Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2007
03/15/2007US20070059642 Method for thermal development of a photosensitive element using a development medium having a support
03/15/2007US20070059633 Dissolving a pi complex of tetramethylcyclopentadienyl 2,2'-bipyridin-1,1'-diyl iridium hydride in a solvent; irrradiating with a laser beam to deprotonate and produce an acidicsolution; chemically-amplified photoresists; color filters for liquid rystal; photography/printing; solubility; efficiency
03/15/2007US20070059632 Method of manufacturing a semiconductor device
03/15/2007US20070059522 Adhesive film functionalizing color compensation and near infrared ray (NIR) blocking and plasma display panel filter using the same
03/15/2007US20070059497 Reversal imprint technique
03/15/2007US20070058274 Illumination system for microlithography
03/15/2007US20070058244 Oblique mirror-type normal-incidence collector system for light sources, particularly euv plasma discharge sources
03/15/2007US20070058147 Apparatus for and method of processing substrate subjected to exposure process
03/15/2007US20070058146 Exposure apparatus, exposure method, position control method, and method for producing device
03/15/2007US20070058145 Lithographic apparatus, programmable patterning structure, device manufacturing method, and device manufactured thereby
03/15/2007US20070057245 Artificial band gap
03/15/2007US20070057201 Lithographic apparatus and device manufacturing method
03/15/2007US20070056513 System for situ photoresist thickness characterizaton
03/15/2007DE10327500B4 Verfahren zur Herstellung von Elektrodenstrukturen sowie Elektrodenstruktur und deren Verwendung A process for the production of electrode structures and electrode structure and the use thereof
03/15/2007DE102006043251A1 Microlithography tool for fabrication of e.g. semiconductor chip, has projection objective with mirrors arranged to direct radiation reflected from reticle, positioned at object plane, to substrate positioned at image plane
03/15/2007DE102006040275A1 Ausrichtmarken für Lithografie mit polarisiertem Licht und Verfahren zur Verwendung derselben Alignment marks for lithography with polarized light and method of using same
03/15/2007DE102006038294A1 Holder for optical unit e.g. lens, has holder unit, where optical unit is connected with holder unit by thin-walled tubular unit that has specified wall thickness, and optical and tubular units have different thermal expansion coefficients
03/15/2007DE102005028212B3 Simulation method for simulation of optical projection of sample in photosensitive resist, involves alleging of record and absorption coefficient for execution of optical projection and weakening of intensities respectively
03/14/2007EP1762898A2 Lithographic apparatus and device manufacturing method
03/14/2007EP1762897A1 Lithographic apparatus and device manufacturing method
03/14/2007EP1762896A2 Method of producing photosensitive planographic printing plate
03/14/2007EP1762895A1 Antireflective Hard Mask Compositions
03/14/2007EP1762894A1 Photopolymerizable photosensitive lithographic printing plate
03/14/2007EP1762893A1 Mold, imprint apparatus, and process for producing structure
03/14/2007EP1762382A1 Image exposure control apparatus in multicolor printing press
03/14/2007EP1761963A1 Imaging system for thermal transfer
03/14/2007EP1761824A2 Immersion photolithography system
03/14/2007EP1761823A1 Method of forming plated product using negative photoresist composition and photosensitive composition used therein
03/14/2007EP1761822A2 A dynamic fluid control system for immersion lithography
03/14/2007EP1761457A1 Imprinting of supported and free-standing 3-d micro-or nano-structures
03/14/2007EP1644778B1 Method for evaluating recorded images of wafers
03/14/2007EP1518262A4 Reflection mirror apparatus, exposure apparatus and device manufacturing method
03/14/2007EP1163552B2 Method of forming a masking pattern on a surface
03/14/2007CN1930526A Method for preparing polymer projection structure
03/14/2007CN1930525A Stable high pH developer
03/14/2007CN1930524A Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof
03/14/2007CN1930523A Positive resist composition for immersion exposure and method for forming resist pattern
03/14/2007CN1930522A Positive light-sensitive resin composition, relief pattern using the same, and solid imaging element
03/14/2007CN1930521A Photomask substrate made of synthetic quartz glass and photomask
03/14/2007CN1930194A Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer
03/14/2007CN1929096A 等离子体灰化方法 Plasma ashing method
03/14/2007CN1928994A Mask forming method and information recording medium manufacturing method
03/14/2007CN1928725A Cleaning agent and flushing agent for photolithography
03/14/2007CN1928724A Photoresistance developer
03/14/2007CN1928723A Substrate processing system and method, certification program and computer-readable recording medium
03/14/2007CN1928722A Testing mark for detecting projection object lens image errors, mask and detection method
03/14/2007CN1928721A Moving phase grating mark and method for utilizing same in detecting image forming quality of photoetching machine
03/14/2007CN1928720A Photoresist liquid feeding device and modified set using same
