| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/15/2007 | US7218399 Method and apparatus for measuring optical overlay deviation |
| 05/15/2007 | US7218383 Holding system, exposure apparatus, and device manufacturing method |
| 05/15/2007 | US7218382 Load-lock technique |
| 05/15/2007 | US7218379 Scanning exposure apparatus and method |
| 05/15/2007 | US7218377 Exposure apparatus and device manufacturing method |
| 05/15/2007 | US7218335 Image recording apparatus and image recording method |
| 05/15/2007 | US7217941 Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source |
| 05/15/2007 | US7217940 Collector for EUV light source |
| 05/15/2007 | US7217923 Microstructured pattern inspection method |
| 05/15/2007 | US7217756 High performance water-based primer |
| 05/15/2007 | US7217672 Optical glass suffering little change in refractive index by radiation of light |
| 05/15/2007 | US7217654 Semiconductor device and method of manufacturing the same |
| 05/15/2007 | US7217581 Misalignment test structure and method thereof |
| 05/15/2007 | US7217562 Preparing a fluidic device for detection of restriction fragment length polymorphism; high throughput macromolecular analysis using diffraction gradient lithography gradient interfaces |
| 05/15/2007 | US7217503 Illuminating photomasks to resolve patterning via projection optical system; for fabricating semiconductor chips, integrated circuits, and liquid crystal displays |
| 05/15/2007 | US7217502 Nanopastes for use as patterning compositions |
| 05/15/2007 | US7217501 Development; wear resistance; using computers; support , heat sensitive layer |
| 05/15/2007 | US7217500 Color image-forming material and lithographic printing plate precursor |
| 05/15/2007 | US7217499 Supports suitable for so-called direct plate-making positive-type lithographic printing plates, which can be used for direct plate-making by receiving digital signals from a computer |
| 05/15/2007 | US7217498 Heat-sensitive lithographic printing plate precursor |
| 05/15/2007 | US7217497 Undercoating for ultraviolet radiation lithography; chemical amplified photoresists; semiconductor |
| 05/15/2007 | US7217496 Fluorinated photoresist materials with improved etch resistant properties |
| 05/15/2007 | US7217495 Fluorinated polymers, photoresists and processes for microlithography |
| 05/15/2007 | US7217493 acid-decomposable group-containing polysiloxane or polysilsesquioxane and a specific amount of an acid generator that generates a sulfonic acid, and an organic base; high sensitivity, high resolution and good line edge roughness |
| 05/15/2007 | US7217492 Onium salt compound and radiation-sensitive resin composition |
| 05/15/2007 | US7217491 Polyester and/or a polyurethane; and a tetraamidomethyl ether crosslinker |
| 05/15/2007 | US7217490 Processes for producing silane monomers and polymers and photoresist compositions comprising same |
| 05/15/2007 | US7217489 A negative-type planographic printing plate having, disposed on a support, a recording layer comprising an image recording material which contains an infrared ray absorbing agent and can be recorded by irradiation with an infrared ray, infrared |
| 05/15/2007 | US7217481 Thin films; sputtering target in vacuum; multilayer construction; crhromium nitride; chromium carbide and chromium oxynitride overcoating transparent substrate; photolithography |
| 05/15/2007 | US7217334 Method for forming film, method for forming wiring pattern, method for manufacturing semiconductor device, electro-optical device, and electronic device |
| 05/15/2007 | CA2325716C Liquid, radiation-curable composition, especially for stereolithography |
| 05/10/2007 | WO2007053396A2 Silsesquioxane-titania hybrid polymers |
| 05/10/2007 | WO2007052748A1 Substrate with septum for use in ink jet color filter, method for manufacture of the substrate, color filter provided with the substrate, method for manufacture of the color filter, and liquid crystal device having the color filter |
| 05/10/2007 | WO2007052699A1 Analyzing apparatus, processing apparatus, measuring instrument, exposure apparatus, substrate processing system, analysis method, and program |
| 05/10/2007 | WO2007052659A1 Exposure apparatus, exposure method and device manufacturing method |
| 05/10/2007 | WO2007052545A1 Washing liquid and washing method |
| 05/10/2007 | WO2007052544A1 Washing liquid and washing method |
| 05/10/2007 | WO2007052540A1 Photosensitive resin composition |
| 05/10/2007 | WO2007052470A1 Lithographic printing plate material, lithographic printing plate, method for preparing lithographic printing plate, and method for printing by lithographic printing plate |
| 05/10/2007 | WO2007052132A1 Anti-reflective coatings |
| 05/10/2007 | WO2007051646A1 Light sensitive component for use in photoresists |
| 05/10/2007 | WO2007051638A1 Optical component, inparticular collector for use in euv lithography |
| 05/10/2007 | WO2007051574A1 Microlithographic projection exposure apparatus |
| 05/10/2007 | WO2007051537A2 High power euv lamp system |
| 05/10/2007 | WO2007051403A1 An edge bead remover composition |
| 05/10/2007 | WO2007025783A3 Microlithographic projection lighting system |
| 05/10/2007 | WO2006132962A3 Novel photosensitive resin compositions |
| 05/10/2007 | WO2006111319A3 Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system |
| 05/10/2007 | WO2000045519A3 Broad band controlled angle analog diffuser and associated method s |
| 05/10/2007 | US20070106056 Crosslinked polyimide, composition comprising the same and method for producing the same |
