| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/04/2007 | CN1940719A Grey mask and method for making it |
| 04/04/2007 | CN1940718A Photomask for providing uniform CD (critical dimension) in semiconductor device, and method for manufacturing same |
| 04/04/2007 | CN1940717A Method of plasma etching a chromium layer through a carbon hardmask suitable for photomask fabrication |
| 04/04/2007 | CN1940715A Optical mask pattern correcting method and its formation |
| 04/04/2007 | CN1940659A Liquid crystal display device, method for manufacturing the same and separator element thereof |
| 04/04/2007 | CN1940646A Liquid crystal display device and method for fabricating of the same |
| 04/04/2007 | CN1940540A Defect inspection apparatus and defect inspection method |
| 04/04/2007 | CN1939736A Method of producing nozzle plate and method of producing liquid-droplet jetting apparatus |
| 04/04/2007 | CN1939601A Substrate processing system, coating apparatus, and coating method |
| 04/04/2007 | CN1939567A Solvent recovery device and method |
| 04/04/2007 | CN1309018C Simple technology for manufacturing semiconductor device |
| 04/04/2007 | CN1309017C Exposure method and device |
| 04/04/2007 | CN1308975C Method for manufacturing ceramic green sheet and method for manufacturing electronic part using that ceramic green sheet |
| 04/04/2007 | CN1308774C Film opaque for lithographic printing plate |
| 04/04/2007 | CN1308773C Surface processing apparatus |
| 04/04/2007 | CN1308758C Thin film transistor panel manufacturing method, etching bath cleaning method and use of alkali |
| 04/04/2007 | CN1308738C High solution digital microoptical grey mask production system and its production method |
| 04/04/2007 | CN1308710C Exposure device |
| 04/04/2007 | CN1308708C Photocurable resin composition and color filters |
| 04/04/2007 | CN1308707C Reflector for exposure device, reflective mask for exposure device, exposure device and pattern forming method |
| 04/03/2007 | US7200834 Exposure pattern forming method and exposure pattern |
| 04/03/2007 | US7200833 Calculating method, verification method, verification program and verification system for edge deviation quantity, and semiconductor device manufacturing method |
| 04/03/2007 | US7199929 Methods for optical beam shaping and diffusing |
| 04/03/2007 | US7199922 Reflective projection lens for EUV-photolithography |
| 04/03/2007 | US7199915 Buffers for light modulation elements in spatial light modulators |
| 04/03/2007 | US7199878 Scan exposure apparatus and method, and device manufacturing method |
| 04/03/2007 | US7199864 Polarization rotator and a crystalline-quartz plate for use in an optical imaging system |
| 04/03/2007 | US7199862 Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system |
| 04/03/2007 | US7199861 Lithographic apparatus and device manufacturing method |
| 04/03/2007 | US7199858 Lithographic apparatus and device manufacturing method |
| 04/03/2007 | US7199493 Alignment stage apparatus |
| 04/03/2007 | US7199393 Photolithographic process to form a pattern, using an inorganic nanocrystals surface-coordinated with a compound containing a photosensitive carbon to carbon double bond functional group; photomasking; simple method; organic-inorganic hybrid electroluminescent devices |
| 04/03/2007 | US7199091 Photoresist stripper |
| 04/03/2007 | US7198973 Method for fabricating an interference display unit |
| 04/03/2007 | US7198888 Water-soluble material, chemically amplified resist and pattern formation method using the same |
| 04/03/2007 | US7198887 Fine pattern photoresists for photolithography; protective coatings |
| 04/03/2007 | US7198886 Forming a masking material layer on a surface of a working film by coating with inorganic compound and volatile component; volatilizing; forming resist layer; patterning resist film, dry-etching |
| 04/03/2007 | US7198885 inkjet technique with lithographic technique, providing extremely high resolution, is used to fabricate transistor source and drain electrodes, parts of interconnections and circuit electrodes, enabling highly conductive materials to be used |
| 04/03/2007 | US7198884 Heat stable photocurable resin composition for dry film resist |
| 04/03/2007 | US7198883 positive-working, heat-sensitive material which generates little or no solid state debris upon exposure to heat and/or light and whereby the exposure step can be carried out by means of a laser with low power output |
| 04/03/2007 | US7198882 Adhesion promoting polymeric materials and planographic printing elements containing them |
| 04/03/2007 | US7198880 Positive resist composition |
| 04/03/2007 | US7198879 a portion of thermoresist material is transferred from the donor element across the gap by ablative transfer and is deposited onto the substrate by laser transfer |
| 04/03/2007 | US7198878 Polymeric backbone, benzocyclobutene reactive groups, and photoswitchable pendant groups that form carboxylic acid groups upon exposure to activating wavelengths of radiation; CO2 emitted when polymer is cured by heating |
| 04/03/2007 | US7198877 Heat-sensitive lithographic printing plate precursor |
| 04/03/2007 | US7198876 Method of preparation of lithographic printing plates |
| 04/03/2007 | US7198873 Lithographic processing optimization based on hypersampled correlations |
| 03/29/2007 | WO2007035735A1 Curable compositions containing dithiane monomers |
| 03/29/2007 | WO2007035166A2 Methods and systems for pattern generation based on multiple forms of design data |
| 03/29/2007 | WO2007035018A1 Antireflective hardmask composition and methods for using same |
| 03/29/2007 | WO2007034993A1 Apparatus and method for manufacturing a photosensitive laminated body |
| 03/29/2007 | WO2007034991A1 Method of applying web |
