| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/28/2007 | EP1164629B1 Exposure apparatus and proces for producing it |
| 02/28/2007 | CN1922727A Manufacturing method of semiconductor device, integrated circuit card, ic tag, rfid, transponder, bill, negotiable securities, passport, electronic apparatus, bag, and clothing |
| 02/28/2007 | CN1922718A Device manufacturing method and substrate |
| 02/28/2007 | CN1922715A Exposure apparatus, exposure method, and device fabricating method |
| 02/28/2007 | CN1922550A Methods for exposing patterns and emulating masks in optical maskless lithography |
| 02/28/2007 | CN1922549A Determining image blur in an imaging system |
| 02/28/2007 | CN1922548A Information management and tracking system (IMTS) |
| 02/28/2007 | CN1922547A 投影光学系统 The projection optical system |
| 02/28/2007 | CN1922546A Bilayer laminated film for bump formation and method for forming bump |
| 02/28/2007 | CN1922545A Photosensitive resin composition for printing substrate capable of laser sculpture |
| 02/28/2007 | CN1922528A Catadioptric imaging system for high numerical aperture imaging with deep ultraviolet light |
| 02/28/2007 | CN1922227A Curable resin composition for light guide, curable dry film for light guide |
| 02/28/2007 | CN1922216A Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern |
| 02/28/2007 | CN1922142A Oxime ester compound, photopolymerizable composition and color filter utilizing the same |
| 02/28/2007 | CN1922030A System for thermal development of flexographic printing plates |
| 02/28/2007 | CN1921053A Method of making a display device having a light-blocking layer and display device having the same |
| 02/28/2007 | CN1920674A Manufacturing system in electronic devices |
| 02/28/2007 | CN1920673A Resist removing method and resist removing apparatus |
| 02/28/2007 | CN1920672A Stripping solution composition for removing transparent conductive film and photoresist |
| 02/28/2007 | CN1920671A Composition for removing a photoresist residue and polymer residue, and residue removal process using the same |
| 02/28/2007 | CN1920670A Latent overlay metrology |
| 02/28/2007 | CN1920669A Laser micro-image device |
| 02/28/2007 | CN1920668A Silicon wafer platform height control system and method in projection type photoetching machine |
| 02/28/2007 | CN1920667A Photosensitive slurry |
| 02/28/2007 | CN1920666A Photosensitive slurry |
| 02/28/2007 | CN1920665A Location method for nano materials synthesis used catalyst |
| 02/28/2007 | CN1920664A Etching tape and method of fabricating array substrate for liquid crystal display using the same |
| 02/28/2007 | CN1920663A Method for manufacturing printing plate |
| 02/28/2007 | CN1920662A Coining photolithography device and method thereof |
| 02/28/2007 | CN1920661A Pt/Ti metal membrane patterning technique |
| 02/28/2007 | CN1920637A 显示装置及其制造方法 Display device and manufacturing method |
| 02/28/2007 | CN1302524C Wet resist removing process after silk etching |
| 02/28/2007 | CN1302515C Semiconductor manufacturing apparatus having a built-in inspection apparatus and a device manufacturing method using said manufacturing apparatus |
| 02/28/2007 | CN1302342C Chemical rinse composition |
| 02/28/2007 | CN1302341C Liquid treatment method and liquid treatment device |
| 02/28/2007 | CN1302340C Lithograph with one-dimensional trigger mask and method for production of digital holograms in a storage medium |
| 02/28/2007 | CN1302339C Photo sensitive resin composition |
| 02/28/2007 | CN1302338C Method for preventing industrial photoresisting residual |
| 02/28/2007 | CN1302337C Mask for use in lithography, method of making a mask, lithographic apparatus, and device manufacturing method |
| 02/27/2007 | US7185312 Exposure method for correcting line width variation in a photomask |
| 02/27/2007 | US7185310 System and method for charge-balanced, continuous-write mask and wafer process for improved colinearity |
| 02/27/2007 | US7184849 Method of planning tasks in a machine, method of controlling a machine, supervisory machine control system, lithographic apparatus, lithographic processing cell and computer program |
| 02/27/2007 | US7184594 Pattern matching method and device, position determining method and device, position aligning method and device, exposing method and device, and device and its production method |
| 02/27/2007 | US7184382 Energy beam irradiating apparatus |
| 02/27/2007 | US7184227 Optical unit, exposure unit and optical devices |
| 02/27/2007 | US7184192 Pattern generator diffractive mirror methods and systems |
| 02/27/2007 | US7184152 Optical measurements of line edge roughness |
| 02/27/2007 | US7184129 Positioning method, and positioning apparatus |
| 02/27/2007 | US7184128 Lithographic apparatus and device manufacturing method |
| 02/27/2007 | US7184127 Exposure apparatus having separately supported first and second shades and method for manufacturing semiconductor device |
| 02/27/2007 | US7184125 Exposure device |
| 02/27/2007 | US7184123 Lithographic optical system |
| 02/27/2007 | US7184122 Lithographic apparatus and device manufacturing method |
| 02/27/2007 | US7184121 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 02/27/2007 | US7184109 Liquid crystal cell that resists degradation from exposure to radiation |
