| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/10/2007 | US7202014 Stimulus-sensitive composition, compound and pattern formation method using the stimulation-sensitive composition |
| 04/10/2007 | US7202013 Antireflective film material, and antireflective film and pattern formation method using the same |
| 04/10/2007 | US7202012 Compositions for positive heat sensitive lithographic printing plates |
| 04/10/2007 | US7202011 Mixture of fluoropolymer and acid generator |
| 04/10/2007 | US7202010 Suitable for lithography |
| 04/10/2007 | US7202009 Vinylphenol-cyclohexyl methacrylate-2,6-difluorostyrene terpolymer |
| 04/10/2007 | US7202008 Thermal development system and method of using the same |
| 04/10/2007 | US7201853 Applying photoresist polymer to substrate; curing; etching; forming projections |
| 04/10/2007 | US7201022 Systems and methods for filling voids and improving properties of porous thin films |
| 04/10/2007 | US7201016 Refrigerant supply apparatus |
| 04/10/2007 | CA2204200C Phenyl alkyl ketone substituted by cyclic amine and a process for the preparation thereof |
| 04/05/2007 | WO2007038635A1 Hydrogen treatment to improve photoresist adhesion and rework consistency |
| 04/05/2007 | WO2007037998A1 Multifunctional probe array system |
| 04/05/2007 | WO2007037825A1 Method and apparatus for isolative substrate edge area processing |
| 04/05/2007 | WO2007037553A1 Process for producing substrate with metal wiring |
| 04/05/2007 | WO2007037519A1 Image recording apparatus, image recording method, data structure, recording medium, data processing apparatus and method |
| 04/05/2007 | WO2007037452A1 Drawing point data obtainment method and apparatus |
| 04/05/2007 | WO2007037394A1 Plotting device and image data creation method |
| 04/05/2007 | WO2007037344A1 Frame data producing apparatus, method and plotting apparatus |
| 04/05/2007 | WO2007037280A1 Positive resist composition and method for forming resist pattern |
| 04/05/2007 | WO2007037236A1 Frame data producing apparatus, method and plotting apparatus |
| 04/05/2007 | WO2007037166A1 Drawing data acquiring method and device, and drawing method and apparatus |
| 04/05/2007 | WO2007037165A1 Drawing data acquiring method and device, and drawing method and apparatus |
| 04/05/2007 | WO2007037101A1 Coating materials consisting of low- or medium-molecular organic compounds |
| 04/05/2007 | WO2007037090A1 Image forming material |
| 04/05/2007 | WO2007036982A1 Composition for antireflection film formation, comprising product of reaction between isocyanuric acid compound and benzoic acid compound |
| 04/05/2007 | WO2007036246A1 Method of simulating a post-exposure-bake (peb) process in a lithographic procedure |
| 04/05/2007 | WO2007013802B1 Maskless lithography system with improved reliability |
| 04/05/2007 | WO2006132664A3 Decal transfer lithography |
| 04/05/2007 | WO2006130995A3 Fluorescent photopolymerizable resins and uses thereof |
| 04/05/2007 | WO2006117527A3 An article, and a method for creating the article, with a chemically patterned surface |
| 04/05/2007 | WO2006105911A3 Exposure device for press plates |
| 04/05/2007 | WO2006086441A3 Improved flexo processor |
| 04/05/2007 | WO2006072583A3 Method for beam calibration and usage of a calibration body |
| 04/05/2007 | WO2006020080A3 Systems and methods for reducing the influence of plasma-generated debris on the internal components of an euv light source |
| 04/05/2007 | WO2005101466A3 Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography |
| 04/05/2007 | US20070077769 Method of removing organic contaminants from a semiconductor surface |
| 04/05/2007 | US20070077526 Method of patterning a positive tone resist layer overlaying a lithographic substrate |
| 04/05/2007 | US20070077525 Multi-level layer |
| 04/05/2007 | US20070077524 Method for forming patterns of semiconductor device |
| 04/05/2007 | US20070077523 Method of patterning a positive tone resist layer overlaying a lithographic substrate |
| 04/05/2007 | US20070077514 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board |
| 04/05/2007 | US20070077512 Resist composition for electron beam or euv |
| 04/05/2007 | US20070077504 refining or generating an optical proximity correction (OPC) simulation tool for use in semiconductor fabrication by designing mask having at least one feature from predetermined layout, preparing mask according to mask design, creating structure corresponding to mask feature on semiconductor wafer |
| 04/05/2007 | US20070076843 Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus |
| 04/05/2007 | US20070076303 Optical arrangement of autofocus elements for use with immersion lithography |
| 04/05/2007 | US20070076184 Optical assembly for photolithography |
| 04/05/2007 | US20070076183 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method |
| 04/05/2007 | US20070076182 Wafer table for immersion lithography |
| 04/05/2007 | US20070076181 Projection optical system inspecting method and inspection apparatus, and a projection optical system manufacturing method |
| 04/05/2007 | US20070074747 Substrate processing method, substrate processing apparatus and computer-readable memory medium |
