| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/25/2007 | CN1952781A Resist coating method and resist coating apparatus |
| 04/25/2007 | CN1952780A Composite hold-up offset printing PS plate and the production technology thereof |
| 04/25/2007 | CN1952779A Colored photosensitive resin composition |
| 04/25/2007 | CN1952778A Compositions and processes for photolithography |
| 04/25/2007 | CN1952777A Imprint method, imprint apparatus, and process for producing chip |
| 04/25/2007 | CN1952776A A method of preparing photoconductive gel film to realize transfer of raster graphic |
| 04/25/2007 | CN1951703A Original plate for lithographic printing plate and its making method |
| 04/25/2007 | CN1312750C Structure and method for determining edges of regions in a semiconductor wafer |
| 04/25/2007 | CN1312535C Optical photoresist stripping composition |
| 04/25/2007 | CN1312534C Electvonic beam based pattern scanning method and scanning device |
| 04/25/2007 | CN1312533C Etching method and method for mfg circuit device thereby |
| 04/25/2007 | CN1312530C Master mask, exposure monitor method, exposure method and semiconductordevice mfg method |
| 04/25/2007 | CN1312529C Photomask for off-axis illumination and its producing method |
| 04/25/2007 | CN1312493C Manufacturing method of micro-lens, image pickup device and manufacturing method thereof |
| 04/25/2007 | CN1312464C Field measurement method for aberration of imaging optical system |
| 04/25/2007 | CN1312232C Treated pigment, use thereof, and compound for treating pigment |
| 04/24/2007 | US7209292 Projection objective, especially for microlithography, and method for adjusting a projection objective |
| 04/24/2007 | US7209286 Objective with pupil obscuration |
| 04/24/2007 | US7209243 Illumination device, and coordinate measuring instrument having an illumination device |
| 04/24/2007 | US7209241 Method for determining wavefront aberrations |
| 04/24/2007 | US7209220 System for using a two part cover for and a box for protecting a reticle |
| 04/24/2007 | US7209219 System for controlling a position of a mass |
| 04/24/2007 | US7209157 Image recorder |
| 04/24/2007 | US7208568 photocurable and thermosetting resin composition derived from the reaction of a multifunctional oxetane compound, an acrylic acid, where the hydroxy group of the subsequent acrylate ester is reacted with an acid anhydride to form carboxyl groups; storage stability; use with printed circuits |
| 04/24/2007 | US7208263 Forming latent images on photosensitive resin made with radiation to form latent images |
| 04/24/2007 | US7208262 Yield and line width performance for liquid polymers and other materials |
| 04/24/2007 | US7208261 Polymers, processes for polymer synthesis and photoresist compositions |
| 04/24/2007 | US7208260 Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same |
| 04/24/2007 | US7208249 Selecting a photoresist which provides a sufficiently dense structure to sterically hinder the movement of photoacid generator groups which have been written upon, and wherein photoresist includes photoacid-generator groups |
| 04/24/2007 | US7208201 Coating apparatus and method having a slide bead coater and liquid drop applicator |
| 04/24/2007 | US7208104 Mixture solution for preparing a conductive polymer to produce solid electrolytic capacitors and its method |
| 04/24/2007 | US7207720 Static gas bearing system, stage mechanism, exposure apparatus, and device manufacturing method |
| 04/19/2007 | WO2007044446A1 Oxidizing aqueous cleaner for the removal of post-etch residues |
| 04/19/2007 | WO2007043597A1 Method and apparatus for driving semiconductor lasers, and method and apparatus for deriving drive current patterns for semiconductor lasers |
| 04/19/2007 | WO2007043556A1 Material for forming film overlying photoresist |
| 04/19/2007 | WO2007043535A1 Optical characteristic measuring method, exposure method, device manufacturing method, inspecting apparatus and measuring method |
| 04/19/2007 | WO2007043470A1 Transfer product, transfer product fabricating method, and transfer product arrangement position identifying method |
| 04/19/2007 | WO2007043449A1 Thermosetting composition, antihalation film for solid-state imaging device and process for producing the same, and solid-state imaging device |
| 04/19/2007 | WO2007043430A1 Composition curable with actinic energy ray |
| 04/19/2007 | WO2007043425A1 Imide-urethane resin, photosensitive resin composition containing the same, and cured object obtained therefrom |
| 04/19/2007 | WO2007043414A1 Multilayer reflecting mirror, multilayer reflecting mirror manufacturing method, optical system, exposure apparatus and device manufacturing method |
| 04/19/2007 | WO2007043411A1 Digital exposure apparatus |
| 04/19/2007 | WO2007043323A1 Photomask and exposure method using same |
| 04/19/2007 | WO2007043270A1 Ic socket set |
| 04/19/2007 | WO2007043240A1 Photosensitive resin composition and photosensitive element using the same |
| 04/19/2007 | WO2007042348A1 Top antireflective coating composition with low refractive index at 193nm radiation wavelength |
| 04/19/2007 | WO2007025004A3 Apparatus and methods for nanolithography using nanoscale optics |
| 04/19/2007 | WO2007010011A3 Optical element module |