| 02/27/2007 | US7183674 Hermetically sealed elements of an actuator |
| 02/27/2007 | US7183566 Lithographic apparatus for manufacturing a device |
| 02/27/2007 | US7183565 Source multiplexing in lithography |
| 02/27/2007 | US7183368 Negative-working photoresist composition |
| 02/27/2007 | US7183335 Supports and three dimensional printing with release agents |
| 02/27/2007 | US7183333 Photopolymer technology, as well as photoinitiated colour forming reactions are achievable by applying a reactive substrate selected from a polymerisable and/or crosslinkable composition and a colour changing substance to a support, |
| 02/27/2007 | US7183245 An alkylbenzenesulfonic acid, anisole, and mesitylene; stripping at room or elevated temperature; improved corrosion and etch resistance of metal substrates |
| 02/27/2007 | US7183192 Composition for removing photoresist and method of forming a bump electrode in a semiconductor device using the composition |
| 02/27/2007 | US7183185 Methods of forming transistor gates; and methods of forming programmable read-only memory constructions |
| 02/27/2007 | US7183128 Photo mask and semiconductor device manufacturing method |
| 02/27/2007 | US7183042 Bit end design for pseudo spin valve (PSV) devices |
| 02/27/2007 | US7183041 Printing plate in the form of a roller and method for obtaining same |
| 02/27/2007 | US7183040 cationically curable component having a linking aliphatic ester group; epoxy group containing component; oxetane group containing component, multifunctional acrylate and a radical photoinitiator and a cationic photoinitiator |
| 02/27/2007 | US7183039 both a high degree of radiation sensitivity and sufficient storage stability |
| 02/27/2007 | US7183038 Lithographic printing plate precursor and lithographic printing method |
| 02/27/2007 | US7183037 Overcoating photoresists |
| 02/27/2007 | US7183036 Low activation energy positive resist |
| 02/27/2007 | US7183022 Providing a sharp imaging, improves the imaging of closely adjacent structures, with at least two masks, strongly coupled structures, simultaneous imaging; semiconductors |
| 02/27/2007 | US7182821 Substrate processing method and substrate processing apparatus |
| 02/27/2007 | US7182794 Correcting device, exposure apparatus, device production method, and device produced by the device production method |
| 02/27/2007 | US7182531 Developing method and apparatus |
| 02/27/2007 | US7182021 Printing plate material, printing plate material roll, printing plate manufacturing process, and printing process |
| 02/27/2007 | CA2197331C A photosensitive paste, a plasma display, and a method for the production thereof |
| 02/22/2007 | WO2007021741A2 Methods of using a nanotransfer printing stamp having conductively coated sidewalls |
| 02/22/2007 | WO2007021085A1 Photoresist stripper composition for semiconductor manufacturing |
| 02/22/2007 | WO2007020901A1 Fluorine-containing adamantane derivative, fluorine-containing adamantane derivative having polymerizable group, and resin composition containing same |
| 02/22/2007 | WO2007020890A1 Plotting device, exposure device, and plotting method |
| 02/22/2007 | WO2007020809A1 Work transfer apparatus, image forming apparatus provided with such work transfer apparatus, and work transfer method |
| 02/22/2007 | WO2007020761A1 Work fixing apparatus, method for positioning such work fixing apparatus, and image forming apparatus |
| 02/22/2007 | WO2007020734A1 Photoresist polymer having nano smoothness and etching resistance and resist composition |
| 02/22/2007 | WO2007020067A1 Immersion lithography objective |
| 02/22/2007 | WO2007020004A1 Projection objective and method for optimizing a system diaphragm of a projection objective |
| 02/22/2007 | WO2007019886A1 Optical system, namely objective or illumination device of a microlithographic projection exposure system |
| 02/22/2007 | WO2007019677A1 Printing plate registration using a camera |
| 02/22/2007 | US20070043138 Resin composition for photofabrication of three dimensional objects |
| 02/22/2007 | US20070043135 Radiation curable coating formulations comprising polyesters |
| 02/22/2007 | US20070042299 Method to print photoresist lines with negative sidewalls |
| 02/22/2007 | US20070042298 Method for manufacturing semiconductor device using immersion lithography process |
| 02/22/2007 | US20070042297 Resist pattern forming method and manufacturing method of semiconductor device |
| 02/22/2007 | US20070042288 Positive photoresist composition and method for forming resist pattern |
| 02/22/2007 | US20070042277 Method and apparatus for performing model-based layout conversion for use with dipole illumination |
| 02/22/2007 | US20070042231 Compressible plate for flexographic printing, and process for obtaining |
| 02/22/2007 | US20070042191 Tougher cycloaliphatic epoxide resins |
| 02/22/2007 | US20070041024 Sensor device and stage device |
| 02/22/2007 | US20070041004 Illumination optical system, projection/exposure device, micro device manufacturing method, illumination device manufacturing method, projection/exposure device adjustment method, and projection/exposure device manufacturing method |