| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/31/2007 | WO2007061189A2 Occupancy based pattern generation method for maskless lithography |
| 05/31/2007 | WO2007061115A1 Process for producing organic el, color filter and diaphragm |
| 05/31/2007 | WO2007061091A1 Photoresist composition for spray coating and laminate |
| 05/31/2007 | WO2007060971A1 Washing liquid for photolithography, and method for washing exposure device using the same |
| 05/31/2007 | WO2007060919A1 Radiation-sensitive resin composition |
| 05/31/2007 | WO2007060857A1 Method for manufacture of color filter, color filter, and display device |
| 05/31/2007 | WO2007060834A1 Optical integrator, illumination optical device, exposure device, and device manufacturing method |
| 05/31/2007 | WO2007060824A1 Etching solution for thermoplastic polyimide resin |
| 05/31/2007 | WO2007060353A1 Method for surface structuring of a glass product, glass product with structured surface and uses |
| 05/31/2007 | WO2007037553A9 Process for producing substrate with metal wiring |
| 05/31/2007 | WO2007037519A9 Image recording apparatus, image recording method, data structure, recording medium, data processing apparatus and method |
| 05/31/2007 | WO2007031842B1 Process for the manufacture of printing support for rollers for the printing of laminar materials, machine for implementing the process and the printing support for printing rollers |
| 05/31/2007 | WO2007023336A3 Method of developing lithographic printing plate precursors |
| 05/31/2007 | WO2007021741A3 Methods of using a nanotransfer printing stamp having conductively coated sidewalls |
| 05/31/2007 | WO2006128713A3 Optical imaging arrangement |
| 05/31/2007 | WO2006114294A3 Illumination system for a microlithgraphic exposure apparatus |
| 05/31/2007 | WO2005070167A3 Nanoscale electric lithography |
| 05/31/2007 | US20070124012 Programmed material consolidation methods employing machine vision |
| 05/31/2007 | US20070123674 Chemical amplification type resist composition |
| 05/31/2007 | US20070123645 Ultraviolet curable silver composition and related method |
| 05/31/2007 | US20070123058 Semiconductor device structures that include sacrificial, readily removable materials |
| 05/31/2007 | US20070123052 Process sequence for photoresist stripping and cleaning of photomasks for integrated circuit manufacturing |
| 05/31/2007 | US20070122942 Conforming Template for Patterning Liquids Disposed on Substrates |
| 05/31/2007 | US20070122754 Radiating vacuum-ultraviolet light through a photomask to a pattern forming substrate, varying a surface property by the vacuum-ultraviolet light, and forming a property varied pattern with the property varied on a surface of the pattern forming substrate to form a pattern formed body; removing |
| 05/31/2007 | US20070122753 Method for manufacturing semiconductor device |
| 05/31/2007 | US20070122752 Semiconductor device manufacturing method and substrate processing system |
| 05/31/2007 | US20070122751 Methods of Patterning Using Photomasks Including Shadowing Elements Therein and Related Systems |
| 05/31/2007 | US20070122748 Photopolymer printing form with reduced processing time |
| 05/31/2007 | US20070122744 Positive-working photoresist composition and photosensitive material using same |
| 05/31/2007 | US20070122733 Positive photosensitive resin composition, method for forming pattern, and electronic part |
| 05/31/2007 | US20070122720 Polarized reticle, photolithography system, and method of fabricating a polarized reticle |
| 05/31/2007 | US20070122718 distribution of the light transmittance is determined so that the resist layer having been exposed in accordance with a first resist shape would be used to form a second resist shape with an aspect ratio higher than the aspect ratio of the first resist shape; gray scale mask; microlens |
| 05/31/2007 | US20070122559 Processing liquid coating apparatus and a processing liquid coating method |
| 05/31/2007 | US20070122551 Coater/developer and coating/developing method |
| 05/31/2007 | US20070121224 Optical element holding apparatus |
| 05/31/2007 | US20070121107 Excimer laser inspection system |
| 05/31/2007 | US20070121089 Exposure method, exposure apparatus, and method for producing device |
| 05/31/2007 | US20070120072 Illumination system particularly for microlithography |
| 05/31/2007 | US20070119131 Chemical filter arrangement for asemiconductor manufacturing apparatus |
| 05/31/2007 | DE19503985B4 Verfahren zur Bildung eines Fotolackmusters für eine Halbleitervorrichtung A method of forming a resist pattern for a semiconductor device |
| 05/31/2007 | DE102005057109A1 Continuous wet chemical processing, e.g. cleaning, etching, stripping, coating or drying of flat, thin, fragile substrates comprises transporting and processing substrates using absorbent rollers |
| 05/31/2007 | DE102005056914A1 Projektionsbelichtungsystem Projection exposure system |
| 05/31/2007 | DE10131667B4 Negativ Resistprozess mit simultaner Entwicklung und Silylierung Negative resist process with simultaneous development and silylation |
| 05/31/2007 | CA2627688A1 Apparatus for recycling alkane immersion liquids and methods of employment |
| 05/30/2007 | EP1791169A1 Aligning method, processing system, substrate loading repeatability measuring method, position measuring method, exposure method, substrate processing apparatus, measuring method and measuring apparatus |
| 05/30/2007 | EP1791165A1 Stage device and exposure system |
