Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2007
05/03/2007US20070099129 Developing method and developing apparatus
05/03/2007US20070099128 Method for manufacturing insulating resin layer, substrate for electro-optical devices, method for manufacturing electro-optical device, and electro-optical device
05/03/2007US20070099127 Compact integrated capacitor
05/03/2007US20070099126 Methods of fabricating integrated circuit transistors by simultaneously removing a photoresist layer and a carbon-containing layer on different active areas
05/03/2007US20070099125 Fabrication Method for a Damascene Bit Line Contact Plug
05/03/2007US20070099122 exposing a photoresist layer with regions of photosensitivity to an image in a planography process using high numerical aperture imaging tools
05/03/2007US20070099120 Developing solution for lithographic printing plate precursor and method for making lithographic printing plate
05/03/2007US20070099117 Sulfonamide compound, polymer compound, resist material and pattern formation method
05/03/2007US20070099107 Copolymer of vinylphenol and (meth)acrylic ester, improves resolution and yields a resist pattern with a favorable shape; resist layer is formed on either a magnetic film or a metallic oxidation prevention film formed on magnetic film, layer is less prone to tailing and undercutting phenomena
05/03/2007US20070099100 Method for exposing a substrate and lithographic projection apparatus
05/03/2007US20070099099 Lithographic apparatus and device manufacturing method
05/03/2007US20070099098 Reference marks is placed inside a pattern area on a first layer mask which is used to form the first layer pattern, plurality of second reference marks is placed on a second layer mask which is used to form the second layer pattern and in which one second reference mark is matched
05/03/2007US20070099094 Method for producing color filter for image sensor
05/03/2007US20070099093 Method for providing representative features for use in inspection of photolithography mask and for use in inspection of photo-lithographically developed and/or patterned wafer layers, and products of same
05/03/2007US20070099091 Method of the adjustable matching map system in lithography
05/03/2007US20070098401 Substrate processing method and apparatus thereof
05/03/2007US20070097355 Reticle and optical characteristic measuring method
05/03/2007US20070097354 Support mechanism, exposure apparatus having the same, and aberration reducing method
05/03/2007US20070097344 Spatial light modulator, lithographic apparatus and device manufacturing method
05/03/2007US20070097343 Lithographic apparatus and device manufacturing method
05/03/2007US20070097314 Process for the fabrication of optical microstructures
05/03/2007US20070096355 Photocurable resin composition
05/03/2007US20070096331 Semiconductor device and method of manufacturing the same
05/03/2007US20070096056 One component resin composition curable with combination of light and heat and use of the same
05/03/2007US20070095469 Formation of self-assembled monolayers
05/03/2007US20070095465 Exposure station for film webs
05/03/2007DE19534165B4 Verfahren zur Bestrahlung einer Oberfläche eines Werkstücks und Einrichtung zur Bestrahlung einer Oberfläche eines Werkstücks A method for irradiating a surface of a workpiece and means for irradiating a surface of a workpiece
05/03/2007DE10310136B4 Maskensatz zur Projektion von jeweils auf den Masken des Satzes angeordneten und aufeinander abgestimmten Strukturmustern auf einen Halbleiterwafer Arranged set of masks for the projection of each of the masks of the sentence and concerted structural patterns on a semiconductor wafer
05/03/2007DE102006033447A1 System und Verfahren für die Photolithographie in der Halbleiterherstellung System and method for photolithography in semiconductor production
05/03/2007DE102005051824A1 Methods of modeling and parameter determination for an illumination distribution in photolithographic imaging of a mask on a semiconductor wafer supplies calculated illumination distributions
05/03/2007DE102004014482B4 Verfahren zum Erweitern von Limitierungen für Strukturweiten beim Herstellungsprozess von Fotomasken Method for upgrading of limitations for feature sizes in the manufacturing process of photomasks
05/03/2007DE10000193B4 Optisches System Optical system
05/03/2007CA2626327A1 Antimony-free photocurable resin composition and three dimensional article
05/02/2007EP1780786A1 Stage apparatus, exposure apparatus, and exposure method
05/02/2007EP1780773A1 Method of determining exposure conditions, exposure method, exposure apparatus, and method of producing device
05/02/2007EP1780772A1 Exposure equipment and device manufacturing method
05/02/2007EP1780771A1 Aligning apparatus, aligning method, exposure apparatus, exposure method and device manufacturing method
05/02/2007EP1780770A1 Light detecting apparatus, illumination optical apparatus, exposure apparatus and exposure method
05/02/2007EP1780602A2 Apparatus and method for improving detected resolution and/or intensity of a sampled image
05/02/2007EP1780601A2 Lithographic apparatus and device manufacturing method
05/02/2007EP1780600A1 Lower layer film forming composition for lithography including naphthalene ring having halogen atom
05/02/2007EP1780599A1 Photosensitive composition, pattern forming material, photosensitive laminate, pattern forming apparatus and method of pattern formation