| 04/19/2007 | WO2007002965B1 Rapid-prototyping method and radiation-hardenable composition of application thereto |
| 04/19/2007 | WO2006137860A3 Reduction of a feature dimension in a nano-scale device |
| 04/19/2007 | WO2006124279A3 Making relief image using removable film |
| 04/19/2007 | WO2006123834A3 Graft pattern forming method and conductive pattern forming method |
| 04/19/2007 | WO2006102649A3 A method for manufacturing a device using imprint lithography and direct write technology |
| 04/19/2007 | WO2006068708A3 Lensed fiber array for sub-micron optical lithography patterning |
| 04/19/2007 | WO2005047974A3 Measurement and compensation of errors in interferometers |
| 04/19/2007 | US20070089086 Information management and tracking system (IMTS) |
| 04/19/2007 | US20070088450 Method of controlling substrate processing apparatus and substrate processing apparatus |
| 04/19/2007 | US20070088131 Sulfonate and resist composition |
| 04/19/2007 | US20070087951 Thinner composition for inhibiting photoresist from drying |
| 04/19/2007 | US20070087291 Lithography process to reduce interference |
| 04/19/2007 | US20070087290 High resolution printing technique |
| 04/19/2007 | US20070087289 Printing form and method for imaging a printing form |
| 04/19/2007 | US20070087284 Multipass multiphoton absorption method and apparatus |
| 04/19/2007 | US20070087275 Method of fabricating liquid crystal display device |
| 04/19/2007 | US20070085986 Exposure apparatus and aberration correction method |
| 04/19/2007 | US20070085034 Exposure method and apparatus for immersion lithography |
| 04/19/2007 | DE112005000681T5 Motorsteuereinrichtung Motor control means |
| 04/19/2007 | DE10200897B4 Resist zur Bildung einer Struktur für die Justierung eines Elektronen- oder Ionenstrahls und Verfahren zur Bildung der Struktur Resist for forming a pattern for adjusting an electron or ion beam and method of forming the structure |
| 04/19/2007 | DE102005060622A1 Assembly device for projection objective in semiconductor fabrication lithography, has lifting device and setting angle for positioning structural parts |
| 04/19/2007 | DE102005048193A1 Positively-working precursor for lithographic printing plates has a first layer containing a polymer and a photothermal conversion material and a cover layer of an acidic cellulose derivative |
| 04/19/2007 | DE10147954B4 CARL für Bioelektronik: Substratanbindung über leitfähige Schicht CARL bioelectronics: substrate connection via conductive layer |
| 04/19/2007 | DE10120659B4 Verfahren zur Strukturierung einer Photolackschicht A method for patterning a photoresist layer |
| 04/18/2007 | EP1775835A2 Method of processing a discrete time input signal |
| 04/18/2007 | EP1775834A2 Method and system for efficient and accurate filtering and interpolation |
| 04/18/2007 | EP1775756A1 Euv light source, euv exposure equipment and semiconductor device manufacturing method |
| 04/18/2007 | EP1775755A1 Euv light source, euv exposure system, and production method for semiconductor device |
| 04/18/2007 | EP1775636A1 A lithographic apparatus |
| 04/18/2007 | EP1775635A1 Method and arrangement for predicting thermally-induced deformation of a substrate, and a semiconductor device |
| 04/18/2007 | EP1775634A1 Electron beam drawing device |
| 04/18/2007 | EP1775633A1 Composition for antireflection coating and method for forming pattern using same |
| 04/18/2007 | EP1775604A1 Multilayer mirror manufacturing method, optical system manufacturing method, exposure apparatus, and device manufacturing method |
| 04/18/2007 | EP1775339A1 Aqueous cleaning composition and method for using same |
| 04/18/2007 | EP1775337A1 Aqueous cleaning composition for removing residues and method using same |
| 04/18/2007 | EP1775316A1 Polyamide |
| 04/18/2007 | EP1774407A2 System and method for improvement of alignment and overlay for microlithography |
| 04/18/2007 | EP1774406A2 Optical system having a cleaning arrangement |
| 04/18/2007 | EP1774405A2 System for measuring the image quality of an optical imaging system |
| 04/18/2007 | EP1774404A2 Lithographic printing plates with high print run stability |
| 04/18/2007 | EP1774403A2 Microstructuring of mesogens using contact printing |
| 04/18/2007 | EP1438738A4 Methods and apparatus for patterning a surface |
| 04/18/2007 | EP1430343A4 Method for fabricating chirped fiber bragg gratings |
| 04/18/2007 | EP1419362A4 In-situ mirror characterization |
| 04/18/2007 | EP1257879B1 Radiation sensitive copolymers, photoresist compositions thereof and deep uv bilayer systems thereof |
| 04/18/2007 | CN1950929A Exposure equipment, exposure method and device manufacturing method |
| 04/18/2007 | CN1950755A Composition for removing a (photo)resist |
| 04/18/2007 | CN1950754A Composition for removing a (photo)resist |
| 04/18/2007 | CN1950753A Pattern forming method |
| 04/18/2007 | CN1950752A Method of making a photopolymer sleeve blank having an integral cushion layer for flexographic printing |
| 04/18/2007 | CN1950751A Radiation-sensitive resin composition, spacer, and method of forming the same |
| 04/18/2007 | CN1950750A Pattern forming material, pattern forming apparatus and pattern forming method |