| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/22/2007 | US7220306 Pigment produced by treating an organic pigment or carbon black each having a functional group reactive with a carbodiimide group; and a polyester side chains, polyether side chain, or a polyacrylic side chain |
| 05/22/2007 | CA2407773C Lithographic imaging with printing members having multiphase laser-responsive layers |
| 05/18/2007 | WO2007056369A2 Batch photoresist dry strip and ash system and process |
| 05/18/2007 | WO2007055929A1 Cyclocarbonate-containing energy-curable compositions |
| 05/18/2007 | WO2007055373A1 Liquid recovery member, exposure apparatus, exposure method, and device production method |
| 05/18/2007 | WO2007055272A1 Positive resist composition and method for forming resist pattern |
| 05/18/2007 | WO2007055237A1 Exposure apparatus, exposure method and device manufacturing method |
| 05/18/2007 | WO2007055220A1 Photosensitive composition, phososensitive film, permanent pattern, and method for formation of the permanent pattern |
| 05/18/2007 | WO2007055199A1 Exposure apparatus and method, and method for manufacturing device |
| 05/18/2007 | WO2007055120A1 Lighting optical system, exposure system, and exposure method |
| 05/18/2007 | WO2007055079A1 Photosensitive resin composition and method of forming pattern |
| 05/18/2007 | WO2007054813A2 Developable undercoating composition for thick photoresist layers |
| 05/18/2007 | WO2007054506A1 Method for printing contacts on a substrate |
| 05/18/2007 | WO2007054443A1 Method and apparatus for control of layer thicknesses by spin coating |
| 05/18/2007 | WO2007054291A1 Euv illumination system with a system for measuring fluctuations of the light source |
| 05/18/2007 | WO2007016109A3 Imageable printing plate for on-press development |
| 05/18/2007 | WO2006105911B1 Exposure device for press plates |
| 05/18/2007 | WO2006017791A3 Aqueous developable photo-imageable composition precursors for use in photo-patterning methods |
| 05/17/2007 | US20070111490 Mask blank, mask blank manufacturing method, transfer mask manufacturing method, and semiconductor device manufacturing method |
| 05/17/2007 | US20070111352 Wafer with optical control modules in dicing paths |
| 05/17/2007 | US20070111256 Method for generating an artificially patterned substrate for stimulating the crystallation of a biomolecule thereon and method for stimulating the crystallization of biomolecules |
| 05/17/2007 | US20070111143 Method of fixing organic molecule and micro/nano article |
| 05/17/2007 | US20070111141 Negative-working photosensitive resin composition and photosensitive resin plate using the same |
| 05/17/2007 | US20070111137 Resist polymer solution and process for producing the same |
| 05/17/2007 | US20070111136 photopolymerizing compound with two or more acrylic ester bonds in the molecule which further containing ether or carbamate characteristic groups with a bond, breaks when monomer is heated, a photopolyerization initiator, acid generator e.g. halogenonium, sulfonium etc. a binder; curing; plating, etching |
| 05/17/2007 | US20070111135 Positive resist composition and method of forming resist pattern using same |
| 05/17/2007 | US20070111116 Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same |
| 05/17/2007 | US20070110916 Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method |
| 05/17/2007 | US20070109659 Refractive projection objective for immersion lithography |
| 05/17/2007 | US20070109525 Exposure apparatus and method |
| 05/17/2007 | US20070109524 Exposure method and device manufacturing method, exposure apparatus, and program |
| 05/17/2007 | US20070109523 Reticle cassette and exposure apparatus using reticle cassette |
| 05/17/2007 | US20070109521 Stage apparatus, exposure apparatus, and exposure method |
| 05/17/2007 | US20070109517 Exposure apparatus and device manufacturing method |
| 05/17/2007 | US20070109516 Exposure apparatus and device fabrication method |
| 05/17/2007 | US20070109515 Exposure apparatus and an exposure method |
| 05/17/2007 | US20070108396 Device for generating and emitting XUV radiation |
| 05/17/2007 | US20070107657 Device for spin-coating substrates |
| 05/17/2007 | US20070107615 Exposure processing method of a planographic printing plate and apparatus for executing the same method |
| 05/16/2007 | EP1786024A1 Method of optical lithography using phase shift masking |
| 05/16/2007 | EP1785771A2 Method for producing an image on a material sensitive to a used radiation, method for obtaining a binary hologram (variants) and methods for producing an image by using said hologram |
| 05/16/2007 | EP1785770A2 Stamp for micro/nano imprint lithography using diamond-like carbon and method of fabricating the same |
| 05/16/2007 | EP1785751A1 Optical element having multilayer film, and exposure apparatus having the optical element |
| 05/16/2007 | EP1785515A1 Method for knitting denim |