05/02/2007EP1780598A1 Colored curable compositions, color filters and process for production thereof
05/02/2007EP1780570A2 Correction of birefringence in cubic crystalline optical systems
05/02/2007EP1780230A1 Polymer and compositions
05/02/2007EP1780199A1 Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
05/02/2007EP1780198A1 Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
05/02/2007EP1779481A2 Method and apparatus for gas discharge laser output light coherency reduction
05/02/2007EP1779410A2 Systems and methods for reducing the influence of plasma-generated debris on the internal components of an euv light source
05/02/2007EP1779200A1 Surface microstructuring device
05/02/2007EP1779199A1 Aqueous edge bead remover
05/02/2007EP1779198A1 Photosensitive composition for use in producing printing plate, and photosensitive printing original plate laminate and printing plate using the photosensitive composition
05/02/2007EP1779197A1 Display panel includidng patterned spacer
05/02/2007EP1779196A1 Binder-free photopolymerizable compositions
05/02/2007EP1779195A2 Aqueous developable photo-imageable composition precursors for use in photo-patterning methods
05/02/2007EP1778759A1 Photosensitive dielectric resin compositions and their uses
05/02/2007EP1778636A1 Oxime ester photoinitiators
05/02/2007EP1676467B1 Electroluminescent devices and methods
05/02/2007EP1660946B1 Method and device for lithography by extreme ultraviolet radiation
05/02/2007EP1629525B1 A structure for a semiconductor arrangement and a method of manufacturing a semiconductor arrangement
05/02/2007CN1957443A Plate member, substrate holding device, exposure device and method, and element manufacturing method
05/02/2007CN1957300A Negative photosensitive composition and negative photosensitive lithography plate
05/02/2007CN1957299A Radiation-sensitive composition, multilayer body and method for producing same, and electronic component
05/02/2007CN1957298A Method of forming a metal pattern on a substrate
05/02/2007CN1957011A Radiation curable liquid resin composition for optical three-dimensional molding and optical molded article obtained by photocuring same
05/02/2007CN1956064A Method of forming patterns and method of manufacturing magnetic recording media
05/02/2007CN1955849A Cooling plate, bake unit, and substrate treating apparatus
05/02/2007CN1955848A Immersion lithography apparatus, lithography apparatus and cleaning methods thereof
05/02/2007CN1955847A System and method for photolithography in semiconductor manufacturing
05/02/2007CN1955846A Salt suitable for an acid generator and a chemically amplified resist composition containing the same
05/02/2007CN1955845A Salt suitable for an acid generator and a chemically amplified resist composition containing the same
05/02/2007CN1955844A Salt suitable for an acid generator and a chemically amplified resist composition containing the same
05/02/2007CN1955843A Photonasty resin compositon
05/02/2007CN1955842A Photoetching equipment
05/02/2007CN1955841A Laser induced thermal imaging mask and fabrication method for organic electroluminescent device
05/02/2007CN1955840A Fabrication method of photomask-blank
05/02/2007CN1314300C Star pinch x-ray and extreme ultraviolet photon source
05/02/2007CN1314079C Photomask, pattern formation method using photomask and mask data creation method for photomask
05/02/2007CN1313886C Device manufacturing method
05/02/2007CN1313885C Method of removing resist pattern
05/02/2007CN1313884C Method and device for lithography
05/02/2007CN1313883C Printed circuit board
05/02/2007CN1313882C Positive type photo erosion resistant agent composition used for outlet spray nozzle coating method and forming method anticorrosion picture
05/02/2007CN1313881C Photosensitve resin composition
05/02/2007CN1313880C Photoresist polymer, photoresist composition containing the same and pattern forming method
05/02/2007CN1313876C Method for manufacturing dot structure of thin film transistor liquid crystal display
05/02/2007CN1313870C Colour optical filter and producing method thereof
05/02/2007CN1313534C Resin composition, optical filter, and plasma display
05/01/2007US7212286 When a plurality of measurement marks exist related a shot, measurement marks to be used for alignment are selected therefrom independently of each other.
05/01/2007US7212277 Substrate holding technique
05/01/2007US7212276 Exposure apparatus
05/01/2007US7212275 Exposure apparatus with laser device
05/01/2007US7212274 Cooling system, exposure apparatus having the same, and device manufacturing method
05/01/2007US7212273 Exposure apparatus and method of producing device
05/01/2007US7212266 Liquid crystal display having reflection electrodes
05/01/2007US7211908 Magnetic floating device
05/01/2007US7211855 Intermediate semiconductor device structure including multiple photoresist layers
05/01/2007US7211453 Method and apparatus for personalization of semiconductor
05/01/2007US7211372 Aligning a reticle along a scanning direction, the reticle characterized by a reticle width and a reticle length and comprising a reticle pattern;exposing the reticle pattern onto a portion of an exposure area on a substrate; moving the substrate perpendicular to the scanning direction
05/01/2007US7211371 Gate electrode wiring, transparent conducting electrode, and the first electrode of the storage capacity are formed while the first mask is processing. selective deposition of the first metal wiring, photo-resist lift-off
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