03/14/2007CN1928719A Application of polymers with polycyclic lipid structural unit in deep ultraviolet light-sensitive lacquer
03/14/2007CN1928718A Photoresist composition for forming light-proof pattern of plasma display device
03/14/2007CN1928717A Photolithographic glue solution preparation method and photolithographic glue film using same
03/14/2007CN1928716A 感光性组合物 The photosensitive composition
03/14/2007CN1928715A 感光性组合物 The photosensitive composition
03/14/2007CN1928714A 黑色感光性树脂组合物 Black photosensitive resin composition
03/14/2007CN1928713A 感光组合物以及黑色矩阵 The photosensitive composition and black matrix
03/14/2007CN1928712A Mould for use in production structure, marking device and process thereof
03/14/2007CN1928711A Mold, imprint method, and process for producing chip
03/14/2007CN1928677A Transflective liquid crystal display device and method of fabricating the same
03/14/2007CN1927944A Resin composition, cured composition and printed circuit board using same
03/14/2007CN1305112C Method for fabricating semiconductor device
03/14/2007CN1305111C Non-lithographic printing method for producing self-alignment mask, produced products and compsns, for such products
03/14/2007CN1304904C Method of using an amorphous carbon layer for reticle fabrication
03/14/2007CN1304903C Photoetching programming system
03/14/2007CN1304896C Fabrication method of thin film transistor liquid crystal display panel
03/13/2007US7190824 Overlay vernier pattern for measuring multi-layer overlay alignment accuracy and method for measuring the same
03/13/2007US7190823 Overlay vernier pattern for measuring multi-layer overlay alignment accuracy and method for measuring the same
03/13/2007US7190760 Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus
03/13/2007US7190708 Annealed copper alloy electrodes for fluorine containing gas discharge lasers
03/13/2007US7190707 Gas discharge laser light source beam delivery unit
03/13/2007US7190530 Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
03/13/2007US7190527 Refractive projection objective
03/13/2007US7190456 Alignment method, alignment apparatus, exposure apparatus using the same, and device manufactured by using the same
03/13/2007US7190443 Reticle and optical characteristic measuring method
03/13/2007US7190438 Near-field exposure apparatus and near-field exposure photomask
03/13/2007US7190436 Illumination apparatus and exposure apparatus
03/13/2007US7190435 Pattern writing apparatus and pattern writing method
03/13/2007US7190434 Lithographic apparatus and device manufacturing method
03/13/2007US7190433 Apparatus and method of exposing a semiconductor device having a curved surface to light
03/13/2007US7190419 Liquid crystal display device and method of fabricating the same
03/13/2007US7190387 Systems for fabricating optical microstructures using a cylindrical platform and a rastered radiation beam
03/13/2007US7189974 EUV light spectrum measuring apparatus and calculating method of EUV light intensity
03/13/2007US7189783 Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof
03/13/2007US7189600 Methods for fabricating stiffeners for flexible substrates
03/13/2007US7189499 Reducing the spacing between adjacent photoresist patterns, by heating to shrink the overcoatings, control pattern dimensions; semiconductors, photolithographic
03/13/2007US7189498 Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process
03/13/2007US7189496 Method for the manufacture of an active matrix, corresponding electro-optical display devices and mask
03/13/2007US7189495 Method of forming photoresist pattern free from side-lobe phenomenon
03/13/2007US7189494 On-press developable imageable element comprising a tetraarylborate salt
03/13/2007US7189493 chemically amplified, suitable as a micropatterning material; high alkaline dissolution-rate contrast before and after exposure, high sensitivity, high resolution, reduced line edge roughness, and an improved etch resistance on exposure to a high energy beam
03/13/2007US7189492 has a wide exposure margin and little density dependency; low in the generation of pattern collapse in the formation of a fine pattern
03/13/2007US7189491 Photoresist composition for deep UV and process thereof
03/13/2007US7189490 Photoresists containing sulfonamide component
03/13/2007US7189489 Oxime ester photoiniators having a combined structure
03/13/2007US7189488 Can be used for positive-type photosensitive material with excellent developing and other properties, and which can be suitable used for interlayer insulating film in various electric and electronic devices, in particular, semiconductor
03/13/2007US7189480 Mask used for layer formation and process of making the mask
03/13/2007US7189479 Phototool coating
03/13/2007US7189446 Curved honeycomb article, EUV apparatus having a curved honeycomb article, and method of making a curved honeycomb article
03/13/2007US7189435 Three dimensional multilayer nanostructure
03/13/2007US7189434 Semiconductor coating equiptment filling pipes for filling bottles with solenoid valves for photoresists
03/13/2007US7189305 Gas-assist systems for applying and moving ozonated resist stripper to resist-bearing surfaces of substrates
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