| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/01/2007 | US7211370 exposing a photoresist coating to radiation that penetrates the wafer, at the side having the electronic circuits along the dicing lines, developing the resist to selectively remove the exposed material along the dicing lines, and dicing by etching |
| 05/01/2007 | US7211369 VLSI-based system for durable high-density information storage |
| 05/01/2007 | US7211368 Stereolithography resins and methods |
| 05/01/2007 | US7211367 S-acylmethyl-S,S-oxydiethylenesulfonium salt in which the acyl is substituted by hydrocarbyl, hydrocarbyloxy or hydrocarbylamino; photoacid generator for high resolution for high energy rays of 300 nm or less |
| 05/01/2007 | US7211366 Photoresist composition for deep ultraviolet lithography |
| 05/01/2007 | US7211365 Negative photoresists for short wavelength imaging |
| 05/01/2007 | US7211364 Enables fast printing while maintaining or increasing print density, maintaining or reducing power to the print head, maintaining or reducing manufacturing cost, and maintaining the optical properties (color and transparency) and physical properties of the donor colorant patches |
| 05/01/2007 | US7211355 Producing and processing an organic coating on the phase shifter mask using an electron beam for repairing a defect of the phase shifter mask, allowing efficient production of very small structures, even for 157 nm lithography. |
| 05/01/2007 | US7211145 Substrate processing apparatus and substrate processing method |
| 05/01/2007 | US7210865 Automatic developing apparatus and process for forming image using the same |
| 05/01/2007 | CA2333896C Composition for bulkhead of thin display panel |
| 05/01/2007 | CA2235344C Method of contact printing on metal alloy-coated polymer films |
| 05/01/2007 | CA2228986C Material and process for covering the edges of photopolymerizable printing plates for flexographic printing |
| 04/26/2007 | WO2007047932A2 Nir/ir curable coatings for light directed imaging |
| 04/26/2007 | WO2007047345A2 Compensation for effects of beam misalignments in interferometer metrology systems |
| 04/26/2007 | WO2007047284A1 Reduction of iso-dense field thickness bias through gas jet for gapfill process |
| 04/26/2007 | WO2007046949A1 Dynamic uv-exposure and thermal development of relief image printing elements |
| 04/26/2007 | WO2007046772A1 Hierarchical nanopatterns by nanoimprint lithography |
| 04/26/2007 | WO2007046655A1 Stripper composition for removing dry etching residue and stripping method |
| 04/26/2007 | WO2007046528A2 Imprint apparatus, imprint method, and mold for imprint |
| 04/26/2007 | WO2007046523A1 Exposure apparatus and device manufacturing method |
| 04/26/2007 | WO2007046453A1 Polymers of vinylnaphthalene derivatives, compositions for forming antireflection coatings, and antireflection coatings |
| 04/26/2007 | WO2007046442A1 Novel compound, acid generator, chemical amplification type photoresist composition, resist layer laminate and method of forming resist pattern |
| 04/26/2007 | WO2007046425A1 Fine particle-containing composition, ink for forming colored film for display, light-blocking film for display, light-blocking material, substrate with light-blocking film, color filter, liquid crystal display element and liquid crystal display |
| 04/26/2007 | WO2007046415A1 Exposure apparatus and method of exposure |
| 04/26/2007 | WO2007046408A1 Plotting device and plotting method |
| 04/26/2007 | WO2007046388A1 Positive resist composition, positive resist composition for thermal flow process, and method for formation of resist patterns |
| 04/26/2007 | WO2007046371A1 Method for producing metal particle dispersion, metal particle dispersion, and colored composition, photosensitive transfer material, substrate with light-blocking image, color filter and liquid crystal display each using such metal particle dispersion |
| 04/26/2007 | WO2007046208A1 Resist composition and method of forming resist pattern |
