Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2007
05/30/2007CN1970172A Condenser type ultrasonic transducing device and its making method
05/30/2007CN1319418C Method for manufacturing electroluminescent element
05/30/2007CN1319141C Method and system for monitoring etch process
05/30/2007CN1319133C Post etch photoresist strip with hydrogen for organosilicate glass low-kappa etch applications
05/30/2007CN1319122C Thermal treatment equipment and thermal treatment method
05/30/2007CN1319121C Method for forming alignment pattern of semiconductor device
05/30/2007CN1319120C Pattern-producing method for semiconductor device
05/30/2007CN1318917C Method for producing semiconductor device using argon fluoride exposure light source
05/30/2007CN1318916C Positive resist composition and method of forming resist pattern from the same
05/30/2007CN1318915C Alkali development type photocurable composition and pattern of burned matter obtained from same
05/30/2007CN1318914C Method of manufacturing wafer and method of evaluating overlapping alignment between light shade patterns
05/30/2007CN1318913C Photoresist composite for short wavelength purpose
05/30/2007CN1318474C Photocurable and thermosetting resin composition and printed circuit boards made by using the same
05/30/2007CN1318473C Unsaturated polybranched compounds, curable compositions containing the same and cured articles thereof
05/30/2007CN1318222C Imaging device, imaging method and printing device
05/30/2007CN1318151C Device and method for forming coating film
05/29/2007USRE39662 Projection exposure apparatus
05/29/2007US7225048 Gap adjustment apparatus and gap adjustment method for adjusting gap between two objects
05/29/2007US7225041 Information providing method and system
05/29/2007US7224505 Manufacturing method of electro-optical apparatus substrate, manufacturing method of electro-optical apparatus, electro-optical apparatus substrate, electro-optical apparatus, and electronic instrument
05/29/2007US7224459 Exposure apparatus, method of controlling same, method of manufacturing devices, computer-readable memory and program
05/29/2007US7224443 Imprint lithography substrate processing tool for modulating shapes of substrates
05/29/2007US7224439 Method and imaging apparatus for imaging a structure onto a semiconductor wafer by means of immersion lithography
05/29/2007US7224438 Method of manufacturing a device, device manufactured thereby, computer program and lithographic apparatus
05/29/2007US7224436 Lithographic apparatus and device manufacturing method
05/29/2007US7224435 Using isotopically specified fluids as optical elements
05/29/2007US7224433 Method and apparatus for immersion lithography
05/29/2007US7224432 Stage device, exposure apparatus, and device manufacturing method
05/29/2007US7224430 Optical component, optical system including such an optical component, lithographic apparatus, method of correcting apodization in an optical system, device manufacturing method, and device manufactured thereby
05/29/2007US7224429 Lithographic apparatus, device manufacturing method and positioning system
05/29/2007US7224428 Lithographic apparatus and device manufacturing method
05/29/2007US7223721 N-(hydroxyalkyl)alkoxyalkanamide; and a swelling agent, especially a hydroxylamine salt; does not attack underlying layers and does not leave residues
05/29/2007US7223703 Method of forming patterns
05/29/2007US7223696 Methods for maskless lithography
05/29/2007US7223527 forming photoresist multilayers containing acid generators, then exposing and developing to pattern the layers; efficiency; miniaturization; accuracy; uniformity; integrated circuits
05/29/2007US7223526 plasma enhanced thermal decomposition of hydrocarbon gas mixtures in close proximity to substrate surfaces, results in deposition of an amorphous carbon layer on the substrate surfaces; film compatible with integrated circuit fabrication
05/29/2007US7223525 Process for generating a hard mask for the patterning of a layer
05/29/2007US7223524 Laser-engravable flexographic printing element containing a conductive carbon black and method for production of flexographic printing forms
05/29/2007US7223523 Hydrophilic surfaces; applying peroxy compound; exposure to electromagnetic radiation
05/29/2007US7223522 Printing plate material and printing plate
05/29/2007US7223519 Imaging compositions and methods
05/29/2007US7223518 polymer resin does not substantially absorb about 1 to 450 nanometer (nm) wavelength energy and photoacid generator does substantially absorb about 1 to 450 nanometer (nm) wavelength energy
05/29/2007US7223517 Lithographic antireflective hardmask compositions and uses thereof
05/29/2007US7223516 High in sensitivity, excellent in adhesion and giving a good resist pattern profile, polymer comprising units of hydroxyalkylacrylate, mercaptoalkylacrylate, or corresponding ethers and sulfides
05/29/2007US7223515 nonabsorbent substrates having light to heat conversion and thermal transfer layers, used to form optics such as color filters, polarizers, printed circuits, liquid crystal displays and electroluminescent devices
05/29/2007US7223514 Method of fabricating donor substrate and method of fabricating OLED using the donor substrate
05/29/2007US7223513 containing heat insulation layers including hollow particles, that provide high density prints and ensure uniform printing
05/29/2007US7223512 Multilayer body with a laser-sensitive layer
05/29/2007US7223506 Imageable members with improved chemical resistance
