Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2007
05/24/2007US20070114942 Discharge lamp
05/24/2007US20070114686 Method for expelling gas positioned between a substrate and a mold
05/24/2007US20070114470 Collector for EUV light source
05/24/2007US20070114469 Collector for EUV light source
05/24/2007US20070114468 Collector for EUV light source
05/24/2007US20070114467 Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system
05/24/2007US20070114452 Lithographic apparatus and device manufacturing method
05/24/2007US20070114450 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device
05/24/2007US20070113874 Substrate processing method and substrate processing apparatus
05/24/2007DE10228325B4 Verfahren zur Herstellung einer Halbleiterspeichervorrichtung durch den Einsatz eines mit ArF-Laserstrahl belichteten Photoresist-Musters A method of manufacturing a semiconductor memory device by the use of an exposed with ArF laser beam photoresist pattern
05/24/2007DE102006052015A1 Positionsmessvorrichtung und Positionsabweichungsmessverfahren Position measuring device and position deviation measurement method
05/24/2007DE102005053751A1 Mega sonic immersion lithography exposure apparatus e.g. stepper, for use in semiconductor integrated circuit, has mega sonic plate engaged to optical transfer chamber for propagating sonic waves through exposure liquid
05/24/2007DE102004029103B4 Wärmebehandlungseinrichtung und Wärmebehandlungsverfahren Heat treatment device and heat treatment process
05/24/2007DE10142600B4 Siliziumhaltiger Resist für die Fotolithografie bei kurzen Belichtungswellenlängen Silicon-containing resist for photolithography with short exposure wavelengths
05/23/2007EP1788694A1 Planar motor equipment, stage equipment, exposure equipment and device manufacturing method
05/23/2007EP1788618A1 Substrate processing method
05/23/2007EP1788617A1 Substrate holding device, exposure apparatus having same, exposure method, method for producing device, and liquid repellent plate
05/23/2007EP1788450A1 Method of making a lithographic printing plate
05/23/2007EP1788449A1 Method for making a lithographic printing plate
05/23/2007EP1788448A1 Method for making a lithographic printing plate
05/23/2007EP1788447A2 Exposure apparatus and device manufacturing method
05/23/2007EP1788446A2 Exposure apparatus and device manufacturing method
05/23/2007EP1788445A1 A method of determining an exposure dose and exposure apparatus
05/23/2007EP1788444A1 Method of making a lithographic printing plate
05/23/2007EP1788443A1 Method of making a lithographic printing plate
05/23/2007EP1788442A1 Method of making a lithographic printing plate
05/23/2007EP1788441A1 Method of making a lithographic printing plate
05/23/2007EP1788440A2 Barrier film material and pattern formation method using the same
05/23/2007EP1788439A1 Material for forming resist protective film and method for forming resist pattern using same
05/23/2007EP1788438A1 Material for formation of resist protection film and method of forming resist pattern therewith
05/23/2007EP1788437A2 Rework process for photoresist film
05/23/2007EP1788436A1 Rework process for photoresist film
05/23/2007EP1788435A1 Method of making a lithographic printing plate
05/23/2007EP1788434A1 Method of making a lithographic printing plate
05/23/2007EP1788433A2 Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method
05/23/2007EP1788431A2 Method of making a lithographic printing plate
05/23/2007EP1788430A1 Method of making a lithographic printing plate
05/23/2007EP1788429A1 Method of making a lithographic printing plate
05/23/2007EP1788012A1 Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method
05/23/2007EP1787809A1 Ink composition, inkjet recording method, printed material, production method of a planographic printing plate and planographic printing plate
05/23/2007EP1787168A1 Non-aqueous microelectronic cleaning compositions containing fructose
05/23/2007EP1787167A2 A laser projection system
05/23/2007EP1787166A1 Interlayer for lithographic printing plates
05/23/2007EP1787165A1 Method for forming an image suitable for multi-colour printing
05/23/2007EP1787164A2 Method and device for structuring a substrate
05/23/2007EP1787104A1 Holographic sensor
05/23/2007EP1377876A4 High resolution resists for next generation lithographies
05/23/2007EP1049142B1 Method and device for removing photoresist film
05/23/2007CN1969404A Imaging system for thermal transfer
05/23/2007CN1969372A EUV light source, EUV exposure equipment and semiconductor device manufacturing method
05/23/2007CN1969371A Support method and support structure for optical member, optical apparatus, exposure apparatus, and device production method
05/23/2007CN1969370A Analysis method, exposing equipment and exposing equipment system
