Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2007
03/21/2007CN1932647A Stepped scanning photoetching machine vibration isolation system analoy experimental apparatus
03/21/2007CN1932646A 曝光装置 Exposure device
03/21/2007CN1932645A Method for fabricating semiconductor device including resist flow process and film coating process
03/21/2007CN1932644A Method for producing sensitized dye and photosensitive composition given by using the same
03/21/2007CN1932643A Photocuring composition and plasma display panel produced by using the same
03/21/2007CN1932622A Transflective liquid crystal display device and method of fabricating the same
03/21/2007CN1932595A Liquid crystal display device and method for manufacturing the same
03/21/2007CN1931858A Monomer and polymer for photoresist having spirocyclic ketal group, and photoresist composition containing the polymer
03/21/2007CN1306583C Substrate protecting device and exposure device therewith
03/21/2007CN1306568C Terminal testing method and device
03/21/2007CN1306353C Enhanced FIELDBVS device alevts in process control system
03/21/2007CN1306341C Digital photoetching system and method on object
03/21/2007CN1306340C Photoresist composition and method for forming photoresist image
03/21/2007CN1306339C Method for mfg. sensibilization pigment and photosensitive composition therewith
03/21/2007CN1306338C Photosensitive composition, cured article thereof, and printed circuit board using same
03/21/2007CN1306337C Positively photosensitive resin composition
03/21/2007CN1306336C Photoresist composite and pattern forming process with it
03/21/2007CN1306241C System and method of using a side-mounted interferometer to acquire position information
03/21/2007CN1305911C A new class of amine coinitiators in photoinitiated polymerizations
03/21/2007CN1305586C Base board coating device and base board coating method
03/21/2007CN1305546C Chemical liquid supplying device and method for venting air
03/20/2007US7194332 Data based node penalties
03/20/2007US7193956 Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object
03/20/2007US7193829 Combination current sensor and relay
03/20/2007US7193794 Adjustment arrangement of an optical element
03/20/2007US7193723 Positioning apparatus and photolithography apparatus including the same
03/20/2007US7193722 Lithographic apparatus with disturbance correction system and device manufacturing method
03/20/2007US7193715 Measurement of overlay using diffraction gratings when overlay exceeds the grating period
03/20/2007US7193713 Method and apparatus for measuring optical characteristic, and projection exposure apparatus using the same
03/20/2007US7193685 Exposure apparatus
03/20/2007US7193684 Pattern mask and exposure for photoresists for patterns and reflection
03/20/2007US7193682 Exposure apparatus and device manufacturing method
03/20/2007US7193681 Lithographic apparatus and device manufacturing method
03/20/2007US7193493 Alignment apparatus, exposure apparatus, and device manufacturing method
03/20/2007US7193339 Positioning apparatus and charged-particle-beam exposure apparatus
03/20/2007US7193232 Lithographic apparatus and device manufacturing method with substrate measurement not through liquid
03/20/2007US7193231 Alignment tool, a lithographic apparatus, an alignment method, a device manufacturing method and device manufactured thereby
03/20/2007US7193228 EUV light source optical elements
03/20/2007US7193023 Acrylic ester copolymers having a nonfluorinated monomer with an acetal or ketal linkage, and a second monomer containing a pendant fluorinated hydroxyalkyl or sulfonamide group; photolithography; chemical amplification photoresists
03/20/2007US7192693 Methods for photopatterning hydrogels
03/20/2007US7192692 Methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers
03/20/2007US7192691 high workability with good dot reproduction and stain recovery capability; printed matters having good dot quality
03/20/2007US7192690 Imagewise exposure to ultraviolet radiation using a digital mirror device, removing an image formation layer having an arene-iron or tribromoacetyl polymerization initiator, an acrylic monomer and diazo resin at non-exposed portions with an basic solution; high chemical resistance and printing durability
03/20/2007US7192689 suitable for laser exposure, provides good small dot reproduction, high printing durability and wide water tolerance; electrolytically surface-roughening an aluminum plate in hydrochloric acid solution, employing a sinewave alternating current, and then anodizing it
03/20/2007US7192688 Polybutadiene (meth)acrylate composition and method
03/20/2007US7192687 Positive resist composition and method of forming resist pattern using same
03/20/2007US7192686 flexibility in acid strength and polarity through changes in chemical structure; strong and large superacid
03/20/2007US7192685 Capable of forming a high-resolution pattern with a vacuum ultraviolet light; for use in microlithography
03/20/2007US7192684 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process
03/20/2007US7192683 Planographic printing plate precursor
03/20/2007US7192682 Radiation transparent photoresist
03/20/2007US7192681 For use in production of semiconductor devices
03/20/2007US7192680 Method of coating a multilayered element
03/20/2007US7192529 Plurality of protrusions of different heights; protrusions of larger height having a stack structure formed of layers of at least two types of materials, allowing transfer of a number of patterns at the same time.