| 05/16/2007 | EP1785253A1 Process for producing molded item and apparatus therefor |
| 05/16/2007 | EP1784690A2 Plasma ashing process for increasing photoresist removal rate and plasma apparatus with cooling means |
| 05/16/2007 | EP1784465A1 Coating composition for film with low refractive index and film prepared therefrom |
| 05/16/2007 | EP1730477A4 Embedded attenuated phase shift mask with tunable transmission |
| 05/16/2007 | EP1673785B1 Plasma source of directed beams and application thereof to microlithography |
| 05/16/2007 | EP1642169B1 Exposure station for film webs |
| 05/16/2007 | EP1570422B1 Layer arrangement provided with a structure producing a diffractive optical effect and a lens-type effect |
| 05/16/2007 | EP1407521B1 Line narrowing unit with flexural grating mount |
| 05/16/2007 | EP1269514B1 An enhanced resist strip in a dielectric etcher using downstream plasma and plasma apparatus used therefor |
| 05/16/2007 | CN2901376Y Manipulator device for even film developing machine |
| 05/16/2007 | CN1965389A Substrate holding device, exposure device having the same, exposure method, method for producing device, and liquid repellent plate |
| 05/16/2007 | CN1965269A Aqueous edge bead remover |
| 05/16/2007 | CN1965268A Antireflection film for semiconductor containing condensation type polymer |
| 05/16/2007 | CN1965267A Photosensitive resin composition, and cured product and use thereof |
| 05/16/2007 | CN1965266A Photosensitive resin for flexographic printing plate |
| 05/16/2007 | CN1965265A Chemically amplified resist composition and method for forming resist pattern |
| 05/16/2007 | CN1965259A Catadioptric projection objective |
| 05/16/2007 | CN1964600A A steam atomizing film-pressing system |
| 05/16/2007 | CN1963995A Processing method and semiconductor manufacturing method |
| 05/16/2007 | CN1963994A Processing method and semiconductor manufacturing method |
| 05/16/2007 | CN1963679A Alignment mark structure for aligning wafer |
| 05/16/2007 | CN1963678A Method for limiting pattern |
| 05/16/2007 | CN1963677A A photoresist developer |
| 05/16/2007 | CN1963676A Testing tag and method for testing imaging quality of photoeching machine using the same |
| 05/16/2007 | CN1963675A Infiltrating type micro-image apparatus and process thereof |
| 05/16/2007 | CN1963674A Improved infiltrating type micro-image system with wafer sealing structure and method thereof |
| 05/16/2007 | CN1963673A Infiltrating type micro-image exposal apparatus and method thereof |
| 05/16/2007 | CN1963672A Method and device for manufacturing reconfiguration mask of integrate circuit by micro electromechanical system |
| 05/16/2007 | CN1963671A Coating apparatus and method of photosensitive resist |
| 05/16/2007 | CN1963670A 涂布装置 Coating device |
| 05/16/2007 | CN1963669A Hologram recording material and hologram recording medium |
| 05/16/2007 | CN1963668A Hologram recording material, and hologram recording medium |
| 05/16/2007 | CN1963667A Chemically amplified positive resist composition |
| 05/16/2007 | CN1963666A Method for fabricating integrated circuit features |
| 05/16/2007 | CN1963665A Film peeling off device |
| 05/16/2007 | CN1963664A Photosensitive hologram recording material of shortwave wide band and preparing method of the same |
| 05/16/2007 | CN1963651A Array base plate of thin film transistor of LCD and manufacturing method of the same |
| 05/16/2007 | CN1963616A Display and its manufacturing method |
| 05/16/2007 | CN1963615A Liquid crystal display device and fabrication method thereof |
| 05/16/2007 | CN1963614A Array substrate for liquid crystal display device and method of fabricating the same |
| 05/16/2007 | CN1963612A Display of initiative irradiance and passiveness reflection and manufacturing method thereof |
| 05/16/2007 | CN1316572C Substrate processing system and its processing method |
| 05/16/2007 | CN1316564C Composite photoresist layer structure |
| 05/16/2007 | CN1316562C Film-forming device |
| 05/16/2007 | CN1316482C Method and device for irradiating spots on a layer |
| 05/16/2007 | CN1316317C Composition for stripping photoresist and organic material from substrate surfaces |
| 05/16/2007 | CN1316316C Method of simulating patterns |
| 05/16/2007 | CN1316315C Antireflective composition |
| 05/16/2007 | CN1315943C Polymer for heat-sensitive lithographic printing plate precursor |
| 05/16/2007 | CN1315906C Modified polycyclic polymers |
| 05/16/2007 | CN1315719C Spacer assembly of partial photo-etching process used for silicon micro machining |
| 05/16/2007 | CN1315583C Base plate treater |
| 05/15/2007 | US7218985 Semiconductor manufacturing apparatus |
| 05/15/2007 | US7218661 Line selected F2 two chamber laser system |
| 05/15/2007 | US7218464 Aligning-assembling method for color wheel |
| 05/15/2007 | US7218445 Microlithographic reduction projection catadioptric objective |