Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2014
06/03/2014US8741509 Colored curable composition, color filter, and method for producing color filter
06/03/2014US8740481 Coating and developing apparatus
06/03/2014US8739701 Method and apparatus for thermal processing of photosensitive printing elements
06/03/2014CA2504080C A manufacturing method of a microchemical chip made of a resin and a microchemical chip made of a resin by the method
05/2014
05/30/2014WO2014081464A1 Process for removing substances from substrates
05/30/2014WO2014081127A1 Photoresist stripping fluid composition and method of stripping photoresist
05/30/2014WO2014080977A1 Photosensitive resin composition, resist laminate, and articles obtained by curing same (10)
05/30/2014WO2014080976A1 Photosensitive resin composition, resist laminate, and articles obtained by curing same (9)
05/30/2014WO2014080975A1 Photosensitive resin composition, resist laminate, and articles obtained by curing same (8)
05/30/2014WO2014080972A1 Photosensitive resin composition, resist laminate, and articles obtained by curing same (4)
05/30/2014WO2014080971A1 Photosensitive resin composition, resist laminate, and articles obtained by curing same (3)
05/30/2014WO2014080970A1 Photosensitive resin composition, resist laminate, and articles obtained by curing same (7)
05/30/2014WO2014080968A1 Photosensitive resin composition, resist laminate, and articles obtained by curing same (6)
05/30/2014WO2014080967A1 Photosensitive resin composition, resist laminate, and articles obtained by curing same (5)
05/30/2014WO2014080957A1 Exposure device, mobile device, and device manufacturing method
05/30/2014WO2014080908A1 Negative photosensitive resin composition
05/30/2014WO2014080849A1 Active ray-sensitive or radioactive ray-sensitive resin composition, pattern-forming method, resist film, method for manufacturing electronic device and electronic device
05/30/2014WO2014080838A1 Photosensitive resin composition, method for producing cured film, cured film, organic el display device, and liquid crystal display device
05/30/2014WO2014080835A1 Pattern-forming method, resist pattern formed using same, method for manufacturing electronic device using same and electronic device
05/30/2014WO2014080834A1 Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board
05/30/2014WO2014080827A1 Positive-acting photosensitive siloxane composition
05/30/2014WO2014080367A1 Lithographic patterning of insulating or semiconducting solid state material in crystalline form
05/30/2014WO2014079408A1 Method for evaluating scattering images of objects generated by narrowband, short-wave coherent laser radiation, particularly for usage in xuv microscopy
05/30/2014WO2014079145A1 Cleaning solution for removing photoresist
05/30/2014WO2014079122A1 Apparatus and method for alignable roll-to-roll uv molding
05/30/2014WO2014049420A3 Developable bottom anti-reflective coating
05/30/2014WO2014001071A3 Lithographic apparatus
05/30/2014WO2013174680A3 Adjustment device and mask inspection device with such an adjustment device
05/30/2014WO2013113336A9 Method of operating a microlithographic projection exposure apparatus and projection objective of such an apparatus
05/29/2014US20140147794 Method of forming photoresist pattern
05/29/2014US20140147793 Method of forming resist pattern
05/29/2014US20140147792 Polymerization method of high-molecular weight compound, resist composition, and method for forming resist pattern
05/29/2014US20140147791 Processing apparatus for processing a flexographic plate, a method and a computer program product
05/29/2014US20140147790 Resist composition and method of forming resist pattern
05/29/2014US20140147789 Lithographic printing plate precursors and processes for preparing lithographic printing plates
05/29/2014US20140147788 Resist composition and method for forming resist pattern
05/29/2014US20140147787 Resist composition and method for forming resist pattern
05/29/2014US20140147776 Photocurable/thermosetting resin composition
05/29/2014US20140147634 Method of casting
