Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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05/30/2007 | CN1970172A Condenser type ultrasonic transducing device and its making method |
05/30/2007 | CN1319418C Method for manufacturing electroluminescent element |
05/30/2007 | CN1319141C Method and system for monitoring etch process |
05/30/2007 | CN1319133C Post etch photoresist strip with hydrogen for organosilicate glass low-kappa etch applications |
05/30/2007 | CN1319122C Thermal treatment equipment and thermal treatment method |
05/30/2007 | CN1319121C Method for forming alignment pattern of semiconductor device |
05/30/2007 | CN1319120C Pattern-producing method for semiconductor device |
05/30/2007 | CN1318917C Method for producing semiconductor device using argon fluoride exposure light source |
05/30/2007 | CN1318916C Positive resist composition and method of forming resist pattern from the same |
05/30/2007 | CN1318915C Alkali development type photocurable composition and pattern of burned matter obtained from same |
05/30/2007 | CN1318914C Method of manufacturing wafer and method of evaluating overlapping alignment between light shade patterns |
05/30/2007 | CN1318913C Photoresist composite for short wavelength purpose |
05/30/2007 | CN1318474C Photocurable and thermosetting resin composition and printed circuit boards made by using the same |
05/30/2007 | CN1318473C Unsaturated polybranched compounds, curable compositions containing the same and cured articles thereof |
05/30/2007 | CN1318222C Imaging device, imaging method and printing device |
05/30/2007 | CN1318151C Device and method for forming coating film |
05/29/2007 | USRE39662 Projection exposure apparatus |
05/29/2007 | US7225048 Gap adjustment apparatus and gap adjustment method for adjusting gap between two objects |
05/29/2007 | US7225041 Information providing method and system |
05/29/2007 | US7224505 Manufacturing method of electro-optical apparatus substrate, manufacturing method of electro-optical apparatus, electro-optical apparatus substrate, electro-optical apparatus, and electronic instrument |
05/29/2007 | US7224459 Exposure apparatus, method of controlling same, method of manufacturing devices, computer-readable memory and program |
05/29/2007 | US7224443 Imprint lithography substrate processing tool for modulating shapes of substrates |
05/29/2007 | US7224439 Method and imaging apparatus for imaging a structure onto a semiconductor wafer by means of immersion lithography |
05/29/2007 | US7224438 Method of manufacturing a device, device manufactured thereby, computer program and lithographic apparatus |
05/29/2007 | US7224436 Lithographic apparatus and device manufacturing method |
05/29/2007 | US7224435 Using isotopically specified fluids as optical elements |
05/29/2007 | US7224433 Method and apparatus for immersion lithography |
05/29/2007 | US7224432 Stage device, exposure apparatus, and device manufacturing method |
05/29/2007 | US7224430 Optical component, optical system including such an optical component, lithographic apparatus, method of correcting apodization in an optical system, device manufacturing method, and device manufactured thereby |
05/29/2007 | US7224429 Lithographic apparatus, device manufacturing method and positioning system |
05/29/2007 | US7224428 Lithographic apparatus and device manufacturing method |
05/29/2007 | US7223721 N-(hydroxyalkyl)alkoxyalkanamide; and a swelling agent, especially a hydroxylamine salt; does not attack underlying layers and does not leave residues |
05/29/2007 | US7223703 Method of forming patterns |
05/29/2007 | US7223696 Methods for maskless lithography |
05/29/2007 | US7223527 forming photoresist multilayers containing acid generators, then exposing and developing to pattern the layers; efficiency; miniaturization; accuracy; uniformity; integrated circuits |
05/29/2007 | US7223526 plasma enhanced thermal decomposition of hydrocarbon gas mixtures in close proximity to substrate surfaces, results in deposition of an amorphous carbon layer on the substrate surfaces; film compatible with integrated circuit fabrication |
05/29/2007 | US7223525 Process for generating a hard mask for the patterning of a layer |
05/29/2007 | US7223524 Laser-engravable flexographic printing element containing a conductive carbon black and method for production of flexographic printing forms |
05/29/2007 | US7223523 Hydrophilic surfaces; applying peroxy compound; exposure to electromagnetic radiation |
05/29/2007 | US7223522 Printing plate material and printing plate |
05/29/2007 | US7223519 Imaging compositions and methods |
05/29/2007 | US7223518 polymer resin does not substantially absorb about 1 to 450 nanometer (nm) wavelength energy and photoacid generator does substantially absorb about 1 to 450 nanometer (nm) wavelength energy |
05/29/2007 | US7223517 Lithographic antireflective hardmask compositions and uses thereof |
05/29/2007 | US7223516 High in sensitivity, excellent in adhesion and giving a good resist pattern profile, polymer comprising units of hydroxyalkylacrylate, mercaptoalkylacrylate, or corresponding ethers and sulfides |
05/29/2007 | US7223515 nonabsorbent substrates having light to heat conversion and thermal transfer layers, used to form optics such as color filters, polarizers, printed circuits, liquid crystal displays and electroluminescent devices |
05/29/2007 | US7223514 Method of fabricating donor substrate and method of fabricating OLED using the donor substrate |
05/29/2007 | US7223513 containing heat insulation layers including hollow particles, that provide high density prints and ensure uniform printing |
05/29/2007 | US7223512 Multilayer body with a laser-sensitive layer |
05/29/2007 | US7223506 Imageable members with improved chemical resistance |