| 05/10/2007 | US20070106021 Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof |
| 05/10/2007 | US20070105396 High resolution structures defined by brush painting fluid onto surface energy patterned substrates |
| 05/10/2007 | US20070105363 Antireflective Hardmask and Uses Thereof |
| 05/10/2007 | US20070105131 Sequencing of surface immobilized polymers utilizing microfluorescence detection |
| 05/10/2007 | US20070105058 Dual Layer Workpiece Masking and Manufacturing Process |
| 05/10/2007 | US20070105057 improved adhesion; heat treatment; photocatalysts; vapor deposition |
| 05/10/2007 | US20070105055 Manufacturing method of master disc for optical disc, and master disc for optical disc |
| 05/10/2007 | US20070105054 Pattern forming method and manufacturing method of semiconductor device |
| 05/10/2007 | US20070105053 Method of manufacturing semiconductor device |
| 05/10/2007 | US20070105052 Method of making thin film transistor liquid crystal display |
| 05/10/2007 | US20070105051 interconnecting, via phase shifting photomasks, photoresists, with sacrificial film on or over wafer; etching |
| 05/10/2007 | US20070105050 Method and apparatus for producing microchips |
| 05/10/2007 | US20070105038 Positive resist composition and method for forming resist pattern |
| 05/10/2007 | US20070105037 Thick film photoresist composition and method of forming resist pattern |
| 05/10/2007 | US20070105036 Photosensitive element, resist pattern formation method and printed wiring board production method |
| 05/10/2007 | US20070105029 semiconductors; lithography; etching; microelectronics |
| 05/10/2007 | US20070105028 Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device |
| 05/10/2007 | US20070104892 Method for fixing metal particles and method for manufacturing substrate containing metal particles, method for manufacturing substrate containing carbon nanotube, and method for manufacturing substrate containing semiconductor-crystalline rod, employing thereof |
| 05/10/2007 | US20070103689 Projection optical system, exposure apparatus and device fabricating method |
| 05/10/2007 | US20070103662 Environmental system including vacuum scavenge for an immersion lithography apparatus |
| 05/10/2007 | US20070103658 Lithographic projection device, method an substrate for manufacturing electronic devices, and obtained electronic device |
| 05/10/2007 | US20070103655 Lithographic apparatus, device manufacturing method and a substrate |
| 05/10/2007 | US20070103639 Method of manufacturing a mould for producing an optical surface, a method of producing a contact lens and a device for use with these methods |
| 05/10/2007 | US20070102651 includes semiconductor substrate and bottom coupled die |
| 05/10/2007 | US20070102620 Method and array for determining the focal position during imaging of a sample |
| 05/10/2007 | US20070102117 Substrate processing system and substrate processing method |
| 05/10/2007 | DE19848861B4 Herstellungsprozeß einer Halbleitervorrichtung durch Elektronenstrahllithographie Manufacturing process of a semiconductor device by electron beam lithography |
| 05/10/2007 | DE10224164B4 Eine zweidimensionale Struktur zum Bestimmen einer Überlagerungsgenauigkeit mittels Streuungsmessung A two-dimensional structure for determining an overlay accuracy using scatterometry |
| 05/10/2007 | DE102005053415A1 Optisches Bauelement mit verbessertem thermischen Verhalten An optical device with improved thermal behavior |
| 05/10/2007 | DE102005052885A1 Lichtempfindliche Komponente zur Verwendung in Photoresists The light-sensitive component for use in photoresists |
| 05/10/2007 | DE102005051972A1 Forming very small semiconductor structures comprises first forming structure on prepared substrate by electron beam lithography, and subsequently forming second structure by optical lithography |
| 05/09/2007 | EP1783823A1 Exposure method and method for producing device |
| 05/09/2007 | EP1783822A1 Exposure device, exposure device member cleaning method, exposure device maintenance method, maintenance device, and device manufacturing method |
| 05/09/2007 | EP1783821A1 Exposure system and device production method |
| 05/09/2007 | EP1783556A2 Lithographic apparatus and device manufacturing method |
| 05/09/2007 | EP1783555A2 Lithographic apparatus and device manufacturing method |
| 05/09/2007 | EP1783554A1 Exposure equipment |
| 05/09/2007 | EP1783553A1 Method of studying interaction between immersion fluid and substrate |
| 05/09/2007 | EP1783552A1 Photopolymerizable composition for producing printing forms |
| 05/09/2007 | EP1783551A2 Resist composition and patterning process |
| 05/09/2007 | EP1783550A1 Positive resist composition and pattern formation method using the positive resist composition |
| 05/09/2007 | EP1783548A2 Photosensitive composition |
| 05/09/2007 | EP1783547A2 Imprint lithography |
| 05/09/2007 | EP1783525A1 Projection optical system, exposure apparatus, and exposure method |
| 05/09/2007 | EP1783153A2 Fluorine-containing epoxy resin composition, and surface modification process, ink jet recording head and ink jet recording apparatus making use of the same |
| 05/09/2007 | EP1783148A1 High-molecular compound, acid generator, positive resist compositions, and method for formation of resist patterns |
| 05/09/2007 | EP1782456A1 Exposure apparatus, exposure method, and exposure mask |
| 05/09/2007 | EP1782133A1 Holographic lithography |
| 05/09/2007 | EP1782129A1 Method and apparatus for development of lithographic printing plate precursor |
| 05/09/2007 | EP1782128A2 Illumination system of a microlithographic exposure apparatus |