufacturing semiconductor component, has cuboid shaped light conducting rod, and crystallographic main axis extending approximately perpendicular or parallel to longitudinal extension of rod |
| 02/22/2007 | DE102005039517A1 Phasenverzögerungselement und Verfahren zur Herstellung eines Phasenverzögerungselementes Phase delay element and method of manufacturing a phase delay element |
| 02/22/2007 | DE102005039483A1 Optical unit e.g. lens, processing device, has ion beam source in vacuum chamber, and pivoting arrangement pivoted around pivoting axis with source, where arrangement and source are adjusted relative to each other in shifting directions |
| 02/22/2007 | DE102005037764A1 Field illumination device for micro-lithography projection exposure system, has field homogenization unit and lens provided between laser and reflecting unit, which is designed so that position of optical axis is not changed by rotation |
| 02/22/2007 | DE10046218B4 Projektionsbelichtungsanlage Projection exposure apparatus |
| 02/21/2007 | EP1755365A1 Positive photosensitive insulating resin composition, cured product thereof, and electronic component |
| 02/21/2007 | EP1755003A1 Stripper |
| 02/21/2007 | EP1755002A2 Manufacturing method of lithographic printing plate and manufacturing apparatus of lithographic printing plate |
| 02/21/2007 | EP1755001A1 Electron beam position fluctuation measurement method, electron beam position fluctuation measurement device, and electron beam recording device |
| 02/21/2007 | EP1755000A2 Positive resist composition and a pattern forming method using the same |
| 02/21/2007 | EP1754999A2 Positive resist composition and method of pattern formation with the same |
| 02/21/2007 | EP1754809A2 Large volume oriented single crystals with a homogeneous refractive index and low stress related birefringence |
| 02/21/2007 | EP1754742A1 Organosilicon compound and method for producing same |
| 02/21/2007 | EP1754722A1 Black paste composite, upper plate of plasma display panel, and manufacturing method by using the same |
| 02/21/2007 | EP1754614A1 Lithographic printing plate precursor and lithographic printing method |
| 02/21/2007 | EP1754597A2 Lithographic printing plate precursor and lithographic printing process |
| 02/21/2007 | EP1754252A1 Method for plasma stripping using periodic modulation of gas chemistry and hydrocarbon addition |
| 02/21/2007 | EP1754240A2 Apparatus for generating and emitting xuv radiation |
| 02/21/2007 | EP1754191A1 Method for characterizing a digital imaging system |
| 02/21/2007 | EP1754122A2 Method and system to control movement of a body for nano-scale manufacturing |
| 02/21/2007 | EP1754111A1 Lighting unit of a microlithographic projection exposure system |
| 02/21/2007 | EP1754110A1 Projection objective for a microlithographic projection exposure apparatus |
| 02/21/2007 | EP1754108A2 Apparatus, system and method to vary dimensions of a substrate during nano-scale manufacturing |
| 02/21/2007 | EP1754083A1 Building up diffractive optics by structured glass coating |
| 02/21/2007 | EP1461373B1 Polymeric compositions and uses therefore |
| 02/21/2007 | EP1299479B2 Pigmentary copper phthalocyanine solid solution and transparent dispersion comprising it |
| 02/21/2007 | EP1239332B1 Photosensitive polysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof |
| 02/21/2007 | EP1141782A4 Using block copolymers as supercritical fluid developable photoresists |
| 02/21/2007 | CN2872416Y Film spreader of printer |
| 02/21/2007 | CN2872415Y Double-net mechanical glue spreader |
| 02/21/2007 | CN1918696A Pattern forming process |
| 02/21/2007 | CN1918695A Stage drive method and stage drive apparatus, exposure apparatus, and device producing method |
| 02/21/2007 | CN1918694A Development device and developing method |
| 02/21/2007 | CN1918643A Novel optical storage materials based on narrowband optical properties |
| 02/21/2007 | CN1918517A Image enhancement for multiple exposure beams |
| 02/21/2007 | CN1918516A Lithographic apparatus, method of calibration |
| 02/21/2007 | CN1918515A Curable resin composition, color filter and liquid crystal display |
| 02/21/2007 | CN1918514A Photosensitive resin composition and cured product thereof |
| 02/21/2007 | CN1918448A Method and system to measure characteristics of a film disposed on a substrate |
| 02/21/2007 | CN1918217A Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern |
| 02/21/2007 | CN1917982A Photomask and method for conveying information associated with a photomask substrate |
| 02/21/2007 | CN1916772A Stripper |
| 02/21/2007 | CN1916771A Liquid processing method and device thereof |
| 02/21/2007 | CN1916770A Method of selecting a grid model for correcting a process recipe and lithographic assembly using the same |
| 02/21/2007 | CN1916769A Method for manufacturing semiconductor device using immersion lithography process |
| 02/21/2007 | CN1916768A Equipment for customizing individualized contact lenses |
| 02/21/2007 | CN1916767A Method for forming a lithography pattern |