| 04/26/2007 | WO2007046110A1 A method and apparatus for the formation of patterns on surfaces and an assembly and alignment of the structure thereof |
| 04/26/2007 | WO2007045607A1 A method for making a lithographic printing plate precursor |
| 04/26/2007 | WO2007045498A2 Photosensitive coating for enhancing a contrast of a photolithographic exposure |
| 04/26/2007 | WO2007045434A2 Collector for lighting systems with a wavelength ≤ 193 nm |
| 04/26/2007 | WO2007045311A1 Pigment preparations based on diketopyrrolopyrroles |
| 04/26/2007 | WO2007001495A3 Thermal development system and method of using the same |
| 04/26/2007 | WO2006138132A3 Commercial adma products having reduced salts and odor and the novel process for preparing same |
| 04/26/2007 | WO2006125617A3 Method for improving the imaging properties of a projection objective, and such a projection objective |
| 04/26/2007 | WO2006084230A3 Phase-shift masked zone plate array lithography |
| 04/26/2007 | US20070093640 Transparent, highly heat-resistant polyimide precursor and photosensitive polyimide composition thereof |
| 04/26/2007 | US20070093079 Imprinting method and imprinting apparatus |
| 04/26/2007 | US20070092844 Method to form photo patterns |
| 04/26/2007 | US20070092843 Method to prevent anti-assist feature and side lobe from printing out |
| 04/26/2007 | US20070092841 Illumination improves imaging for hybrid pattern with a sufficient depth of focus by having a mask with a contact hole pattern including a hybrid pattern and using an illumination light that has plural poles and projecting an image of the mask onto a plate through a projection optics |
| 04/26/2007 | US20070092840 System and method for photolithography in semiconductor manufacturing |
| 04/26/2007 | US20070092835 decreased fish eye defects; improved workability |
| 04/26/2007 | US20070092810 Mask-less method of forming aligned semiconductor wafer features |
| 04/26/2007 | US20070092805 Microlithography method using a mask with curved surface |
| 04/26/2007 | US20070092804 Photopolymerizable medium comprising siloxane compounds that support cationic polymerization for holographic storage |
| 04/26/2007 | US20070092746 Microelectronic wafers having photosensitive antireflective polyester and photoresist multilayers used to form integrated circuits; relief images |
| 04/26/2007 | US20070091968 Two-stage laser system for aligners |
| 04/26/2007 | US20070091451 Microlithography projection objective with crystal lens |
| 04/26/2007 | US20070091440 Method and System for Correction of Intrinsic Birefringence in UV Microlithography |
| 04/26/2007 | US20070091420 Multilayer reflective film coated substrate, manufacturing method thereof, reflective mask blank, and reflective mask |
| 04/26/2007 | US20070091327 Spectroscopic Scatterometer System |
| 04/26/2007 | US20070091288 Protective layer on objective lens for liquid immersion lithography applications |
| 04/26/2007 | US20070091275 Cooling apparatus |
| 04/26/2007 | US20070089671 Yield and line width performance for liquid polymers and other materials |
| 04/26/2007 | DE202006018004U1 Vorrichtung zur Aufbewahrung und Benutzung wenigstens einer Photomaske für die lithographische Projektion Device for the storage and use at least a photomask for the lithographic projection |
| 04/26/2007 | DE10301626B4 Transportsystem mit Spülung einer optischen Einheit Transport system with flushing an optical unit |
| 04/26/2007 | DE10255623B4 Verfahren zum Justieren eines Wafers in einem Photolithographieverfahren Method for adjusting a wafer in a photolithography process |
| 04/26/2007 | DE102006041436A1 Electron beam dosage computing method for e.g. electron beam lithographic device, involves utilizing parameter values to create illustration of basic dosages of beams and to prepare illustration of proximity effect correction coefficients |
