Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2007
03/28/2007EP1767995A2 Method of producing photosensitive planographic printing plate precursor
03/28/2007EP1767994A2 Planographic printing plate precursor
03/28/2007EP1767993A1 Positive photosensitive composition and pattern forming method using the same
03/28/2007EP1767992A1 Positive resist composition for immersion exposure and pattern forming method using the same
03/28/2007EP1767991A2 Positive resist composition and pattern forming method using the same
03/28/2007EP1767990A1 Photosensitive resin for flexographic printing plate
03/28/2007EP1767989A1 Method of forming graft pattern, graft pattern material, method of lithography, method of forming conductive pattern, conductive pattern, process for producing color filter, color filter and process for producing microlens
03/28/2007EP1767978A1 Optical system, exposing apparatus and exposing method
03/28/2007EP1767586A2 Process for the preparation of metal compounds of an azo-compound by using a multi-step tempering process
03/28/2007EP1767491A1 Method for manufacturing nanostructure and nanostructure
03/28/2007EP1766737A1 Laser output beam wavefront splitter for bandwidth spectrum control
03/28/2007EP1766699A2 Compliant device for nano-scale manufacturing
03/28/2007EP1766572A1 Area based optical proximity correction in raster scan printing
03/28/2007EP1766477A1 Method and apparatus for the drying of the printing plates for flexography
03/28/2007EP1766475A1 Photosensitive resin composition, method of forming level difference pattern using the photosensitive resin composition, and method of producing ink jet head
03/28/2007EP1766474A2 Photoactive compounds
03/28/2007EP1766473A2 Cationic photoplymerizable epoxy resin composition minute structural member using the same and method for manufacturing minute structural member
03/28/2007EP1766442A1 Aperture stop assembly for high power laser beams
03/28/2007EP1765593A1 Imageable element with solvent-resistant polymeric binder
03/28/2007EP1765591A2 Apparatus and method for thermally developing flexographic printing elements
03/28/2007EP1540423B1 Grating based spectral filter for eliminating out of band radiation in an extreme ultra-violet lithography system
03/28/2007CN2884264Y Six freedom precision regulator having memory function
03/28/2007CN2884263Y Apparatus for making photon crystal mask layer on light-emitting diode
03/28/2007CN1938934A Motor controller
03/28/2007CN1938647A Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate
03/28/2007CN1938646A Microlithographic projection exposure apparatus and measuring device for a projection lens
03/28/2007CN1938605A An optical medium, an optical lens and a prism
03/28/2007CN1938412A Resist, BARC and gap fill material stripping chemical and method
03/28/2007CN1938377A Composition curable by both free-radical photocuring and cationic photocuring
03/28/2007CN1938370A Method of coloring a coating composition
03/28/2007CN1938259A Calixresorcinarene compounds, photoresist base materials, and compositions thereof
03/28/2007CN1938162A Hollow cylindrical printing element
03/28/2007CN1936711A Alignment system for photoetching device and stage jointing grating system
03/28/2007CN1936710A Alignment mark and its producing method
03/28/2007CN1936709A Lithographic method
03/28/2007CN1936708A Antireflective hard mask compositions
03/28/2007CN1936707A Flexible photosensitive resin plate and preparing method thereof
03/28/2007CN1936706A Water-soluble photopolymer composition for flexographic printing and water-developable photosensitive original printing plate for flexographic printing
03/28/2007CN1936705A Photoresist composition and method of manufacturing a thin-film transistor substrate using the same
03/28/2007CN1936704A Radiation sensitivity composition for forming pigmentation layer and color filter
03/28/2007CN1936703A Grey-regulation mask and producing method
03/28/2007CN1936701A CPL mask and a method and program product for generating the same
03/28/2007CN1936661A Arrangement of spacers in a liquid crystal display device
03/28/2007CN1936660A Liquid crystal display device and method of fabricating the same
03/28/2007CN1935516A Method for producing liquid ejecting recording head
03/28/2007CN1935515A Orifice slice and its preparing process
03/28/2007CN1307486C Method for making dimethyl silicone polymer micro flow control chip composite type optical cured resin die arrangement
03/28/2007CN1307485C System and method for improving line width control in use of photoetching apparatus
03/28/2007CN1307476C Method for producing light conducting plate mould core
03/28/2007CN1307472C Optical device, method for producing same, and electronic device
03/28/2007CN1307461C Method of making aspheric surface lens
03/28/2007CN1307460C Homogenizer
03/28/2007CN1307457C Visual display element in micro electromechanical unit
03/28/2007CN1307456C Projection optical system, exposure apparatus, and device manufacturing method
03/28/2007CN1307443C Blue colored composition for color filter and color filter
