Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2014
06/05/2014DE102013208129A1 Microlithographic projection exposure system for lithographic production of integrated electric circuit, has projection lens for imaging part of mask, and traversing device movable with optical elements and perpendicular to optical axis
06/05/2014DE102012221923A1 Kühlsystem für zumindest eine Systemkomponente eines optischen Systems für EUV-Anwendungen sowie derartige Systemkomponente und derartiges optisches System A cooling system for at least one system component of an optical system for EUV, as well as applications such system component, and such an optical system
06/05/2014DE102012221831A1 Anordnung zur Aktuierung wenigstens eines optischen Elementes in einem optischen System Arrangement for actuation of at least one optical element in an optical system
06/05/2014DE102012111114A1 Halbleiterbearbeitungsvorrichtung und -verfahren Semiconductor processing apparatus and method
06/04/2014EP2738792A2 Exposure method, substrate stage, exposure apparatus, and device manufacturing method
06/04/2014EP2738609A2 Exposure condition determining method and surface inspection apparatus
06/04/2014EP2738608A1 Method and system for driving a movable body in an exposure apparatus
06/04/2014EP2738607A1 Nano graphics and ultra-wideband electromagnetic characteristic measurement system
06/04/2014EP2738606A1 A processing apparatus for processing a flexographic plate, a method and a computer program product
06/04/2014EP2738605A2 Developer for resist pattern-forming method
06/04/2014EP2738604A1 Photoresist employing photodimerization chemistry and method for manufacturing organic light emitting diode display using the same
06/04/2014EP2737575A1 Polymer-based resonator antennas
06/04/2014EP2737367A1 Laser-engraveable compositions and flexographic printing precursors
06/04/2014EP2736988A1 Photocurable adhesive composition and use of the same
06/04/2014EP2736978A1 Pigment dispersion, and resist composition for color filter and ink composition each using the pigment dispersion
06/04/2014EP2736635A1 A substrate surface structured with thermally stable metal alloy nanoparticles, a method for preparing the same and uses thereof, in particular as a catalyst
06/04/2014CN203630511U 光刻胶显影装置 Photoresist developing device
06/04/2014CN203630510U 光刻胶回收再利用系统 Photoresist recycling system
06/04/2014CN203630509U 机械手臂、传送装置及曝光设备 Robotic arm, the transfer device and exposure apparatus
06/04/2014CN203630508U 高硬度纳米压印软膜复合模板 High hardness nanoimprint templates soft membrane complex
06/04/2014CN203630384U 一种大尺寸光栅制造设备 One kind of large-sized grating fabricating apparatus
06/04/2014CN103843198A Polymer-based resonator antennas
06/04/2014CN103842909A Positive-type photosensitive resin composition, and insulating film and OLED formed using the same
06/04/2014CN103842908A Photosensitive resin composition, and dry film resist
06/04/2014CN103842883A Imaging catoptric euv projection optical unit
06/04/2014CN103842185A Printing method using on press development lithograph printing plate precursor
06/04/2014CN103840050A Method for fast preparing sapphire pattern substrate through nanoimprint technology
06/04/2014CN103840038A Three-dimensional sphere-like structure for enhancing light extraction efficiency of LED sample, and method for preparing same
06/04/2014CN103839770A Technological method for simultaneously forming graphs at bottom and top of deep trench
06/04/2014CN103838092A Cleaning fluid for removing photoresistance residue
06/04/2014CN103838091A Cleaning fluid for removing photoresist
06/04/2014CN103838090A Polymer thin film dissolving solution
06/04/2014CN103838089A Method of determining mask pattern and exposure condition and computer
06/04/2014CN103838088A Focusing and levelling device and method
06/04/2014CN103838087A Method for thickening photoresist
06/04/2014CN103838086A Composition containing reaction product of isocyanuric acid compound and benzoic acid compound for forming anti-reflection film
06/04/2014CN103838085A Adhesion force promoter for non-etching photoresist
06/04/2014CN103838084A Photosensitive resin composition
06/04/2014CN103838083A Photosensitive resin composition, color filter formed by photosensitive resin composition, and liquid crystal display element
06/04/2014CN103838082A Treating agent for inkjet substrate
06/04/2014CN103838081A Photosensitive resin composition for color filter, and application of photosensitive resin composition
06/04/2014CN103838080A Preparation method of tiny graph
06/04/2014CN103838079A Crude flexible printing plate and process for manufacturing mature plate by using same
06/04/2014CN103838078A Improved optical imaging
06/04/2014CN103838025A Array substrate, manufacturing method thereof and display device
06/04/2014CN103837974A Optical system of microscope lens with infinite tube length
06/04/2014CN103837967A I-line photoetching machine projection lens with large visual field and high numerical aperture