03/20/2007US7192489 Method for polymer residue removal following metal etching
03/20/2007US7191785 Substrate processing apparatus for resist film removal
03/20/2007US7191599 Cooling apparatus and method, and exposure apparatus having the cooling apparatus
03/20/2007CA2338635C Colour changing composition and colouring polymeric articles made therefrom
03/15/2007WO2007030593A1 Negative photoresist for silicon koh etch without silicon nitride
03/15/2007WO2007030495A1 Methods for fabricating sub-resolution line space patterns
03/15/2007WO2007029871A1 Radiation-sensitive resin composition and color filters
03/15/2007WO2007029852A1 Pattern exposure method and pattern exposure apparatus
03/15/2007WO2007029829A1 Exposure apparatus, exposure method, and device production method
03/15/2007WO2007029828A1 Analysis method, exposure method, and method for manufacturing device
03/15/2007WO2007029822A1 Material for protective film formation, and method for photoresist pattern formation using the same
03/15/2007WO2007029810A1 Process for producing 3-dimensional mold, process for producing microfabrication product, process for producing micropattern molding, 3-dimensional mold, microfabrication product, micropattern molding and optical device
03/15/2007WO2007029767A1 Washing agent for photolithography and method of forming photoresist pattern using the same
03/15/2007WO2007029765A1 Material for protective film formation and method for photoresist pattern formation using the same
03/15/2007WO2007029701A1 Resist composition and method of resist pattern formation
03/15/2007WO2007029614A1 Positive photosensitive resin composition
03/15/2007WO2007029561A1 Aligner
03/15/2007WO2007029542A1 Film forming composition for nanoimprinting and method for pattern formation
03/15/2007WO2007029483A1 Photosensitive composition for volume hologram recording
03/15/2007WO2007029462A1 Polymer, negative resist composition, and method of forming resist pattern
03/15/2007WO2007029442A1 Adamantane derivative and process for producing the same
03/15/2007WO2007029315A1 Pattern transfer mask, focus error measurement method and apparatus, and method of fabricating semiconductor device
03/15/2007WO2007029303A1 One-to-one x-ray exposure method and one-to-one x-ray exposure apparatus
03/15/2007WO2007029177A1 Lithographic method
03/15/2007WO2007029176A1 Lithographic method
03/15/2007WO2007028793A1 Illuminator for a photolithography device
03/15/2007WO2007028553A1 Method for determining intensity distribution in the focal plane of a projection exposure arrangement
03/15/2007WO2007028294A1 A developer solution for photoresist
03/15/2007WO2006135230A3 Lithographic apparatus and cleaning method therefor
03/15/2007WO2006125790A3 Imaging systems in particular for a microlithographic projection illumination unit
03/15/2007WO2006067730A3 Device and method for holding a substrate
03/15/2007WO2006008073A3 Lithographic printing plates with high print run stability
03/15/2007WO2005077135A3 Method and appartus for high speed thickness mapping of patterned thin films
03/15/2007US20070061609 Holding system, exposure apparatus, and device manufacturing method
03/15/2007US20070061035 Method and computer-readable medium for in situ photoresist thickness characterization
03/15/2007US20070060729 Photosensitive resin composition and dry film resist using the same
03/15/2007US20070060682 Actinic radiation-curable stereolithographic resin composition having improved stability
03/15/2007US20070060664 Modified pigment products and black matrixes comprising same
03/15/2007US20070060490 Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors
03/15/2007US20070059651 Photolithography microelectronic fabrication; minimizing precipitation of developing reactant; involves rinsing polymer layer with an additional charge of developer fluid to minimize a sudden change in pH; and then rinsing said polymer layer with a rinse fluid of different chemistry than developer
03/15/2007US20070059650 Developing solution for photosensitive composition and method for forming patterned resist film
03/15/2007US20070059648 Method for forming a capacitor
03/15/2007US20070059647 Capacitor for a semiconductor device
03/15/2007US20070059645 Methods for fabricating nanoscale electrodes and uses thereof
03/15/2007US20070059644 Micropattern formation material and method of micropattern formation
03/15/2007US20070059643 Method of producing photosensitive planographic printing plate
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