| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 04/18/2007 | CN1950749A Photosensitive original printing plate for relief printing, method for producing relief printing plate, and light-shielding ink for performing the method |
| 04/18/2007 | CN1950191A Method for producing a three-dimensional object with resolution enhancement by means of pixel shift |
| 04/18/2007 | CN1949462A Method for reducing positive charge on chip surface in ion injecting process |
| 04/18/2007 | CN1949087A Aligning system of photoetching apparatus and steping combined system of said aligning system thereof |
| 04/18/2007 | CN1949086A Substrate processing method and substrate processing apparatus |
| 04/18/2007 | CN1949085A Aqueous cleaning composition for removing residues and method using same |
| 04/18/2007 | CN1949084A Aqueous cleaning composition and method for using same |
| 04/18/2007 | CN1949083A Photoetching machine table, developing apparatus and developing process thereof |
| 04/18/2007 | CN1949082A Exposure method and apparatus for immersion lithography |
| 04/18/2007 | CN1949081A A lithographic apparatus |
| 04/18/2007 | CN1949080A Film transistor mfg. apparatus and mfg. method |
| 04/18/2007 | CN1949079A Coating apparatus and coating method |
| 04/18/2007 | CN1949044A Linking base plate rotating method |
| 04/18/2007 | CN1949041A Method of fabricating liquid crystal display device |
| 04/18/2007 | CN1311716C Method and device for producing extreme ultraviolet radiation and soft X-radiation |
| 04/18/2007 | CN1311522C Pattern forming method and semiconductor device mfg method |
| 04/18/2007 | CN1311304C Photoresist pattern thickness-increasing material, photoresist pattern containing it and its use |
| 04/18/2007 | CN1311303C Developing method and apparatus |
| 04/18/2007 | CN1311302C Substrate processing system for performing exposure process in gas atmosphere |
| 04/18/2007 | CN1311301C Photoetching projection device |
| 04/18/2007 | CN1311300C Charge beam exposure device, exposure method by charge beam, charge beam controlling method and method for mfg. semiconductor device |
| 04/18/2007 | CN1311299C Photosensitive lithographic printing plate |
| 04/18/2007 | CN1311298C Positive resist compsn. of chemical amplification type, resist coated material, method of forming resis pattern, and process for producing semiconductor device |
| 04/18/2007 | CN1311297C Polymerizable composition, inhibitor and electron beam plate printing method |
| 04/18/2007 | CN1311296C Positive type photo erosion resistant agent composition used for making LCD and forming method of erosion resistant picture |
| 04/18/2007 | CN1311295C Paste, display member, and process for production of display member |
| 04/18/2007 | CN1311294C 加热装置 Heating device |
| 04/18/2007 | CN1310971C Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers |
| 04/17/2007 | US7207030 Method for improving a simulation model of photolithographic projection |
| 04/17/2007 | US7207028 System for evaluating a design of a mask, exposure system, method for evaluating a design of a mask, method for manufacturing a semiconductor device and mask |
| 04/17/2007 | US7206061 Mask supporting apparatus using vacuum and light exposing system, and method using the same |
| 04/17/2007 | US7206060 Illumination optical system, exposure apparatus, and device fabrication method with a polarizing element and an optical element with low birefringence |
| 04/17/2007 | US7206059 Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems |
| 04/17/2007 | US7206058 Off-axis levelling in lithographic projection apparatus |
| 04/17/2007 | US7206057 Liquid crystal display panel and fabricating method thereof |
| 04/17/2007 | US7206011 Apparatus for and method of recording optically scanned image |
| 04/17/2007 | US7205741 Planar motor initialization method, planar motor, lithographic apparatus and device manufacturing method |
| 04/17/2007 | US7205543 Auto focusing apparatus and method |
| 04/17/2007 | US7205265 Cleaning compositions and methods of use thereof |
| 04/17/2007 | US7205222 Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light |
| 04/17/2007 | US7205167 Method to detect photoresist residue on a semiconductor device |
| 04/17/2007 | US7205094 Coating fluid contains a carrier liquid, thermoplastic resin particles and an IR absorber that has a decomposition temperature higher than the resin melt temperature; TiO2 photocatalyst; images can be written in response to input digital data and can be easily regenerated and reused |
| 04/17/2007 | US7205093 Topcoats for use in immersion lithography |
| 04/17/2007 | US7205092 Photosensitive layer contains a water-soluble or -dispersible resin and an ultraviolet-curable monomer; adhesion-adjusting layer; water-insoluble heat-sensitive mask layer containing an infrared-absorbing material; peel assist layer, and a protective layer; mass transfer between layers prevented |
| 04/17/2007 | US7205091 That includes a surface-tension modifier dispersed in the binder is between the imaging layer and the substrate member to inhibit the production of thermal degradation products that disrupt the oleophilicity of the exposed imaged areas; inhibit static charge buildup |
| 04/17/2007 | US7205090 Interpolymer of an adamantyl (meth)acrylate, a tetrahydrofuranonyl (meth)acrylate, and a cyclohexyl or cyclopentyl (meth)acrylate and an acid generator; gives particularly excellent pattern shape and excellent line edge roughness |
| 04/17/2007 | US7205089 Cross-linking polymer for organic anti-reflective coating, organic anti-reflective coating composition comprising the same and method for forming photoresist pattern using the same |