03/28/2007CN1307441C Optical elements, it metal mould and method for processing optical elements
03/28/2007CN1307260C Solvent-soluble block copolyimide composition and process for producing the same
03/28/2007CN1307207C Incorporable photoinitiator
03/28/2007CN1307186C Silyl alkyl esters of anthracene- and phenanthrene carboxylic acids
03/27/2007US7197201 Optical wiring substrate fabrication process and optical wiring substrate device
03/27/2007US7197108 Method of fabricating X-ray mask and method of fabricating semiconductor device using the X-ray mask
03/27/2007US7196841 Lighting system, particularly for use in extreme ultraviolet (EUV) lithography
03/27/2007US7196782 Methods and systems for determining a thin film characteristic and an electrical property of a specimen
03/27/2007US7196774 Lithography device
03/27/2007US7196773 Illumination optical system and exposure apparatus using the same
03/27/2007US7196772 Lithographic apparatus and device manufacturing method
03/27/2007US7196771 Reticle stage based linear dosimeter
03/27/2007US7196769 Exposure apparatus and device manufacturing method
03/27/2007US7196429 Method of reducing film stress on overlay mark
03/27/2007US7196343 Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby
03/27/2007US7196342 Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
03/27/2007US7196321 Fine pattern forming apparatus and fine pattern inspecting apparatus
03/27/2007US7196228 Making dimer and multimer forms of Bisacylphosphine Oxide (BAPO) by reacting a dimetalated-phosphine with a di- or polycarboxylic acid halogenide, further reacting with carboxylic acid halogenide to form dimers or multimers, and oxidizing; use as photoinitiators for photopolymerization
03/27/2007US7196155 Process for preparing poly(arylene ethers) with pendant crosslinkable groups
03/27/2007US7196027 Optical glass suffering little change in refractive index by radiation of light
03/27/2007US7196017 Method for etching smooth sidewalls in III-V based compounds for electro-optical devices
03/27/2007US7195863 Development defect preventing process and material
03/27/2007US7195862 Process for producing a tool insert for injection molding a microstructured part
03/27/2007US7195861 Method for making a negative working, heat-sensitive lithographic printing plate precursor
03/27/2007US7195860 Forming resist film on substrate, irradiating selectively the resist film with exposure to light with a liquid on resist film, and forming resist pattern by developing film, wherein step of performing pattern exposure includes sub-step of removing a gas included in film; prevents diffraction abnormality
03/27/2007US7195859 Method of making a lithographic printing plate precursor
03/27/2007US7195858 Negative type photosensitive resin composition containing a phenol-biphenylene resin
03/27/2007US7195857 Photosensitive prepolymer having an ethylenically unsaturated terminal group originating in an acrylic monomer, a photopolymerization initiator and a flame-retarding agent
03/27/2007US7195856 Positive resist composition and pattern formation method using the same
03/27/2007US7195855 Negative-type photosensitive resin composition containing epoxy compound
03/27/2007US7195854 Photoresist composition
03/27/2007US7195849 Photosensitive resin compositions
03/27/2007US7195847 Exposing, through a photo mask( having at least two light transmittable pattern), a substrate, on which a first and second negative photosensitive resin layers are formed and the photosensitivity ratio of resin layer is greater then 1
03/27/2007US7195845 Spin-coating method, determination method for spin-coating condition and mask blank
03/27/2007US7195734 Device and method in connection with the production of structures
03/27/2007US7195733 Provides stamps, molds and photomasks used in soft lithography fabrication methods for generating high resolution patterns of structures on flat and contoured surfaces, including surfaces having a large radius of curvature on a wide variety of substrates
03/27/2007US7195021 In-situ cleaning of light source collector optics
03/27/2007CA2362173C Laser processing power output stabilization
03/27/2007CA2307565C Use of dimerdiolalcoxylate (meth)acrylic acid esters as constituents for radiation cured coatings
03/22/2007WO2007032729A1 An arrangement adapted to evaluate the intensity of or a changing in the intensity of an electro-magnetic beam or a bundle of beams
03/22/2007WO2007032671A1 Lithography system and projection method
03/22/2007WO2007032574A1 Antireflective hardmask composition and methods for using same
03/22/2007WO2007032552A1 Photosensitive composition, transfer material, light shielding film and production method thereof, color filter for display device, substrate for display device, and display device
03/22/2007WO2007032504A1 Photomask, photomask manufacturing method, and photomask processing device
03/22/2007WO2007032372A1 Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program
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