05/23/2007CN1969234A A system for positioning a product
05/23/2007CN1969233A Photosensitive composition for use in producing printing plate, and photosensitive printing original plate laminate and printing plate using the photosensitive composition
05/23/2007CN1969232A Inorganic powder-containing resin composition, transfer film and method for producing member for plasma display panel
05/23/2007CN1969231A Method of forming plated product using negative photoresist composition and photosensitive composition used therein
05/23/2007CN1968815A Manufacturing method for liquid ejecting head and liquid ejecting head obtained by this method
05/23/2007CN1968573A Flexible PCB envelop forming method and its system
05/23/2007CN1967388A Composition for removing photoresist and method of forming a pattern using the same
05/23/2007CN1967387A Barrier film material and pattern formation method using the same
05/23/2007CN1967386A Wafer platform mask platform synchronous control system of step-scan photoetching machine
05/23/2007CN1967385A Anticorrdant dilution system
05/23/2007CN1967384A LCD tft manufacture using charge transfer stamp
05/23/2007CN1967383A 感光性树脂组合物 The photosensitive resin composition
05/23/2007CN1967382A A shared light shield layout method and manufacturing method of semiconductor element using same
05/23/2007CN1967381A Light shield improving joining effect and exposal method used the same
05/23/2007CN1967360A Liquid crystal display device and method for fabricating the same
05/23/2007CN1967337A Color light filter and manufacturing method of semi-transmission-type LCD device
05/23/2007CN1967293A Manufacturing method of eliminating aberration concave holographic grating
05/23/2007CN1966635A Aqueous alkaline photoresist cleaning composition and method of use
05/23/2007CN1966276A Method for proceeding flexible mixed printing on hose
05/23/2007CN1966270A Method of manufacturing inkjet printhead and inkjet printhead manufactured using the method
05/23/2007CN1317603C Light shade and its making method
05/22/2007US7222328 Semiconductor integrated circuit design tool, computer implemented method for designing semiconductor integrated circuit, and method for manufacturing semiconductor integrated circuit
05/22/2007US7222327 Photo mask, method of manufacturing photo mask, and method of generating mask data
05/22/2007US7221516 Projection lens for a microlithographic projection exposure apparatus
05/22/2007US7221501 Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems
05/22/2007US7221463 Positioning apparatus, exposure apparatus, and method for producing device
05/22/2007US7221460 Optical system in exposure apparatus, and device manufacturing method
05/22/2007US7221431 Exposure apparatus
05/22/2007US7221430 Lithographic apparatus and device manufacturing method
05/22/2007US7221060 Composite alignment mark scheme for multi-layers in lithography
05/22/2007US7220998 Electroluminescent element
05/22/2007US7220975 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device
05/22/2007US7220969 Mask blanks inspection tool
05/22/2007US7220808 Thiol compound, copolymer and method for producing the copolymer
05/22/2007US7220714 comprises carbon dioxide, additive (tetramethylammoniumfluoride) for removing residues, inhibitor (ethylene glycol) of residues, and co-solvent for dissolving additive and inhibitor in carbon dioxide at pressurized fluid conditions; for removal of photoresists during semiconductor processing
05/22/2007US7220679 Method for forming patterns in a semiconductor device
05/22/2007US7220606 Integrated circuit identification
05/22/2007US7220534 Photosensitive composition and color filter
05/22/2007US7220533 For laser scanning exposure; irradiation polymerizaion with high pressure mercury lamp
05/22/2007US7220532 Increasing the photosensitivity and high resolution, by including a catalysts of acid generator and amide compound; excimer laser lithography for micro-semiconductors
05/22/2007US7220531 Resist for electron beam lithography and a process for producing photomasks using electron beam lithography
05/22/2007US7220530 Light sensitive planographic printing plate material
05/22/2007US7220529 Mixture of addition polymer and cyanine dye, sensitivity, storability of unprocessed stock, surface yellowing (stain) resistance, and light fixation
05/22/2007US7220520 Photosensitive resin compositions
05/22/2007US7220486 Photoresist compositions
05/22/2007US7220467 Polymer having a photo-reactive ethenyl group on a main chain; improved alignment stability against external shocks, light, and heat.
05/22/2007US7220452 Multilayer transfer patterning using polymer-on-polymer stamping
05/22/2007US7220307 Treated pigment, use thereof, and compound for pigment treatment
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