Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2007
03/13/2007US7189015 Method for replenishing development replenisher in automatic developing machine for photosensitive lithographic printing plate precursor
03/13/2007US7189002 Hydrostatic gas bearing, hydrostatic gas bearing device for use in vacuum environment, and gas recovering method for hydrostatic gas bearing device
03/13/2007CA2211628C Liquid, radiation-curable composition, especially for stereolithography
03/13/2007CA2177650C Method for optimized utilization of base material in the manufacture of optoelectronic components with variable-period gratings
03/08/2007WO2007026816A1 Exposure apparatus, method and process for producing device
03/08/2007WO2007026652A1 Film-forming composition, method for pattern formation, and three-dimensional mold
03/08/2007WO2007026629A1 Photosensitive resin composition, spacer, color filter, and liquid crystal display device
03/08/2007WO2007026599A1 Photosensitive colored composition, color filter substrate, and semitransmission-type liquid crystal display device
03/08/2007WO2007026573A1 Solution for immersion exposure and immersion exposure method
03/08/2007WO2007026528A1 Developing solution and treatment method for photosensitive lithographic printing plate
03/08/2007WO2007026523A1 Printing plate material and process for producing printing plate
03/08/2007WO2007026520A1 Radiation-sensitive resin composition and process for producing plating shaped item
03/08/2007WO2007026491A1 Original plate for lithography, and resin composition for photosensitive layer in original plate for lithography
03/08/2007WO2007026475A1 Photosensitive resin composition and photosensitive element
03/08/2007WO2007026390A1 Scanning exposure apparatus
03/08/2007WO2007025783A2 Microlithographic projection lighting system
03/08/2007WO2007025675A1 Aqueous solution and method for removing ionic contaminants from the surface of a workpiece
03/08/2007WO2007025643A1 High-na projection objective with aspheric lens surfaces
03/08/2007WO2006136352A3 Lens featuring determination of the relative position of optical elements
03/08/2007WO2006135808A9 Methods for reclaiming developing solvents
03/08/2007WO2006133907A3 Passive reticle tool, lithographic apparatus and method of patterning a device
03/08/2007WO2006100013A3 Method for producing three-dimensional fine structures
03/08/2007WO2005120834A3 Fluid dispensing and drop-on-demand dispensing for nano-scale manufacturing
03/08/2007WO2005119395A3 Method and system to control movement of a body for nano-scale manufacturing
03/08/2007WO2004081663A3 Novel photosensitive resin compositions
03/08/2007US20070054497 Method for preventing contamination and lithographic device
03/08/2007US20070054218 Radiation curable resin composition for making colored three dimensional objects
03/08/2007US20070054214 Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions
03/08/2007US20070054196 Depositing a thin Cr, Ta, or W film as an absorber layer on a Si substrate covered with a multi-layered thin film and capping layer; applying electric field between cantilever tip and multi-layered structure using an atomic force microscope to form oxide structures with fixed height and width; etching
03/08/2007US20070054195 Optical recording medium, method of producing the same, and, optical recording method and optical reproducing method
03/08/2007US20070053090 Using isotopically specified fluids as optical elements
03/08/2007US20070053076 Diaphragm changing device
03/08/2007US20070053033 Exposure apparatus
03/08/2007US20070052948 Test pattern, inspection method, and device manufacturing method
03/08/2007US20070052945 Method and apparatus for protecting a reticle used in chip production from contamination
03/08/2007US20070052944 Lithographic apparatus and device manufacturing method
03/08/2007US20070052942 Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method
03/08/2007US20070052941 Exposure apparatus and device manufacturing method
03/08/2007US20070052936 Method and device for irradiating spots on a layer
03/08/2007US20070052301 Apparatus for manipulation of an optical element
03/08/2007US20070051262 System for thermal development of flexographic printing plates
03/08/2007DE19800633B4 Verfahren und Vorrichtung unter Verwendung eines ArF Photoresists Method and apparatus using an ArF photoresists
03/08/2007DE10230532B4 Verfahren zum Bestimmen des Aufbaus einer Maske zum Mikrostrukturieren von Halbleitersubstraten mittels Fotolithographie A method for determining the structure of a mask for micro-patterning of semiconductor substrates by means of photolithography,
03/08/2007DE102006040280A1 Überlagerungstarget für Lithografie mit polarisiertem Licht Overlay target for lithography with polarized light
03/08/2007DE102005042496A1 Verfahren zur Korrektur der Apodisierung in mikroskopischen Abbildungssystemen A method of correcting the apodization in microscopic imaging systems
03/08/2007DE102005041938A1 Mikrolithographische Projektionsbelichtungsanlage Microlithographic projection exposure apparatus
03/08/2007DE102004009095B4 Verfahren zum Bestimmen der Überlagerungsgenauigkeit einer Maskenstruktur auf einer Halbleiterschicht anhand von Justiermarken A method for determining the overlay accuracy of a mask pattern on a semiconductor layer based on alignment marks