05/29/2014US20140146311 Method of determining mask pattern and exposure condition, storage medium, and computer
05/29/2014US20140146302 Device for homothetic projection of a pattern onto the surface of a sample, and lithography method using such a device
05/29/2014US20140146301 Exposure machine
05/29/2014US20140146300 Movable body drive system and movable body drive method, pattern formation apparatus and method, exposure apparatus and method, device manufacturing method, and decision-making method
05/29/2014US20140146298 Device for manufacturing a surface using character projection lithography with variable magnification
05/29/2014US20140146297 Methods and Apparatus for Inspection of Articles, EUV Lithography Reticles, Lithography Apparatus and Method of Manufacturing Devices
05/28/2014EP2735906A2 Mask, and optical filter manufacturing apparatus comprising same
05/28/2014EP2735905A1 Double-surface manufacturing method and exposure apparatus
05/28/2014EP2735904A1 Thin film formation composition for lithography which contains titanium and silicon
05/28/2014EP2735903A1 Negative working lithographic printing plate precursors comprising a hyperbranched binder material
05/28/2014EP2734887A1 Displays having self-aligned apertures and methods of making the same
05/28/2014DE102013209012A1 Projection exposure system e.g. EUV projection exposure system for e.g. semiconductor lithography, has shape memory element with martensite start temperature at which transition from martensite state into austenitic state begins
05/28/2014DE102013206528A1 Microlithographic projection exposure apparatus for lithographic production of microstructured components, has traversing device adding functions of optical elements to form overall filter function in first, second and third positions
05/28/2014DE102013204391B3 Projection lens for imaging projection lens pattern from object plane into image plane, has field point in field plane of outgoing beam illuminating manipulator surface with sub-aperture, and manipulation system comprising manipulator
05/28/2014DE102012220597A1 Beleuchtungsoptik für die EUV-Projektionslithographie Illumination optics for EUV projection lithography
05/28/2014CN203616578U 一种基于矢量曲线路径的象元可变角度的曲线光刻加工装置 A vector-based pixel curved path variable angle curve lithographic processing device
05/28/2014CN103827753A 平版印刷版原版和用于制造平版印刷版的方法 The lithographic printing plate precursor and a method for making a lithographic printing plate
05/28/2014CN103827752A 形成含有硅的euv抗蚀剂下层膜的组合物 Euv resist underlayer film is formed of silicon-containing composition
05/28/2014CN103827751A 图案形成方法、电子束敏感或极紫外线敏感组合物、抗蚀剂膜、使用其制造电子器件的方法和电子器件 A pattern forming method, an electron beam or extreme ultraviolet sensitive sensitive composition, a resist film, a method of manufacturing an electronic device and an electronic device
05/28/2014CN103827750A 图案形成方法、电子束敏感或极紫外线辐射敏感树脂组合物、抗蚀剂膜、使用其的电子器件的制造方法和电子器件 A pattern forming method, an electron beam or extreme ultraviolet radiation-sensitive resin composition-sensitive resist film, and a method of manufacturing an electronic device using an electronic device which
05/28/2014CN103827749A 平版印刷版的制版方法 Lithographic printing plate method
05/28/2014CN103827748A 平版印刷版的制版方法 Lithographic printing plate method
05/28/2014CN103827703A 着色组合物、着色图案、彩色滤光片和其制造方法、图案形成方法、固态成像器件和图像显示装置 The coloring composition, a colored pattern, and a method of manufacturing a color filter, a pattern forming method, the solid-state imaging device and an image display apparatus
05/28/2014CN103827701A 包括具有稳定组成的氮氧化物覆盖层的euv反射镜、euv光刻设备和操作方法 Includes a cover layer having a nitrogen oxides consisting of a stable euv mirror, euv lithographic apparatus and method of operation
05/28/2014CN103827163A 具有芴结构的树脂及光刻用下层膜形成材料 A resin having a fluorene structure and underlayer film forming material lithography
05/28/2014CN103827159A 二芳基胺酚醛清漆树脂 Diaryl amine novolac resin
05/28/2014CN103826856A 平版印刷版的制版方法 Lithographic printing plate method
05/28/2014CN103824810A 薄膜晶体管阵列基板及其制造方法 The thin film transistor array substrate and a method of manufacturing
