| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/22/2007 | WO2007032370A1 Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program |
| 03/22/2007 | WO2007032369A1 Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program |
| 03/22/2007 | WO2007032326A1 Photosensitive resin composition and cured object obtained therefrom |
| 03/22/2007 | WO2007032323A1 Photosensitive lithographic printing plate material |
| 03/22/2007 | WO2007032246A1 Material for pattern formation, apparatus for pattern formation, and method for pattern formation |
| 03/22/2007 | WO2007032215A1 Photosensitive composition, pattern-forming material, photosensitive laminate, apparatus for formation of pattern, and method for formation of pattern |
| 03/22/2007 | WO2007032195A1 Pattern forming material, pattern forming apparatus and pattern forming process |
| 03/22/2007 | WO2007032181A1 Negative resist composition and method of resist pattern formation |
| 03/22/2007 | WO2007032144A1 Colored composition and photosensitive transfer material |
| 03/22/2007 | WO2007031842A1 Process for the manufacture of printing support for rollers for the printing of laminar materials, machine for implementing the process and the printing support for printing rollers |
| 03/22/2007 | WO2007031630A1 Equipment and method for monitoring an immersion lithography device |
| 03/22/2007 | WO2007031544A1 Optical system of a microlithographic exposure system |
| 03/22/2007 | WO2007031505A1 Photocurable compositions for preparing abs-like articles |
| 03/22/2007 | WO2007031413A2 Optical element unit for exposure processes |
| 03/22/2007 | WO2007031412A1 Optical element unit |
| 03/22/2007 | WO2007031271A1 Microlithography projection optical system, method for manufacturing a device and method to design an optical surface |
| 03/22/2007 | WO2007031205A2 Stamp comprising a nanostamping structure, device and method for the production thereof |
| 03/22/2007 | WO2007031182A1 Microlithographic projection exposure apparatus and method for setting an optical imaging property thereof |
| 03/22/2007 | WO2007031105A1 Alignment method with compensation of non linear errors |
| 03/22/2007 | WO2007007176A3 Photoresist composition for imaging thick films |
| 03/22/2007 | WO2006117642B1 Lithographic method for maskless pattern transfer onto a photosensitive substrate |
| 03/22/2007 | WO2006088643A3 System and method for absorbance modulation lithography |
| 03/22/2007 | WO2006056730A3 Protection of surfaces exposed to charged particles |
| 03/22/2007 | WO2006024373A3 Device for producing molded bodies |
| 03/22/2007 | WO2005104311A3 Duv light source optical element improvements |
| 03/22/2007 | US20070067064 Surface level control systems and material recycling systems for use with programmable material consolidation apparatus |
| 03/22/2007 | US20070066775 Vinyl addition polycylic olefin polymers prepared using non-olefinic chain transfer agents and uses thereof |
| 03/22/2007 | US20070066699 photocurable polyisobutene or polyoxypropylene glycol endcapped with epoxy group-containing silicon compound or copolymerized with polysiloxanes; excellent curability by irradiation of a light energy source within a short time, no need moisture and heating; as adhesive, sealant; storage stability |
| 03/22/2007 | US20070065760 Substrate processing apparatus and substrate processing method |
| 03/22/2007 | US20070065751 Water-soluble photopolymer composition for flexographic printing and water-soluble photosensitive original printing plate for flexographic printing |
| 03/22/2007 | US20070065748 Resin for photoresist composition, photoresist composition and method for forming resist pattern |
| 03/22/2007 | US20070065734 Exposure method, exposure mask, and exposure apparatus |
| 03/22/2007 | US20070065731 Photomask, method for fabricating photomask, and method for fabricating semiconductor device |
| 03/22/2007 | US20070065730 Photomask and pattern formation method and mask data generation method using the same |
| 03/22/2007 | US20070065667 Photocuring composition and plasma display panel produced by using the same |
| 03/22/2007 | US20070065575 Method for in situ photoresist thickness characterization |
| 03/22/2007 | US20070065145 Development apparatus and development method |
| 03/22/2007 | US20070064308 Optical sheet and process for producing the same |
| 03/22/2007 | US20070064215 Removable pellicle for immersion lithography |
| 03/22/2007 | US20070064214 Exposure apparatus, and device manufacturing method |
| 03/22/2007 | US20070064212 Projection exposure apparatus and stage unit, and exposure method |
| 03/22/2007 | US20070064210 Exposure apparatus and method for producing device |
| 03/22/2007 | US20070064209 Exposure apparatus and method for manufacturing device |
| 03/22/2007 | US20070063390 Nano impression lithographic process which involves the use of a die having a region able to generate heat |
| 03/22/2007 | US20070063371 Production process and production apparatus of three-dimensionally structure material |
| 03/22/2007 | US20070063283 Thin film transistor, liquid crystal display using thin film transistor, and method of manufacturing thin film transistor |
| 03/22/2007 | US20070063149 Positioning device and method of initializing a positioning device |
| 03/22/2007 | US20070062389 Method and device for printing wherein a hydrophilic layer is produced and structured |
| 03/22/2007 | DE4419038B4 Mehrfachstrahlen erzeugendes Element und damit ausgerüstetes optisches Druckgerät Multiple beams generating element and optical printing apparatus equipped therewith |
| 03/22/2007 | DE10329644B4 Anordnung zum Zu-oder Abführen von Wärme zu/von einem Halbleitersubstrat zur Vorbereitung oder Nachbearbeitung eines lithographischen Projektionsschrittes, dessen Verfahren sowie die Verwendung Arrangement for supply or removal of heat to / from a semiconductor substrate in preparation or post a lithographic projection step, the process and the use |