03/08/2007DE10056645B4 Verfahren zur Herstellung von rißfreien, planaren Gruppe-III-N,Gruppe III-VN und Metall-Stickstoff Bauelementestrukturen auf Si-Substraten mittels epitaktischer Methoden A process for preparing crack-free, planar Group III-N, group III-VN, and metal-nitrogen device structures on Si substrates by means of epitaxial methods
03/08/2007CA2620655A1 Original plate for lithography, and resin composition for photosensitive layer in original plate for lithography
03/07/2007EP1760766A2 Antireflective film and exposure method
03/07/2007EP1760598A2 Communication control apparatus, communication control method, exposure apparatus, and device manufacturing method
03/07/2007EP1760531A1 Lithographic method
03/07/2007EP1760530A1 Lithographic apparatus and device manufacturing method
03/07/2007EP1760529A1 Position measurement system and lithographic apparatus
03/07/2007EP1760528A2 Optical element, exposure apparatus based on the use of the same, exposure method, and method for producing microdevice
03/07/2007EP1760527A1 Photochemical method for manufacturing nanometrically surface-decorated substrates
03/07/2007EP1760526A1 Mold, imprint method, and process for producing chip
03/07/2007EP1760525A1 Device manufacturing method, mask and device
03/07/2007EP1760519A2 High quality and ultra large screen liquid crystal display device and production method thereof
03/07/2007EP1760518A2 High quality and ultra large screen liquid crystal display device and production method thereof
03/07/2007EP1760496A1 An optical medium, an optical lens and a prism
03/07/2007EP1759837A2 Infrared-sensitive planographic printing plate precursor
03/07/2007EP1759248A1 Projection system with compensation of intensity variatons and compensation element therefor
03/07/2007EP1759247A2 Method for the electrostatic structuring of a substrate surface and raster probe lithography method
03/07/2007EP1759246A2 Photopolymerisable composition
03/07/2007EP1759245A1 Modified metal mold for use in imprinting processes
03/07/2007EP1759244A2 Photosensitive resin composition, and cured product and use thereof
03/07/2007EP1652009B1 Method for producing patterns with inclined sidewalls by photolithography
03/07/2007EP1512048B1 Method for fabricating nanoscale patterns in light curable compositions using an electric field
03/07/2007EP1181848B1 Ultraviolet curable silver composition and related method
03/07/2007CN1926677A Multi-layer overlay measurement and correction technique for ic manufacturing
03/07/2007CN1926663A Method for separating resist film and rework process
03/07/2007CN1926662A Coater/developer and coating/developing method
03/07/2007CN1926474A Method for ascertaining radiation power and exposure equipment
03/07/2007CN1926473A Inorganic paste composition, method for preparing inorganic paste composition, and sheet-shaped unbaked body for producing display panel
03/07/2007CN1926472A Method for providing a thin film having a chemical composition that is spatially structured on a micrometric or nanometric scale on a substrate
03/07/2007CN1926471A Photosensitive structure for flexographic printing and process for producing the same
03/07/2007CN1926457A Photocurable resin composition for forming optical waveguide, photocurable dry film for forming optical waveguide, and optical waveguide
03/07/2007CN1926174A Active energy line cured resin, optical solidified and thermosetting resin composition containing said resin and its condensate
03/07/2007CN1925125A Substrate conveyer, substrate conveying method and coating, developing apparatus
03/07/2007CN1924712A Two-sets location switching system
03/07/2007CN1924711A Method for producing absolute zero-position alignment marks by semi-reflective zero-position grating
03/07/2007CN1924710A Optical resist clearing agent composition for wiping improved optical resist of semiconductor device
03/07/2007CN1924709A Heating apparatus, and coating and developing apparatus
03/07/2007CN1924708A Position measurement system and lithographic apparatus
03/07/2007CN1924707A Space scanning based alignment signals sampling synchronous control method
03/07/2007CN1924706A Method for photolithography in semiconductor manufacturing
03/07/2007CN1924705A Method for manufacturing printing plate
03/07/2007CN1924704A Apparatus and method of forming an applied film
03/07/2007CN1924703A Lithographic printing plate precursor, lithographic printing method, and novel cyanine dye
03/07/2007CN1924702A Pattern forming method and method for manufacturing a semiconductor device
03/07/2007CN1924701A Method for forming photoinduced resist pattern
03/07/2007CN1924700A Etching technology for reducing mask flaws
03/07/2007CN1924699A Infrared-sensitive planographic printing plate precursor
03/07/2007CN1924676A Display panel and method of manufacturing the same
03/07/2007CN1924640A Method for manufacturing spectacles leg used spring mandrel body
03/07/2007CN1924628A Micro-lens and method for manufacturing the same
03/07/2007CN1924382A Method for manufacturing dynamic pressure bearing
03/07/2007CN1923532A Printing plate, method of fabricating the same, and method of fabricating flat panel display using the same
03/07/2007CN1303649C Exposure device, exposure method and element making method
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