Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/2007
04/12/2007DE102006045459A1 Verhinderung von Wasser-Markierungsdefekten für Immersions-Lithographie Prevention of water-marking defects for immersion lithography
04/12/2007DE102005048376A1 Simulation method for an optical formation device involves the calculation from a pre-defined value from a value range of an image defect of the image device's influenced parameters
04/12/2007DE102005027046B4 Vorrichtung zur Erzeugung eines periodisch hoch aufgelösten Beleuchtungsmusters Apparatus for generating a periodic high-resolution illumination pattern
04/12/2007DE102005003905B4 Anordnung zur Projektion eines Musters in eine Bildebene Arrangement for projecting a pattern in an image plane
04/12/2007DE102004050642B4 Verfahren zur Überwachung von Parametern eines Belichtungsgerätes für die Immersionslithographie und Belichtungsgerät für die Immersionslithographie A method for monitoring parameters of an exposure apparatus for immersion lithography exposure apparatus and for immersion lithography
04/12/2007DE10131489B4 Negativ Resistprozess mit simultaner Entwicklung und chemischer Nachverstärkung von Resiststrukturen Negative resist process with simultaneous development and chemical amplification resist patterns
04/11/2007EP1772776A1 Method of patterning a positive tone resist layer overlaying a lithographic substrate and a computer program
04/11/2007EP1772775A1 Microlithographic reduction lens and projection illumination system
04/11/2007EP1772774A2 Photoinitiated reactions
04/11/2007EP1772773A1 Method for realizing a multispacer structure, use of said structure as a mould and method for producing circuital architectures using said mould
04/11/2007EP1772482A1 Waveguide compositions and waveguides formed therefrom
04/11/2007EP1772468A1 Fluorine-containing compound, fluorine-containing polymer, resist composition and resist protective film composition
04/11/2007EP1771773A2 Defect repair device and defect repair method
04/11/2007EP1771772A2 Method of manufacturing photosensitive laminated body and apparatus therefor
04/11/2007EP1771771A1 Catadioptric projection objective
04/11/2007EP1771753A2 Catadioptric imaging system exhibiting enhanced deep ultraviolet spectral bandwidth
04/11/2007EP1771491A1 Photosensitive compositions based on polycyclic polymers
04/11/2007EP1687381B1 Formation of self-assembled monolayers
04/11/2007EP1440459B1 Method and apparatus for mitigating cross-contamination between liquid dispensing jets in close proximity to a surface
04/11/2007EP1257882B1 Device for detecting wave fronts
04/11/2007EP1112995B1 Alicyclic compounds and curable resin composition
04/11/2007EP1053507B1 Integral thin-film metal resistor with improved tolerance and simplified processing
04/11/2007EP0760109B1 Method for particle wave reconstruction in a particle-optical apparatus
04/11/2007CN2888496Y Device for cleaning photoresist coating equipment components
04/11/2007CN2888495Y Original version of negative-type PS
04/11/2007CN2888494Y Original version of heat sensitive CTP
04/11/2007CN1947479A Method and apparatus for accurately applying structures to a substrate
04/11/2007CN1947478A Circuit board, circuit board manufacturing method and display apparatus provided with circuit board
04/11/2007CN1947238A Process for forming a solder mask, apparatus thereof and process for forming electric-curcuit patterned internal dielectric layer
04/11/2007CN1947225A Pattern transfer method
04/11/2007CN1947224A Substrate processing method and substrate processing apparatus
04/11/2007CN1947069A Exposure apparatus
04/11/2007CN1947068A Water-soluble resin composition and method of forming pattern therewith
04/11/2007CN1947067A Rinse solution for lithography
04/11/2007CN1947066A Rinsing fluid for lithography
04/11/2007CN1947065A Resist pattern forming method and composite rinse agent
04/11/2007CN1947064A 曝光图案形成方法 Exposure pattern forming method
04/11/2007CN1947063A System and method for fabricating contact holes
04/11/2007CN1947062A Method to determine the value of process parameters based on scatterometry data
04/11/2007CN1947061A Lithographic printing plate precursors with mercapto-functionalized free-radical polymerizable monomers
04/11/2007CN1946751A Material for forming resist protection film for liquid immersion lithography and method for forming resist pattern by using the protection film
04/11/2007CN1945813A Manufacturing method of thin film transistor array panel
04/11/2007CN1945795A Exhaust device in substrate processing
04/11/2007CN1945792A Semiconductor device manufacturing method for preventing patterns from inclining in drying process
04/11/2007CN1945484A Optical head action control device and method and carrying table device
