Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2007
03/07/2007CN1303648C Method for producing semiconductor element
03/07/2007CN1303488C Heat-pipe constant-temperature high-precision sampling resistor
03/07/2007CN1303479C Method for forming patterned ITO structure by using photosensitive ITO solution
03/07/2007CN1303478C Method for realizing micro nano pattern transfer based on rotary coating and bonding
03/07/2007CN1303477C Determination of center of focus by cross-section analysis
03/07/2007CN1303476C Improved lighting system for micro-offset printing
03/07/2007CN1303475C Optical mask with illuminance polarization control
03/07/2007CN1303474C Optical proximity correction for phase shifting photolithographic masks
03/07/2007CN1303468C Method of making optical spacing walls
03/07/2007CN1303467C Method for making liquid crystal display panel
03/07/2007CN1303439C Microlens array substrate and fabrication method thereof, and projection-type liquid crystal display device using same
03/07/2007CN1303121C PS plate and synthetic resin for PS thereof
03/07/2007CN1303114C Cross-linking monomer using for photoresist and process for producing photoresist polymer using the same
03/07/2007CN1302931C Method of manufacturing monolithic inkjet printhead
03/06/2007US7187503 Refractive projection objective for immersion lithography
03/06/2007US7187433 Electrostatic clamp assembly for a lithographic apparatus
03/06/2007US7187432 Holding system, exposure apparatus, and device manufacturing method
03/06/2007US7187430 Advanced illumination system for use in microlithography
03/06/2007US7187399 Exposure head with spatial light modulator
03/06/2007US7187106 Positioning mechanism, exposure apparatus and device manufacturing method
03/06/2007US7186983 Illumination system particularly for microlithography
03/06/2007US7186773 Process for preparing fluorine-containing norbornene derivative
03/06/2007US7186498 Alkaline developer for radiation sensitive compositions
03/06/2007US7186497 Developer composition for lithographic printing plate
03/06/2007US7186496 Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same
03/06/2007US7186495 (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
03/06/2007US7186488 Semiconductor device manufacturing method and semiconductor device manufacturing system
03/06/2007US7186486 Method to pattern a substrate
03/06/2007US7186485 Inspection method and a photomask
03/06/2007US7186484 Method for determining the relative positional accuracy of two structure elements on a wafer
03/06/2007US7186483 Method of determining alignment of a template and a substrate having a liquid disposed therebetween
03/06/2007US7186482 Multilayer imageable elements
03/06/2007US7186481 Flare measuring mask and flare measuring method of semiconductor aligner
03/06/2007US7186350 Providing a substrate with an alignment mark;forming a color resist layer over the substrate and the alignment mark;injecting a solvent to contact the color resist over the alignment mark and dissolve the color resist; removal of the dissolved color resist by vacuum suction to expose alignment mark
03/06/2007US7186285 Chemical filter arrangement for a semiconductor manufacturing apparatus
03/06/2007US7185992 Lens holding technique
03/01/2007WO2007023908A1 Film-forming material and method of forming pattern
03/01/2007WO2007023813A1 Exposure apparatus, exposure method, and device manufacturing method
03/01/2007WO2007023710A1 Lithographic coated-type underlayer film forming composition containing vinylnaphthalene resin derivative
03/01/2007WO2007023665A1 Projection optical system, exposure apparatus and device manufacturing method
03/01/2007WO2007023648A1 Substrate heating device, coating/development device, and method for heating substrate
03/01/2007WO2007023336A2 Method of developing lithographic printing plate precursors
03/01/2007WO2007022922A2 Replacement device for an optical element
03/01/2007WO2007006844A3 A method of building a sensor structure
03/01/2007WO2006135546A3 Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an euv light source
03/01/2007WO2006133884A3 Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element
03/01/2007WO2006055045A3 Edge cure prevention process
03/01/2007WO2004090634A3 Environmental system including vaccum scavange for an immersion lithography apparatus
03/01/2007US20070048678 System and method for photolithography in semiconductor manufacturing
03/01/2007US20070048677 Exposure method for making separator
03/01/2007US20070048675 Photoresist layer is formed on the substrate; photoresist layer is exposed and developed to form pattern; polymer-containing layer is formed; photoresist pattern and the polymer-containing layer are thermally treated so that polymer is diffused into the photoresist pattern
03/01/2007US20070048674 for use in integrated circuits; conventional photolithography steps can be used in combination with pitch-reduction techniques to form superimposed patterns of crossing elongate features with pillars at the intersections; reduction in size of integrated circuits
03/01/2007US20070048669 Method of forming the photo resist feature
03/01/2007US20070048668 Wafer edge patterning in semiconductor structure fabrication
03/01/2007US20070048667 Printing plate, method of fabricating the same, and method of fabricating flat panel display using the same