| 04/17/2007 | US7205088 Photochromic material capable of reversibly converting among a number of different forms, one of which has an absorption spectrum that overlaps with a predetermined wavelength scope; and a light absorbing material with a light absorption band that overlaps with the absorption spectrum of the one form |
| 04/17/2007 | US7205087 Solvents and photoresist compositions for 193 nm imaging |
| 04/17/2007 | US7205086 Multilayer elements containing photoresist compositions and their use in microlithography |
| 04/17/2007 | US7205085 Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern |
| 04/17/2007 | US7205084 Oleophilic coating composed of an infrared light-to-heat converter, an alkali-soluble phenolic resin substituted with an arylazo group or a phthalazinedione group, and a phenolic resin with an alkali solubilizing group as a development accelerator |
| 04/17/2007 | US7205083 Recording material |
| 04/17/2007 | US7205078 Determining the backscattering intensity by using the reflection coefficient (rn), the transmission coefficient (tn), and the scatter distribution. |
| 04/17/2007 | US7204942 Method of making a fluoride crystalline optical lithography lens element blank |
| 04/17/2007 | US7204686 Parallelism adjustment device |
| 04/12/2007 | WO2007041701A2 Mask-patterns including intentional breaks |
| 04/12/2007 | WO2007041423A1 Vertical profile fixing |
| 04/12/2007 | WO2007040855A1 Structure and method for simultaneously determining an overlay accuracy and pattern placement error |
| 04/12/2007 | WO2007040544A1 Dense opc |
| 04/12/2007 | WO2007040465A1 Luminescent display and method of making the same |
| 04/12/2007 | WO2007040255A1 Semiconductor substrate and method for manufacturing same |
| 04/12/2007 | WO2007040254A1 Exposure apparatus and exposure method |
| 04/12/2007 | WO2007040204A1 Photosensitive resin composition, photosensitive element, and method for manufacturing printed wiring board |
| 04/12/2007 | WO2007040165A1 Image exposure apparatus |
| 04/12/2007 | WO2007040150A1 Plotting device and plotting method |
| 04/12/2007 | WO2007040140A1 Photogravure engraving roll with cushioning layer and production method therefor |
| 04/12/2007 | WO2007040138A1 Method for preparing surface concaves and convexes |
| 04/12/2007 | WO2007040066A1 Writing method and device |
| 04/12/2007 | WO2007039989A1 Positive resist composition and method for formation of resist patterns |
| 04/12/2007 | WO2007039519A1 Device and method for influencing polarisation distribution in an optical system, in particular in a microlithography exposure system |
| 04/12/2007 | WO2007039381A1 Microelectronic substrate having removable edge extension element |
| 04/12/2007 | WO2007039374A2 Immersion optical lithography system having protective optical coating |
| 04/12/2007 | WO2007039272A1 Lithographic apparatus and method of controlling |
| 04/12/2007 | WO2007039257A1 Illumination system comprising an otpical filter |
| 04/12/2007 | WO2007018464A3 Method and apparatus for projection printing |
| 04/12/2007 | WO2007005362A3 Use of supercritical fluid to dry wafer and clean lens in immersion lithography |
| 04/12/2007 | WO2006135808A3 Methods for reclaiming developing solvents |
| 04/12/2007 | WO2006134513A3 Method of protecting a radiation source producing euv-radiation and/or soft x-rays against short circuits |
| 04/12/2007 | WO2006109185A3 Nanocomposite photoresist composition for imaging thick films |
| 04/12/2007 | WO2006109121A3 Nanocomposite photosensitive composition and use thereof |
| 04/12/2007 | WO2006075291A3 Displacement device |
| 04/12/2007 | US20070083021 Fluorocopolymer, method for its production and resist composition containing it |
| 04/12/2007 | US20070083012 Curable polymer compound |
| 04/12/2007 | US20070082966 Novel photopolymers and use in dental restorative materials |
| 04/12/2007 | US20070082965 Photocuring resin composition, medical device using same and method for manufacturing same |
| 04/12/2007 | US20070082298 Method of manufacturing semiconductor device from semiconductor wafer |
| 04/12/2007 | US20070082295 Aquiring dimensional information on photoresist patterns using immersion exposure method of photolithograpy with a liquid interposed between a projection lens and a substrate; adjusting the refractive index; avoiding deviations due to optical proximity corrections; miniaturization; accuracy |
| 04/12/2007 | US20070082292 Water-soluble material, chemically amplified resist and pattern formation method using the same |
| 04/12/2007 | US20070082291 Lithographic Printing Plate Precursor and Lithographic Printing Method |
| 04/12/2007 | US20070082279 Near-field exposure method and device manufacturing method using the same |
| 04/12/2007 | US20070082272 Masks, lithography device and semiconductor component |
| 04/12/2007 | US20070081194 Flexographic printing |
| 04/12/2007 | US20070081170 Overlay metrology method and apparatus using more than one grating per measurement direction |
| 04/12/2007 | US20070081142 Stage base, stage apparatus, exposure apparatus, and device manufacturing method |
| 04/12/2007 | US20070081136 Exposure apparatus and device fabrication method |
| 04/12/2007 | US20070081114 Polarization-modulating optical element |
| 04/12/2007 | US20070079498 Method of manufacturing a spin-valve giant magnetoresistive head |
| 04/12/2007 | DE10305617B4 Maske und Verfahren zum Strukturieren eines Halbleiterwafers Mask and method of patterning a semiconductor wafer |
| 04/12/2007 | DE102006046453A1 Neues Tarc-Material zur Verringerung der Wasserzeichenimmersion New Tarc material to reduce water mark immersion |