06/04/2014CN103837919A Method for processing colorful filter coating of grating structure based on double-layer glue nanometer embossment
06/04/2014CN103836596A High-power mercury lamp lamphouse device
06/04/2014CN103834227A Light-sensitive solder resist ink for LED (Light Emitting Diode) backlight source
06/04/2014CN103833872A Di-oxime ester photoinitiator as well as preparation method and application thereof
06/04/2014CN103832966A Forming method and detection method of semiconductor device
06/04/2014CN103832050A Lithographic printing plat and image forming method using a lithographic printing plat
06/04/2014CN103831914A Methods and materials for fabricating laminate nanomolds and nanoparticles therefrom
06/04/2014CN103019048B Developing spray nozzle
06/04/2014CN102863559B Photoinitiator for UV (ultraviolet)-LED curing
06/04/2014CN102841502B Imaging liquid for thermosensitive CTP (cytidine triphosphate) plate
06/04/2014CN102654734B Method for calculating cone-shaped diffractional field of dual-absorption layer alternating phase shift L/S (line/space) mask
06/04/2014CN102597061B Polyimide precursor and photosensitive resin composition containing the polyimide precursor
06/04/2014CN102555419B Method for wax printing by carving and printing of iron roller and method for processing iron roller
06/04/2014CN102540773B Novel method for inspecting photolithographic process by utilizing optical proximity correction (OPC) models of post exposure bake
06/04/2014CN102540758B Method for matching different photolithography coating devices in same photolithography process
06/04/2014CN102498437B Device and method for aligning laminated plate and inserting into automatic plating machine
06/04/2014CN102486991B Method of wafer surface photoresist edge removing
06/04/2014CN102486604B Phase shift mask, manufacturing method thereof and haze defect detection method thereof
06/04/2014CN102437049B Method for simplifying double pattern exposure process of side wall definition
06/04/2014CN102317258B Sulfonium salt, photo-acid generator, and photosensitive resin composition
06/04/2014CN102242053B Biochip with polymer three-dimensional nanostructure
06/04/2014CN102201365B Method for producing semiconductor device
06/04/2014CN102033435B Lithographic apparatus and method of operating the same
06/04/2014CN101842414B Photoimageable branched polymer
06/04/2014CN101685273B Cleanout fluid for removing photoresist layer residue
06/03/2014US8743343 Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
06/03/2014US8743341 Immersion exposure apparatus and immersion exposure method, and device manufacturing method
06/03/2014US8743339 Lithographic apparatus and device manufacturing method
06/03/2014US8743165 Methods and device for laser processing
06/03/2014US8742381 Radiation source with cleaning apparatus
06/03/2014US8742376 Method and apparatus of mask drawing using a grounding body at lowest resistance value position of the mask
06/03/2014US8742005 Acrylate-based compounds and photosensitive composition comprising the same
06/03/2014US8741979 Process for producing siloxane copolymers with urethane-sulphonamido linking groups
06/03/2014US8741554 Patterning process and resist composition
06/03/2014US8741553 Aromatic hydrocarbon resin, underlayer film forming composition for lithography, and method for forming multilayer resist pattern
06/03/2014US8741552 Double patterning strategy for contact hole and trench in photolithography
06/03/2014US8741551 Method and composition of a dual sensitive resist
06/03/2014US8741550 Building up diffractive optics by structured glass coating
06/03/2014US8741548 Patterning process
06/03/2014US8741547 Multi charged particle beam writing apparatus and multi charged particle beam writing method
06/03/2014US8741546 Patterning process and resist composition
06/03/2014US8741545 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
06/03/2014US8741544 Salt, photoresist composition and method for producing photoresist pattern
06/03/2014US8741543 Resist composition and method for producing resist pattern
06/03/2014US8741542 Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same
06/03/2014US8741541 Compound, resin, photoresist composition, and method for producing photoresist pattern
06/03/2014US8741540 Hard mask composition, method of forming a pattern, and semiconductor integrated circuit device including the pattern
06/03/2014US8741539 Hardmask composition, method of forming a pattern using the same, and semiconductor integrated circuit device including the pattern
06/03/2014US8741538 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern
06/03/2014US8741537 Positive resist composition and pattern-forming method using the same
06/03/2014US8741536 Light sensitive coating compositions useful for lithographic elements
06/03/2014US8741511 Determination of lithography tool process condition
06/03/2014US8741510 Method of calculating amount of fluctuation of imaging characteristic of projection optical system, exposure apparatus, and method of fabricating device
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