04/11/2007CN1945445A Method for stage control developing process
04/11/2007CN1945444A Method of patterning a positive tone resist layer overlaying a lithographic substrate
04/11/2007CN1945443A Lithographic apparatus and device manufacturing method utilizing a multiple dictionary compression method for fpd
04/11/2007CN1945442A System and method to correct for field curvature of multi lens array
04/11/2007CN1945441A System and method for compensating for radiation induced thermal distortions
04/11/2007CN1945440A Dimension monitoring method and system
04/11/2007CN1945439A Achromatic immersion interference imaging optical etching system
04/11/2007CN1945438A Method of producing semiconductor integrated circuit device and method of producing multi-chip module
04/11/2007CN1945437A Coating drier with regulating air flow path function
04/11/2007CN1945436A Lithographic printing plate precursor and lithographic printing method
04/11/2007CN1945435A Printing forme
04/11/2007CN1945434A Photohardenable and thermosetting resin compositions, their hardened product, and printing circuit boards using the same
04/11/2007CN1945433A Novel heavy nitrogen salt photosensitive material
04/11/2007CN1945432A Radiation sensitive resin composition, and formation of interlayer insulating film and microlens
04/11/2007CN1945431A Resist material and nanofabrication method
04/11/2007CN1945430A Photosensitive resin composition and photosensitive resin laminate using the same
04/11/2007CN1945429A Photosensitive resin composition and photosensitive resin laminate using the same
04/11/2007CN1945428A Photosensitive resin composition and photosensitive resin laminate using the same
04/11/2007CN1945389A Liquid crystal display structure and its producing method
04/11/2007CN1945382A Control method for light field in holographic printing technology and its system
04/11/2007CN1945361A Method for producing color filter sheet
04/11/2007CN1944068A Method for printing braille
04/11/2007CN1310295C Material for forming fine pattern and method for manufacturing semiconductor device using the same
04/11/2007CN1310234C Optical information medium
04/11/2007CN1310093C Exposure device
04/11/2007CN1310092C Positive slushing agent composition and resist pattern forming method
04/11/2007CN1310091C Positive photoresist composition and method of forming photoresist pattern
04/11/2007CN1310090C Polymers and photoresist compositions
04/11/2007CN1310089C Photoetching adhesive composition
04/11/2007CN1310088C Photosensitive resin composition and use thereof
04/11/2007CN1310087C Discharge nozzle type positive photoresist composite used for coating method and method for forming anticorrosion pattern
04/11/2007CN1310066C Method for producing transparent current-conducing plate with low-contact surface resistance
04/11/2007CN1309787C Energy-ray curing resin composition
04/11/2007CN1309754C Water photosensitive resin emulsion and preparation thereof
04/11/2007CN1309561C Photosensitive composition and photosensitive planographic printing plate
04/11/2007CN1309560C Printing plate and imaging method of planographic printing plate
04/10/2007US7203562 Process monitoring system for lithography lasers
04/10/2007US7203275 Multilayer film reflector and X-ray exposure system
04/10/2007US7203217 Narrow band electric discharge gas laser having improved beam direction stability
04/10/2007US7203216 Timing control for two-chamber gas discharge laser system
04/10/2007US7203047 Combination current sensor and relay
04/10/2007US7203010 Catadioptric projection objective
04/10/2007US7203008 Very high-aperture projection objective
04/10/2007US7203007 Projection exposure machine comprising a projection lens
04/10/2007US7202938 Off-axis levelling in lithographic projection apparatus
04/10/2007US7202937 Balanced positioning system for use in lithographic apparatus
04/10/2007US7202936 Stage unit, drive table, and scanning exposure apparatus using same
04/10/2007US7202935 Imprinting apparatus with independently actuating separable modules
04/10/2007US7202934 Lithographic apparatus and device manufacturing method
04/10/2007US7202488 Correction system, method of correcting deflection distortion, program and method for manufacturing a semiconductor device
04/10/2007US7202175 Method and apparatus for treating a substrate surface by bubbling
04/10/2007US7202153 Method for forming, under a thin layer of a first material, portions of another material and/or empty areas
04/10/2007US7202103 Overlapped color filter fabrication technique
04/10/2007US7202016 Radiation-sensitive resin composition
04/10/2007US7202015 acid-decomposable resin in which an alicyclic structure showing no absorption in the 193 nm range is introduced into the main or side chain of a polymer
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