03/01/2007US20070048661 Infrared-sensitive planographic printing plate precursor
03/01/2007US20070048632 Photomask and method for exposing chip pattern
03/01/2007US20070048436 Mask for LITI and LITI method using the same
03/01/2007US20070047876 Device consisting of at least one optical element
03/01/2007US20070047069 8-Mirror microlithography projection objective
03/01/2007US20070046919 Lithographic apparatus and device manufacturing method
03/01/2007US20070046915 Lithographic apparatus and device manufacturing method
03/01/2007US20070046912 Interferometric measuring device and projection exposure installation comprising such measuring device
03/01/2007US20070045606 Shaping a phase change layer in a phase change memory cell
03/01/2007DE202005016654U1 Vorrichtung zur Überwachung der Relativposition mehrerer Einrichtungen Apparatus for monitoring the relative position of multiple devices
03/01/2007DE112005000963T5 Vorrichtung und Verfahren zum Bestimmen eines Beleuchtungsintensitätsprofils einer Beleuchtungseinrichtung für ein Lithographiesystem Apparatus and method for determining an illumination intensity profile of a lighting device for a lithography system
03/01/2007DE10352639B4 Verfahren zur dynamischen Kontrolle eines Reticles A method for dynamic control of a reticle
03/01/2007DE10293414B4 Lithograph mit bewegtem Zylinderlinsensystem Lithograph with a moving cylindrical lens system
03/01/2007DE10208754B4 Polymermaterial mit niedriger Glastemperatur für die Anwendung in chemisch verstärkten Fotoresists für die Halbleiterfertigung Polymer material having a low glass transition temperature for use in chemically amplified resists for semiconductor fabrication
03/01/2007DE102006042634A1 Method of increasing transmission of an optical element applies dummy radiation until a temporarily reduced transmission increases again and applies dummy radiation again until there is no linear increase
03/01/2007DE102005041559A1 Layer assembly production apparatus for three-dimensional articles, has exposure unit arranged to expose selected part of formed fluid layer or resin layer on target surface using UV rays in linear exposure process
03/01/2007DE102005041311A1 Automatic detection of exposed substrates with defocused exposure areas during semiconductor manufacture, involves determining current focus status of exposed substrates based on current and statistical values relative to focus parameter
03/01/2007DE102005041245A1 Mask for producing stereoscopic images, has lamellar, non-transparent shadowing areas arranged parallel to optical active areas in such manner that optical active areas are limited at longitudinal sides by shadowing areas
03/01/2007DE102004031111B4 Verfahren zum Herstellen sublithografischer Gate-Strukturen eines Feldeffekttransistoren A method for producing sublithographic gate structures of field effect transistors
03/01/2007DE10116059B4 Lithograph mit bewegter Linse und Verfahren zum Herstellen digitaler Hologramme in einem Speichermedium Lithograph by moving lens and method for producing digital holograms in a storage medium
02/2007
02/28/2007EP1757990A1 Resin composition for forming fine pattern and method for forming fine pattern
02/28/2007EP1757989A1 Water-soluble resin composition and method of forming pattern therewith
02/28/2007EP1757988A1 Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same
02/28/2007EP1757987A1 Antireflective film-forming composition containing vinyl ether compound
02/28/2007EP1757986A1 Antireflection film for semiconductor containing condensation type polymer
02/28/2007EP1757985A1 Antireflective film containing sulfur atom
02/28/2007EP1757984A1 Photosensitive lithographic printing plate
02/28/2007EP1757983A1 Resist composition, method for forming resist pattern, semiconductor device and method for manufacturing thereof
02/28/2007EP1757982A1 Negative photosensitive composition and negative photosensitive lithography plate
02/28/2007EP1757981A1 Photopolymer printing plate precursor
02/28/2007EP1757980A1 Radiation sensitive resin composition
02/28/2007EP1757979A1 Rapid prototyping resin compositions
02/28/2007EP1757633A1 Accelerators useful for energy polymerizable compositions
02/28/2007EP1757628A1 Lactone copolymer and radiation-sensitive resin composition
02/28/2007EP1757175A1 Method and apparatus for accurately applying structures to a substrate
02/28/2007EP1756816A1 Holographic storage medium with thermally crosslinked polysiloxane binder
02/28/2007EP1756673A1 Developer for a photopolymer protective layer
02/28/2007EP1756672A2 Vacuum system for immersion photolithography
02/28/2007EP1756671A1 Method for enabling transmission of substantially equal amounts of energy
02/28/2007EP1756670A1 Method of making a photopolymer sleeve blank having an integral cushion layer for flexographic printing
02/28/2007EP1756669A2 Imprinting lithography using the liquid/solid transition of metals and their alloys
02/28/2007EP1756191A1 Derivatized polyhydroxystyrenes with a novolak type structure and processes for preparing the same
02/28/2007EP1550677B1 Composition for holography, method of curing the same, and cured article
02/28/2007EP1404797B1 Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility
02/28/2007EP1393127A4 Backside alignment system and method
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