| 04/26/2007 | DE102006000783B3 Negatively working, radiation sensitive element, useful in lamps and lasers, comprises a carrier and a radiation sensitive coating comprising photo initiator, sensitizer system and co-initiator, and a radically polymerizable oligomer |
| 04/26/2007 | DE102005049942A1 Polarizers for illumination system of a microlithographic projection lighting unit as for integrated circuits has polarization-selective beam dividing layers alternately inclined to optical axis |
| 04/26/2007 | DE10142651B4 Verfahren zur Herstellung von hoch homogenen strahlenbeständigen streufreien Einkristallen, eines damit erhaltenen Ingots sowie deren Verwendung Process for the preparation of highly homogeneous radiation resistant scattering-free single crystals of an ingot thus obtained and their use |
| 04/25/2007 | EP1777590A2 Gas shower, lithographic apparatus and use of a gas shower |
| 04/25/2007 | EP1777589A2 Immersion lithography apparatus and method |
| 04/25/2007 | EP1777587A1 A method of cleaning a surface of a photomask |
| 04/25/2007 | EP1777274A1 Pigment dispersion composition, use thereof and compound for treating pigment |
| 04/25/2007 | EP1777268A2 Organic pigments for colour filter |
| 04/25/2007 | EP1777267A2 Process for the preparation of metallic azo compounds by means of re-pumping |
| 04/25/2007 | EP1777266A2 Process for the preparation of metal compounds of azo compounds in the presence of seeding crystals |
| 04/25/2007 | EP1777067A1 A method for making a lithographic printing plate precursor |
| 04/25/2007 | EP1776968A2 Low-viscosity radiation-curable formulation for the preparation of ear pieces with antimicrobial properties |
| 04/25/2007 | EP1776607A1 Transmissive element |
| 04/25/2007 | EP1776236A2 Imaging a violet sensitive printing plate |
| 04/25/2007 | EP1485949A4 Novel planarization method for multi-layer lithography processing |
| 04/25/2007 | EP1436297B1 Photoactivable nitrogen bases |
| 04/25/2007 | EP1311627B1 Process for producing coatings using surface-accumulating photoinitiators |
| 04/25/2007 | EP1252691A4 Wavemeter for gas discharge laser |
| 04/25/2007 | CN2893752Y Photosensitive resin flexible printing plate roll |
| 04/25/2007 | CN1954408A Exposure apparatus, exposure method, and method for producing device |
| 04/25/2007 | CN1954407A Exposure method and method for producing device |
| 04/25/2007 | CN1954406A Projection optical system, exposure apparatus, and exposure method |
| 04/25/2007 | CN1954272A Hologram recording material and hologram recording medium |
| 04/25/2007 | CN1954271A Hologram recording material and hologram recording medium |
| 04/25/2007 | CN1954267A Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof |
| 04/25/2007 | CN1954266A A vibration damper or isolator |
| 04/25/2007 | CN1954265A Antireflective film-forming composition containing vinyl ether compound |
| 04/25/2007 | CN1954264A Positive photosensitive resin composition, and interlayer dielectrics and micro lenses made therefrom |
| 04/25/2007 | CN1954263A Formation of metal-insulator-metal capacitor using a hardmask |
| 04/25/2007 | CN1954007A Thermally reactive infrared absorption polymers and their use in a heat sensitive lithographic printing plate |
| 04/25/2007 | CN1952791A Developing method, substrate treating method, and substrate treating apparatus |
| 04/25/2007 | CN1952790A Substrate, method of exposing a substrate, machine readable medium |
| 04/25/2007 | CN1952789A Direct write-in method and apparatus of parallel laser based on harmonic resonance method |
| 04/25/2007 | CN1952787A Method and system for manufacturing integrated circuit assembly |
| 04/25/2007 | CN1952786A Gas shower, lithographic apparatus and use of a gas shower |
| 04/25/2007 | CN1952785A Immersion lithography apparatus and method |
| 04/25/2007 | CN1952784A Microlens structure for semiconductor image sensors and method of forming microlens |
| 04/25/2007 | CN1952783A 曝光方法 Exposure method |
| 04/25/2007 | CN1952782A Method for forming feature definitions |