| 05/30/2007 | EP1791164A1 Exposure equipment, exposure method and device manufacturing method |
| 05/30/2007 | EP1791028A1 Micro pattern forming material, method of forming micro resist pattern and electronic device |
| 05/30/2007 | EP1791027A1 Lithographic apparatus and device manufacturing method |
| 05/30/2007 | EP1791026A1 System and method to increase surface tension and contact angle in immersion lithography |
| 05/30/2007 | EP1791025A2 Negative resist composition and patterning process |
| 05/30/2007 | EP1791024A1 Electron-beam or euv (extreme ultraviolet) resist composition and process for the formation of resist patterns |
| 05/30/2007 | EP1790703A2 Coating liquid for forming silica-based film having low dielectric constant and substrate having film of low dielectric constant coated thereon |
| 05/30/2007 | EP1790645A1 Lactone compound, lactone-containing monomer, polymer of those, resist composition using same, method for forming pattern using same |
| 05/30/2007 | EP1789852A2 Monolithic polarization controlled angle diffusers and associated methods |
| 05/30/2007 | EP1789851A2 Pupil improvement of incoherent imaging systems for enhanced cd linearity |
| 05/30/2007 | EP1789850A2 Novel resist material and method for forming a patterned resist layer on a substrate |
| 05/30/2007 | EP1789849A2 Use of methanofullerene derivatives as resist materials and method for forming a resist layer |
| 05/30/2007 | EP1789848A1 A flexible nano-imprint stamp |
| 05/30/2007 | EP1789847A1 Integral plated resistor and method for the manufacture of printed circuit boards comprising boards comprising the same |
| 05/30/2007 | EP1789846A2 Fabrication of polymeric structures |
| 05/30/2007 | EP1789527A1 Cleaning compositions for microelectronics substrates |
| 05/30/2007 | EP1695142A4 Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| 05/30/2007 | EP1554347B1 Polymer for heat-sensitive lithographic printing plate precursor |
| 05/30/2007 | EP1468041B1 Resin composition |
| 05/30/2007 | EP1440459B8 Method and apparatus for mitigating cross-contamination between liquid dispensing jets in close proximity to a surface |
| 05/30/2007 | EP1287549A4 An apparatus and a method for forming a pattern using a crystal structure of material |
| 05/30/2007 | EP1163550B1 Hydroxy-amino thermally cured undercoat for 193 nm lithography |
| 05/30/2007 | CN1973358A Processing system and method for chemically treating a TERA layer |
| 05/30/2007 | CN1973357A EUV light source, EUV exposure system, and production method for semiconductor device |
| 05/30/2007 | CN1973247A Developer for a photopolymer protective layer |
| 05/30/2007 | CN1973246A System for measuring the image quality of an optical imaging system |
| 05/30/2007 | CN1973245A Organic film composition and method for forming resist pattern |
| 05/30/2007 | CN1973244A Levenson type phase shift mask and production method therefor |
| 05/30/2007 | CN1972803A Imageable element with solvent-resistant polymeric binder |
| 05/30/2007 | CN1971854A Substrate treating method and apparatus |
| 05/30/2007 | CN1971842A Method for manufacturing semiconductor device |
| 05/30/2007 | CN1971430A Lithographic apparatus and device manufacturing method |
| 05/30/2007 | CN1971429A Lithographic apparatus and device manufacturing method |
| 05/30/2007 | CN1971428A Manufacturing method of semiconductor device using immersion lithography process |
| 05/30/2007 | CN1971427A Method of determining photo mask, method of manufacturing semiconductor device |
| 05/30/2007 | CN1971426A Optical system of focusing and leveling sensor |
| 05/30/2007 | CN1971425A Measuring system and method for photoelectric difference |
| 05/30/2007 | CN1971424A Semiconductor structure and method of forming photoresist pattern and pattern of semiconductor device using the same structure |
| 05/30/2007 | CN1971423A Method of manufacturing of printing plate and liquid crystal display device using the same |
| 05/30/2007 | CN1971422A Cooler of static chuck of extreme ultraviolet photolithographic mask platform |
| 05/30/2007 | CN1971421A Salt for acid generating agent and chemically amplifiable anticorrosion composition containing the salt |
| 05/30/2007 | CN1971420A Red photoresist combination of color light filter used for LCD device and its application |
| 05/30/2007 | CN1971419A Liquid photo-imaging alkali developable electronic solder-proof ink and its preparing method |
| 05/30/2007 | CN1971418A Photosensitive resin precursor composition |
| 05/30/2007 | CN1971416A Printing plate, method of manufacturing of printing plate and liquid crystal display device using the same |
| 05/30/2007 | CN1971415A Manufacturing method of contact hole on surface of silicon chip |
| 05/30/2007 | CN1971395A A manufacturing method of optical limiter of photon crystal |
| 05/30/2007 | CN1971389A Pixel structure of TFT-LCD device and its manufacturing method |
| 05/30/2007 | CN1971365A Color filter substrate for liquid crystal display device and method for manufacturing the same |
| 05/30/2007 | CN1971351A Etching composition for ito |
| 05/30/2007 | CN1970715A Cleaning liquid of medicinal liquor supply device for semiconductor manufacture |
| 05/30/2007 | CN1970657A Printing oil ink and production method of coating film using the oil ink |
| 05/30/2007 | CN1970599A SU-8 epoxy resin separation method |
| 05/30/2007 | CN1970432A Microelectromechanicl system vibration jet actuator and its preparation method |