| 03/29/2007 | WO2007034963A1 Colorant dispersion, coloring resin composition, color filter, and liquid-crystal display |
| 03/29/2007 | WO2007034949A1 Method for measuring liquid immersion lithography soluble fraction in organic film |
| 03/29/2007 | WO2007034719A1 Compound, method for producing same, positive resist composition and method for forming resist pattern |
| 03/29/2007 | WO2007034610A1 Photosensitive resin composition, photosensitive element, method of forming resist pattern, process for producing printed wiring board, and method of forming partition wall for plasma display |
| 03/29/2007 | WO2007034604A1 Negative photosensitive resin composition, method of pattern forming and electronic part |
| 03/29/2007 | WO2007033964A1 Adaptive optical element |
| 03/29/2007 | WO2007033710A1 Polarization analyzer, polarization sensor and method for determining a polarization property of a lithographic apparatus |
| 03/29/2007 | WO2006134512A3 Debris mitigation system with improved gas distribution |
| 03/29/2007 | WO2006088262A3 Image-drawing method, image-drawing device, image-drawing system, and correction method |
| 03/29/2007 | US20070072782 Unsaturated dicarboxylic acid and ethylene urea containing formulation for cleaning semiconductor and cleaning method |
| 03/29/2007 | US20070072134 Semiconductor device fabrication method |
| 03/29/2007 | US20070072133 photolithography for exposing semiconductor substrates; double exposure for enhancing the image resolution; controlling the lithographic exposure apparatus and spin-coat device |
| 03/29/2007 | US20070072132 Method of forming device structure, method of manufacturing magnetoresistive element, and method of manufacturing thin film magnetic head |
| 03/29/2007 | US20070072131 Method of manufacturing semiconductor device |
| 03/29/2007 | US20070072130 Process for fabricating micro-display |
| 03/29/2007 | US20070072128 Method of manufacturing an integrated circuit to obtain uniform exposure in a photolithographic process |
| 03/29/2007 | US20070072127 On-press developable lithographic printing plate having darker aluminum substrate |
| 03/29/2007 | US20070072126 Method of producing photosensitive planographic printing plate precursor |
| 03/29/2007 | US20070072122 Photosensitive polymer composition, method of forming relief patterns, and electronic equipment |
| 03/29/2007 | US20070072109 Thick film or ultrathick film responsive chemical amplification type photosensitive resin composition |
| 03/29/2007 | US20070072105 Toner particle having a core of a styrene-butyl acrylate or carboxyethyl acrylate and an optional colorant; and a shell of a styrene-butyl acrylate or carboxyethyl acrylate-multifunctional ultraviolet light curable acrylate oligomer; temperature sensitive packaging and foil seals |
| 03/29/2007 | US20070072097 photolithography for exposing semiconductor substrates; double exposure for enhancing the image resolution; controlling the lithographic exposure apparatus and spin-coat device |
| 03/29/2007 | US20070072096 Negative curable dye-containing composition, color filter, and method of manufacturing the same |
| 03/29/2007 | US20070072095 Apparatus and method for argon plasma induced ultraviolet light curing step for increasing silicon-containing photoresist selectivity |
| 03/29/2007 | US20070072093 Manufacturing method of pattern formed body, and photomask for vacuum-ultraviolet light |
| 03/29/2007 | US20070072092 Rinse treatment method, developing treatment method and developing apparatus |
| 03/29/2007 | US20070071306 Inspection method and photomask |
| 03/29/2007 | US20070070502 Illuminating and imaging system comprising a diffractive beam splitter |
| 03/29/2007 | US20070070334 Defect inspection apparatus |
| 03/29/2007 | US20070070322 Projection system for EUV lithography |
| 03/29/2007 | US20070070320 Method for aberration evaluation in a projection system |
| 03/29/2007 | US20070070318 Lithographic process |
| 03/29/2007 | US20070070316 Microlithographic projection exposure apparatus and measuring device for a projection lens |
| 03/29/2007 | US20070070269 Substrate for liquid crystal display and method of fabricating the same |
| 03/29/2007 | US20070069666 Apparatus for processing an object with high position accurancy |
| 03/29/2007 | US20070069400 Alignment mark, alignment apparatus and method, exposure apparatus, and device manufacturing method |
| 03/29/2007 | US20070069398 Overlay metrology mark |
| 03/29/2007 | US20070068866 Internal die filters with multiple passageways which are fluidically in parallel |
| 03/29/2007 | US20070068453 Scatterometric method of monitoring hot plate temperature and facilitating critical dimension control |
| 03/29/2007 | US20070068412 Method for handling printing plates |
| 03/29/2007 | DE102006040305A1 Preparation of three-dimensional articles by photopolymerization of multiple layers of monomer or oligomer, useful e.g. for rapid manufacturing in the motor industry |
| 03/29/2007 | DE102005045795A1 Illumination system for micro-lithographic projection exposure system, has polarizer including transformation units that convert polarization condition of projection light into orthogonal polarization condition |
| 03/29/2007 | DE102005044697A1 Calcium fluoride mono-crystal for production of optical products, lasers, computer chips and integrated circuits, is doped with Al, Ga, In or Tl-ions |
| 03/29/2007 | CA2550481A1 Method of making ceramic discharge vessels using stereolithography |
| 03/28/2007 | EP1768172A1 Projection optical system, exposure device, and exposure method |
| 03/28/2007 | EP1768171A1 Exposure apparatus, exposure method, and device producing method |
| 03/28/2007 | EP1768170A1 Exposure equipment, exposure method and device manufacturing method |
| 03/28/2007 | EP1768169A1 Exposure apparatus, exposure method, and device producing method |