05/29/2007US7223505 Thin film formed on a substrate, irradiating with an energy beam to elevate the temperature of a region to a predetermined temperature, and patterning
05/29/2007US7223444 Determinating shape of surface; stamp for transferring electricity charging; fine geometric shapes
05/29/2007US7223162 Holder for wafers
05/29/2007CA2380075C Microfabricated devices and method of manufacturing the same using polymer gel
05/29/2007CA2256446C Imaging device, imaging method, and printing device
05/24/2007WO2007058443A1 Thinner composition for removing photoresist
05/24/2007WO2007058355A1 Photosensitive transfer material, partition wall and method for forming same, optical device and method for producing same, and display
05/24/2007WO2007058345A1 Radiation-sensitive resin composition
05/24/2007WO2007058240A1 Substrate processing method, photomask manufacturing method, photomask and device manufacturing method
05/24/2007WO2007058188A1 Exposure apparatus, exposure method and device manufacturing method
05/24/2007WO2007058163A1 Flexo printing plate
05/24/2007WO2007057673A1 Lithographic apparatus
05/24/2007WO2007057664A2 A method of patterning a thin film
05/24/2007WO2007057413A1 Method of making a lithographic printing plate
05/24/2007WO2007057410A1 Method of making a lithographic printing plate
05/24/2007WO2007057409A1 Method of making a lithographic printing plate
05/24/2007WO2007057349A1 Method of making a lithographic printing plate
05/24/2007WO2007057348A1 Method of making a lithographic printing plate
05/24/2007WO2007057347A1 Method of making a lithographic printing plate
05/24/2007WO2007057336A1 Method of making a lithographic printing plate
05/24/2007WO2007057335A1 Method of making a lithographic printing plate
05/24/2007WO2007057334A1 Method of making a lithographic printing plate
05/24/2007WO2007057333A1 Method of making a lithographic printing plate
05/24/2007WO2007057263A1 Water castable - water strippable top coats for 193 nm immersion lithography
05/24/2007WO2007043597A9 Method and apparatus for driving semiconductor lasers, and method and apparatus for deriving drive current patterns for semiconductor lasers
05/24/2007WO2007037452A9 Drawing point data obtainment method and apparatus
05/24/2007WO2006125576A3 Optical grid system, measuring device, multiple exposure device and method
05/24/2007WO2006074812A3 Illumination sytsem for a microlithographic projection exposure apparatus
05/24/2007US20070117876 Alkali-soluble resin containing fluorenediphenoxy residues; photopolymerizable monomer (dipentaerythritol hexaacrylate); photoinitiator; solvent; black pigment; coatable on a liquid crystal display substrate by slit coating; heat resistance
05/24/2007US20070117411 Rework process for photoresist film
05/24/2007US20070117409 Aligner and Semiconductor Device Manufacturing Method Using the Aligner
05/24/2007US20070117389 Pattern formation method using nanoimprinting and device for carrying out same
05/24/2007US20070117341 Hydrogen plasma photoresist strip and polymeric residue cleanup process for low dielectric constant materials
05/24/2007US20070117050 Maintenance of photoresist activity on the surface of dielectric arcs for 90 nm feature sizes
05/24/2007US20070117049 Form crosslinks of repeating -(CO-O-CH(-CH3)-O)-; reaction of multifunctional vinyl ether and a polymer with free acid groups, e.g. poly(methacryloyloxy ethyl phthalate); eliminate the bottom anti-reflective coating etch step by using a wet-developable bottom anti-reflective coating; high resolution
05/24/2007US20070117048 Method of manufacturing printing plate and method of manufacturing liquid crystal display device using the same
05/24/2007US20070117047 Printing plate, method of manufacturing of printing plate and liquid crystal display device using the same
05/24/2007US20070117045 Alkali soluble reaction product of a copolymer having optionally alkylated styrene and hydroxystyrene units and bisvinyloxyalkylene curing agent; photoacid generator; organic solvent; high sensitivity, heat resistance and resolution; undulation suppression
05/24/2007US20070117039 Water dispersion latexes, photopolymerizable alkyl methacrylate, nonionic surfactant
05/24/2007US20070117031 Colored curable composition, color filter and method of producing thereof
05/24/2007US20070117030 photolithography mask; generating a known set of functions (calibrated model) defining the performance of an imaging system which are used to correct for optical proximity effects and to improve the printing of mask patterns; computer program
05/24/2007US20070117029 Exposure pattern or mask and inspection method and manufacture method for the same
05/24/2007US20070117028 Mask handling method, and mask and device or apparatus comprising a gripper therefor, device manufacturing method and device manufactured thereby
05/24/2007US20070115586 Method of manufacturing magnetic recording medium, magnetic recording medium stamper, and magnetic recording medium preform
05/24/2007US20070115555 Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method
05/24/2007US20070115458 Optical apparatus, method of determining position of optical element in optical system, and device manufacturing method
05/24/2007US20070115453 Immersion lithography fluid control system
05/24/2007US20070115450 Exposure apparatus, exposure method, method for producing device, and optical part
05/24/2007US20070115449 Lithographic apparatus and device manufacturing method
05/24/2007US20070115448 Exposure apparatus and device manufacturing method
05/24/2007US20070115447 Exposure apparatus and device manufacturing method