05/29/2007 | US7223505 Thin film formed on a substrate, irradiating with an energy beam to elevate the temperature of a region to a predetermined temperature, and patterning |
05/29/2007 | US7223444 Determinating shape of surface; stamp for transferring electricity charging; fine geometric shapes |
05/29/2007 | US7223162 Holder for wafers |
05/29/2007 | CA2380075C Microfabricated devices and method of manufacturing the same using polymer gel |
05/29/2007 | CA2256446C Imaging device, imaging method, and printing device |
05/24/2007 | WO2007058443A1 Thinner composition for removing photoresist |
05/24/2007 | WO2007058355A1 Photosensitive transfer material, partition wall and method for forming same, optical device and method for producing same, and display |
05/24/2007 | WO2007058345A1 Radiation-sensitive resin composition |
05/24/2007 | WO2007058240A1 Substrate processing method, photomask manufacturing method, photomask and device manufacturing method |
05/24/2007 | WO2007058188A1 Exposure apparatus, exposure method and device manufacturing method |
05/24/2007 | WO2007058163A1 Flexo printing plate |
05/24/2007 | WO2007057673A1 Lithographic apparatus |
05/24/2007 | WO2007057664A2 A method of patterning a thin film |
05/24/2007 | WO2007057413A1 Method of making a lithographic printing plate |
05/24/2007 | WO2007057410A1 Method of making a lithographic printing plate |
05/24/2007 | WO2007057409A1 Method of making a lithographic printing plate |
05/24/2007 | WO2007057349A1 Method of making a lithographic printing plate |
05/24/2007 | WO2007057348A1 Method of making a lithographic printing plate |
05/24/2007 | WO2007057347A1 Method of making a lithographic printing plate |
05/24/2007 | WO2007057336A1 Method of making a lithographic printing plate |
05/24/2007 | WO2007057335A1 Method of making a lithographic printing plate |
05/24/2007 | WO2007057334A1 Method of making a lithographic printing plate |
05/24/2007 | WO2007057333A1 Method of making a lithographic printing plate |
05/24/2007 | WO2007057263A1 Water castable - water strippable top coats for 193 nm immersion lithography |
05/24/2007 | WO2007043597A9 Method and apparatus for driving semiconductor lasers, and method and apparatus for deriving drive current patterns for semiconductor lasers |
05/24/2007 | WO2007037452A9 Drawing point data obtainment method and apparatus |
05/24/2007 | WO2006125576A3 Optical grid system, measuring device, multiple exposure device and method |
05/24/2007 | WO2006074812A3 Illumination sytsem for a microlithographic projection exposure apparatus |
05/24/2007 | US20070117876 Alkali-soluble resin containing fluorenediphenoxy residues; photopolymerizable monomer (dipentaerythritol hexaacrylate); photoinitiator; solvent; black pigment; coatable on a liquid crystal display substrate by slit coating; heat resistance |
05/24/2007 | US20070117411 Rework process for photoresist film |
05/24/2007 | US20070117409 Aligner and Semiconductor Device Manufacturing Method Using the Aligner |
05/24/2007 | US20070117389 Pattern formation method using nanoimprinting and device for carrying out same |
05/24/2007 | US20070117341 Hydrogen plasma photoresist strip and polymeric residue cleanup process for low dielectric constant materials |
05/24/2007 | US20070117050 Maintenance of photoresist activity on the surface of dielectric arcs for 90 nm feature sizes |
05/24/2007 | US20070117049 Form crosslinks of repeating -(CO-O-CH(-CH3)-O)-; reaction of multifunctional vinyl ether and a polymer with free acid groups, e.g. poly(methacryloyloxy ethyl phthalate); eliminate the bottom anti-reflective coating etch step by using a wet-developable bottom anti-reflective coating; high resolution |
05/24/2007 | US20070117048 Method of manufacturing printing plate and method of manufacturing liquid crystal display device using the same |
05/24/2007 | US20070117047 Printing plate, method of manufacturing of printing plate and liquid crystal display device using the same |
05/24/2007 | US20070117045 Alkali soluble reaction product of a copolymer having optionally alkylated styrene and hydroxystyrene units and bisvinyloxyalkylene curing agent; photoacid generator; organic solvent; high sensitivity, heat resistance and resolution; undulation suppression |
05/24/2007 | US20070117039 Water dispersion latexes, photopolymerizable alkyl methacrylate, nonionic surfactant |
05/24/2007 | US20070117031 Colored curable composition, color filter and method of producing thereof |
05/24/2007 | US20070117030 photolithography mask; generating a known set of functions (calibrated model) defining the performance of an imaging system which are used to correct for optical proximity effects and to improve the printing of mask patterns; computer program |
05/24/2007 | US20070117029 Exposure pattern or mask and inspection method and manufacture method for the same |
05/24/2007 | US20070117028 Mask handling method, and mask and device or apparatus comprising a gripper therefor, device manufacturing method and device manufactured thereby |
05/24/2007 | US20070115586 Method of manufacturing magnetic recording medium, magnetic recording medium stamper, and magnetic recording medium preform |
05/24/2007 | US20070115555 Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method |
05/24/2007 | US20070115458 Optical apparatus, method of determining position of optical element in optical system, and device manufacturing method |
05/24/2007 | US20070115453 Immersion lithography fluid control system |
05/24/2007 | US20070115450 Exposure apparatus, exposure method, method for producing device, and optical part |
05/24/2007 | US20070115449 Lithographic apparatus and device manufacturing method |
05/24/2007 | US20070115448 Exposure apparatus and device manufacturing method |
05/24/2007 | US20070115447 Exposure apparatus and device manufacturing method |