05/28/2014CN103824770A 降低硅凹陷的光阻去除工艺 Reduce silicon recess resist removal process
05/28/2014CN103823334A 图形化光刻胶的形成方法 Method of forming a patterned photoresist
05/28/2014CN103823333A 导电电路形成用导电性树脂组合物及导电电路 A conductive circuit is formed of a conductive resin composition and the conductive circuit
05/28/2014CN103823332A 光波导形成用树脂组合物及使用其的光波导、以及光传输用挠性印刷基板及光波导的制法 The resin composition for forming an optical waveguide and an optical waveguide using the same, and an optical transmission system using the method of the flexible printed substrate and the optical waveguide
05/28/2014CN103823331A 包含离子性化合物的光刻胶 Photoresist comprising an ionic compound
05/28/2014CN103819616A 光敏丙烯酸aed树脂和包括它的负性光致抗蚀剂组合物及其制备方法 Aed photosensitive acrylic resin and including its negative photoresist composition and a method for preparing
05/28/2014CN103819583A 一种含硝基双肟酯类光引发剂及其制备方法和应用 Oxime esters containing nitro double photoinitiator and its preparation method and application
05/28/2014CN103819378A 光酸发生剂及含有它的抗蚀剂组合物 Agent containing a photo-acid generator of the resist composition which
05/28/2014CN102759858B 彩色滤光片用感光性树脂组成物及其所形成的彩色滤光片 A color filter and a photosensitive resin composition formed by a color filter
05/28/2014CN102725690B 感光性树脂组合物及其固化物、以及印刷电路板 The photosensitive resin composition and a cured product, and a printed circuit board
05/28/2014CN102656518B 感光性树脂组合物、其干膜以及使用了它们的印刷电路板 The photosensitive resin composition of the dry film and the use of printed circuit boards are
05/28/2014CN102621810B 光敏性树脂组合物、光敏性元件、抗蚀剂图案的形成方法及印刷电路板的制造方法 Method for producing a photosensitive resin composition, a photosensitive element, resist pattern forming method and printed circuit board
05/28/2014CN102608868B 感光性元件 Photosensitive element
05/28/2014CN102591138B 应用于硅穿孔晶圆级封装中的双光阻墙及其制备方法 Double photoresist is applied to the silicon wall perforation wafer level packaging in its preparation method
05/28/2014CN102566340B 一种基于相移莫尔条纹的数字无掩模光刻对准装置 A phase shift moire figures are based maskless lithography alignment means
05/28/2014CN102566322B 一种多台光刻设备校正方法 A multi-stage lithographic apparatus calibration method
05/28/2014CN102566318B 一种光束传输稳定装置 One kind of beam propagation stabilizing device
05/28/2014CN102566285B 制造微结构的方法及该微结构 The method of manufacturing a micro structure, and the microstructure
05/28/2014CN102455599B 抗蚀图案改善材料、形成抗蚀图案的方法以及制造半导体器件的方法 Methods to improve the resist pattern material, resist pattern forming method for manufacturing a semiconductor device, and
05/28/2014CN102419514B 光固化性树脂组合物及其固化物、干膜、印刷电路板 The photocurable resin composition and a cured dry film, a printed circuit board
05/28/2014CN102402130B 曝光装置及光源装置 An exposure apparatus and a light source apparatus
05/28/2014CN102375277B 液晶显示装置及其制造方法 The liquid crystal display device and manufacturing method
05/28/2014CN102311344B 化合物、包含所述化合物的共聚物和包含所述共聚物的抗蚀剂保护膜组合物 Compound comprising a copolymer of the compound and the resist protective film composition comprising said copolymer
05/28/2014CN102257437B 预对准装置以及预对准方法 Pre-alignment apparatus and method for pre-alignment
05/28/2014CN102253477B 反射折射投影光学系统、扫描曝光装置、微元件的制造方法 The method of manufacturing the catadioptric projection optical system, the scanning exposure apparatus, the micro-elements
05/28/2014CN102236267B 一种激光干涉光刻系统 A laser interference lithography system
05/28/2014CN102047178B 感光性树脂组合物 The photosensitive resin composition
05/28/2014CN102033370B 液晶显示基板及其制造方法 The liquid crystal display substrate and a method of manufacturing
05/28/2014CN101965375B 感光性树脂以及利用其的感光性树脂组合物 The photosensitive resin composition and a photosensitive resin composition using thereof
05/28/2014CN101899241B 滤色片用颜料分散物和含有该分散物的滤色片用颜料分散抗蚀剂组合物 A color filter and a color filter containing the pigment dispersion of the dispersion resist composition dispersing a pigment
05/28/2014CN101000462B 光固化性树脂组合物及形成图案的方法 The photocurable resin composition and a method for forming a pattern
05/27/2014US8736816 Asymmetric complementary dipole illuminator
05/27/2014US8736815 Position sensor and lithographic apparatus
1 ... 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 ... 1272