| 02/21/2007 | CN1916766A Immersion lithography method and its disposal method |
| 02/21/2007 | CN1916765A Optimized modules' proximity correction |
| 02/21/2007 | CN1916764A Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same |
| 02/21/2007 | CN1916763A Positive resist composition and method of forming resist pattern |
| 02/21/2007 | CN1916762A Photosensitive resin composition, cushion for display panel and display panel |
| 02/21/2007 | CN1916761A Photosensitive resin composition, cushion for display panel and display panel |
| 02/21/2007 | CN1916760A Acid-producing agent, sulfonic acid, sulfonic acid derivative and radiation-sensitive resin composition |
| 02/21/2007 | CN1916759A Pattern replication with intermediate stamp |
| 02/21/2007 | CN1916758A Method for photo mask, and correcting exposure machine |
| 02/21/2007 | CN1916718A Substrate alignment apparatus, substrate processing apparatus, and substrate transfer apparatus |
| 02/21/2007 | CN1916672A Method for fabricating color filter |
| 02/21/2007 | CN1916603A Method and apparatus for angular-resolved spectroscopic lithography characterisation |
| 02/21/2007 | CN1916571A Formed in one time optical coded disc through exposing and developing coated sensitive emulsion glue |
| 02/21/2007 | CN1916561A Interferometer for measuring perpendicular translations |
| 02/21/2007 | CN1916088A Opaque coatings |
| 02/21/2007 | CN1916044A Resin compound of containing addition product of benzoquinone-cyclopentadiene, and composition of photoresistive agent of containing the resin compound |
| 02/21/2007 | CN1916034A Solidifiable composition material by ultraviolet light and application |
| 02/21/2007 | CN1301443C Background exposure method and equipment using said method |
| 02/21/2007 | CN1301442C Automatic processing method for photosensitive lithographic printing plate and its automatic processing device |
| 02/21/2007 | CN1301276C Alkali-soluble maleimide copolymer and liquid crystal display comprising the same |
| 02/21/2007 | CN1301198C Method of performing micro contact printing using colloidal crystal as ink |
| 02/20/2007 | US7181296 Method of adaptive interactive learning control and a lithographic manufacturing process and apparatus employing such a method |
| 02/20/2007 | US7181057 Overlay marks, methods of overlay mark design and methods of overlay measurements |
| 02/20/2007 | US7180667 Objective with fluoride crystal lenses |
| 02/20/2007 | US7180658 High performance catadioptric imaging system |
| 02/20/2007 | US7180603 Reduction of thermal non-cyclic error effects in interferometers |
| 02/20/2007 | US7180593 Overlay mark for aligning different layers on a semiconductor wafer |
| 02/20/2007 | US7180578 Exposure assembly for exposing a double-sided printed circuit panel to light |
| 02/20/2007 | US7180576 Exposure with intensity balancing to mimic complex illuminator shape |
| 02/20/2007 | US7180574 Exposure apparatus and method |
| 02/20/2007 | US7180572 Immersion optical projection system |
| 02/20/2007 | US7180198 Method of fabricating polycrystalline silicon and switching device using polycrystalline silicon |
| 02/20/2007 | US7180081 Discharge produced plasma EUV light source |
| 02/20/2007 | US7180051 Polarization state detecting system, light source, and exposure apparatus |
| 02/20/2007 | US7179751 Hydrogen plasma photoresist strip and polymeric residue cleanup process for low dielectric constant materials |
| 02/20/2007 | US7179584 Exposure method and device for forming patterns on printed wiring board |
| 02/20/2007 | US7179583 Providing a photosensitive printing element;cutting the photosensitive printing element in a pattern of a desired size and shape for mounting on a sleeve or cylindrical carrier; andapplying an edge-covering formulation to cover the cut surfaces of the printing element |
| 02/20/2007 | US7179582 Suitably used as a recording material of a so-called direct plate-making lithographic printing plate precursor, from which a printing plate is directly prepared based on digital signal, for example, from a computer using various kinds of lasers |
| 02/20/2007 | US7179581 Resist composition and patterning process |
| 02/20/2007 | US7179580 Radiation sensitive material and method for forming pattern |
| 02/20/2007 | US7179579 Radiation-sensitive composition |
| 02/20/2007 | US7179578 Positive resist composition |
| 02/20/2007 | US7179571 Apparatus for characterization of photoresist resolution, and method of use |
| 02/20/2007 | US7179504 Coating using discharging nozzle; depressurization to dry |
| 02/20/2007 | US7179399 Material for forming protective film |
| 02/20/2007 | US7179396 Positive tone bi-layer imprint lithography method |
| 02/20/2007 | US7179148 Cathode with improved work function and method for making the same |
| 02/20/2007 | US7179079 Conforming template for patterning liquids disposed on substrates |
| 02/20/2007 | US7179000 Method of developing a resist film and a resist development processor |
| 02/20/2007 | CA2174411C 2-(2-hydroxy-3-.alpha.-cumyl-5-alkylphenyl)-2h benzotriazoles |