| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/09/2007 | EP1782127A1 Lithographic printing plate precursor |
| 05/09/2007 | EP1690135A4 Resist, barc and gap fill material stripping chemical and method |
| 05/09/2007 | EP1614000A4 Optical arrangement of autofocus elements for use with immersion lithography |
| 05/09/2007 | EP1598398B1 Curable composition |
| 05/09/2007 | EP1556896A4 Anti-reflective compositions comprising triazine compounds |
| 05/09/2007 | CN1961619A Atomic beam to protect a reticle |
| 05/09/2007 | CN1961262A Device for covering substrates in a rotating manner |
| 05/09/2007 | CN1961261A Radiation-sensitive composition, laminate, process for producing the sane and electronic part |
| 05/09/2007 | CN1961260A Photoactive compounds |
| 05/09/2007 | CN1961259A Fabrication and use of superlattice |
| 05/09/2007 | CN1961228A Aperture diaphragm assembly for high power laser beams |
| 05/09/2007 | CN1961065A Nanoelectronic and microelectronic cleaning compositions |
| 05/09/2007 | CN1960022A High resolution structures defined by brush painting fluid onto surface energy patterned substrates |
| 05/09/2007 | CN1959977A Semiconductor device, method of forming wiring pattern, and method of generating mask wiring data |
| 05/09/2007 | CN1959951A Carrying processing device |
| 05/09/2007 | CN1959944A Method for removing photoresist, and method for fabricating semiconductor component |
| 05/09/2007 | CN1959940A Forming method of part semiconductor assembly |
| 05/09/2007 | CN1959542A Composition for removing immersion lithography solution and method for manufacturing semiconductor device |
| 05/09/2007 | CN1959541A Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of lithographic apparatus |
| 05/09/2007 | CN1959540A Method for attaching a scale to a carrier, a scale, and carrier having a scale |
| 05/09/2007 | CN1959539A Pattern density control method using edge printing processes |
| 05/09/2007 | CN1959538A Around exposure device and method thereof |
| 05/09/2007 | CN1959537A Around exposure device irradiated by laser beam and uv-ray, and method thereof |
| 05/09/2007 | CN1959536A Laser beam exposure device and method thereof |
| 05/09/2007 | CN1959535A Around exposure device irradiated by laser beam and uv-ray, and method thereof |
| 05/09/2007 | CN1959534A Around exposure device and method thereof |
| 05/09/2007 | CN1959533A Accurate vibration isolation system in use for step-by-step scanning photo-etching device |
| 05/09/2007 | CN1959532A Self-adapting sensor system for focusing and leveling adjustment, and application method |
| 05/09/2007 | CN1959531A Method for forming multi-layer bumps on a substrate |
| 05/09/2007 | CN1959530A Ultraviolet light solidified coating in use for post processing of imaging material |
| 05/09/2007 | CN1959529A Method of forming etching mask |
| 05/09/2007 | CN1959527A Phase shift type mask and preparation method, and method for manufacturing semiconductor elements |
| 05/09/2007 | CN1959510A Pixel structure of liquid crystal display of thin film transistor, and fabricating method |
| 05/09/2007 | CN1959509A Pixel structure of liquid crystal display of thin film transistor, and fabricating method |
| 05/09/2007 | CN1959508A Baseplate structure of TFT LCD array, and preparation method |
| 05/09/2007 | CN1959449A Method and apparatus for manufacturing a pixel matrix of a color filter for a flat panel display |
| 05/09/2007 | CN1958763A Agent of cleaning edge rubber |
| 05/09/2007 | CN1958629A Organic anti-reflective coating polymer, organic anti-reflective coating composition and method for forming photoresist pattern |
| 05/09/2007 | CN1958177A Acid-free cleaning process for substrates, in particular masks and mask blanks |
| 05/09/2007 | CN1315174C Method for manufacturing liquid discharging head |
| 05/09/2007 | CN1315169C Parallel, individually addressable probes for nanolithography |
| 05/09/2007 | CN1315165C Method for manufacturing semiconductor, electro-optical device, integrated circuit and electronic device |
| 05/09/2007 | CN1315007C Transfer basic board platform for exposure equipment |
| 05/09/2007 | CN1314578C Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
| 05/09/2007 | CN1314546C Support device for offset printing plate and offset printing plate raw sheet |
| 05/08/2007 | US7216009 Machine vision systems for use with programmable material consolidation system and associated methods and structures |
| 05/08/2007 | US7215804 Method and apparatus for providing a bioinformatics database |
| 05/08/2007 | US7215471 Diffractive optical element, illumination system comprising the same, and method of manufacturing semiconductor device using illumination system |
| 05/08/2007 | US7215411 Method of exposing wafer using scan-type exposure apparatus |
| 05/08/2007 | US7215410 Exposure apparatus |
| 05/08/2007 | US7215409 Image forming method and apparatus |
| 05/08/2007 | US7215408 Specification determining method, projection optical system making method and adjusting method, exposure apparatus and making method thereof, and computer system |
| 05/08/2007 | US7215095 Driving apparatus, exposure apparatus, and device manufacturing method |
| 05/08/2007 | US7214951 Charged-particle multi-beam exposure apparatus |
| 05/08/2007 | US7214743 Co-polycondensation product of phenol derivative and a cycloaliphatic hydrocarbon such as dicyclopentadiene; antireflection film for exposure with short wavelength; transparency, etching resistance; lithography |
| 05/08/2007 | US7214733 Positive type resist composition |
| 05/08/2007 | US7214624 Resist pattern forming method, magnetic recording medium manufacturing method and magnetic head manufacturing method |
| 05/08/2007 | US7214549 Correcting device, exposure apparatus, device production method, and device produced by the device production method |