| 03/22/2007 | DE10209493B4 Verfahren zur Vermeidung von Kontamination auf optischen Elementen, Vorrichtung zur Regelung von Kontamination auf optischen Elementen und EUV-Lithographievorrichtung Method to prevent contamination on optical elements, means for control of contamination on optical elements and EUV lithography apparatus |
| 03/22/2007 | DE102006027846A1 Vorrichtung und Verfahren für die Immersionslithographie Apparatus and method for immersion lithography |
| 03/22/2007 | DE102006015722A1 System und Verfahren zur Photolithographie bei der Halbleiter-Herstellung System and method for photolithography in semiconductor production |
| 03/22/2007 | DE102005044375A1 Automated positioning method for objects, involves carrying out of approximate adjustment on basis of existing coordinate information and fine adjustment on basis of coordinate information determined from additional information |
| 03/22/2007 | DE102004021415B4 Verfahren zum Strukturbelichten einer photoreaktiven Schicht und zugehörige Be lichtungsvorrichtung A method for exposing a photo-reactive layer structure and related Be clearing device |
| 03/22/2007 | DE10151724B4 Verfahren und Vorrichtung zum Korrigieren eines Musterfilms auf einem Halbleitersubstrat Method and apparatus for correcting a pattern film on a semiconductor substrate |
| 03/22/2007 | CA2620714A1 Photocurable compositions for preparing abs-like articles |
| 03/21/2007 | EP1764655A2 Lithographic apparatus and device manufacturing method |
| 03/21/2007 | EP1764654A1 Method for thermal development of a photosensitive element using a development medium having a support |
| 03/21/2007 | EP1764653A2 Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of lithographic apparatus |
| 03/21/2007 | EP1764652A2 Positive resist composition and pattern-forming method using the same |
| 03/21/2007 | EP1764651A2 Water-soluble photopolymer composition for flexographic printing and water-developable photosensitive original printing plate for flexographic printing |
| 03/21/2007 | EP1764650A1 Photosensitive composition, and lithographic printing plate precursor and image-recording method using the same |
| 03/21/2007 | EP1764649A2 Positive resist composition and pattern forming method using the same |
| 03/21/2007 | EP1764648A1 Stamp with nanostructures and device as well as process for its production |
| 03/21/2007 | EP1764647A2 Positive resist composition for immersion exposure and pattern-forming method using the same |
| 03/21/2007 | EP1763707A2 Device and method for producing resist profiled elements |
| 03/21/2007 | EP1763706A2 Method for manufacturing minute structure, method for manufacturing liquid discharge head, and liquid discharge head |
| 03/21/2007 | EP1763705A1 Photosensitive resin composition, ink jet head using photosensitive resin composition, and process for manufacturing ink jet head |
| 03/21/2007 | EP1763704A2 Soft lithographic stamp with a chemically patterned surface |
| 03/21/2007 | EP1608934A4 Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry |
| 03/21/2007 | EP1608933A4 Apparatus and method for measurement of fields of backscattered and forward scattered/reflected beams by an object in interferometry |
| 03/21/2007 | EP1412969B1 Method for the production of a self-adjusted structure on a semiconductor wafer |
| 03/21/2007 | EP1370828A4 Line profile asymmetry measurement using scatterometry |
| 03/21/2007 | CN2881725Y Aluminium-plastic compound printing plate |
| 03/21/2007 | CN1934713A Pattern formation method, thin film transistor, display device and manufacturing method of these device, and television set |
| 03/21/2007 | CN1934503A Electron beam lithography system |
| 03/21/2007 | CN1934502A Pattern forming process and pattern |
| 03/21/2007 | CN1934501A Method for producing a base material for screen printing, and base material of this type |
| 03/21/2007 | CN1934500A Antireflective film containing sulfur atom |
| 03/21/2007 | CN1934499A Positively radiation-sensitive resin composition |
| 03/21/2007 | CN1934498A Permanent resist composition, cured product thereof, and use thereof |
| 03/21/2007 | CN1934497A Negative radiation-sensitive resin composition |
| 03/21/2007 | CN1934496A Photosensitive insulative paste composition and photosensitive film using the same |
| 03/21/2007 | CN1934411A Stage device |
| 03/21/2007 | CN1934221A Composition useful for removal of bottom anti-reflection coatings from patterned ion-implanted photoresist wafers |
| 03/21/2007 | CN1934196A Violet colorant for colour filters, inks for ink-jet, electrophotographic toners and developers and e-inks |
| 03/21/2007 | CN1934179A High performance water-based primer |
| 03/21/2007 | CN1934153A Novel solvent for producing polyurethane dispersions |
| 03/21/2007 | CN1933961A Photocurable compositions |
| 03/21/2007 | CN1933700A Wiring forming system and method |
| 03/21/2007 | CN1933103A Semiconductor producing method for preventing crystal border film layer from stripping and interconnection wire producing method |
| 03/21/2007 | CN1933101A Process for forming a film, process for manufacturing a device |
| 03/21/2007 | CN1933100A Apparatus for and method of processing substrate subjected to exposure process |
| 03/21/2007 | CN1932653A Stack type alignment mark and photoetching process aligning method |
| 03/21/2007 | CN1932652A Photoresist stripping method |
| 03/21/2007 | CN1932651A Method and system for manufacturing semiconductor, base and recording medium used therefor |
| 03/21/2007 | CN1932650A Lithographic apparatus and device manufacturing method |
| 03/21/2007 | CN1932649A Device manufacturing method, mask and device |
| 03/21/2007 | CN1932648A Apparatus and methods for immersion lithography |