| 04/05/2007 | DE19953340B4 Vor-Ort-Herstellung von prozeßfreien thermischen Druckplatten durch Verwenden reaktiver Materialien On-site production of thermal process-free printing plates by using reactive materials |
| 04/05/2007 | DE19609297B4 Projektionsbelichtungsverfahren und hierfür verwendbare Maske The projection exposure method and be used for this mask |
| 04/05/2007 | DE102005047207A1 Reworking an optical element fixed in a mounting comprising surface treatment followed by coating comprises removing the optical element from the mounting before coating |
| 04/05/2007 | DE102005044716A1 Aktives optisches Element Active optical element |
| 04/05/2007 | DE102005044141A1 Exposure device for lithographic projects has electromagnetic trap in container for collecting neutral particles emitted during operation of radiation source by ionization arrangement ionizing neutral particles |
| 04/04/2007 | EP1770753A2 Actively-cooled distribution plate for reducing reactive gas temperature in a plasma processing system |
| 04/04/2007 | EP1770446A1 Aqueous stripping composition |
| 04/04/2007 | EP1770445A1 Lithographic apparatus and device manufacturing method |
| 04/04/2007 | EP1770444A1 Lithographic apparatus and method for conditioning an interior space of a device manufacturing apparatus |
| 04/04/2007 | EP1770443A2 Laser processing apparatus, exposure apparatus and exposure method |
| 04/04/2007 | EP1770442A2 Compositions and processes for photolithography |
| 04/04/2007 | EP1770441A2 Positive resist composition and pattern forming method using the same |
| 04/04/2007 | EP1770440A2 Pattern forming method and resist composition used therefor |
| 04/04/2007 | EP1769521A1 Electron beam applying apparatus and drawing apparatus |
| 04/04/2007 | EP1769287A1 Laser irradiation |
| 04/04/2007 | EP1769286A2 Oxime derivatives and the use therof as latent acids |
| 04/04/2007 | EP1769285A2 Improved method for bump exposing relief image printing plates |
| 04/04/2007 | EP1769102A2 Substrate support system and method |
| 04/04/2007 | EP1768848A1 Liquid discharge head manufacturing method, and liquid discharge head obtained using this method |
| 04/04/2007 | EP1768847A2 Liquid discharge head manufacturing method, and liquid discharge head obtained using this method |
| 04/04/2007 | EP1768846A2 Fluid dispensing and drop-on-demand dispensing for nano-scale manufacturing |
| 04/04/2007 | EP1308717A4 X-ray measuring and testing system |
| 04/04/2007 | EP1009020B1 Exposure method and exposure apparatus |
| 04/04/2007 | CN1943013A Liquid for immersion exposure and immersion exposure method |
| 04/04/2007 | CN1942829A Electron beam position fluctuation measurement method, electron beam position fluctuation measurement device, and electron beam recording device |
| 04/04/2007 | CN1942828A Light source for photolithography |
| 04/04/2007 | CN1942827A Method of producing a relief image |
| 04/04/2007 | CN1942826A Positive-working photoimageable bottom antireflective coating |
| 04/04/2007 | CN1942825A Resist composition |
| 04/04/2007 | CN1942824A Uv radiation blocking protective layers compatible with thick film pastes |
| 04/04/2007 | CN1941283A Semiconductor device fabrication method |
| 04/04/2007 | CN1941279A H20 plasma and h20 vapor methods for releasing charges and use thereof |
| 04/04/2007 | CN1941251A Manufacturing method of color cathode ray tube and exposure device used for the manufacturing method |
| 04/04/2007 | CN1941093A System and method for patterning a master disk for nanoimprinting patterned magnetic recording disks |
| 04/04/2007 | CN1940734A Four-quadrant aligning device of mask transmission system |
| 04/04/2007 | CN1940733A Stripper |
| 04/04/2007 | CN1940732A Technology for removing photoetching film |
| 04/04/2007 | CN1940731A Decreasement for residual polymer during low-temperature nitrogen/hydrogen ashing procedure |
| 04/04/2007 | CN1940730A Bake unit, method for cooling heating plate used in the bake unit, apparatus and method for treating substrates with the bake unit |
| 04/04/2007 | CN1940729A Lithographic apparatus, device manufacturing method and device manufactured thereby |
| 04/04/2007 | CN1940728A Lithographic apparatus and method for conditioning an interior space of a device manufacturing apparatus |
| 04/04/2007 | CN1940727A Lithographic apparatus and device manufacturing method |
| 04/04/2007 | CN1940726A Method for producing resin for chemically amplified positive resist |
| 04/04/2007 | CN1940725A Radiation-sensitive resin composition for optical waveguides, optical waveguide, and method for manufacturing optical waveguide |
| 04/04/2007 | CN1940724A Photosensitive resin composition, protective film and separator of LCD panel, forming method thereof and lcd panel |
| 04/04/2007 | CN1940723A Photosensitive resin composition and laminating article thereof |
| 04/04/2007 | CN1940722A Novel tarc material for immersion watermark reduction and method for immersion watermark reduction |
| 04/04/2007 | CN1940721A Novel tarc material for immersion watermark reduction and method for immersion watermark reduction |
| 04/04/2007 | CN1940720A 感光性树脂组合物 The photosensitive resin composition |