| 05/08/2007 | US7214537 Process control; monitoring concentration of hydrogen peroxide, hydroxylamine |
| 05/08/2007 | US7214474 Poly(dodecylacrylate-co-sodium acrylate), poly(styrene-co-alpha-methylstyrene-co-acrylic acid), poly(acrylic acid-co-methyl methacrylate), hydrophobic poly(acrylic acid), poly (vinylnaphtalene-alt-maleic acid)-g-polystyrene, and a poly(2-hydroxyethyl-11-methacryloyloxyundecyldimethylammonium bromide) |
| 05/08/2007 | US7214473 Method for removing patterned layer from lower layer through reflow |
| 05/08/2007 | US7214472 Printing plate material and printing process employing the same |
| 05/08/2007 | US7214471 Alkali-soluble copolymer of p-isopropenylphenol, unsaturated carboxy acid, acrylic ester, and unsaturated aliphatic polycyclic compound, especially isobornyl (meth)acrylate and tricyclo[5.2.1.02,6]decanyl (meth)acrylate; unsaturated compound; and radical polymerization initiator; used for forming bumps |
| 05/08/2007 | US7214470 Photoresists; mixture with solvent and photoacid generator |
| 05/08/2007 | US7214469 Image recording layer contains an infrared absorber and a graft polymer graft chain containing a hydrophilic segment; image recording by infrared laser scanning and an on-press development and excellent in fine line reproducibility and press life while maintaining good on-press developing properties |
| 05/08/2007 | US7214468 comprising a flexible support having a hydrophilic layer and an image forming layer; superior exposure visibility of images formed upon exposure to lasers or near-infrared rays and enhanced sensitivity without producing stains in the printer; printing |
| 05/08/2007 | US7214467 Containing an unsaturated resin which decomposes by an action of acid to increase the solubility in alkaline developer |
| 05/08/2007 | US7214466 Conductive, resistive, or dielectric particles and inorganic binder dispersed in an organic solvent containing an aqueous developable interpolymer of an acrylic ester and an unsaturated carboxylic acid; cationically polymerizable monomer; and a photoinitiation system; used to form plasma display panels |
| 05/08/2007 | US7214465 Fluorinated aromatic sulfonic acid generator; acid decomposable resin with alicyclic hydrocarbon structures; compound with at least 3 OH groups that may be substituted; onium alkanesulfonate |
| 05/08/2007 | US7214456 When the temporary image is exposed to indoor ambient conditions of darkness and/or indoor light, the contrast changes to the absence of contrast to erase the image; capable of undergoing multiple cycles of temporary image formation and temporary image erasure |
| 05/08/2007 | US7214455 Photosensitive resin composition and process for producing heat-resistant resin film |
| 05/08/2007 | US7214454 Positively photosensitive insulating resin composition and cured object obtained therefrom |
| 05/08/2007 | US7213963 Lithographic apparatus and device manufacturing method |
| 05/08/2007 | US7213628 Photosensitive layer laminator and photosensitive layer laminating method |
| 05/08/2007 | US7213516 Method of processing laser sensitive lithographic printing plate |
| 05/08/2007 | CA2222502C Removal of material by polarized radiation and back side application of radiation |
| 05/03/2007 | WO2007050704A2 Microstructure synthesis by flow lithography and polymerization |
| 05/03/2007 | WO2007050279A1 Triple layer anti-reflective hard mask |
| 05/03/2007 | WO2007050023A1 Writing apparatuses and methods |
| 05/03/2007 | WO2007050022A2 Writing apparatuses and methods |
| 05/03/2007 | WO2007049665A1 Alkali development-type photosensitive resin composition, substrate with projections for liquid crystal division alignment control formed using the same, and liquid crystal display device |
| 05/03/2007 | WO2007049640A1 Exposure method and exposure apparatus |
| 05/03/2007 | WO2007049637A1 Composition for forming upper film and method for forming photoresist pattern |
| 05/03/2007 | WO2007049604A1 Power transmission device, stage device, exposure apparatus, and method for manufacturing device |
| 05/03/2007 | WO2007049603A1 Stage apparatus, coordinate correction method for the stage apparatus, exposure apparatus, and device production method |
| 05/03/2007 | WO2007049593A1 Resist polymer, resist composition, method for manufacture of substrate having pattern formed thereon, polymerizable monomer, and method for production of polymerizable monomer |
| 05/03/2007 | WO2007049579A1 Squarylium compound and photopolymerizable composition for short-wavelength light source using same |
| 05/03/2007 | WO2007049524A1 Positive photosensitive resin composition |
| 05/03/2007 | WO2007049519A1 Photosensitive resin composition, photosensitive element comprising the same, method of forming resist pattern, and process for producing printed wiring board |
| 05/03/2007 | WO2007049440A1 Siloxane resin composition and method for producing same |
| 05/03/2007 | WO2007049436A1 Exposure apparatus |
| 05/03/2007 | WO2007048819A1 Antimony-free photocurable resin composition and three dimensional article |
| 05/03/2007 | WO2007048586A2 Polymer and compositions |
| 05/03/2007 | WO2007048474A1 Light beam intensity non-uniformity correction device and method for amending intensity distribution of a light beam |
| 05/03/2007 | WO2007031205A3 Stamp comprising a nanostamping structure, device and method for the production thereof |
| 05/03/2007 | WO2007027522A3 Composition and method for removing thick film photoresist |
| 05/03/2007 | WO2006131517A3 Illuminating device of a microlithographic projection exposure system |
| 05/03/2007 | WO2006076740A3 Synchronous raster scanning lithographic system |
| 05/03/2007 | US20070099337 Positive Tone Bi-Layer Imprint Lithography Method |
| 05/03/2007 | US20070099323 Manufacturing method of display device and mold therefor |